JPH0136961B2 - - Google Patents

Info

Publication number

JPH0136961B2

JPH0136961B2 JP58070461A JP7046183A JPH0136961B2 JP H0136961 B2 JPH0136961 B2 JP H0136961B2 JP 58070461 A JP58070461 A JP 58070461A JP 7046183 A JP7046183 A JP 7046183A JP H0136961 B2 JPH0136961 B2 JP H0136961B2

Authority

JP

Japan

Prior art keywords

boric acid

mol

leakage current

amount

voltage

Prior art date

1983-04-19

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Expired

Links

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• KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 27
• 239000004327 boric acid Substances 0.000 claims description 25
• XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 19
• 229910000416 bismuth oxide Inorganic materials 0.000 claims description 15
• TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 claims description 15
• 239000013078 crystal Substances 0.000 claims description 10
• 239000011787 zinc oxide Substances 0.000 claims description 9
• 239000000654 additive Substances 0.000 claims description 5
• 238000010438 heat treatment Methods 0.000 description 11
• 238000010304 firing Methods 0.000 description 7
• 238000000137 annealing Methods 0.000 description 6
• AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 4
• 238000000034 method Methods 0.000 description 4
• 239000000203 mixture Substances 0.000 description 4
• 230000020169 heat generation Effects 0.000 description 3
• 230000005855 radiation Effects 0.000 description 3
• 239000002994 raw material Substances 0.000 description 3
• ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
• 239000004372 Polyvinyl alcohol Substances 0.000 description 2
• 238000010521 absorption reaction Methods 0.000 description 2
• 230000004913 activation Effects 0.000 description 2
• 229910052797 bismuth Inorganic materials 0.000 description 2
• JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
• 229910052796 boron Inorganic materials 0.000 description 2
• 230000006378 damage Effects 0.000 description 2
• 230000007423 decrease Effects 0.000 description 2
• 230000017525 heat dissipation Effects 0.000 description 2
• 229920002451 polyvinyl alcohol Polymers 0.000 description 2
• 239000000243 solution Substances 0.000 description 2
• 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 1
• 229910004298 SiO 2 Inorganic materials 0.000 description 1
• VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
• 238000002441 X-ray diffraction Methods 0.000 description 1
• 239000006096 absorbing agent Substances 0.000 description 1
• 229910052782 aluminium Inorganic materials 0.000 description 1
• XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
• 230000003466 anti-cipated effect Effects 0.000 description 1
• GHPGOEFPKIHBNM-UHFFFAOYSA-N antimony(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Sb+3].[Sb+3] GHPGOEFPKIHBNM-UHFFFAOYSA-N 0.000 description 1
• 239000007864 aqueous solution Substances 0.000 description 1
• 230000004888 barrier function Effects 0.000 description 1
• 239000011230 binding agent Substances 0.000 description 1
• 230000015572 biosynthetic process Effects 0.000 description 1
• 238000006243 chemical reaction Methods 0.000 description 1
• 229910000428 cobalt oxide Inorganic materials 0.000 description 1
• KAGOZRSGIYZEKW-UHFFFAOYSA-N cobalt(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Co+3].[Co+3] KAGOZRSGIYZEKW-UHFFFAOYSA-N 0.000 description 1
• IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
• RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 1
• 230000006866 deterioration Effects 0.000 description 1
• 238000010586 diagram Methods 0.000 description 1
• JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 1
• QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 1
• 230000000694 effects Effects 0.000 description 1
• 230000005611 electricity Effects 0.000 description 1
• 238000002474 experimental method Methods 0.000 description 1
• 238000004519 manufacturing process Methods 0.000 description 1
• 238000000465 moulding Methods 0.000 description 1
• 230000001590 oxidative effect Effects 0.000 description 1
• 239000002245 particle Substances 0.000 description 1
• 239000000843 powder Substances 0.000 description 1
• 238000004904 shortening Methods 0.000 description 1
• HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
• 229910010271 silicon carbide Inorganic materials 0.000 description 1
• 229910052814 silicon oxide Inorganic materials 0.000 description 1
• 238000005245 sintering Methods 0.000 description 1
• 230000000087 stabilizing effect Effects 0.000 description 1
• XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1