JP7800444B2 - ガラス基板及びガラス基板の製造方法 - Google Patents

ガラス基板及びガラス基板の製造方法

Info

Publication number
JP7800444B2
JP7800444B2 JP2022571534A JP2022571534A JP7800444B2 JP 7800444 B2 JP7800444 B2 JP 7800444B2 JP 2022571534 A JP2022571534 A JP 2022571534A JP 2022571534 A JP2022571534 A JP 2022571534A JP 7800444 B2 JP7800444 B2 JP 7800444B2
Authority
JP
Japan
Prior art keywords
glass substrate
less
supported
amount
deflection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2022571534A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2022138693A1 (https=
JPWO2022138693A5 (https=
Inventor
悠波 小林
賢志 後藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of JPWO2022138693A1 publication Critical patent/JPWO2022138693A1/ja
Publication of JPWO2022138693A5 publication Critical patent/JPWO2022138693A5/ja
Application granted granted Critical
Publication of JP7800444B2 publication Critical patent/JP7800444B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/18—Stirring devices; Homogenisation
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/18—Stirring devices; Homogenisation
    • C03B5/187—Stirring devices; Homogenisation with moving elements
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/078—Glass compositions containing silica with 40% to 90% silica, by weight containing an oxide of a divalent metal, e.g. an oxide of zinc
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/095—Glass compositions containing silica with 40% to 90% silica, by weight containing rare earths
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/01—Manufacture or treatment
    • H10W74/019—Manufacture or treatment using temporary auxiliary substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Glass Compositions (AREA)
JP2022571534A 2020-12-23 2021-12-22 ガラス基板及びガラス基板の製造方法 Active JP7800444B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020214053 2020-12-23
JP2020214053 2020-12-23
PCT/JP2021/047481 WO2022138693A1 (ja) 2020-12-23 2021-12-22 ガラス基板及びガラス基板の製造方法

Publications (3)

Publication Number Publication Date
JPWO2022138693A1 JPWO2022138693A1 (https=) 2022-06-30
JPWO2022138693A5 JPWO2022138693A5 (https=) 2023-09-11
JP7800444B2 true JP7800444B2 (ja) 2026-01-16

Family

ID=82156991

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022571534A Active JP7800444B2 (ja) 2020-12-23 2021-12-22 ガラス基板及びガラス基板の製造方法

Country Status (5)

Country Link
US (1) US12040212B2 (https=)
JP (1) JP7800444B2 (https=)
CN (1) CN116745243A (https=)
TW (1) TW202241820A (https=)
WO (1) WO2022138693A1 (https=)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015180594A (ja) 2012-11-29 2015-10-15 ＡｖａｎＳｔｒａｔｅ株式会社 ガラス基板の製造方法
JP6715381B1 (ja) 2019-07-29 2020-07-01 Ａｇｃ株式会社 支持ガラス基板

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5263152B2 (ja) * 2007-03-23 2013-08-14 旭硝子株式会社 データ記憶媒体用基板ガラスおよびガラス基板
JP6443668B2 (ja) 2014-12-17 2018-12-26 日本電気硝子株式会社 支持ガラス基板及びこれを用いた積層体
JP6645502B2 (ja) * 2015-07-24 2020-02-14 Ａｇｃ株式会社 ガラス基板、積層基板、積層基板の製造方法、積層体、梱包体、およびガラス基板の製造方法
US20230135358A1 (en) * 2021-10-29 2023-05-04 AGC Inc. Glass and method for manufacturing glass

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015180594A (ja) 2012-11-29 2015-10-15 ＡｖａｎＳｔｒａｔｅ株式会社 ガラス基板の製造方法
JP6715381B1 (ja) 2019-07-29 2020-07-01 Ａｇｃ株式会社 支持ガラス基板

Also Published As

Publication number Publication date
JPWO2022138693A1 (https=) 2022-06-30
WO2022138693A1 (ja) 2022-06-30
TW202241820A (zh) 2022-11-01
US20230335427A1 (en) 2023-10-19
US12040212B2 (en) 2024-07-16
CN116745243A (zh) 2023-09-12

Similar Documents

Publication Publication Date Title
US20230253012A1 (en) Substrate for magnetic disk and magnetic disk
CN102898022A (zh) 基板用玻璃及玻璃基板
JP7800444B2 (ja) ガラス基板及びガラス基板の製造方法
JP7811289B2 (ja) スペーサ及びハードディスクドライブ装置
JP2025133906A (ja) ガラス基板の製造方法及びガラス基板
US11817328B2 (en) Laminate and method for producing laminate
US20250110340A1 (en) Glass substrate
TW202613047A (zh) 玻璃基板及玻璃基板之製造方法
JP7739813B2 (ja) ガラス基板
JP2016219085A (ja) 磁気記録媒体基板用ガラス、磁気記録媒体基板、および磁気記録媒体
US20230135358A1 (en) Glass and method for manufacturing glass
US20240286945A1 (en) Alkali-free glass sheet
US20250263325A1 (en) Glass substrate for magnetic recording medium, glass disk for magnetic recording medium, method for manufacturing magnetic recording medium, and method for manufacturing glass disk
WO2024085083A1 (ja) ガラス基板
WO2021200513A1 (ja) ガラスブランク材の製造方法、及びガラスブランク材製造装置
KR102957542B1 (ko) 지지 유리 기판
WO2026083979A1 (ja) ガラス基板
US20240246854A1 (en) Glass substrate
KR102440332B1 (ko) 공학적 응력 분포를 갖는 유리계 제품 및 이의 제조 방법
TWI921488B (zh) 玻璃物件及其用途、壓力感測器及玻璃物件之製造方法
US20240270625A1 (en) Alkali-free glass sheet
US20240262737A1 (en) Alkali-free glass sheet
TW202515835A (zh) 玻璃
JPWO2022138693A5 (https=)
JP2023160152A (ja) ガラス

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20230508

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20240820

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20250909

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20251202

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20251215

R150 Certificate of patent or registration of utility model

Ref document number: 7800444

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150