JPH0147930B2 - - Google Patents
Info
- Publication number
- JPH0147930B2 JPH0147930B2 JP6224681A JP6224681A JPH0147930B2 JP H0147930 B2 JPH0147930 B2 JP H0147930B2 JP 6224681 A JP6224681 A JP 6224681A JP 6224681 A JP6224681 A JP 6224681A JP H0147930 B2 JPH0147930 B2 JP H0147930B2
- Authority
- JP
- Japan
- Prior art keywords
- crystal resonator
- etching
- glass substrate
- film
- piece
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011521 glass Substances 0.000 claims description 33
- 239000000758 substrate Substances 0.000 claims description 32
- 238000005530 etching Methods 0.000 claims description 30
- 239000013078 crystal Substances 0.000 claims description 29
- 239000002184 metal Substances 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 6
- 229910018104 Ni-P Inorganic materials 0.000 claims description 5
- 229910018536 Ni—P Inorganic materials 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 5
- 238000000576 coating method Methods 0.000 claims description 5
- 238000007747 plating Methods 0.000 claims description 5
- 238000007789 sealing Methods 0.000 claims description 3
- 238000000059 patterning Methods 0.000 claims description 2
- 239000010453 quartz Substances 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- 239000010408 film Substances 0.000 description 13
- 239000010409 thin film Substances 0.000 description 9
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000004060 metabolic process Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6224681A JPS57176817A (en) | 1981-04-24 | 1981-04-24 | Manufacture of flat type crystal oscillator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6224681A JPS57176817A (en) | 1981-04-24 | 1981-04-24 | Manufacture of flat type crystal oscillator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57176817A JPS57176817A (en) | 1982-10-30 |
| JPH0147930B2 true JPH0147930B2 (enrdf_load_stackoverflow) | 1989-10-17 |
Family
ID=13194586
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6224681A Granted JPS57176817A (en) | 1981-04-24 | 1981-04-24 | Manufacture of flat type crystal oscillator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57176817A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005015308A2 (en) * | 2003-08-08 | 2005-02-17 | Quantiscript Inc. | Fabrication process for high resolution lithography masks using evaporated or plasma assisted electron sensitive resists with plating image reversal |
-
1981
- 1981-04-24 JP JP6224681A patent/JPS57176817A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57176817A (en) | 1982-10-30 |
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