JPWO2022030107A1 - - Google Patents

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Publication number
JPWO2022030107A1
JPWO2022030107A1 JP2022541135A JP2022541135A JPWO2022030107A1 JP WO2022030107 A1 JPWO2022030107 A1 JP WO2022030107A1 JP 2022541135 A JP2022541135 A JP 2022541135A JP 2022541135 A JP2022541135 A JP 2022541135A JP WO2022030107 A1 JPWO2022030107 A1 JP WO2022030107A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022541135A
Other languages
Japanese (ja)
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JP7684309B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Publication of JPWO2022030107A1 publication Critical patent/JPWO2022030107A1/ja
Application granted granted Critical
Publication of JP7684309B2 publication Critical patent/JP7684309B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C311/00—Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
    • C07C311/48—Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups having nitrogen atoms of sulfonamide groups further bound to another hetero atom
    • C07C311/49—Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups having nitrogen atoms of sulfonamide groups further bound to another hetero atom to nitrogen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/82—Carbazoles; Hydrogenated carbazoles
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D491/00—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00
    • C07D491/02—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00 in which the condensed system contains two hetero rings
    • C07D491/04—Ortho-condensed systems
    • C07D491/044—Ortho-condensed systems with only one oxygen atom as ring hetero atom in the oxygen-containing ring
    • C07D491/048—Ortho-condensed systems with only one oxygen atom as ring hetero atom in the oxygen-containing ring the oxygen-containing ring being five-membered
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP2022541135A 2020-08-06 2021-06-14 非イオン系光酸発生剤、及びフォトリソグラフィー用樹脂組成物 Active JP7684309B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020133632 2020-08-06
JP2020133632 2020-08-06
PCT/JP2021/022438 WO2022030107A1 (ja) 2020-08-06 2021-06-14 非イオン系光酸発生剤、及びフォトリソグラフィー用樹脂組成物

Publications (2)

Publication Number Publication Date
JPWO2022030107A1 true JPWO2022030107A1 (enrdf_load_stackoverflow) 2022-02-10
JP7684309B2 JP7684309B2 (ja) 2025-05-27

Family

ID=80117837

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022541135A Active JP7684309B2 (ja) 2020-08-06 2021-06-14 非イオン系光酸発生剤、及びフォトリソグラフィー用樹脂組成物

Country Status (3)

Country Link
JP (1) JP7684309B2 (enrdf_load_stackoverflow)
TW (1) TW202206410A (enrdf_load_stackoverflow)
WO (1) WO2022030107A1 (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116332811A (zh) * 2023-03-08 2023-06-27 南京工业大学 双三氟甲烷磺酰亚胺甲脒化合物结构及其制备方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0798485A (ja) * 1993-05-26 1995-04-11 Philips Electron Nv レーザー光線による物体表面の標識方法
JP2020501173A (ja) * 2017-09-11 2020-01-16 エルジー・ケム・リミテッド 光酸発生剤およびこれを含む厚膜用化学増幅型ポジ型フォトレジスト組成物
WO2021012264A1 (zh) * 2019-07-25 2021-01-28 东莞市东阳光农药研发有限公司 三唑磺酰胺衍生物及其制备方法和应用
WO2021029158A1 (ja) * 2019-08-09 2021-02-18 サンアプロ株式会社 スルホンアミド化合物、非イオン系光酸発生剤、およびフォトリソグラフィー用樹脂組成物

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4445968A1 (de) * 1994-12-22 1996-06-27 Bayer Ag Verwendung von Sulfonylguanazinen

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0798485A (ja) * 1993-05-26 1995-04-11 Philips Electron Nv レーザー光線による物体表面の標識方法
JP2020501173A (ja) * 2017-09-11 2020-01-16 エルジー・ケム・リミテッド 光酸発生剤およびこれを含む厚膜用化学増幅型ポジ型フォトレジスト組成物
WO2021012264A1 (zh) * 2019-07-25 2021-01-28 东莞市东阳光农药研发有限公司 三唑磺酰胺衍生物及其制备方法和应用
WO2021029158A1 (ja) * 2019-08-09 2021-02-18 サンアプロ株式会社 スルホンアミド化合物、非イオン系光酸発生剤、およびフォトリソグラフィー用樹脂組成物

Also Published As

Publication number Publication date
JP7684309B2 (ja) 2025-05-27
WO2022030107A1 (ja) 2022-02-10
TW202206410A (zh) 2022-02-16

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