JPS6230337U - - Google Patents

Info

Publication number
JPS6230337U
JPS6230337U JP12096785U JP12096785U JPS6230337U JP S6230337 U JPS6230337 U JP S6230337U JP 12096785 U JP12096785 U JP 12096785U JP 12096785 U JP12096785 U JP 12096785U JP S6230337 U JPS6230337 U JP S6230337U
Authority
JP
Japan
Prior art keywords
plasma processing
gas supply
chamber
section
utility
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12096785U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12096785U priority Critical patent/JPS6230337U/ja
Publication of JPS6230337U publication Critical patent/JPS6230337U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案の一実施例を示す断面図である
。 1…プラズマ処理部チヤンバ、2…処理ガス供
給ノズル、3…高周波発振電極、4…半導体ウエ
ハ、5…キヤリア、6…補助チヤンバ、7…ガス
供給ノズル、8…排気口、9…電磁弁、10…ロ
ータリ式真空ポンプ。
FIG. 1 is a sectional view showing an embodiment of the present invention. DESCRIPTION OF SYMBOLS 1... Plasma processing part chamber, 2... Processing gas supply nozzle, 3... High frequency oscillation electrode, 4... Semiconductor wafer, 5... Carrier, 6... Auxiliary chamber, 7... Gas supply nozzle, 8... Exhaust port, 9... Solenoid valve, 10...Rotary vacuum pump.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 半導体ウエハのフオトレジスト除去用プラズマ
処理装置において、プラズマ処理部チヤンバ排気
部に、複数個のガス供給ノズルを有する補助チヤ
ンバを設置したことを特徴とするプラズマ処理装
置。
A plasma processing apparatus for removing photoresist from semiconductor wafers, characterized in that an auxiliary chamber having a plurality of gas supply nozzles is installed in a chamber exhaust section of the plasma processing section.
JP12096785U 1985-08-07 1985-08-07 Pending JPS6230337U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12096785U JPS6230337U (en) 1985-08-07 1985-08-07

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12096785U JPS6230337U (en) 1985-08-07 1985-08-07

Publications (1)

Publication Number Publication Date
JPS6230337U true JPS6230337U (en) 1987-02-24

Family

ID=31009786

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12096785U Pending JPS6230337U (en) 1985-08-07 1985-08-07

Country Status (1)

Country Link
JP (1) JPS6230337U (en)

Similar Documents

Publication Publication Date Title
JPS6230337U (en)
JP4388627B2 (en) Processing equipment
JPH01154630U (en)
JPS5966120A (en) Semiconductor manufacturing device
JPS63260033A (en) Plasma reaction treatment device
JPS6059078A (en) Dry etching apparatus
JPH038430U (en)
JPS6329929U (en)
JPH0231126U (en)
JPS6255564U (en)
JPH0167738U (en)
JPS6350127U (en)
JPH0272530U (en)
JPH0260232U (en)
JPS6273542U (en)
JPS6268228U (en)
KR20010086502A (en) Dry etching apparatus
JPS61136537U (en)
JPS62170762U (en)
JPH0374665U (en)
JPH02127030U (en)
JPH0460556U (en)
JPS59131152U (en) semiconductor manufacturing equipment
JPH0621007A (en) Dry etching device
JPS621887A (en) Dry etching apparatus