JP7684309B2 - 非イオン系光酸発生剤、及びフォトリソグラフィー用樹脂組成物 - Google Patents

非イオン系光酸発生剤、及びフォトリソグラフィー用樹脂組成物 Download PDF

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JP7684309B2
JP7684309B2 JP2022541135A JP2022541135A JP7684309B2 JP 7684309 B2 JP7684309 B2 JP 7684309B2 JP 2022541135 A JP2022541135 A JP 2022541135A JP 2022541135 A JP2022541135 A JP 2022541135A JP 7684309 B2 JP7684309 B2 JP 7684309B2
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JPWO2022030107A1 (enrdf_load_stackoverflow
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竜輔 高橋
智仁 木津
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San Apro KK
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San Apro KK
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C311/00—Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
    • C07C311/48—Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups having nitrogen atoms of sulfonamide groups further bound to another hetero atom
    • C07C311/49—Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups having nitrogen atoms of sulfonamide groups further bound to another hetero atom to nitrogen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/82—Carbazoles; Hydrogenated carbazoles
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D491/00—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00
    • C07D491/02—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00 in which the condensed system contains two hetero rings
    • C07D491/04—Ortho-condensed systems
    • C07D491/044—Ortho-condensed systems with only one oxygen atom as ring hetero atom in the oxygen-containing ring
    • C07D491/048—Ortho-condensed systems with only one oxygen atom as ring hetero atom in the oxygen-containing ring the oxygen-containing ring being five-membered
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP2022541135A 2020-08-06 2021-06-14 非イオン系光酸発生剤、及びフォトリソグラフィー用樹脂組成物 Active JP7684309B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020133632 2020-08-06
JP2020133632 2020-08-06
PCT/JP2021/022438 WO2022030107A1 (ja) 2020-08-06 2021-06-14 非イオン系光酸発生剤、及びフォトリソグラフィー用樹脂組成物

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JPWO2022030107A1 JPWO2022030107A1 (enrdf_load_stackoverflow) 2022-02-10
JP7684309B2 true JP7684309B2 (ja) 2025-05-27

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JP2022541135A Active JP7684309B2 (ja) 2020-08-06 2021-06-14 非イオン系光酸発生剤、及びフォトリソグラフィー用樹脂組成物

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JP (1) JP7684309B2 (enrdf_load_stackoverflow)
TW (1) TW202206410A (enrdf_load_stackoverflow)
WO (1) WO2022030107A1 (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116332811A (zh) * 2023-03-08 2023-06-27 南京工业大学 双三氟甲烷磺酰亚胺甲脒化合物结构及其制备方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020501173A (ja) 2017-09-11 2020-01-16 エルジー・ケム・リミテッド 光酸発生剤およびこれを含む厚膜用化学増幅型ポジ型フォトレジスト組成物
WO2021012264A1 (zh) 2019-07-25 2021-01-28 东莞市东阳光农药研发有限公司 三唑磺酰胺衍生物及其制备方法和应用
WO2021029158A1 (ja) 2019-08-09 2021-02-18 サンアプロ株式会社 スルホンアミド化合物、非イオン系光酸発生剤、およびフォトリソグラフィー用樹脂組成物

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Publication number Priority date Publication date Assignee Title
TW249779B (enrdf_load_stackoverflow) * 1993-05-26 1995-06-21 Philips Electronics Nv
DE4445968A1 (de) * 1994-12-22 1996-06-27 Bayer Ag Verwendung von Sulfonylguanazinen

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020501173A (ja) 2017-09-11 2020-01-16 エルジー・ケム・リミテッド 光酸発生剤およびこれを含む厚膜用化学増幅型ポジ型フォトレジスト組成物
WO2021012264A1 (zh) 2019-07-25 2021-01-28 东莞市东阳光农药研发有限公司 三唑磺酰胺衍生物及其制备方法和应用
WO2021029158A1 (ja) 2019-08-09 2021-02-18 サンアプロ株式会社 スルホンアミド化合物、非イオン系光酸発生剤、およびフォトリソグラフィー用樹脂組成物

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WO2022030107A1 (ja) 2022-02-10
TW202206410A (zh) 2022-02-16

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