JPH0121974Y2 - - Google Patents
Info
- Publication number
- JPH0121974Y2 JPH0121974Y2 JP11274584U JP11274584U JPH0121974Y2 JP H0121974 Y2 JPH0121974 Y2 JP H0121974Y2 JP 11274584 U JP11274584 U JP 11274584U JP 11274584 U JP11274584 U JP 11274584U JP H0121974 Y2 JPH0121974 Y2 JP H0121974Y2
- Authority
- JP
- Japan
- Prior art keywords
- sputtering
- ion plating
- evaporation source
- gold
- vacuum chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004544 sputter deposition Methods 0.000 claims description 23
- 238000007733 ion plating Methods 0.000 claims description 20
- 230000008020 evaporation Effects 0.000 claims description 14
- 238000001704 evaporation Methods 0.000 claims description 14
- 230000007246 mechanism Effects 0.000 claims description 13
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 11
- 239000010931 gold Substances 0.000 description 11
- 229910052737 gold Inorganic materials 0.000 description 11
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 8
- 238000000576 coating method Methods 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 239000010953 base metal Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 229910000510 noble metal Inorganic materials 0.000 description 4
- 239000007789 gas Substances 0.000 description 3
- 239000010970 precious metal Substances 0.000 description 3
- 238000005477 sputtering target Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910001020 Au alloy Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003353 gold alloy Substances 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 231100000481 chemical toxicant Toxicity 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11274584U JPS6130069U (ja) | 1984-07-25 | 1984-07-25 | 被膜形成装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11274584U JPS6130069U (ja) | 1984-07-25 | 1984-07-25 | 被膜形成装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6130069U JPS6130069U (ja) | 1986-02-22 |
| JPH0121974Y2 true JPH0121974Y2 (cg-RX-API-DMAC7.html) | 1989-06-29 |
Family
ID=30671782
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11274584U Granted JPS6130069U (ja) | 1984-07-25 | 1984-07-25 | 被膜形成装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6130069U (cg-RX-API-DMAC7.html) |
-
1984
- 1984-07-25 JP JP11274584U patent/JPS6130069U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6130069U (ja) | 1986-02-22 |
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