JPS61170066U - - Google Patents
Info
- Publication number
- JPS61170066U JPS61170066U JP5295885U JP5295885U JPS61170066U JP S61170066 U JPS61170066 U JP S61170066U JP 5295885 U JP5295885 U JP 5295885U JP 5295885 U JP5295885 U JP 5295885U JP S61170066 U JPS61170066 U JP S61170066U
- Authority
- JP
- Japan
- Prior art keywords
- nozzle
- gas
- spraying
- chamber
- gas injection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000002347 injection Methods 0.000 claims description 4
- 239000007924 injection Substances 0.000 claims description 4
- 239000007921 spray Substances 0.000 claims description 3
- 238000004807 desolvation Methods 0.000 claims description 2
- 239000012488 sample solution Substances 0.000 claims description 2
- 238000005507 spraying Methods 0.000 claims 4
- 238000010438 heat treatment Methods 0.000 claims 2
- 238000004895 liquid chromatography mass spectrometry Methods 0.000 claims 1
- 239000000243 solution Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
Landscapes
- Electron Tubes For Measurement (AREA)
Description
第１図は本考案の一実施例を示す主要部の断面
図、第２図は従来の装置を示す概略図である。
２：イオン源、３：インタフエース、４：試料
溶液噴霧室、５：脱溶媒室、１２：ハウジング、
１４：プローブ、１５：噴霧ノズル、１９：加熱
ヒータ、２０：ガス噴射ノズル、２１：パイプ、
２２：バルブ、２３：高圧ガス供給源、２４；ガ
ス加熱ヒータ、２５：オリフイス。
FIG. 1 is a sectional view of the main parts showing an embodiment of the present invention, and FIG. 2 is a schematic diagram showing a conventional device. 2: ion source, 3: interface, 4: sample solution spray chamber, 5: desolvation chamber, 12: housing,
14: probe, 15: spray nozzle, 19: heater, 20: gas injection nozzle, 21: pipe,
22: Valve, 23: High pressure gas supply source, 24: Gas heater, 25: Orifice.
Claims (1)
らなり、脱溶媒室は質量分析装置のイオン源に接
続せしめ、噴霧室内には液体クロマトグラフから
流出した溶液を噴霧するためのノズル部を配置し
、この噴霧室内を排気する真空ポンプを設けた装
置において、前記噴霧室内に前記試料溶液噴霧用
のノズルに対向してガス噴射ノズルを設け、この
ガス噴射ノズルに高圧ガスを供給する手段及び噴
射すべきガスを所望の温度に加熱する手段を備え
たことを特徴とするＬＣ／ＭＳインタフエース。 (2) 前記噴射すべきガスの加熱手段はガス噴射
ノズルに接続するパイプの回りに巻回されたヒー
タである実用新案登録請求の範囲第１項記載のＬ
Ｃ／ＭＳインタフエース。[Scope of Claim for Utility Model Registration] (1) Consists of a spray chamber and a desolvation chamber equipped with a heater. In an apparatus including a nozzle part for spraying a solution and a vacuum pump for evacuating the inside of this spraying chamber, a gas injection nozzle is provided in the spraying chamber opposite to the nozzle for spraying the sample solution, and the gas injection An LC/MS interface comprising means for supplying high pressure gas to a nozzle and means for heating the gas to be injected to a desired temperature. (2) L according to claim 1 of the utility model registration claim, wherein the heating means for the gas to be injected is a heater wound around a pipe connected to a gas injection nozzle.
C/MS interface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5295885U JPS61170066U (en) | 1985-04-10 | 1985-04-10 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5295885U JPS61170066U (en) | 1985-04-10 | 1985-04-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61170066U true JPS61170066U (en) | 1986-10-22 |
Family
ID=30573375
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5295885U Pending JPS61170066U (en) | 1985-04-10 | 1985-04-10 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61170066U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2021043093A (en) * | 2019-09-12 | 2021-03-18 | 株式会社島津製作所 | Sample pretreatment device |
-
1985
- 1985-04-10 JP JP5295885U patent/JPS61170066U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2021043093A (en) * | 2019-09-12 | 2021-03-18 | 株式会社島津製作所 | Sample pretreatment device |
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