JPH0156501B2 - - Google Patents
Info
- Publication number
- JPH0156501B2 JPH0156501B2 JP54168169A JP16816979A JPH0156501B2 JP H0156501 B2 JPH0156501 B2 JP H0156501B2 JP 54168169 A JP54168169 A JP 54168169A JP 16816979 A JP16816979 A JP 16816979A JP H0156501 B2 JPH0156501 B2 JP H0156501B2
- Authority
- JP
- Japan
- Prior art keywords
- crossover
- electron beam
- image
- electron
- chip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/248—Components associated with high voltage supply
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16816979A JPS5691363A (en) | 1979-12-26 | 1979-12-26 | Use of electron gun and electron beam device |
US06/216,948 US4424448A (en) | 1979-12-26 | 1980-12-16 | Electron beam apparatus |
DE8585109319T DE3072128D1 (en) | 1979-12-26 | 1980-12-22 | A method for determining the optimum operative conditions of an electron gun |
EP80108139A EP0031579B1 (en) | 1979-12-26 | 1980-12-22 | Method for determining the optimum operative conditions of the electron gun of an electron beam apparatus |
DE8080108139T DE3071935D1 (en) | 1979-12-26 | 1980-12-22 | Method for determining the optimum operative conditions of the electron gun of an electron beam apparatus |
EP85109319A EP0168064B1 (en) | 1979-12-26 | 1980-12-22 | A method for determining the optimum operative conditions of an electron gun |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16816979A JPS5691363A (en) | 1979-12-26 | 1979-12-26 | Use of electron gun and electron beam device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5691363A JPS5691363A (en) | 1981-07-24 |
JPH0156501B2 true JPH0156501B2 (enrdf_load_stackoverflow) | 1989-11-30 |
Family
ID=15863073
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16816979A Granted JPS5691363A (en) | 1979-12-26 | 1979-12-26 | Use of electron gun and electron beam device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5691363A (enrdf_load_stackoverflow) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5818833A (ja) * | 1981-07-27 | 1983-02-03 | Denki Kagaku Kogyo Kk | 高密度電子ビ−ムの低温発生方法及びその装置 |
US4423305A (en) * | 1981-07-30 | 1983-12-27 | International Business Machines Corporation | Method and apparatus for controlling alignment of an electron beam of a variable shape |
JPS5840729A (ja) * | 1981-09-02 | 1983-03-09 | Denki Kagaku Kogyo Kk | 単結晶ランタンボライド陰極を備えた高輝度電子銃の処理方法 |
JPS58129736A (ja) * | 1982-01-28 | 1983-08-02 | Toshiba Corp | 電子光学鏡筒 |
JP2003297272A (ja) * | 2002-04-04 | 2003-10-17 | Ebara Corp | 電子線装置及び該装置を用いたデバイス製造方法 |
JP2011040341A (ja) * | 2009-08-18 | 2011-02-24 | Nuflare Technology Inc | 電子銃、荷電粒子ビーム描画装置および荷電粒子ビーム描画方法 |
JP5912835B2 (ja) * | 2012-05-14 | 2016-04-27 | 日本電子株式会社 | 電子銃、その駆動装置、およびその制御方法 |
JP7068069B2 (ja) * | 2018-06-27 | 2022-05-16 | 株式会社日立製作所 | 電子顕微鏡 |
-
1979
- 1979-12-26 JP JP16816979A patent/JPS5691363A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5691363A (en) | 1981-07-24 |
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