JPH0115858B2 - - Google Patents

Info

Publication number
JPH0115858B2
JPH0115858B2 JP56053359A JP5335981A JPH0115858B2 JP H0115858 B2 JPH0115858 B2 JP H0115858B2 JP 56053359 A JP56053359 A JP 56053359A JP 5335981 A JP5335981 A JP 5335981A JP H0115858 B2 JPH0115858 B2 JP H0115858B2
Authority
JP
Japan
Prior art keywords
water
weight
image
parts
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56053359A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57168248A (en
Inventor
Takeo Morya
Masayoshi Oota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kimoto Co Ltd
Original Assignee
Kimoto Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kimoto Co Ltd filed Critical Kimoto Co Ltd
Priority to JP5335981A priority Critical patent/JPS57168248A/ja
Publication of JPS57168248A publication Critical patent/JPS57168248A/ja
Publication of JPH0115858B2 publication Critical patent/JPH0115858B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP5335981A 1981-04-09 1981-04-09 Formation of image with nonsilver photoresist composition Granted JPS57168248A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5335981A JPS57168248A (en) 1981-04-09 1981-04-09 Formation of image with nonsilver photoresist composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5335981A JPS57168248A (en) 1981-04-09 1981-04-09 Formation of image with nonsilver photoresist composition

Publications (2)

Publication Number Publication Date
JPS57168248A JPS57168248A (en) 1982-10-16
JPH0115858B2 true JPH0115858B2 (en, 2012) 1989-03-20

Family

ID=12940602

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5335981A Granted JPS57168248A (en) 1981-04-09 1981-04-09 Formation of image with nonsilver photoresist composition

Country Status (1)

Country Link
JP (1) JPS57168248A (en, 2012)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2643155B2 (ja) * 1987-07-08 1997-08-20 株式会社日立製作所 感光性組成物及びそれを用いたパターン形成方法
JPH0789163B2 (ja) * 1988-05-10 1995-09-27 東京応化工業株式会社 カラーフィルターの作成方法
JPH0289631A (ja) * 1988-09-27 1990-03-29 Somar Corp ケミカルマットフィルム及びそれを用いた感光性フィルム
JP2003041159A (ja) * 2001-07-25 2003-02-13 Toppan Forms Co Ltd Ｉｃメディア用エポキシ系絶縁インク

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5418933B2 (en, 2012) * 1972-11-06 1979-07-11

Also Published As

Publication number Publication date
JPS57168248A (en) 1982-10-16

Similar Documents

Publication Publication Date Title
US4472494A (en) Bilayer photosensitive imaging article
US3173787A (en) Photosensitive element comprising a hydrophobic support, a hydrophilic layer thereonand a light-sensitive resin overcoat layer and photomechanical processes therewith
DE2023083A1 (de) Lichtempfindliches aetzfaehiges Kopiermaterial
CA1091969A (en) Photosensitive unilayer film structure cast from a polymeric emulsion dispersion
US4522910A (en) Photosensitive graphic arts article
JPH0115858B2 (en, 2012)
JPS6131856B2 (en, 2012)
JPH045980B2 (en, 2012)
DE3800131C2 (de) Lichtempfindliches Material
JPS6032045A (ja) 多色画像形成材料およびその画像形成方法
US4343876A (en) Dot-enlargement process for photopolymer litho masks
US4710447A (en) Color proofing and color proofing transfer process using water developed ink
EP0048160B1 (en) Photosensitive recording material, and method of half-tone etching
US5310627A (en) Changing the color of yellow resist images by application of pH-sensitive dyes
JPH0527451A (ja) 画像形成方法
GB2089058A (en) Photomechanical colour images
JPH0551897B2 (en, 2012)
JPH0462375B2 (en, 2012)
JPH0331249B2 (en, 2012)
JPH0327105B2 (en, 2012)
SU492100A3 (ru) Способ получени многоцветных коллоидных рельефных изображений
JPS61186954A (ja) 着色画像形成用感光材料
JPS63189856A (ja) 着色感光材料
JPS63313148A (ja) 感光性シート
JPS641010B2 (en, 2012)