JP7840732B2 - トランジスタ、および表示装置 - Google Patents
トランジスタ、および表示装置Info
- Publication number
- JP7840732B2 JP7840732B2 JP2022031439A JP2022031439A JP7840732B2 JP 7840732 B2 JP7840732 B2 JP 7840732B2 JP 2022031439 A JP2022031439 A JP 2022031439A JP 2022031439 A JP2022031439 A JP 2022031439A JP 7840732 B2 JP7840732 B2 JP 7840732B2
- Authority
- JP
- Japan
- Prior art keywords
- insulator
- oxide
- conductor
- transistor
- oxygen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/674—Thin-film transistors [TFT] characterised by the active materials
- H10D30/6755—Oxide semiconductors, e.g. zinc oxide, copper aluminium oxide or cadmium stannate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/6758—Thin-film transistors [TFT] characterised by the insulating substrates
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
- G09G3/20—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
- G09G3/22—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources
- G09G3/30—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels
- G09G3/32—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels semiconductive, e.g. using light-emitting diodes [LED]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/6729—Thin-film transistors [TFT] characterised by the electrodes
- H10D30/673—Thin-film transistors [TFT] characterised by the electrodes characterised by the shapes, relative sizes or dispositions of the gate electrodes
- H10D30/6733—Multi-gate TFTs
- H10D30/6734—Multi-gate TFTs having gate electrodes arranged on both top and bottom sides of the channel, e.g. dual-gate TFTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/674—Thin-film transistors [TFT] characterised by the active materials
- H10D30/675—Group III-V materials, Group II-VI materials, Group IV-VI materials, selenium or tellurium
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D87/00—Integrated devices comprising both bulk components and either SOI or SOS components on the same substrate
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G2300/00—Aspects of the constitution of display devices
- G09G2300/04—Structural and physical details of display devices
- G09G2300/0404—Matrix technologies
- G09G2300/0417—Special arrangements specific to the use of low carrier mobility technology
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G2300/00—Aspects of the constitution of display devices
- G09G2300/04—Structural and physical details of display devices
- G09G2300/0421—Structural details of the set of electrodes
- G09G2300/0426—Layout of electrodes and connections
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G2300/00—Aspects of the constitution of display devices
- G09G2300/08—Active matrix structure, i.e. with use of active elements, inclusive of non-linear two terminal elements, in the pixels together with light emitting or modulating elements
- G09G2300/0809—Several active elements per pixel in active matrix panels
- G09G2300/0842—Several active elements per pixel in active matrix panels forming a memory circuit, e.g. a dynamic memory with one capacitor
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
- G09G3/20—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
- G09G3/22—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources
- G09G3/30—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels
- G09G3/32—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels semiconductive, e.g. using light-emitting diodes [LED]
- G09G3/3208—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels semiconductive, e.g. using light-emitting diodes [LED] organic, e.g. using organic light-emitting diodes [OLED]
- G09G3/3225—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels semiconductive, e.g. using light-emitting diodes [LED] organic, e.g. using organic light-emitting diodes [OLED] using an active matrix
- G09G3/3233—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels semiconductive, e.g. using light-emitting diodes [LED] organic, e.g. using organic light-emitting diodes [OLED] using an active matrix with pixel circuitry controlling the current through the light-emitting element
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Thin Film Transistor (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Electroluminescent Light Sources (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Semiconductor Memories (AREA)
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021035525 | 2021-03-05 | ||
