JPS63123096U - - Google Patents
Info
- Publication number
- JPS63123096U JPS63123096U JP1538787U JP1538787U JPS63123096U JP S63123096 U JPS63123096 U JP S63123096U JP 1538787 U JP1538787 U JP 1538787U JP 1538787 U JP1538787 U JP 1538787U JP S63123096 U JPS63123096 U JP S63123096U
- Authority
- JP
- Japan
- Prior art keywords
- container
- gas
- plasma
- electrodes
- frequency induction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000006698 induction Effects 0.000 claims description 4
- 238000001816 cooling Methods 0.000 description 1
Description
第１図は本考案の一実施例の縦断面図、第２図
は第１図のＡＡ断面図である。
１：容器、２：架台、３：誘導コイル、４：高
周波電源、５：第１の蓋体、６：Ｏリング、７：
ガス溜、８ａ，８ｂ，８ｃ，８ｄ：ノズル、９：
パイプ、１０，１７：弁、１１：冷却パイプ、１
２：着火室、１３：第２の蓋体、１４ａ，１４ｂ
：電極棒、１５：高周波電源、１６：導入パイプ
、１８：材料導入パイプ。
FIG. 1 is a longitudinal cross-sectional view of an embodiment of the present invention, and FIG. 2 is a cross-sectional view taken along line AA in FIG. 1: Container, 2: Frame, 3: Induction coil, 4: High frequency power supply, 5: First lid, 6: O-ring, 7:
Gas reservoir, 8a, 8b, 8c, 8d: Nozzle, 9:
Pipe, 10, 17: Valve, 11: Cooling pipe, 1
2: Ignition chamber, 13: Second lid, 14a, 14b
: electrode rod, 15: high frequency power supply, 16: introduction pipe, 18: material introduction pipe.
Claims (1)
巻かれた誘導コイルに高周波電流を供給すること
により、該容器内にプラズマを発生するようにし
た高周波誘導プラズマ装置において、前記容器内
に着火用ガスを導入する手段と、該着火用ガスの
流路中に置かれた一対の電極と、該両電極間に放
電を起こさせるための電源とを備えたことを特徴
とする高周波誘導プラズマ装置。 In a high-frequency induction plasma device that generates plasma in a container by supplying a high-frequency current to an induction coil wound around the outer circumference of a container into which plasma gas is introduced, an ignition gas is introduced into the container. 1. A high-frequency induction plasma device comprising: means for introducing gas, a pair of electrodes placed in a flow path of the ignition gas, and a power source for causing a discharge between the two electrodes.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1538787U JPS63123096U (en) | 1987-02-04 | 1987-02-04 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1538787U JPS63123096U (en) | 1987-02-04 | 1987-02-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63123096U true JPS63123096U (en) | 1988-08-10 |
Family
ID=30806273
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1538787U Pending JPS63123096U (en) | 1987-02-04 | 1987-02-04 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63123096U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009004157A (en) * | 2007-06-20 | 2009-01-08 | Univ Nagoya | Plasma generating device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5532317A (en) * | 1978-08-28 | 1980-03-07 | Asahi Chemical Ind | High frequency magnetic field coupling arc plasma reactor |
-
1987
- 1987-02-04 JP JP1538787U patent/JPS63123096U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5532317A (en) * | 1978-08-28 | 1980-03-07 | Asahi Chemical Ind | High frequency magnetic field coupling arc plasma reactor |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009004157A (en) * | 2007-06-20 | 2009-01-08 | Univ Nagoya | Plasma generating device |
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