JP7579516B2 - 化合物、（共）重合体、組成物、パターン形成方法、及び化合物の製造方法 - Google Patents

化合物、（共）重合体、組成物、パターン形成方法、及び化合物の製造方法 Download PDF

Info

Publication number
JP7579516B2
JP7579516B2 JP2020563234A JP2020563234A JP7579516B2 JP 7579516 B2 JP7579516 B2 JP 7579516B2 JP 2020563234 A JP2020563234 A JP 2020563234A JP 2020563234 A JP2020563234 A JP 2020563234A JP 7579516 B2 JP7579516 B2 JP 7579516B2
Authority
JP
Japan
Prior art keywords
group
iodine
carbon atoms
mac
meth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2020563234A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2020137935A1 (ja
Inventor
禎 大松
正裕 松本
道裕 由利
健太郎 片岡
隆 佐藤
雅敏 越後
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Gas Chemical Co Inc
Original Assignee
Mitsubishi Gas Chemical Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Gas Chemical Co Inc filed Critical Mitsubishi Gas Chemical Co Inc
Publication of JPWO2020137935A1 publication Critical patent/JPWO2020137935A1/ja
Priority to JP2024090131A priority Critical patent/JP2024123024A/ja
Application granted granted Critical
Publication of JP7579516B2 publication Critical patent/JP7579516B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/62—Halogen-containing esters
    • C07C69/65—Halogen-containing esters of unsaturated acids
    • C07C69/653—Acrylic acid esters; Methacrylic acid esters; Haloacrylic acid esters; Halomethacrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/73—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
    • C07C69/734—Ethers
    • C07C69/736—Ethers the hydroxy group of the ester being etherified with a hydroxy compound having the hydroxy group bound to a carbon atom of a six-membered aromatic ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/96—Esters of carbonic or haloformic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/22—Esters containing halogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/56—Ring systems containing bridged rings
    • C07C2603/58—Ring systems containing bridged rings containing three rings
    • C07C2603/70—Ring systems containing bridged rings containing three rings containing only six-membered rings
    • C07C2603/74—Adamantanes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Furan Compounds (AREA)
JP2020563234A 2018-12-27 2019-12-23 化合物、（共）重合体、組成物、パターン形成方法、及び化合物の製造方法 Active JP7579516B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2024090131A JP2024123024A (ja) 2018-12-27 2024-06-03 化合物、（共）重合体、組成物、パターン形成方法、及び化合物の製造方法

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2018244504 2018-12-27
JP2018244504 2018-12-27
JP2019144313 2019-08-06
JP2019144313 2019-08-06
PCT/JP2019/050261 WO2020137935A1 (ja) 2018-12-27 2019-12-23 化合物、（共）重合体、組成物、パターン形成方法、及び化合物の製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2024090131A Division JP2024123024A (ja) 2018-12-27 2024-06-03 化合物、（共）重合体、組成物、パターン形成方法、及び化合物の製造方法

Publications (2)

Publication Number Publication Date
JPWO2020137935A1 JPWO2020137935A1 (ja) 2021-11-11
JP7579516B2 true JP7579516B2 (ja) 2024-11-08

Family

ID=71127975

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2020563234A Active JP7579516B2 (ja) 2018-12-27 2019-12-23 化合物、（共）重合体、組成物、パターン形成方法、及び化合物の製造方法
JP2024090131A Pending JP2024123024A (ja) 2018-12-27 2024-06-03 化合物、（共）重合体、組成物、パターン形成方法、及び化合物の製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2024090131A Pending JP2024123024A (ja) 2018-12-27 2024-06-03 化合物、（共）重合体、組成物、パターン形成方法、及び化合物の製造方法

Country Status (6)

Country Link
US (1) US20220119336A1 (https=)
JP (2) JP7579516B2 (https=)
KR (2) KR20260019026A (https=)
CN (1) CN113227028A (https=)
TW (1) TWI828827B (https=)
WO (1) WO2020137935A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2024123024A (ja) * 2018-12-27 2024-09-10 三菱瓦斯化学株式会社 化合物、（共）重合体、組成物、パターン形成方法、及び化合物の製造方法

