JPH0126047B2 - - Google Patents

Info

Publication number
JPH0126047B2
JPH0126047B2 JP15427781A JP15427781A JPH0126047B2 JP H0126047 B2 JPH0126047 B2 JP H0126047B2 JP 15427781 A JP15427781 A JP 15427781A JP 15427781 A JP15427781 A JP 15427781A JP H0126047 B2 JPH0126047 B2 JP H0126047B2
Authority
JP
Japan
Prior art keywords
polyamide
polymer
light
solution
image forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15427781A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5855926A (ja
Inventor
Masaki Hasegawa
Nobuyuki Yonezawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP15427781A priority Critical patent/JPS5855926A/ja
Publication of JPS5855926A publication Critical patent/JPS5855926A/ja
Publication of JPH0126047B2 publication Critical patent/JPH0126047B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polyamides (AREA)
JP15427781A 1981-09-29 1981-09-29 ポリアミド系線状高分子を用いる画像形成方法 Granted JPS5855926A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15427781A JPS5855926A (ja) 1981-09-29 1981-09-29 ポリアミド系線状高分子を用いる画像形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15427781A JPS5855926A (ja) 1981-09-29 1981-09-29 ポリアミド系線状高分子を用いる画像形成方法

Publications (2)

Publication Number Publication Date
JPS5855926A JPS5855926A (ja) 1983-04-02
JPH0126047B2 true JPH0126047B2 (enExample) 1989-05-22

Family

ID=15580636

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15427781A Granted JPS5855926A (ja) 1981-09-29 1981-09-29 ポリアミド系線状高分子を用いる画像形成方法

Country Status (1)

Country Link
JP (1) JPS5855926A (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6028430A (ja) * 1983-07-27 1985-02-13 Masaki Hasegawa 光学活性ポリアミド
JP2542033B2 (ja) * 1988-03-03 1996-10-09 セントラル硝子株式会社 芳香族ポリアミド樹脂およびこれを用いた耐熱性感光材料
JP2540925B2 (ja) * 1988-12-06 1996-10-09 日立化成工業株式会社 感光性樹脂組成物及びこれを用いた感光性エレメント
JP2540926B2 (ja) * 1988-12-06 1996-10-09 日立化成工業株式会社 感光性樹脂組成物及びこれを用いた感光性エレメント
JP5246441B2 (ja) * 2007-06-05 2013-07-24 日産化学工業株式会社 ポジ型感光性樹脂組成物及びポリヒドロキシアミド樹脂
CN102089711B (zh) * 2008-07-09 2013-05-22 日产化学工业株式会社 正型感光性树脂组合物和聚羟基酰胺树脂
JP7782163B2 (ja) * 2021-08-17 2025-12-09 日油株式会社 ポリアミド系ポリマー

Also Published As

Publication number Publication date
JPS5855926A (ja) 1983-04-02

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