JP7828332B2 - 光配向層の露光方法 - Google Patents

光配向層の露光方法

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Publication number
JP7828332B2
JP7828332B2 JP2023514624A JP2023514624A JP7828332B2 JP 7828332 B2 JP7828332 B2 JP 7828332B2 JP 2023514624 A JP2023514624 A JP 2023514624A JP 2023514624 A JP2023514624 A JP 2023514624A JP 7828332 B2 JP7828332 B2 JP 7828332B2
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JP
Japan
Prior art keywords
liquid crystal
optically anisotropic
exposure mask
anisotropic layer
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2023514624A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2022220185A1 (https=
Inventor
寛 佐藤
隆 米本
克己 篠田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of JPWO2022220185A1 publication Critical patent/JPWO2022220185A1/ja
Application granted granted Critical
Publication of JP7828332B2 publication Critical patent/JP7828332B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Polarising Elements (AREA)
  • Liquid Crystal (AREA)
JP2023514624A 2021-04-12 2022-04-06 光配向層の露光方法 Active JP7828332B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021067286 2021-04-12
JP2021067286 2021-04-12
PCT/JP2022/017178 WO2022220185A1 (ja) 2021-04-12 2022-04-06 光配向層の露光方法

Publications (2)

Publication Number Publication Date
JPWO2022220185A1 JPWO2022220185A1 (https=) 2022-10-20
JP7828332B2 true JP7828332B2 (ja) 2026-03-11

Family

ID=83639738

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023514624A Active JP7828332B2 (ja) 2021-04-12 2022-04-06 光配向層の露光方法

Country Status (3)

Country Link
US (1) US20240045334A1 (https=)
JP (1) JP7828332B2 (https=)
WO (1) WO2022220185A1 (https=)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010525394A (ja) 2007-04-16 2010-07-22 ノース・キャロライナ・ステイト・ユニヴァーシティ 低ツイストキラル液晶偏光回折格子および関連する作製方法
JP2012148034A (ja) 2011-01-21 2012-08-09 Hitachi Maxell Ltd 被測定物内の成分濃度の測定装置
US20170373459A1 (en) 2016-06-27 2017-12-28 University Of Central Florida Research Foundation, Inc. Volume polarization grating, methods of making, and applications
WO2019189675A1 (ja) 2018-03-29 2019-10-03 富士フイルム株式会社 光偏向装置および光学装置
WO2020022496A1 (ja) 2018-07-27 2020-01-30 富士フイルム株式会社 光学素子、光配向パターンの形成方法および光学素子の製造方法
WO2020066429A1 (ja) 2018-09-28 2020-04-02 富士フイルム株式会社 光学素子および光偏向装置
WO2020071169A1 (ja) 2018-10-01 2020-04-09 富士フイルム株式会社 ディスプレイ
WO2020122127A1 (ja) 2018-12-11 2020-06-18 富士フイルム株式会社 コレステリック液晶層およびコレステリック液晶層の形成方法、ならびに、積層体、導光素子および画像表示装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3001713B1 (fr) * 2013-02-05 2016-07-15 Astrium Sas Dispositif de retenue d'un reservoir dans un aeronef

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010525394A (ja) 2007-04-16 2010-07-22 ノース・キャロライナ・ステイト・ユニヴァーシティ 低ツイストキラル液晶偏光回折格子および関連する作製方法
JP2012148034A (ja) 2011-01-21 2012-08-09 Hitachi Maxell Ltd 被測定物内の成分濃度の測定装置
US20170373459A1 (en) 2016-06-27 2017-12-28 University Of Central Florida Research Foundation, Inc. Volume polarization grating, methods of making, and applications
WO2019189675A1 (ja) 2018-03-29 2019-10-03 富士フイルム株式会社 光偏向装置および光学装置
WO2020022496A1 (ja) 2018-07-27 2020-01-30 富士フイルム株式会社 光学素子、光配向パターンの形成方法および光学素子の製造方法
WO2020066429A1 (ja) 2018-09-28 2020-04-02 富士フイルム株式会社 光学素子および光偏向装置
WO2020071169A1 (ja) 2018-10-01 2020-04-09 富士フイルム株式会社 ディスプレイ
WO2020122127A1 (ja) 2018-12-11 2020-06-18 富士フイルム株式会社 コレステリック液晶層およびコレステリック液晶層の形成方法、ならびに、積層体、導光素子および画像表示装置

Also Published As

Publication number Publication date
JPWO2022220185A1 (https=) 2022-10-20
US20240045334A1 (en) 2024-02-08
WO2022220185A1 (ja) 2022-10-20

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