JPH0151051B2 - - Google Patents

Info

Publication number
JPH0151051B2
JPH0151051B2 JP56185081A JP18508181A JPH0151051B2 JP H0151051 B2 JPH0151051 B2 JP H0151051B2 JP 56185081 A JP56185081 A JP 56185081A JP 18508181 A JP18508181 A JP 18508181A JP H0151051 B2 JPH0151051 B2 JP H0151051B2
Authority
JP
Japan
Prior art keywords
gas
core tube
furnace core
protrusion
rail groove
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56185081A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5885523A (ja
Inventor
Iwao Matsushima
Junichi Takahara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Home Electronics Ltd
Original Assignee
NEC Home Electronics Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Home Electronics Ltd filed Critical NEC Home Electronics Ltd
Priority to JP56185081A priority Critical patent/JPS5885523A/ja
Publication of JPS5885523A publication Critical patent/JPS5885523A/ja
Publication of JPH0151051B2 publication Critical patent/JPH0151051B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P32/00—
JP56185081A 1981-11-17 1981-11-17 半導体製造装置 Granted JPS5885523A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56185081A JPS5885523A (ja) 1981-11-17 1981-11-17 半導体製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56185081A JPS5885523A (ja) 1981-11-17 1981-11-17 半導体製造装置

Publications (2)

Publication Number Publication Date
JPS5885523A JPS5885523A (ja) 1983-05-21
JPH0151051B2 true JPH0151051B2 (enExample) 1989-11-01

Family

ID=16164483

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56185081A Granted JPS5885523A (ja) 1981-11-17 1981-11-17 半導体製造装置

Country Status (1)

Country Link
JP (1) JPS5885523A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3012521B2 (ja) * 1996-05-30 2000-02-21 山形日本電気株式会社 ウェハ搬出入装置
JP5912230B2 (ja) * 2010-06-25 2016-04-27 光洋サーモシステム株式会社 連続拡散処理装置
JP5912229B2 (ja) * 2010-06-25 2016-04-27 光洋サーモシステム株式会社 連続拡散処理装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5242075A (en) * 1975-09-29 1977-04-01 Nippon Denso Co Ltd Device for controlling gas atmosphere in semiconductor producing equip ment
JPS53129964A (en) * 1977-04-20 1978-11-13 Hitachi Ltd Method and device for inserting and taking out of heat treatment jig
JPS5469384A (en) * 1977-11-14 1979-06-04 Matsushita Electric Ind Co Ltd Electric furnace unit

Also Published As

Publication number Publication date
JPS5885523A (ja) 1983-05-21

Similar Documents

Publication Publication Date Title
US4911638A (en) Controlled diffusion environment capsule and system
JP4174837B2 (ja) 縦型熱処理炉
EP0140755B1 (en) A plasma processor for ic fabrication
US4957781A (en) Processing apparatus
JP4275769B2 (ja) 基体の移載装置
US4955808A (en) Method of heat-processing objects and device and boat for the same
KR900000835B1 (ko) 서스펜션 캔릴레버(Suspension Cantilever) 로딩장치(Loading system)를 갖는 횡형로(橫型爐)
US5080039A (en) Processing apparatus
JPH0151051B2 (enExample)
JP3361804B2 (ja) Ｃｃｖｄ反応器システム
US5178534A (en) Controlled diffusion environment capsule and system
JP2005268244A (ja) 基板処理装置
KR100350612B1 (ko) 이중수직형열처리로(爐)
JP4495470B2 (ja) エッチング方法
JP2733681B2 (ja) 熱処理装置
KR100533459B1 (ko) 고온공정용 반도체 제조장치
JPH04111417A (ja) 縦型熱処理装置
JP2645360B2 (ja) 縦型熱処理装置および熱処理方法
JPH03129722A (ja) 気相成長装置
JPH0250619B2 (enExample)
GB2139744A (en) Apparatus for firing semiconductor elements
JPS6367729A (ja) 半導体熱処理装置
JPH04245421A (ja) 熱処理装置
JPS6430234A (en) Apparatus for manufacturing semiconductor device
KR100834218B1 (ko) 파티클 발생을 줄인 종형로의 페디스틀 구조