| JP2021035525 | 2021-03-05 | ||
| JP2021080946 | 2021-05-12 | ||
| JP2021080946 | 2021-05-12 | ||
| JP2021161151 | 2021-09-30 | ||
| JP2021161151 | 2021-09-30 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2022136007A JP2022136007A (ja) | 2022-09-15 |
| JP2022136007A5 JP2022136007A5 (https=) | 2025-02-26 |
| JP7840732B2 true JP7840732B2 (ja) | 2026-04-06 |
Family
ID=83117495
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022031439A Active JP7840732B2 (ja) | 2021-03-05 | 2022-03-02 | トランジスタ、および表示装置 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US12009432B2 (https=) |
| JP (1) | JP7840732B2 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8247276B2 (en) * | 2009-02-20 | 2012-08-21 | Semiconductor Energy Laboratory Co., Ltd. | Thin film transistor, method for manufacturing the same, and semiconductor device |
| CN116508161A (zh) * | 2021-11-26 | 2023-07-28 | 京东方科技集团股份有限公司 | 场效应薄膜晶体管及其制造方法、显示面板 |
| TW202501634A (zh) * | 2023-05-19 | 2025-01-01 | 日商半導體能源研究所股份有限公司 | 半導體裝置、顯示裝置、顯示模組、電子裝置 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016095381A (ja) | 2014-11-13 | 2016-05-26 | 株式会社Joled | 表示装置およびその駆動方法 |
| WO2019092549A1 (ja) | 2017-11-09 | 2019-05-16 | 株式会社半導体エネルギー研究所 | 表示装置、表示装置の駆動方法、および電子機器 |
| WO2019215538A1 (ja) | 2018-05-11 | 2019-11-14 | 株式会社半導体エネルギー研究所 | 表示装置、表示モジュール、及び電子機器 |
| JP2020021955A (ja) | 2014-06-09 | 2020-02-06 | 株式会社半導体エネルギー研究所 | 撮像装置 |
| WO2020136467A1 (ja) | 2018-12-28 | 2020-07-02 | 株式会社半導体エネルギー研究所 | 半導体装置、および半導体装置の作製方法 |
| WO2021019334A1 (ja) | 2019-07-26 | 2021-02-04 | 株式会社半導体エネルギー研究所 | 半導体装置 |
Family Cites Families (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5138163B2 (ja) | 2004-11-10 | 2013-02-06 | キヤノン株式会社 | 電界効果型トランジスタ |
| EP2453481B1 (en) | 2004-11-10 | 2017-01-11 | Canon Kabushiki Kaisha | Field effect transistor with amorphous oxide |
| JP5078246B2 (ja) | 2005-09-29 | 2012-11-21 | 株式会社半導体エネルギー研究所 | 半導体装置、及び半導体装置の作製方法 |
| JP5064747B2 (ja) | 2005-09-29 | 2012-10-31 | 株式会社半導体エネルギー研究所 | 半導体装置、電気泳動表示装置、表示モジュール、電子機器、及び半導体装置の作製方法 |
| JP2010153802A (ja) | 2008-11-20 | 2010-07-08 | Semiconductor Energy Lab Co Ltd | 半導体装置及び半導体装置の作製方法 |
| JP5606680B2 (ja) | 2009-01-19 | 2014-10-15 | 富士フイルム株式会社 | 薄膜トランジスタの製造方法及び電気光学装置の製造方法 |
| US8278657B2 (en) | 2009-02-13 | 2012-10-02 | Semiconductor Energy Laboratory Co., Ltd. | Transistor, semiconductor device including the transistor, and manufacturing method of the transistor and the semiconductor device |
| KR101396102B1 (ko) | 2009-12-04 | 2014-05-15 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 |
| WO2011102203A1 (en) | 2010-02-19 | 2011-08-25 | Semiconductor Energy Laboratory Co., Ltd. | Transistor and display device using the same |
| KR102420689B1 (ko) | 2010-02-26 | 2022-07-15 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 |
| WO2011132529A1 (en) | 2010-04-23 | 2011-10-27 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing semiconductor device |
| WO2011145484A1 (en) | 2010-05-21 | 2011-11-24 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| WO2011145467A1 (en) | 2010-05-21 | 2011-11-24 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| TWI541782B (zh) | 2010-07-02 | 2016-07-11 | 半導體能源研究所股份有限公司 | 液晶顯示裝置 |
| KR20120020073A (ko) | 2010-08-27 | 2012-03-07 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치의 설계 방법 |
| JP5723262B2 (ja) | 2010-12-02 | 2015-05-27 | 株式会社神戸製鋼所 | 薄膜トランジスタおよびスパッタリングターゲット |
| KR20200052993A (ko) * | 2010-12-03 | 2020-05-15 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 산화물 반도체막 및 반도체 장치 |
| JP2013153118A (ja) | 2011-03-09 | 2013-08-08 | Kobe Steel Ltd | 薄膜トランジスタの半導体層用酸化物、上記酸化物を備えた薄膜トランジスタの半導体層および薄膜トランジスタ |
| JP5947099B2 (ja) | 2011-05-20 | 2016-07-06 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| JP6005401B2 (ja) | 2011-06-10 | 2016-10-12 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| WO2013042562A1 (en) | 2011-09-22 | 2013-03-28 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| US8716708B2 (en) | 2011-09-29 | 2014-05-06 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same |
| US20130137232A1 (en) | 2011-11-30 | 2013-05-30 | Semiconductor Energy Laboratory Co., Ltd. | Method for forming oxide semiconductor film and method for manufacturing semiconductor device |
| JP6204036B2 (ja) | 2012-03-16 | 2017-09-27 | 株式会社神戸製鋼所 | 酸化物半導体薄膜の評価方法、及び酸化物半導体薄膜の品質管理方法 |
| JP5901420B2 (ja) | 2012-05-14 | 2016-04-13 | 富士フイルム株式会社 | 薄膜トランジスタの製造方法 |
