JPH01500472A - 印刷回路板の製造方法 - Google Patents

印刷回路板の製造方法

Info

Publication number
JPH01500472A
JPH01500472A JP62504477A JP50447787A JPH01500472A JP H01500472 A JPH01500472 A JP H01500472A JP 62504477 A JP62504477 A JP 62504477A JP 50447787 A JP50447787 A JP 50447787A JP H01500472 A JPH01500472 A JP H01500472A
Authority
JP
Japan
Prior art keywords
resist
metal
metallization
alkaline
areas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62504477A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0455553B2 (fr
Inventor
クカンスキス，ピーター，イー．
ローデニザー，ハロルド
Original Assignee
マクダーミッド，インコーポレーテッド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by マクダーミッド，インコーポレーテッド filed Critical マクダーミッド，インコーポレーテッド
Publication of JPH01500472A publication Critical patent/JPH01500472A/ja
Publication of JPH0455553B2 publication Critical patent/JPH0455553B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/108—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by semi-additive methods; masks therefor
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/54—Electroplating of non-metallic surfaces
    • C25D5/56—Electroplating of non-metallic surfaces of plastics
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
    • H05K3/184—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method using masks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42—Plated through-holes or plated via connections
    • H05K3/425—Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern
    • H05K3/427—Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern initial plating of through-holes in metal-clad substrates
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0703—Plating
    • H05K2203/0706—Inactivating or removing catalyst, e.g. on surface of resist
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0703—Plating
    • H05K2203/072—Electroless plating, e.g. finish plating or initial plating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0756—Uses of liquids, e.g. rinsing, coating, dissolving
    • H05K2203/0769—Dissolving insulating materials, e.g. coatings, not used for developing resist after exposure
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
    • H05K2203/0786—Using an aqueous solution, e.g. for cleaning or during drilling of holes
    • H05K2203/0793—Aqueous alkaline solution, e.g. for cleaning or etching
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/14—Related to the order of processing steps
    • H05K2203/1415—Applying catalyst after applying plating resist
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/14—Related to the order of processing steps
    • H05K2203/1476—Same or similar kind of process performed in phases, e.g. coarse patterning followed by fine patterning
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061—Etching masks
    • H05K3/062—Etching masks consisting of metals or alloys or metallic inorganic compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S205/00—Electrolysis: processes, compositions used therein, and methods of preparing the compositions
    • Y10S205/924—Electrolytic coating substrate predominantly comprised of specified synthetic resin
    • Y10S205/926—Polyamide or polyimide, e.g. nylon

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Electrochemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Laminated Bodies (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP62504477A 1986-08-06 1987-06-25 印刷回路板の製造方法 Granted JPH01500472A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US89362686A 1986-08-06 1986-08-06
US893,626 1986-08-06

Publications (2)

Publication Number Publication Date
JPH01500472A true JPH01500472A (ja) 1989-02-16
JPH0455553B2 JPH0455553B2 (fr) 1992-09-03

Family

ID=25401829

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62504477A Granted JPH01500472A (ja) 1986-08-06 1987-06-25 印刷回路板の製造方法

Country Status (9)

