TW202443297A - 圖案形成方法、圖案形成用套組、及電子器件之製造方法 - Google Patents

圖案形成方法、圖案形成用套組、及電子器件之製造方法 Download PDF

Info

Publication number
TW202443297A
TW202443297A TW113100467A TW113100467A TW202443297A TW 202443297 A TW202443297 A TW 202443297A TW 113100467 A TW113100467 A TW 113100467A TW 113100467 A TW113100467 A TW 113100467A TW 202443297 A TW202443297 A TW 202443297A
Authority
TW
Taiwan
Prior art keywords
group
composition
resin
developer
compound
Prior art date
Application number
TW113100467A
Other languages
English (en)
Chinese (zh)
Inventor
石原英幸
楜澤佑真
藤田光宏
高橋智美
福原敏明
Original Assignee
日商富士軟片股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商富士軟片股份有限公司 filed Critical 日商富士軟片股份有限公司
Publication of TW202443297A publication Critical patent/TW202443297A/zh

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
TW113100467A 2023-01-06 2024-01-04 圖案形成方法、圖案形成用套組、及電子器件之製造方法 TW202443297A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2023001267 2023-01-06
JP2023-001267 2023-01-06

Publications (1)

Publication Number Publication Date
TW202443297A true TW202443297A (zh) 2024-11-01

Family

ID=91803819

Family Applications (1)

Application Number Title Priority Date Filing Date
TW113100467A TW202443297A (zh) 2023-01-06 2024-01-04 圖案形成方法、圖案形成用套組、及電子器件之製造方法

Country Status (3)

Country Link
JP (1) JPWO2024147288A1 (https=)
TW (1) TW202443297A (https=)
WO (1) WO2024147288A1 (https=)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20220119336A1 (en) * 2018-12-27 2022-04-21 Mitsubishi Gas Chemical Company, Inc. Compound, (co)polymer, composition, method for forming pattern, and method for producing compound
CN115023652A (zh) * 2020-01-31 2022-09-06 富士胶片株式会社 正型抗蚀剂组合物、抗蚀剂膜、图案形成方法及电子器件的制造方法

Also Published As

Publication number Publication date
WO2024147288A1 (ja) 2024-07-11
JPWO2024147288A1 (https=) 2024-07-11

Similar Documents

Publication Publication Date Title
CN115997167B (zh) 感光化射线性或感放射线性树脂组合物、抗蚀剂膜
TWI890829B (zh) 感光化射線性或感放射線性樹脂組成物、抗蝕劑膜、圖案形成方法及電子器件的製造方法
TWI787400B (zh) 感光化射線性或感放射線性樹脂組成物、抗蝕劑膜、圖案形成方法、電子元件的製造方法、化合物
TW202436392A (zh) 感光化射線性或感放射線性樹脂組成物
TW201942184A (zh) 感光化射線性或感放射線性樹脂組成物、感光化射線性或感放射線性膜、圖案形成方法、電子器件之製造方法及聚酯
TW202442717A (zh) 感光化射線性或感放射線性樹脂組成物、光阻膜、圖案形成方法、電子器件之製造方法
TW202413461A (zh) 感光化射線性或感放射線性樹脂組成物、感光化射線性或感放射線性膜、圖案形成方法、及電子器件之製造方法
TW202443296A (zh) 感光化射線性或感放射線性樹脂組成物、光阻膜、圖案形成方法、電子器件之製造方法
TW202443297A (zh) 圖案形成方法、圖案形成用套組、及電子器件之製造方法
WO2023157712A1 (ja) 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法、重合体
TW202432632A (zh) 感光化射線性或感放射線性樹脂組成物、光阻膜、圖案形成方法及電子器件之製造方法
TW202436390A (zh) 感光化射線性或感放射線性樹脂組成物、光阻膜、圖案形成方法、及電子器件之製造方法
TW202432638A (zh) 感光化射線性或感放射線性樹脂組成物、光阻膜、圖案形成方法、及電子器件之製造方法
TW202432631A (zh) 感光化射線性或感放射線性樹脂組成物、光阻膜、圖案形成方法、及電子器件之製造方法
TW202436391A (zh) 感光化射線性或感放射線性樹脂組成物
TW202437013A (zh) 感光化射線性或感放射線性樹脂組成物、光阻膜、圖案形成方法、及電子器件之製造方法
TW202413457A (zh) 感光化射線性或感放射線性樹脂組成物、光阻膜、圖案形成方法、及電子器件之製造方法
TW202419480A (zh) 感光化射線性或感放射線性樹脂組成物、光阻膜、圖案形成方法、電子器件之製造方法及聚合物
TW202511313A (zh) 感光化射線性或感放射線性樹脂組成物、樹脂、光阻膜、圖案形成方法、及電子元件之製造方法
TW202347030A (zh) 感光化射線性或感放射線性樹脂組成物、光阻膜、圖案形成方法、電子器件的製造方法
WO2025047309A1 (ja) 感活性光線性又は感放射線性樹脂組成物の製造方法、パターン形成方法、及び電子デバイスの製造方法
TW202413460A (zh) 感光化射線性或感放射線性樹脂組成物、感光化射線性或感放射線性膜、圖案形成方法、及電子器件之製造方法
WO2025205441A1 (ja) 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法
WO2024048463A1 (ja) 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、及び電子デバイスの製造方法
TW202440677A (zh) 感光化射線性或感放射線性組成物、感光化射線性或感放射線性膜、圖案形成方法、及電子器件之製造方法