JPH0145614B2 - - Google Patents

Info

Publication number
JPH0145614B2
JPH0145614B2 JP56037689A JP3768981A JPH0145614B2 JP H0145614 B2 JPH0145614 B2 JP H0145614B2 JP 56037689 A JP56037689 A JP 56037689A JP 3768981 A JP3768981 A JP 3768981A JP H0145614 B2 JPH0145614 B2 JP H0145614B2
Authority
JP
Japan
Prior art keywords
copolymer
compound
mol
acid
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56037689A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57151939A (en
Inventor
Yukihiro Hosaka
Yasuo Terasawa
Yoshuki Harita
Toko Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP3768981A priority Critical patent/JPS57151939A/ja
Publication of JPS57151939A publication Critical patent/JPS57151939A/ja
Publication of JPH0145614B2 publication Critical patent/JPH0145614B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP3768981A 1981-03-16 1981-03-16 Positive type photosensitive resin composition Granted JPS57151939A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3768981A JPS57151939A (en) 1981-03-16 1981-03-16 Positive type photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3768981A JPS57151939A (en) 1981-03-16 1981-03-16 Positive type photosensitive resin composition

Publications (2)

Publication Number Publication Date
JPS57151939A JPS57151939A (en) 1982-09-20
JPH0145614B2 true JPH0145614B2 (show.php) 1989-10-04

Family

ID=12504532

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3768981A Granted JPS57151939A (en) 1981-03-16 1981-03-16 Positive type photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS57151939A (show.php)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0302941B1 (en) * 1987-02-02 1993-12-29 Nippon Paint Co., Ltd. Positive photosensitive resin composition and process for its production
CN114867761B (zh) * 2020-03-23 2024-02-09 三菱化学株式会社 丙烯酸系聚合物、固化性组合物及其固化物

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4141733A (en) * 1977-10-25 1979-02-27 Eastman Kodak Company Development of light-sensitive quinone diazide compositions
JPS56122031A (en) * 1980-03-01 1981-09-25 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition
JPS57120931A (en) * 1981-01-20 1982-07-28 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition

Also Published As

Publication number Publication date
JPS57151939A (en) 1982-09-20

Similar Documents

Publication Publication Date Title
JPH0145053B2 (show.php)
KR101312603B1 (ko) 포지티브형 감광성 수지 조성물
US7101650B2 (en) Photosensitive resin composition for photoresist
JPH05165214A (ja) 感放射線性樹脂組成物
TWI403836B (zh) 感光性樹脂組成物
KR101068111B1 (ko) 감광성 수지 조성물
JP2007286620A (ja) 感光性樹脂組成物
JP3484808B2 (ja) 層間絶縁膜形成用感放射線性樹脂組成物並びに層間絶縁膜およびその製造方法
JP2000194130A (ja) 感光性樹脂組成物
JPH0145613B2 (show.php)
KR20120036330A (ko) 유기 절연막용 감광성 수지 조성물 및 이로부터 제조된 유기 절연막
JP4906356B2 (ja) 感光性樹脂組成物、ｌｃｄ基板及びそのパターン形成方法
JP2006336016A (ja) 感光性樹脂組成物と、これを用いた薄膜トランジスタ基板の製造方法、及び共通電極基板の製造方法
CN1898605B (zh) 辐射敏感性树脂组合物、层间绝缘膜和微透镜以及它们的制备方法
JP2000327875A (ja) カラーフィルター保護膜またはｔｆｔ層間絶縁膜と一体となったスペーサー用感放射線性樹脂組成物
JPH0145614B2 (show.php)
JP5157860B2 (ja) 感放射線性樹脂組成物、層間絶縁膜及びマイクロレンズ、並びにそれらの製造方法
JPH05107757A (ja) 感光性樹脂組成物
JP2002182380A (ja) 有機ｅｌ表示素子の絶縁膜形成用感放射線性樹脂組成物、それから形成された絶縁膜、および有機ｅｌ表示素子
JP3424225B2 (ja) 感放射線性樹脂組成物およびそれから形成された被膜
JPS5875149A (ja) ポジ型感光性樹脂組成物
JPH11174673A (ja) 表示パネルスペーサー用感放射線性樹脂組成物
JP3003064B2 (ja) 感放射線性樹脂組成物
JPH06348017A (ja) 感放射線性樹脂組成物
KR20090062899A (ko) 절연막 형성용 감광성 수지 조성물