JPH0119467B2 - - Google Patents

Info

Publication number
JPH0119467B2
JPH0119467B2 JP22365286A JP22365286A JPH0119467B2 JP H0119467 B2 JPH0119467 B2 JP H0119467B2 JP 22365286 A JP22365286 A JP 22365286A JP 22365286 A JP22365286 A JP 22365286A JP H0119467 B2 JPH0119467 B2 JP H0119467B2
Authority
JP
Japan
Prior art keywords
base material
discharge
film formation
substrate
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP22365286A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6379970A (ja
Inventor
Ryoji Makabe
Shingo Kawamura
Shoichi Mochizuki
Saburo Kimura
Sadao Nakajima
Osamu Tabata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
YKK Corp
Original Assignee
Agency of Industrial Science and Technology
Yoshida Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Yoshida Kogyo KK filed Critical Agency of Industrial Science and Technology
Priority to JP22365286A priority Critical patent/JPS6379970A/ja
Publication of JPS6379970A publication Critical patent/JPS6379970A/ja
Publication of JPH0119467B2 publication Critical patent/JPH0119467B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
JP22365286A 1986-09-24 1986-09-24 プラズマｃｖｄ法による高密着性薄膜形成方法 Granted JPS6379970A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22365286A JPS6379970A (ja) 1986-09-24 1986-09-24 プラズマｃｖｄ法による高密着性薄膜形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22365286A JPS6379970A (ja) 1986-09-24 1986-09-24 プラズマｃｖｄ法による高密着性薄膜形成方法

Publications (2)

Publication Number Publication Date
JPS6379970A JPS6379970A (ja) 1988-04-09
JPH0119467B2 true JPH0119467B2 (enrdf_load_stackoverflow) 1989-04-11

Family

ID=16801538

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22365286A Granted JPS6379970A (ja) 1986-09-24 1986-09-24 プラズマｃｖｄ法による高密着性薄膜形成方法

Country Status (1)

Country Link
JP (1) JPS6379970A (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02258979A (ja) * 1989-02-21 1990-10-19 Anelva Corp 常圧ｃｖｄ方法および装置
KR100241817B1 (ko) 1993-12-27 2000-02-01 니시무로 타이죠 박막형성법
TW269743B (enrdf_load_stackoverflow) * 1994-04-26 1996-02-01 Toshiba Eng Co
US5690759A (en) * 1996-06-24 1997-11-25 General Motors Corporation Coated permanent mold having textured undersurface
KR101924850B1 (ko) * 2011-08-24 2018-12-04 니폰 제온 가부시키가이샤 카본 나노튜브 배향 집합체의 제조장치 및 제조방법

Also Published As

Publication number Publication date
JPS6379970A (ja) 1988-04-09

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term