JPH01154630U - - Google Patents
Info
- Publication number
- JPH01154630U JPH01154630U JP5199388U JP5199388U JPH01154630U JP H01154630 U JPH01154630 U JP H01154630U JP 5199388 U JP5199388 U JP 5199388U JP 5199388 U JP5199388 U JP 5199388U JP H01154630 U JPH01154630 U JP H01154630U
- Authority
- JP
- Japan
- Prior art keywords
- reaction chamber
- dry etching
- vacuum
- vacuum reaction
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims description 2
- 238000001312 dry etching Methods 0.000 claims 2
- 238000000034 method Methods 0.000 claims 1
- 238000005530 etching Methods 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Description
第１図は本考案の実施例１を示す断面図、第２
図は本考案の実施例２を示す断面図である。
１……ガス導入管、２ａ……上部電極、２ｂ…
…下部電極、３……半導体基板、４……排気管、
５……排気口、６……エツチングチヤンバー、７
……圧力コントローラ、８……ロータリーポンプ
。
Fig. 1 is a sectional view showing the first embodiment of the present invention;
The figure is a sectional view showing a second embodiment of the present invention. 1... Gas introduction pipe, 2a... Upper electrode, 2b...
... lower electrode, 3 ... semiconductor substrate, 4 ... exhaust pipe,
5...Exhaust port, 6...Etching chamber, 7
...Pressure controller, 8...Rotary pump.
Claims (1)
する電極を設けた真空反応室内部に導入管よりガ
スを供給し、プラズマを発生させて複数枚の半導
体基板を一度に処理するドライエツチング装置に
おいて、前記真空反応室内部に複数個の排気口を
有することを特徴とするドライエツチング装置。 In a dry etching device that processes multiple semiconductor substrates at once by supplying gas from an inlet pipe into a vacuum reaction chamber equipped with an exhaust system that maintains a high vacuum and an electrode that applies high frequency power, plasma is generated. A dry etching apparatus comprising a plurality of exhaust ports inside the vacuum reaction chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5199388U JPH01154630U (en) | 1988-04-18 | 1988-04-18 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5199388U JPH01154630U (en) | 1988-04-18 | 1988-04-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01154630U true JPH01154630U (en) | 1989-10-24 |
Family
ID=31278006
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5199388U Pending JPH01154630U (en) | 1988-04-18 | 1988-04-18 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01154630U (en) |
-
1988
- 1988-04-18 JP JP5199388U patent/JPH01154630U/ja active Pending