JPS57176817A - Manufacture of flat type crystal oscillator - Google Patents
Manufacture of flat type crystal oscillatorInfo
- Publication number
- JPS57176817A JPS57176817A JP6224681A JP6224681A JPS57176817A JP S57176817 A JPS57176817 A JP S57176817A JP 6224681 A JP6224681 A JP 6224681A JP 6224681 A JP6224681 A JP 6224681A JP S57176817 A JPS57176817 A JP S57176817A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- crystal oscillator
- type crystal
- flat type
- base plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000013078 crystal Substances 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000005530 etching Methods 0.000 abstract 7
- 239000011521 glass Substances 0.000 abstract 3
- 229910018104 Ni-P Inorganic materials 0.000 abstract 1
- 229910018536 Ni—P Inorganic materials 0.000 abstract 1
- 238000009713 electroplating Methods 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 238000000206 photolithography Methods 0.000 abstract 1
- 238000007747 plating Methods 0.000 abstract 1
- 239000010453 quartz Substances 0.000 abstract 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 1
- 238000004544 sputter deposition Methods 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 238000007740 vapor deposition Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6224681A JPS57176817A (en) | 1981-04-24 | 1981-04-24 | Manufacture of flat type crystal oscillator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6224681A JPS57176817A (en) | 1981-04-24 | 1981-04-24 | Manufacture of flat type crystal oscillator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57176817A true JPS57176817A (en) | 1982-10-30 |
| JPH0147930B2 JPH0147930B2 (enrdf_load_stackoverflow) | 1989-10-17 |
Family
ID=13194586
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6224681A Granted JPS57176817A (en) | 1981-04-24 | 1981-04-24 | Manufacture of flat type crystal oscillator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57176817A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005015308A3 (en) * | 2003-08-08 | 2005-07-28 | Quantiscript Inc | Fabrication process for high resolution lithography masks using evaporated or plasma assisted electron sensitive resists with plating image reversal |
-
1981
- 1981-04-24 JP JP6224681A patent/JPS57176817A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005015308A3 (en) * | 2003-08-08 | 2005-07-28 | Quantiscript Inc | Fabrication process for high resolution lithography masks using evaporated or plasma assisted electron sensitive resists with plating image reversal |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0147930B2 (enrdf_load_stackoverflow) | 1989-10-17 |
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