JPWO2024147288A1 - - Google Patents
Info
- Publication number
- JPWO2024147288A1 JPWO2024147288A1 JP2024568895A JP2024568895A JPWO2024147288A1 JP WO2024147288 A1 JPWO2024147288 A1 JP WO2024147288A1 JP 2024568895 A JP2024568895 A JP 2024568895A JP 2024568895 A JP2024568895 A JP 2024568895A JP WO2024147288 A1 JPWO2024147288 A1 JP WO2024147288A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023001267 | 2023-01-06 | ||
| PCT/JP2023/045793 WO2024147288A1 (ja) | 2023-01-06 | 2023-12-20 | パターン形成方法、パターン形成用キット、及び電子デバイスの製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2024147288A1 true JPWO2024147288A1 (https=) | 2024-07-11 |
Family
ID=91803819
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024568895A Pending JPWO2024147288A1 (https=) | 2023-01-06 | 2023-12-20 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2024147288A1 (https=) |
| TW (1) | TW202443297A (https=) |
| WO (1) | WO2024147288A1 (https=) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20220119336A1 (en) * | 2018-12-27 | 2022-04-21 | Mitsubishi Gas Chemical Company, Inc. | Compound, (co)polymer, composition, method for forming pattern, and method for producing compound |
| CN115023652A (zh) * | 2020-01-31 | 2022-09-06 | 富士胶片株式会社 | 正型抗蚀剂组合物、抗蚀剂膜、图案形成方法及电子器件的制造方法 |
-
2023
- 2023-12-20 WO PCT/JP2023/045793 patent/WO2024147288A1/ja not_active Ceased
- 2023-12-20 JP JP2024568895A patent/JPWO2024147288A1/ja active Pending
-
2024
- 2024-01-04 TW TW113100467A patent/TW202443297A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| WO2024147288A1 (ja) | 2024-07-11 |
| TW202443297A (zh) | 2024-11-01 |