JPH0119135B2 - - Google Patents

Info

Publication number
JPH0119135B2
JPH0119135B2 JP54129948A JP12994879A JPH0119135B2 JP H0119135 B2 JPH0119135 B2 JP H0119135B2 JP 54129948 A JP54129948 A JP 54129948A JP 12994879 A JP12994879 A JP 12994879A JP H0119135 B2 JPH0119135 B2 JP H0119135B2
Authority
JP
Japan
Prior art keywords
general formula
resist
developer
polymer
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54129948A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5654434A (en
Inventor
Motoyasu Saito
Nobuyuki Watamori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kojin Co Ltd
Original Assignee
Kojin Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kojin Co Ltd filed Critical Kojin Co Ltd
Priority to JP12994879A priority Critical patent/JPS5654434A/ja
Publication of JPS5654434A publication Critical patent/JPS5654434A/ja
Publication of JPH0119135B2 publication Critical patent/JPH0119135B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP12994879A 1979-10-11 1979-10-11 Radiation and far ultraviolet ray sensitive positive type resist method Granted JPS5654434A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12994879A JPS5654434A (en) 1979-10-11 1979-10-11 Radiation and far ultraviolet ray sensitive positive type resist method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12994879A JPS5654434A (en) 1979-10-11 1979-10-11 Radiation and far ultraviolet ray sensitive positive type resist method

Publications (2)

Publication Number Publication Date
JPS5654434A JPS5654434A (en) 1981-05-14
JPH0119135B2 true JPH0119135B2 (cg-RX-API-DMAC7.html) 1989-04-10

Family

ID=15022388

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12994879A Granted JPS5654434A (en) 1979-10-11 1979-10-11 Radiation and far ultraviolet ray sensitive positive type resist method

Country Status (1)

Country Link
JP (1) JPS5654434A (cg-RX-API-DMAC7.html)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3036615A1 (de) * 1980-09-29 1982-05-13 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung von resiststrukturen
JPS57196232A (en) * 1981-05-29 1982-12-02 Nippon Telegr & Teleph Corp <Ntt> High sensitive and positive type resist
JPH01217341A (ja) * 1988-02-25 1989-08-30 Toppan Printing Co Ltd ポジ型電子線レジストのパターン形成方法
JPH0328851A (ja) * 1988-05-24 1991-02-07 Toppan Printing Co Ltd 電子ビームレジストのパターン形成方法
JP2598492B2 (ja) * 1988-10-24 1997-04-09 凸版印刷株式会社 ポジ型電子線レジストパターンの形成方法
JPH022564A (ja) * 1988-06-15 1990-01-08 Toagosei Chem Ind Co Ltd ポジ型電子線レジスト
JPH0258060A (ja) * 1988-08-24 1990-02-27 Toagosei Chem Ind Co Ltd ポジ型レジスト
JPH02113253A (ja) * 1988-10-24 1990-04-25 Toagosei Chem Ind Co Ltd ポジ型レジスト
JPH02275462A (ja) * 1989-04-17 1990-11-09 Toppan Printing Co Ltd 電子ビームレジストのパターン形成方法
JPH05289339A (ja) * 1992-04-08 1993-11-05 Toppan Printing Co Ltd ポジ型電子線レジスト
KR100557529B1 (ko) * 2001-06-29 2006-03-03 주식회사 하이닉스반도체 화학증폭형 포토레지스트 단량체, 그의 중합체 및 이를함유하는 포토레지스트 조성물
US6943248B2 (en) * 2003-04-30 2005-09-13 Tate & Lyle Public Limited Company Crystalline form of sucralose, and method for producing it
JP6060012B2 (ja) * 2013-03-15 2017-01-11 富士フイルム株式会社 パターン形成方法、及び、電子デバイスの製造方法

Also Published As

Publication number Publication date
JPS5654434A (en) 1981-05-14

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