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7509071B2 (ja) * 2020-04-28 2024-07-02 信越化学工業株式会社 ヨウ素化芳香族カルボン酸型ペンダント基含有ポリマー、レジスト材料及びパターン形成方法
WO2021230300A1 (ja) * 2020-05-15 2021-11-18 三菱瓦斯化学株式会社 化合物、（共）重合体、組成物、レジストパターン形成方法、並びに化合物及び（共）重合体の製造方法
JP7789494B2 (ja) * 2020-06-01 2025-12-22 住友化学株式会社 化合物、樹脂、レジスト組成物及びレジストパターンの製造方法
FR3113904B1 (fr) * 2020-09-08 2022-08-12 Innoverda Procédé de synthèse du 3,5-diiodo-4-hydroxy benzylalcool
KR20230123513A (ko) * 2020-12-21 2023-08-23 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 화합물, 중합체, 조성물, 막형성용 조성물, 패턴의형성방법, 절연막의 형성방법 및 화합물의 제조방법
CN116615405A (zh) * 2020-12-21 2023-08-18 三菱瓦斯化学株式会社 化合物、聚合物、组合物、膜形成用组合物、图案的形成方法、绝缘膜的形成方法及化合物的制造方法
IL310053A (en) * 2021-07-14 2024-03-01 Fujifilm Corp A method for creating a template and a method for manufacturing an electronic device
US20230103685A1 (en) * 2021-09-30 2023-04-06 Rohm And Haas Electronic Materials Llc Iodine-containing acid cleavable compounds, polymers derived therefrom, and photoresist compositions
WO2023189586A1 (ja) * 2022-03-29 2023-10-05 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法
WO2023189969A1 (ja) * 2022-03-31 2023-10-05 日本ゼオン株式会社 レジスト組成物及びレジストパターン形成方法
JP2023161653A (ja) * 2022-04-26 2023-11-08 東京応化工業株式会社 レジスト組成物、レジストパターン形成方法及び化合物
JP7722257B2 (ja) * 2022-05-10 2025-08-13 信越化学工業株式会社 マスクブランク、レジストパターン形成方法及び化学増幅ポジ型レジスト組成物
CN114755884B (zh) * 2022-06-14 2022-09-16 之江实验室 一种有机无机杂化飞秒激光直写光刻胶
CN115784891B (zh) * 2022-12-14 2024-09-27 吉林化工学院 一种受阻酚类抗氧剂及其制备方法和应用
WO2024147288A1 (ja) * 2023-01-06 2024-07-11 富士フイルム株式会社 パターン形成方法、パターン形成用キット、及び電子デバイスの製造方法
JPWO2024150663A1 (https=) * 2023-01-11 2024-07-18
WO2025079631A1 (ja) * 2023-10-11 2025-04-17 三菱瓦斯化学株式会社 組成物、樹脂組成物、膜形成用組成物、リソグラフィー用膜形成用組成物、レジスト膜形成用組成物
WO2025079648A1 (ja) * 2023-10-11 2025-04-17 三菱瓦斯化学株式会社 化合物、組成物、樹脂組成物、膜形成用組成物、リソグラフィー用膜形成用組成物、レジスト膜形成用組成物
WO2025079646A1 (ja) * 2023-10-11 2025-04-17 三菱瓦斯化学株式会社 有機ハロゲン化合物の製造方法、化合物、酸発生剤、塩基発生剤、クエンチャー、重合体、組成物及びレジストパターン形成方法
TW202535805A (zh) * 2023-10-20 2025-09-16 日商三菱瓦斯化學股份有限公司 含碘（甲基）丙烯酸酯化合物、含碘（甲基）丙烯酸酯（共）聚合物、微影用組合物、阻劑組成物、下層膜形成用組成物及含碘（甲基）丙烯酸酯化合物之製造方法
WO2025154627A1 (ja) * 2024-01-17 2025-07-24 学校法人 関西大学 リソグラフィー下層膜形成組成物、リソグラフィー下層膜、ポジ型レジスト組成物、レジスト膜、及びレジストパターンの形成方法
WO2026054065A1 (ja) * 2024-09-09 2026-03-12 三菱瓦斯化学株式会社 ヨウ素含有（メタ）アクリル酸エステル化合物及びヨウ素・水酸基含有重合体の製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009275155A (ja) 2008-05-15 2009-11-26 Jsr Corp 上層膜用組成物及びレジストパターン形成方法
JP2015516972A (ja) 2012-04-20 2015-06-18 エルジー・ケム・リミテッド 重合性液晶化合物、重合性液晶組成物および光学異方体
WO2018180049A1 (ja) 2017-03-30 2018-10-04 Jsr株式会社 感放射線性組成物及びレジストパターン形成方法
JP2018172640A (ja) 2017-03-31 2018-11-08 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ 酸開裂性モノマー及びこれを含むポリマー

