JPH0462375B2 - - Google Patents

Info

Publication number
JPH0462375B2
JPH0462375B2 JP58151122A JP15112283A JPH0462375B2 JP H0462375 B2 JPH0462375 B2 JP H0462375B2 JP 58151122 A JP58151122 A JP 58151122A JP 15112283 A JP15112283 A JP 15112283A JP H0462375 B2 JPH0462375 B2 JP H0462375B2
Authority
JP
Japan
Prior art keywords
film
light
mask layer
layer
photomasking
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58151122A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6043660A (ja
Inventor
Akio Hashizume
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kimoto Co Ltd
Original Assignee
Kimoto Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kimoto Co Ltd filed Critical Kimoto Co Ltd
Priority to JP58151122A priority Critical patent/JPS6043660A/ja
Publication of JPS6043660A publication Critical patent/JPS6043660A/ja
Publication of JPH0462375B2 publication Critical patent/JPH0462375B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Liquid Crystal (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP58151122A 1983-08-19 1983-08-19 フオトマスキングフイルム Granted JPS6043660A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58151122A JPS6043660A (ja) 1983-08-19 1983-08-19 フオトマスキングフイルム

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58151122A JPS6043660A (ja) 1983-08-19 1983-08-19 フオトマスキングフイルム

Publications (2)

Publication Number Publication Date
JPS6043660A JPS6043660A (ja) 1985-03-08
JPH0462375B2 true JPH0462375B2 (en, 2012) 1992-10-06

Family

ID=15511843

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58151122A Granted JPS6043660A (ja) 1983-08-19 1983-08-19 フオトマスキングフイルム

Country Status (1)

Country Link
JP (1) JPS6043660A (en, 2012)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1004757C2 (nl) * 1996-12-12 1998-06-15 Av Flexologic Bv Systeem en werkwijze voor het verschaffen van fotodrukplaten en dergelijke.
CN108351605B (zh) * 2016-01-27 2020-12-15 株式会社Lg化学 膜掩模、其制备方法、使用膜掩模的图案形成方法和由膜掩模形成的图案
KR102126110B1 (ko) 2016-01-27 2020-06-24 주식회사 엘지화학 필름 마스크, 이의 제조방법, 이를 이용한 패턴 형성 방법 및 이를 이용하여 형성된 패턴
KR102089835B1 (ko) 2016-01-27 2020-03-16 주식회사 엘지화학 필름 마스크, 이의 제조방법 및 이를 이용한 패턴 형성 방법
WO2018069242A1 (de) * 2016-10-10 2018-04-19 Akk Gmbh Verbundplatte mit sperrschicht und verfahren zur herstellung einer hochdruckplatte

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5858546A (ja) * 1981-10-02 1983-04-07 Kimoto & Co Ltd 製版用感光性マスク材料

Also Published As

Publication number Publication date
JPS6043660A (ja) 1985-03-08

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