JPS5752053A - Manufacture of photosensitive resin plate - Google Patents

Manufacture of photosensitive resin plate

Info

Publication number
JPS5752053A
JPS5752053A JP12697080A JP12697080A JPS5752053A JP S5752053 A JPS5752053 A JP S5752053A JP 12697080 A JP12697080 A JP 12697080A JP 12697080 A JP12697080 A JP 12697080A JP S5752053 A JPS5752053 A JP S5752053A
Authority
JP
Japan
Prior art keywords
resin plate
stickiness
development
image
contg
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12697080A
Other languages
Japanese (ja)
Inventor
Motoaki Takahashi
Noboru Yoshino
Reijiro Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Asahi Kasei Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd, Asahi Kasei Kogyo KK filed Critical Asahi Chemical Industry Co Ltd
Priority to JP12697080A priority Critical patent/JPS5752053A/en
Publication of JPS5752053A publication Critical patent/JPS5752053A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Abstract

PURPOSE:To obtain a resin plate with no stickiness, no residual granule and superior durability by forming an image of a photopolymerizing resin composition followed by exposure and development with an aqueous soln. contg. a specified amount of a metallic ion chelating agent, especially a specified aminopolycarboxylic acid. CONSTITUTION:An image of a photopolymerizing resin composition is formed, exposed, and developed with an aqueous developer contg. 0.001-0.1wt% metallic ion chelating agent such as polysulfonic acids or amino-polycarboxylic acids, especially EDTA or its alkali metallic salt having a group represented by the formula (where n is 1 or 2, and R is H or an alkali metal) in the molecule. To the developer are added 0.1-5wt% ''Pluronic '' type surfactant and 0.1-5wt% alkaline salt such as NaOH besides said compound. Thus, a resin plate with a superior finished surface free from stickiness and an unremoved part is obtd. after the development.
JP12697080A 1980-09-12 1980-09-12 Manufacture of photosensitive resin plate Pending JPS5752053A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12697080A JPS5752053A (en) 1980-09-12 1980-09-12 Manufacture of photosensitive resin plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12697080A JPS5752053A (en) 1980-09-12 1980-09-12 Manufacture of photosensitive resin plate

Publications (1)

Publication Number Publication Date
JPS5752053A true JPS5752053A (en) 1982-03-27

Family

ID=14948395

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12697080A Pending JPS5752053A (en) 1980-09-12 1980-09-12 Manufacture of photosensitive resin plate

Country Status (1)

Country Link
JP (1) JPS5752053A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58190952A (en) * 1982-04-30 1983-11-08 Fuji Photo Film Co Ltd Developing solution of photosensitive printing plate
JPS6088945A (en) * 1983-10-20 1985-05-18 Toyobo Co Ltd Aqueous processing solution for image copying material
JPS61203456A (en) * 1985-03-06 1986-09-09 Fuotopori Ouka Kk Formation of pattern
JPH0643631A (en) * 1992-04-01 1994-02-18 Internatl Business Mach Corp <Ibm> Photo-resist containing nonionic polyglycol
WO1997033197A1 (en) * 1996-03-08 1997-09-12 Nippon Zeon Co., Ltd. Method of preparing photosensitive printing plate, aqueous developing solution suited for the preparation, aqueous rinsing solution and developer for the photosensitive printing plate

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5320377A (en) * 1976-08-10 1978-02-24 Kobe Steel Ltd Method and device for heightening sensitivity of stress paint in load test
JPS5525100A (en) * 1978-08-10 1980-02-22 Hoechst Ag Developing exposed print plate

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5320377A (en) * 1976-08-10 1978-02-24 Kobe Steel Ltd Method and device for heightening sensitivity of stress paint in load test
JPS5525100A (en) * 1978-08-10 1980-02-22 Hoechst Ag Developing exposed print plate

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58190952A (en) * 1982-04-30 1983-11-08 Fuji Photo Film Co Ltd Developing solution of photosensitive printing plate
JPH0322621B2 (en) * 1982-04-30 1991-03-27 Fuji Photo Film Co Ltd
JPS6088945A (en) * 1983-10-20 1985-05-18 Toyobo Co Ltd Aqueous processing solution for image copying material
JPH0331249B2 (en) * 1983-10-20 1991-05-02 Toyo Boseki
JPS61203456A (en) * 1985-03-06 1986-09-09 Fuotopori Ouka Kk Formation of pattern
JPH0643631A (en) * 1992-04-01 1994-02-18 Internatl Business Mach Corp <Ibm> Photo-resist containing nonionic polyglycol
WO1997033197A1 (en) * 1996-03-08 1997-09-12 Nippon Zeon Co., Ltd. Method of preparing photosensitive printing plate, aqueous developing solution suited for the preparation, aqueous rinsing solution and developer for the photosensitive printing plate

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