JPH0331249B2 - - Google Patents

Info

Publication number
JPH0331249B2
JPH0331249B2 JP58197161A JP19716183A JPH0331249B2 JP H0331249 B2 JPH0331249 B2 JP H0331249B2 JP 58197161 A JP58197161 A JP 58197161A JP 19716183 A JP19716183 A JP 19716183A JP H0331249 B2 JPH0331249 B2 JP H0331249B2
Authority
JP
Japan
Prior art keywords
acid
image
layer
photosensitive resin
parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58197161A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6088945A (ja
Inventor
Takamasa Ariki
Yoshio Kato
Michiatsu Kono
Shinichi Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyobo Co Ltd
Original Assignee
Toyobo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyobo Co Ltd filed Critical Toyobo Co Ltd
Priority to JP19716183A priority Critical patent/JPS6088945A/ja
Publication of JPS6088945A publication Critical patent/JPS6088945A/ja
Publication of JPH0331249B2 publication Critical patent/JPH0331249B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP19716183A 1983-10-20 1983-10-20 画像複製材料用水性処理液 Granted JPS6088945A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19716183A JPS6088945A (ja) 1983-10-20 1983-10-20 画像複製材料用水性処理液

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19716183A JPS6088945A (ja) 1983-10-20 1983-10-20 画像複製材料用水性処理液

Publications (2)

Publication Number Publication Date
JPS6088945A JPS6088945A (ja) 1985-05-18
JPH0331249B2 true JPH0331249B2 (en, 2012) 1991-05-02

Family

ID=16369784

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19716183A Granted JPS6088945A (ja) 1983-10-20 1983-10-20 画像複製材料用水性処理液

Country Status (1)

Country Link
JP (1) JPS6088945A (en, 2012)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6211852A (ja) * 1985-07-10 1987-01-20 Nippon Telegr & Teleph Corp <Ntt> パタ−ン形成方法
JP2597892B2 (ja) * 1988-07-15 1997-04-09 富士写真フイルム株式会社 減力液及び銀画像の減力処理法
JP2840624B2 (ja) * 1989-12-27 1998-12-24 コニカ株式会社 着色画像形成材料用現像液
WO1997033197A1 (fr) * 1996-03-08 1997-09-12 Nippon Zeon Co., Ltd. Procede de preparation d'une planche d'impression photosensible, solution de developpement aqueuse associee, solution de rinçage aqueuse et revelateur destine a la planche d'impression photosensible

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2834958A1 (de) * 1978-08-10 1980-02-21 Hoechst Ag Verfahren zum entwickeln von belichteten lichtempfindlichen druckplatten
JPS5752053A (en) * 1980-09-12 1982-03-27 Asahi Chem Ind Co Ltd Manufacture of photosensitive resin plate

Also Published As

Publication number Publication date
JPS6088945A (ja) 1985-05-18

Similar Documents

Publication Publication Date Title
US4126466A (en) Composite, mask-forming, photohardenable elements
US4340657A (en) Novel radiation-sensitive articles
GB2077452A (en) A heat mode recording material and a recording method using it
US4311784A (en) Multilayer photosensitive solvent-processable litho element
US5691106A (en) Photosensitive material for the production of lithographic printing plates utilizing peel development
JPH0210936B2 (en, 2012)
US4564589A (en) Image-forming composite with film
JPH0331249B2 (en, 2012)
US4740450A (en) Method of making image reproducing material having scratch improvment
JPS6120939A (ja) 平版印刷版用感光性組成物
US4308338A (en) Methods of imaging photopolymerizable materials containing diester polyether
JPS60191238A (ja) 画像複製材料およびその製造法
GB2049210A (en) Photographic formation of visible images
EP0036221B1 (en) Photosensitive material and a process for reproducing photo-information
US5124227A (en) Protective overcoats for diazo type layers
GB1587476A (en) Photopolymerizable compositions and elements and methods of imaging
JPS60175044A (ja) リスフィルム用感光性組成物
JPH0327107B2 (en, 2012)
JPS6098433A (ja) 画像複製材料
JPS62229127A (ja) 感光性樹脂版材
GB1586547A (en) Cross-linkable block copolymers and their use in screen printing
JPS61174541A (ja) 画像複製材料用感光性組成物
US5705313A (en) Process for the production of a lithographic printing plate through selective transfer
US4699859A (en) Dot-etchable image-containing element useful in lithographic mask formation and its production
JPS62223747A (ja) 画像形成板