Country Link
US (1) US4931148A (fr)
EP (1) EP0276276B1 (fr)
JP (1) JPH01500472A (fr)
AT (1) ATE66498T1 (fr)
AU (1) AU7752287A (fr)
CA (1) CA1278877C (fr)
DE (1) DE3772370D1 (fr)
WO (1) WO1988000988A1 (fr)
ZA (1) ZA875224B (fr)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3777162D1 (de) * 1986-09-30 1992-04-09 Macdermid Inc Verfahren zur metallisierung nichtleitender substrate.
US5108786A (en) * 1989-05-01 1992-04-28 Enthone-Omi, Inc. Method of making printed circuit boards
DE3928832C2 (de) * 1989-08-31 1995-04-20 Blasberg Oberflaechentech Verfahren zur Herstellung von durchkontaktierten Leiterplatten und Leiterplatten-Halbzeug
US5342501A (en) * 1989-11-21 1994-08-30 Eric F. Harnden Method for electroplating metal onto a non-conductive substrate treated with basic accelerating solutions for metal plating
US5213841A (en) * 1990-05-15 1993-05-25 Shipley Company Inc. Metal accelerator
EP0467199A3 (en) * 1990-07-19 1992-11-25 Learonal, Inc. Preparation of printed circuit boards by metallization
US5429934A (en) * 1990-08-18 1995-07-04 Schering Aktiengesellschaft Process for the production of 20-methyl-5,7-pregnadiene-3β,21-diol derivatives using mycobacterium
EP0643032B1 (fr) * 1991-07-16 1997-02-05 Chiyoda Corporation Procédé de condensation pour la récupération de bisphénol A et phénol
US5360946A (en) * 1991-09-17 1994-11-01 International Business Machines Corporation Flex tape protective coating
EP0584386A1 (fr) * 1992-08-26 1994-03-02 International Business Machines Corporation Plaque de circuit imprimé et procédé pour la fabrication de plaques de circuit imprimé
US5384153A (en) * 1993-03-10 1995-01-24 At&T Corp. Monitoring electroless plating baths
CA2119050C (fr) * 1993-03-18 1999-11-23 Nayan H. Joshi Methode d'enduction par immersion non-fermaldehyde auto-accelerante et reconstituante
US5427895A (en) * 1993-12-23 1995-06-27 International Business Machines Corporation Semi-subtractive circuitization
US6403146B1 (en) 1994-08-26 2002-06-11 Gary B. Larson Process for the manufacture of printed circuit boards
JPH11501457A (ja) * 1995-08-09 1999-02-02 フィリップス エレクトロニクス ネムローゼ フェンノートシャップ 導電体の導体パターンを有する基部を具える装置の製造方法
US5620612A (en) * 1995-08-22 1997-04-15 Macdermid, Incorporated Method for the manufacture of printed circuit boards
EP0762813A1 (fr) * 1995-08-25 1997-03-12 Macdermid Incorporated Procédé de fabrication de panneaux à circuit imprimé
US6044550A (en) * 1996-09-23 2000-04-04 Macdermid, Incorporated Process for the manufacture of printed circuit boards
US5747098A (en) * 1996-09-24 1998-05-05 Macdermid, Incorporated Process for the manufacture of printed circuit boards
US6023842A (en) * 1996-09-24 2000-02-15 Macdermid, Incorporated Process for the manufacture of printed circuit boards
US5770032A (en) * 1996-10-16 1998-06-23 Fidelity Chemical Products Corporation Metallizing process
US6495394B1 (en) 1999-02-16 2002-12-17 Sumitomo Metal (Smi) Electronics Devices Inc. Chip package and method for manufacturing the same
US6264851B1 (en) * 1998-03-17 2001-07-24 International Business Machines Corporation Selective seed and plate using permanent resist
US6039889A (en) * 1999-01-12 2000-03-21 Fujitsu Limited Process flows for formation of fine structure layer pairs on flexible films
JP2000252630A (ja) * 1999-02-24 2000-09-14 Omg Fidelity ニッケルメッキされたスルーホールおよび／またはブラインド経由路を備えた基板
JP3524424B2 (ja) * 1999-04-01 2004-05-10 キヤノン株式会社 マイクロ構造体アレイ用金型又は金型マスター、及びその作製方法
DE60045566D1 (de) * 1999-08-06 2011-03-03 Ibiden Co Ltd Mehrschicht-Leiterplatte
US6720080B2 (en) * 2000-09-08 2004-04-13 Jps Glass And Industrial Fabrics Finish for glass fabrics used for reinforcing epoxy structures
US20040188257A1 (en) * 2001-08-31 2004-09-30 John Klocke Methods for processing micro-feature workpieces, patterned structures on micro-feature workpieces, and integrated tools for processing micro-feature workpieces
CN1910041B (zh) * 2004-01-13 2012-11-07 宇部兴产株式会社 聚酰亚胺-金属层压体和聚酰亚胺电路板
KR100601483B1 (ko) * 2004-12-06 2006-07-18 삼성전기주식회사 비아포스트에 의해 층간 전도성이 부여된 병렬적 다층인쇄회로기판 및 그 제조 방법
JP2007134364A (ja) * 2005-11-08 2007-05-31 Hitachi Cable Ltd 多層配線基板の製造方法及び多層配線基板並びにそれを用いた電子装置
JP5573429B2 (ja) * 2009-08-10 2014-08-20 住友ベークライト株式会社 無電解ニッケル−パラジウム−金めっき方法、めっき処理物、プリント配線板、インターポーザ、および半導体装置
TW201349976A (zh) * 2012-05-31 2013-12-01 Zhen Ding Technology Co Ltd 多層線路板之製作方法
RU2543518C1 (ru) * 2013-10-03 2015-03-10 Общество с ограниченной ответственностью "Компания РМТ"(ООО"РМТ") Способ изготовления двусторонней печатной платы
CN103476204B (zh) * 2013-10-08 2016-06-08 复旦大学 一种双面板的加成制备方法
US9699914B2 (en) * 2014-10-20 2017-07-04 Averatek Corporation Patterning of electroless metals by selective deactivation of catalysts

