JPS61164027U - - Google Patents

Info

Publication number
JPS61164027U
JPS61164027U JP4688685U JP4688685U JPS61164027U JP S61164027 U JPS61164027 U JP S61164027U JP 4688685 U JP4688685 U JP 4688685U JP 4688685 U JP4688685 U JP 4688685U JP S61164027 U JPS61164027 U JP S61164027U
Authority
JP
Japan
Prior art keywords
processing chamber
gas supply
nozzle
gas
manufacturing apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4688685U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP4688685U priority Critical patent/JPS61164027U/ja
Publication of JPS61164027U publication Critical patent/JPS61164027U/ja
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の一実施例である半導体製造装
置を示す構成図、第2図は第1図のA部の詳細図
、第3図は第1図の他の実施例であるA部の詳細
図である。 1……処理室、6……真空ポンプ、7……供給
ライン、12ないし14……流量制御ユニツト、
15……ノズル。
FIG. 1 is a configuration diagram showing a semiconductor manufacturing apparatus that is an embodiment of the present invention, FIG. 2 is a detailed view of section A in FIG. 1, and FIG. 3 is a section A that is another embodiment of the invention. FIG. 1... Processing chamber, 6... Vacuum pump, 7... Supply line, 12 to 14... Flow rate control unit,
15... Nozzle.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 処理室と、該処理室を真空排気し圧力制御する
排気手段と、前記処理室にプロセスガスを供給す
るガス供給手段とから成る半導体製造装置におい
て、前記ガス供給手段のガス供給ラインの処理室
側にノズルを設け、該ノズル部に蒸気圧の低いガ
スラインを接続したことを特徴とする半導体製造
装置。
In a semiconductor manufacturing apparatus comprising a processing chamber, an exhaust means for evacuating the processing chamber and controlling the pressure, and a gas supply means for supplying process gas to the processing chamber, a gas supply line of the gas supply means on the processing chamber side 1. A semiconductor manufacturing apparatus comprising: a nozzle; and a gas line having a low vapor pressure connected to the nozzle.
JP4688685U 1985-04-01 1985-04-01 Pending JPS61164027U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4688685U JPS61164027U (en) 1985-04-01 1985-04-01

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4688685U JPS61164027U (en) 1985-04-01 1985-04-01

Publications (1)

Publication Number Publication Date
JPS61164027U true JPS61164027U (en) 1986-10-11

Family

ID=30561702

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4688685U Pending JPS61164027U (en) 1985-04-01 1985-04-01

Country Status (1)

Country Link
JP (1) JPS61164027U (en)

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