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6160630A (ja) * 1984-08-31 1986-03-28 Sumitomo Chem Co Ltd アルデヒド誘導体の製造法
JPH0920721A (ja) * 1995-07-10 1997-01-21 Nippon Oil & Fats Co Ltd ２，４，６−トリヨードフェニルアクリレートおよび製造方法
US7317058B2 (en) * 2004-11-01 2008-01-08 Nitto Denko Corporation (Meth)acrylate polymer and non-linear optical device material composition
JP6196897B2 (ja) 2013-12-05 2017-09-13 東京応化工業株式会社 ネガ型レジスト組成物、レジストパターン形成方法及び錯体
JP6163438B2 (ja) * 2014-02-27 2017-07-12 富士フイルム株式会社 パターン形成方法、電子デバイスの製造方法、及び、電子デバイス、並びに、感活性光線性又は感放射線性樹脂組成物、及び、レジスト膜
JP7079591B2 (ja) * 2016-12-14 2022-06-02 住友化学株式会社 樹脂、レジスト組成物及びレジストパターンの製造方法
US20220119336A1 (en) * 2018-12-27 2022-04-21 Mitsubishi Gas Chemical Company, Inc. Compound, (co)polymer, composition, method for forming pattern, and method for producing compound
JP7379059B2 (ja) * 2019-10-02 2023-11-14 キヤノン株式会社 中間サーバ装置、情報処理装置、通信方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009275155A (ja) 2008-05-15 2009-11-26 Jsr Corp 上層膜用組成物及びレジストパターン形成方法
JP2015516972A (ja) 2012-04-20 2015-06-18 エルジー・ケム・リミテッド 重合性液晶化合物、重合性液晶組成物および光学異方体
WO2018180049A1 (ja) 2017-03-30 2018-10-04 Jsr株式会社 感放射線性組成物及びレジストパターン形成方法
JP2018172640A (ja) 2017-03-31 2018-11-08 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ 酸開裂性モノマー及びこれを含むポリマー

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
GREEN, Ori et al.，Near-Infrared Dioxetane Luminophores with Direct Chemiluminescence Emission Mode，J. Am. Chem. Soc.，2017年，139，Pages 13243-13248
SAHA, Sourabh K. et al.，Radiopaque Resists for Two-Photon Lithography To Enable Submicron 3D Imaging of Polymer Parts via X-，Appl. Mater. Interfaces，2018年，10，Pages 1164-1172

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2024123024A (ja) * 2018-12-27 2024-09-10 三菱瓦斯化学株式会社 化合物、（共）重合体、組成物、パターン形成方法、及び化合物の製造方法