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60120591A (ja) * 1983-12-05 1985-06-28 株式会社日立製作所 微細銅導体の形成法
JPS60120590A (ja) * 1983-12-02 1985-06-28 セイコーエプソン株式会社 プリント回路基板の製造方法
JPS60120589A (ja) * 1983-12-02 1985-06-28 塩尻工業株式会社 プリント回路基板の製造方法
US4574031A (en) * 1985-03-29 1986-03-04 At&T Technologies, Inc. Additive processing electroless metal plating using aqueous photoresist

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3562038A (en) * 1968-05-15 1971-02-09 Shipley Co Metallizing a substrate in a selective pattern utilizing a noble metal colloid catalytic to the metal to be deposited
US3672925A (en) * 1970-10-02 1972-06-27 Rca Corp Method of preparing a substrate for depositing a metal on selected portions thereof
US4151313A (en) * 1977-03-11 1979-04-24 Hitachi, Ltd. Method for production of printed circuits by electroless metal plating employing a solid solution of metal oxides of titanium, nickel, and antimony as a masking material
US4279948A (en) * 1978-05-25 1981-07-21 Macdermid Incorporated Electroless copper deposition solution using a hypophosphite reducing agent
US4388351A (en) * 1979-08-20 1983-06-14 Western Electric Company, Inc. Methods of forming a patterned metal film on a support
US4597988A (en) * 1983-06-06 1986-07-01 Macdermid, Incorporated Process for preparing printed circuit board thru-holes
US4537799A (en) * 1984-04-16 1985-08-27 At&T Technologies, Inc. Selective metallization process
DE3417563C2 (de) * 1984-05-11 1986-12-04 Dr.-Ing. Max Schlötter GmbH & Co KG, 7340 Geislingen Verfahren zur Herstellung von Metallmustern auf isolierenden Trägern, insbesondere gedruckte Schaltungen
US4668532A (en) * 1984-09-04 1987-05-26 Kollmorgen Technologies Corporation System for selective metallization of electronic interconnection boards

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60120590A (ja) * 1983-12-02 1985-06-28 セイコーエプソン株式会社 プリント回路基板の製造方法
JPS60120589A (ja) * 1983-12-02 1985-06-28 塩尻工業株式会社 プリント回路基板の製造方法
JPS60120591A (ja) * 1983-12-05 1985-06-28 株式会社日立製作所 微細銅導体の形成法
US4574031A (en) * 1985-03-29 1986-03-04 At&T Technologies, Inc. Additive processing electroless metal plating using aqueous photoresist

Also Published As

Publication number Publication date
CA1278877C (fr) 1991-01-08
US4931148A (en) 1990-06-05
ATE66498T1 (de) 1991-09-15
EP0276276B1 (fr) 1991-08-21
EP0276276A4 (fr) 1989-03-29
JPH0455553B2 (fr) 1992-09-03
EP0276276A1 (fr) 1988-08-03
AU7752287A (en) 1988-02-24
ZA875224B (en) 1988-01-22
DE3772370D1 (de) 1991-09-26
WO1988000988A1 (fr) 1988-02-11

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