JPH0127596B2 - - Google Patents
Info
- Publication number
- JPH0127596B2 JPH0127596B2 JP58001900A JP190083A JPH0127596B2 JP H0127596 B2 JPH0127596 B2 JP H0127596B2 JP 58001900 A JP58001900 A JP 58001900A JP 190083 A JP190083 A JP 190083A JP H0127596 B2 JPH0127596 B2 JP H0127596B2
- Authority
- JP
- Japan
- Prior art keywords
- silicon
- sapphire substrate
- region
- type
- sapphire
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58001900A JPS58151064A (ja) | 1983-01-10 | 1983-01-10 | Sos型半導体装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58001900A JPS58151064A (ja) | 1983-01-10 | 1983-01-10 | Sos型半導体装置 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5953974A Division JPS5716499B2 (enrdf_load_stackoverflow) | 1974-05-27 | 1974-05-27 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58151064A JPS58151064A (ja) | 1983-09-08 |
JPH0127596B2 true JPH0127596B2 (enrdf_load_stackoverflow) | 1989-05-30 |
Family
ID=11514452
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58001900A Granted JPS58151064A (ja) | 1983-01-10 | 1983-01-10 | Sos型半導体装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58151064A (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4766482A (en) * | 1986-12-09 | 1988-08-23 | General Electric Company | Semiconductor device and method of making the same |
-
1983
- 1983-01-10 JP JP58001900A patent/JPS58151064A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS58151064A (ja) | 1983-09-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4272880A (en) | MOS/SOS Process | |
JPH04226066A (ja) | Bicmos装置及びその製造方法 | |
JP3354145B2 (ja) | バイポーラ・トランジスタとその製法 | |
KR100189739B1 (ko) | 반도체 기판에 삼중웰을 형성하는 방법 | |
JPH04226064A (ja) | 半導体装置用の相互接続体及びその製造方法 | |
JPH0412628B2 (enrdf_load_stackoverflow) | ||
JPS58501848A (ja) | 導電性に相互接続されたウエルを有する高密度cmosデバイス及びその製造方法 | |
JPH0127596B2 (enrdf_load_stackoverflow) | ||
JPH0456456B2 (enrdf_load_stackoverflow) | ||
JPS5931226B2 (ja) | 半導体装置 | |
JPH0575041A (ja) | Cmos半導体装置 | |
JP3253712B2 (ja) | 半導体装置の製造方法 | |
JPH06163576A (ja) | 半導体装置の製造方法 | |
JP3379312B2 (ja) | 半導体への不純物拡散抑制方法、半導体への不純物選択拡散方法、半導体装置及び半導体装置の製造方法 | |
JPH06267881A (ja) | 半導体装置とその製造方法 | |
JP2808620B2 (ja) | 半導体装置の製造方法 | |
JP3311082B2 (ja) | 半導体装置の製造方法 | |
JP2601209B2 (ja) | 半導体装置の製造方法 | |
JP2571449B2 (ja) | バイポーラicの製造方法 | |
JPS63144567A (ja) | 半導体装置の製造方法 | |
JPS6359547B2 (enrdf_load_stackoverflow) | ||
JPH0479336A (ja) | 半導体装置の製造方法 | |
JPH04129274A (ja) | 半導体装置 | |
JP3016342B2 (ja) | 半導体装置の製造方法 | |
JP2889246B2 (ja) | 半導体装置 |