JP7595685B2 - フレキソ印刷原版、フレキソ印刷版及びフレキソ印刷版の製造方法 - Google Patents

フレキソ印刷原版、フレキソ印刷版及びフレキソ印刷版の製造方法 Download PDF

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JP7595685B2
JP7595685B2 JP2022580683A JP2022580683A JP7595685B2 JP 7595685 B2 JP7595685 B2 JP 7595685B2 JP 2022580683 A JP2022580683 A JP 2022580683A JP 2022580683 A JP2022580683 A JP 2022580683A JP 7595685 B2 JP7595685 B2 JP 7595685B2
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Japan
Prior art keywords
flexographic printing
printing plate
receiving layer
ink
mass
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Japanese (ja)
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JPWO2022173000A1 (https=
Inventor
優壮 藤木
壮太 豊岡
慎二 宮本
勉 古川
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Asahi Kasei Corp
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Asahi Kasei Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
JP2022580683A 2021-02-10 2022-02-10 フレキソ印刷原版、フレキソ印刷版及びフレキソ印刷版の製造方法 Active JP7595685B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021019889 2021-02-10
JP2021019889 2021-02-10
PCT/JP2022/005383 WO2022173000A1 (ja) 2021-02-10 2022-02-10 フレキソ印刷原版、フレキソ印刷版及びフレキソ印刷版の製造方法

Publications (2)

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JPWO2022173000A1 JPWO2022173000A1 (https=) 2022-08-18
JP7595685B2 true JP7595685B2 (ja) 2024-12-06

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JP2022580683A Active JP7595685B2 (ja) 2021-02-10 2022-02-10 フレキソ印刷原版、フレキソ印刷版及びフレキソ印刷版の製造方法

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Country Link
US (1) US20240111213A1 (https=)
EP (1) EP4292819A4 (https=)
JP (1) JP7595685B2 (https=)
CN (1) CN116868126A (https=)
WO (1) WO2022173000A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20240089130A (ko) * 2021-11-04 2024-06-20 닛토덴코 가부시키가이샤 광학 적층체 및 시스템
WO2025069850A1 (ja) * 2023-09-26 2025-04-03 富士フイルム株式会社 フレキソ印刷版原版およびフレキソ印刷版の製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008225446A (ja) 2007-02-13 2008-09-25 Tokyo Ohka Kogyo Co Ltd 凸版印刷用原版およびその製造方法、凸版印刷版の製造方法、ならびにインク受容層形成用組成物

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3264103A (en) 1962-06-27 1966-08-02 Du Pont Photopolymerizable relief printing plates developed by dry thermal transfer
US5175072A (en) 1990-07-26 1992-12-29 Minnesota Mining And Manufacturing Company Flexographic printing plate process
US6171758B1 (en) 1994-11-08 2001-01-09 Dupont Operations Worldwide, Inc. Dimensionally stable flexographic printing plates
EP1282838B1 (en) 2000-05-17 2007-01-03 E.I. Dupont De Nemours And Company Process for preparing a flexographic printing plate
EP2006737B1 (en) 2006-04-07 2015-01-07 Asahi Kasei Chemicals Corporation Photosensitive resin composition for flexographic printing
CN102472972B (zh) 2009-07-30 2013-09-11 东洋纺织株式会社 柔性版印刷原版
US8541162B2 (en) * 2010-09-01 2013-09-24 E I Du Pont De Nemours And Company High resolution, solvent resistant, thin elastomeric printing plates
US9114601B2 (en) * 2012-03-01 2015-08-25 Kyle P. Baldwin Clean flexographic printing plate and method of making the same
JP6865210B2 (ja) * 2016-04-01 2021-04-28 旭化成株式会社 フレキソ印刷版用感光性樹脂構成体、及びフレキソ印刷版
JP7028560B2 (ja) 2017-01-26 2022-03-02 旭化成株式会社 フレキソ印刷版
JP6380775B1 (ja) 2017-04-25 2018-08-29 東洋インキＳｃホールディングス株式会社 輪転印刷インキ及びその利用
CN113168090B (zh) * 2018-12-10 2024-12-27 旭化成株式会社 柔性印刷原版及柔性印刷版的制造方法
US20220082940A1 (en) * 2019-02-27 2022-03-17 Asahi Kasei Kabushiki Kaisha Flexographic printing raw plate and manufacturing method of flexographic printing plate
JP7267777B2 (ja) * 2019-03-01 2023-05-02 旭化成株式会社 フレキソ印刷版用原版

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008225446A (ja) 2007-02-13 2008-09-25 Tokyo Ohka Kogyo Co Ltd 凸版印刷用原版およびその製造方法、凸版印刷版の製造方法、ならびにインク受容層形成用組成物

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Publication number Publication date
CN116868126A (zh) 2023-10-10
EP4292819A1 (en) 2023-12-20
EP4292819A4 (en) 2025-06-25
WO2022173000A1 (ja) 2022-08-18
US20240111213A1 (en) 2024-04-04
JPWO2022173000A1 (https=) 2022-08-18

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