JPS57168248A - Formation of image with nonsilver photoresist composition - Google Patents

Formation of image with nonsilver photoresist composition

Info

Publication number
JPS57168248A
JPS57168248A JP5335981A JP5335981A JPS57168248A JP S57168248 A JPS57168248 A JP S57168248A JP 5335981 A JP5335981 A JP 5335981A JP 5335981 A JP5335981 A JP 5335981A JP S57168248 A JPS57168248 A JP S57168248A
Authority
JP
Japan
Prior art keywords
image
photoresist composition
layer
water
soln
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5335981A
Other languages
Japanese (ja)
Other versions
JPH0115858B2 (en
Inventor
Takeo Moriya
Masayoshi Oota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kimoto Co Ltd
Original Assignee
Kimoto Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kimoto Co Ltd filed Critical Kimoto Co Ltd
Priority to JP5335981A priority Critical patent/JPS57168248A/en
Publication of JPS57168248A publication Critical patent/JPS57168248A/en
Publication of JPH0115858B2 publication Critical patent/JPH0115858B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds

Abstract

PURPOSE:To obtain a negative image developable with water and having high optical density and resolving power by using a photoresist composition contg. water soluble diazo resin. CONSTITUTION:A photoresist composition prepared by adding 2-10wt% water soluble diazo resin to a copolymer consisting of 20-90mol% diacetone acrylamide and 10-80mol% acrylamide is applied to a support of glass or plastic film. An original brought into contact with the photoresist layer and exposed to ultraviolet light, and the unexposed non-image part of the layer is removed by dissolution in water to conduct development. The layer is then dyed with a water soluble dye soln., the dye at the non-image part is removed with water and a washing soln., and the layer is finished by treatment with a hardening mordant soln. Thus, a black relief image with 2.3-4.0 optical density is obtd. Since no photoresist composition is left and the unexposed part, the image is not discolored and has superior dimensional stability.
JP5335981A 1981-04-09 1981-04-09 Formation of image with nonsilver photoresist composition Granted JPS57168248A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5335981A JPS57168248A (en) 1981-04-09 1981-04-09 Formation of image with nonsilver photoresist composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5335981A JPS57168248A (en) 1981-04-09 1981-04-09 Formation of image with nonsilver photoresist composition

Publications (2)

Publication Number Publication Date
JPS57168248A true JPS57168248A (en) 1982-10-16
JPH0115858B2 JPH0115858B2 (en) 1989-03-20

Family

ID=12940602

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5335981A Granted JPS57168248A (en) 1981-04-09 1981-04-09 Formation of image with nonsilver photoresist composition

Country Status (1)

Country Link
JP (1) JPS57168248A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6413540A (en) * 1987-07-08 1989-01-18 Hitachi Ltd Photosensitive composition and pattern forming method using same
JPH01282504A (en) * 1988-05-10 1989-11-14 Tokyo Ohka Kogyo Co Ltd Formation of color filter
JPH0289631A (en) * 1988-09-27 1990-03-29 Somar Corp Chemical mat film and photosensitive film used therewith
JP2003041159A (en) * 2001-07-25 2003-02-13 Toppan Forms Co Ltd Epoxy-based insulating ink for ic media

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4968801A (en) * 1972-11-06 1974-07-03

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4968801A (en) * 1972-11-06 1974-07-03

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6413540A (en) * 1987-07-08 1989-01-18 Hitachi Ltd Photosensitive composition and pattern forming method using same
JPH01282504A (en) * 1988-05-10 1989-11-14 Tokyo Ohka Kogyo Co Ltd Formation of color filter
JPH0789163B2 (en) * 1988-05-10 1995-09-27 東京応化工業株式会社 How to create a color filter
JPH0289631A (en) * 1988-09-27 1990-03-29 Somar Corp Chemical mat film and photosensitive film used therewith
JPH0524172B2 (en) * 1988-09-27 1993-04-07 Somar Corp
JP2003041159A (en) * 2001-07-25 2003-02-13 Toppan Forms Co Ltd Epoxy-based insulating ink for ic media

Also Published As

Publication number Publication date
JPH0115858B2 (en) 1989-03-20

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