JP7707511B2 - ウェハ及びウェハの製造方法 - Google Patents
ウェハ及びウェハの製造方法Info
- Publication number
- JP7707511B2 JP7707511B2 JP2021135446A JP2021135446A JP7707511B2 JP 7707511 B2 JP7707511 B2 JP 7707511B2 JP 2021135446 A JP2021135446 A JP 2021135446A JP 2021135446 A JP2021135446 A JP 2021135446A JP 7707511 B2 JP7707511 B2 JP 7707511B2
- Authority
- JP
- Japan
- Prior art keywords
- region
- conductive bumps
- area
- conductive
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
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- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/14—Structure, shape, material or disposition of the bump connectors prior to the connecting process of a plurality of bump connectors
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| JP2021135446A JP7707511B2 (ja) | 2021-08-23 | 2021-08-23 | ウェハ及びウェハの製造方法 |
| US17/816,805 US20230054800A1 (en) | 2021-08-23 | 2022-08-02 | Wafer |
| KR1020220099076A KR20230029522A (ko) | 2021-08-23 | 2022-08-09 | 웨이퍼 및 웨이퍼의 제조 방법 |
| CN202210995634.XA CN115910961A (zh) | 2021-08-23 | 2022-08-18 | 晶圆以及晶圆的制造方法 |
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| JP2003168700A (ja) | 2001-09-18 | 2003-06-13 | Seiko Epson Corp | 半導体ウエハ、半導体装置及びその製造方法、回路基板並びに電子機器 |
| JP2005093461A (ja) | 2003-09-12 | 2005-04-07 | Casio Comput Co Ltd | 半導体基板、半導体基板の製造方法および半導体装置の製造方法 |
| JP2007013063A (ja) | 2005-07-04 | 2007-01-18 | Fujitsu Ltd | 半導体装置 |
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| JP2000100851A (ja) * | 1998-09-25 | 2000-04-07 | Sony Corp | 半導体部品及びその製造方法、半導体部品の実装構造及びその実装方法 |
| US9911709B1 (en) * | 2016-10-26 | 2018-03-06 | Advanced Semiconductor Engineering, Inc. | Semiconductor device and semiconductor manufacturing process |
| US9905527B1 (en) * | 2016-12-15 | 2018-02-27 | Micron Technology, Inc. | Uniform electrochemical plating of metal onto arrays of pillars having different lateral densities and related technology |
| US11469198B2 (en) * | 2018-07-16 | 2022-10-11 | Taiwan Semiconductor Manufacturing Company Ltd. | Semiconductor device manufacturing method and associated semiconductor die |
| KR102879035B1 (ko) * | 2020-07-10 | 2025-10-29 | 삼성전자주식회사 | 반도체 패키지 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2003168700A (ja) | 2001-09-18 | 2003-06-13 | Seiko Epson Corp | 半導体ウエハ、半導体装置及びその製造方法、回路基板並びに電子機器 |
| JP2005093461A (ja) | 2003-09-12 | 2005-04-07 | Casio Comput Co Ltd | 半導体基板、半導体基板の製造方法および半導体装置の製造方法 |
| JP2007013063A (ja) | 2005-07-04 | 2007-01-18 | Fujitsu Ltd | 半導体装置 |
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| KR20230029522A (ko) | 2023-03-03 |
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