| JP2014082388A (ja) | 2012-10-17 | 2014-05-08 | Semiconductor Energy Lab Co Ltd | 半導体装置 |
| JP5722293B2 (ja) | 2012-10-19 | 2015-05-20 | 株式会社神戸製鋼所 | 薄膜トランジスタ |
| TWI624936B (zh) | 2013-06-05 | 2018-05-21 | 半導體能源研究所股份有限公司 | 顯示裝置 |
| JP2015195327A (ja) | 2013-06-05 | 2015-11-05 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| US20150008428A1 (en) | 2013-07-08 | 2015-01-08 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing semiconductor device |
| WO2015128774A1 (en) | 2014-02-28 | 2015-09-03 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and display device including the semiconductor device |
| US9564535B2 (en) | 2014-02-28 | 2017-02-07 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, display device including the semiconductor device, display module including the display device, and electronic appliance including the semiconductor device, the display device, and the display module |
| US9887291B2 (en) | 2014-03-19 | 2018-02-06 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, display device including the semiconductor device, display module including the display device, and electronic device including the semiconductor device, the display device, or the display module |
| US9768315B2 (en) | 2014-04-18 | 2017-09-19 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and display device having the same |
| TWI669761B (zh) | 2014-05-30 | 2019-08-21 | 日商半導體能源研究所股份有限公司 | 半導體裝置、包括該半導體裝置的顯示裝置 |
| US9666655B2 (en) * | 2015-05-05 | 2017-05-30 | Semiconductor Energy Laboratory Co., Ltd. | Display device |
| US10418385B2 (en) * | 2016-11-18 | 2019-09-17 | Shanghai Tianma Micro-electronics Co., Ltd. | Array substrate and fabrication method thereof, display panel |
| WO2021090104A1 (ja) | 2019-11-08 | 2021-05-14 | 株式会社半導体エネルギー研究所 | 半導体装置およびその作製方法 |
-
2022
- 2022-02-24 US US17/679,413 patent/US12009432B2/en active Active
- 2022-03-02 JP JP2022031439A patent/JP7840732B2/ja active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2020021955A (ja) | 2014-06-09 | 2020-02-06 | 株式会社半導体エネルギー研究所 | 撮像装置 |
| JP2016095381A (ja) | 2014-11-13 | 2016-05-26 | 株式会社Joled | 表示装置およびその駆動方法 |
| WO2019092549A1 (ja) | 2017-11-09 | 2019-05-16 | 株式会社半導体エネルギー研究所 | 表示装置、表示装置の駆動方法、および電子機器 |
| WO2019215538A1 (ja) | 2018-05-11 | 2019-11-14 | 株式会社半導体エネルギー研究所 | 表示装置、表示モジュール、及び電子機器 |
| WO2020136467A1 (ja) | 2018-12-28 | 2020-07-02 | 株式会社半導体エネルギー研究所 | 半導体装置、および半導体装置の作製方法 |
| WO2021019334A1 (ja) | 2019-07-26 | 2021-02-04 | 株式会社半導体エネルギー研究所 | 半導体装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20220285560A1 (en) | 2022-09-08 |
| JP2022136007A (ja) | 2022-09-15 |
| US12009432B2 (en) | 2024-06-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI856139B (zh) | 半導體裝置 | |
| JPWO2019234561A1 (ja) | 半導体装置、および半導体装置の作製方法 | |
| JP7840732B2 (ja) | トランジスタ、および表示装置 | |
| TWI864037B (zh) | 半導體裝置及半導體裝置的製造方法 | |
| JPWO2020049425A1 (ja) | 半導体装置の作製方法 | |
| TW201810614A (zh) | 半導體裝置 | |
| JP2020009960A (ja) | 半導体装置、および半導体装置の作製方法 | |
| TWI878367B (zh) | 半導體裝置 | |
| TWI858071B (zh) | 半導體裝置以及半導體裝置的製造方法 | |
| TW202310425A (zh) | 半導體裝置 | |
| JPWO2020070580A1 (ja) | 半導体装置、および半導体装置の作製方法 | |
| CN115244713A (zh) | 半导体装置、半导体装置的制造方法 | |
| WO2020084400A1 (ja) | 金属酸化物の作製方法、半導体装置の作製方法 | |
| US20250048676A1 (en) | Semiconductor device, method for manufacturing semiconductor device | |
| WO2021090106A1 (ja) | トランジスタ、および電子機器 | |
| KR20230053616A (ko) | 반도체 장치의 제작 방법 | |
| CN116097401A (zh) | 绝缘膜的改性方法及半导体装置的制造方法 | |
| TW202503860A (zh) | 氧化物半導體層、氧化物半導體層的製造方法、半導體裝置以及半導體裝置的製造方法 | |
| KR20230052894A (ko) | 금속 산화물의 제조 방법 | |
| KR20230054836A (ko) | 반도체 장치의 제작 방법 | |
| KR20220120577A (ko) | 반도체 장치, 반도체 장치의 제작 방법 | |
| US20240306423A1 (en) | Light-Emitting Element, Display Apparatus, and Electronic Device | |
| CN118318309A (zh) | 半导体装置、半导体装置的制造方法 | |
| TW202505981A (zh) | 氧化物半導體層、氧化物半導體層的製造方法、半導體裝置及半導體裝置的製造方法 | |
| TW202301695A (zh) | 半導體裝置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20250217 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20250217 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20250930 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20251021 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20251202 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20260224 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20260325 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 7840732 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |