JP7652330B2 - キャパシタ - Google Patents

キャパシタ Download PDF

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Publication number
JP7652330B2
JP7652330B2 JP2024501940A JP2024501940A JP7652330B2 JP 7652330 B2 JP7652330 B2 JP 7652330B2 JP 2024501940 A JP2024501940 A JP 2024501940A JP 2024501940 A JP2024501940 A JP 2024501940A JP 7652330 B2 JP7652330 B2 JP 7652330B2
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JP
Japan
Prior art keywords
substrate
cross
dielectric layer
conductive
width
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2024501940A
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English (en)
Japanese (ja)
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JPWO2024095536A5 (https=
JPWO2024095536A1 (https=
Inventor
創太 柳井
康弘 清水
真己 永田
暢明 白井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
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Publication date
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Publication of JPWO2024095536A1 publication Critical patent/JPWO2024095536A1/ja
Publication of JPWO2024095536A5 publication Critical patent/JPWO2024095536A5/ja
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00—Resistors, capacitors or inductors
    • H10D1/60—Capacitors
    • H10D1/68—Capacitors having no potential barriers
    • H10D1/692—Electrodes
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/15—Nano-sized carbon materials
    • C01B32/158—Carbon nanotubes
    • C01B32/168—After-treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00—Fixed capacitors; Processes of their manufacture
    • H01G4/30—Stacked capacitors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00—Fixed capacitors; Processes of their manufacture
    • H01G4/33—Thin- or thick-film capacitors (thin- or thick-film circuits; capacitors without a potential-jump or surface barrier specially adapted for integrated circuits, details thereof, multistep manufacturing processes therefor)
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01—Manufacture or treatment
    • H10D84/02—Manufacture or treatment characterised by using material-based technologies
    • H10D84/03—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
    • H10D84/038—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Nanotechnology (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
JP2024501940A 2022-11-01 2023-07-14 キャパシタ Active JP7652330B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022175699 2022-11-01
JP2022175699 2022-11-01
PCT/JP2023/026070 WO2024095536A1 (ja) 2022-11-01 2023-07-14 キャパシタ

Publications (3)

Publication Number Publication Date
JPWO2024095536A1 JPWO2024095536A1 (https=) 2024-05-10
JPWO2024095536A5 JPWO2024095536A5 (https=) 2024-09-26
JP7652330B2 true JP7652330B2 (ja) 2025-03-27

Family

ID=90930117

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024501940A Active JP7652330B2 (ja) 2022-11-01 2023-07-14 キャパシタ

Country Status (4)

Country Link
US (1) US20250203891A1 (https=)
JP (1) JP7652330B2 (https=)
CN (1) CN120019459A (https=)
WO (1) WO2024095536A1 (https=)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007111107A1 (ja) 2006-03-24 2007-10-04 Fujitsu Limited 炭素系繊維のデバイス構造およびその製造方法
JP2010506391A (ja) 2006-10-04 2010-02-25 エヌエックスピー ビー ヴィ Ｍｉｍキャパシタ
JP2010206203A (ja) 2009-03-02 2010-09-16 Qinghua Univ 熱伝導構造体の製造方法
WO2018173884A1 (ja) 2017-03-21 2018-09-27 日本電産リード株式会社 プローブ構造体、及びプローブ構造体の製造方法
WO2021059569A1 (ja) 2019-09-25 2021-04-01 株式会社村田製作所 キャパシタおよびその製造方法
WO2022113843A1 (ja) 2020-11-27 2022-06-02 株式会社村田製作所 キャパシタ

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007111107A1 (ja) 2006-03-24 2007-10-04 Fujitsu Limited 炭素系繊維のデバイス構造およびその製造方法
JP2010506391A (ja) 2006-10-04 2010-02-25 エヌエックスピー ビー ヴィ Ｍｉｍキャパシタ
JP2010206203A (ja) 2009-03-02 2010-09-16 Qinghua Univ 熱伝導構造体の製造方法
WO2018173884A1 (ja) 2017-03-21 2018-09-27 日本電産リード株式会社 プローブ構造体、及びプローブ構造体の製造方法
WO2021059569A1 (ja) 2019-09-25 2021-04-01 株式会社村田製作所 キャパシタおよびその製造方法
WO2022113843A1 (ja) 2020-11-27 2022-06-02 株式会社村田製作所 キャパシタ

Also Published As

Publication number Publication date
US20250203891A1 (en) 2025-06-19
CN120019459A (zh) 2025-05-16
WO2024095536A1 (ja) 2024-05-10
JPWO2024095536A1 (https=) 2024-05-10

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