Also Published As

Publication number Publication date
WO2020137935A1 (ja) 2020-07-02
TWI828827B (zh) 2024-01-11
JP2024123024A (ja) 2024-09-10
KR102923916B1 (ko) 2026-02-05
JPWO2020137935A1 (ja) 2021-11-11
US20220119336A1 (en) 2022-04-21
KR20210108939A (ko) 2021-09-03
TW202039408A (zh) 2020-11-01
CN113227028A (zh) 2021-08-06
KR20260019026A (ko) 2026-02-09

Similar Documents

Publication Publication Date Title
JP7579516B2 (ja) 化合物、（共）重合体、組成物、パターン形成方法、及び化合物の製造方法
JP7770639B2 (ja) 化合物、（共）重合体、組成物、レジストパターン形成方法、並びに化合物及び（共）重合体の製造方法
US11204551B2 (en) Resist composition and method for forming resist pattern
US10241406B2 (en) Resist composition and method for forming resist pattern
JP7814674B2 (ja) 化合物、重合体、組成物、膜形成用組成物、パターンの形成方法、絶縁膜の形成方法及び化合物の製造方法
JP7709679B2 (ja) 化合物、（共）重合体、組成物、及びパターン形成方法
US10921711B2 (en) Resist composition and method of forming resist pattern
WO2023048168A1 (ja) レジスト組成物、レジストパターン形成方法、化合物及び酸拡散制御剤
JP7183021B2 (ja) レジスト組成物、レジストパターン形成方法、及び高分子化合物
JP2022114980A (ja) レジスト組成物及びレジストパターン形成方法
JP7233319B2 (ja) レジスト組成物及びレジストパターン形成方法
WO2025079631A1 (ja) 組成物、樹脂組成物、膜形成用組成物、リソグラフィー用膜形成用組成物、レジスト膜形成用組成物
KR20250027629A (ko) 조성물, 수지 조성물, 막형성용 조성물, 패턴 형성방법 및 화합물
TWI828918B (zh) 阻劑組成物及阻劑圖型形成方法
WO2022265034A1 (ja) レジスト組成物、レジストパターン形成方法、化合物の製造方法、中間体及び化合物
WO2026054064A1 (ja) ヨウ素含有化合物、ヨウ素含有ヒドロキシ化合物、ヨウ素含有（共）重合体、組成物、パターン形成方法、及びヨウ素含有化合物の製造方法
WO2025084341A1 (ja) ヨウ素含有（メタ）アクリレート化合物、ヨウ素含有（メタ）アクリレート（共）重合体、リソグラフィー用組成物、レジスト組成物、下層膜形成用組成物、及びヨウ素含有（メタ）アクリレート化合物の製造方法
WO2025084340A1 (ja) ヨウ素含有（メタ）アクリレート化合物、ヨウ素含有（メタ）アクリレート（共）重合体、リソグラフィー用組成物、レジスト組成物、下層膜形成用組成物、及びヨウ素含有（メタ）アクリレート化合物の製造方法
WO2025084342A1 (ja) ヨウ素含有（メタ）アクリレート化合物、ヨウ素含有（メタ）アクリレート（共）重合体、リソグラフィー用組成物、レジスト組成物、下層膜形成用組成物、及びヨウ素含有（メタ）アクリレート化合物の製造方法
JP2022191173A (ja) レジスト組成物及びレジストパターン形成方法
TW202534072A (zh) 化合物、組成物、樹脂組成物、膜形成用組成物、微影術用膜形成用組成物、阻劑膜形成用組成物
WO2023048128A1 (ja) レジスト組成物、レジストパターン形成方法、化合物及び酸発生剤
WO2023080138A1 (ja) レジスト組成物及びレジストパターン形成方法
JP2022015541A (ja) レジスト組成物、レジストパターン形成方法、化合物及び樹脂

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20221114

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20231117

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20240116

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20240329

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20240603

A911 Transfer to examiner for re-examination before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20240611

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20240927

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20241010

R150 Certificate of patent or registration of utility model

Ref document number: 7579516

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150