JPWO2024203960A1 - - Google Patents
Info
- Publication number
- JPWO2024203960A1 JPWO2024203960A1 JP2025510785A JP2025510785A JPWO2024203960A1 JP WO2024203960 A1 JPWO2024203960 A1 JP WO2024203960A1 JP 2025510785 A JP2025510785 A JP 2025510785A JP 2025510785 A JP2025510785 A JP 2025510785A JP WO2024203960 A1 JPWO2024203960 A1 JP WO2024203960A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/06—Hydrocarbons
- C08F212/08—Styrene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/22—Esters containing halogen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023056615 | 2023-03-30 | ||
| PCT/JP2024/011498 WO2024203960A1 (ja) | 2023-03-30 | 2024-03-22 | 共重合体、ポジ型レジスト組成物、およびレジストパターン形成方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2024203960A1 true JPWO2024203960A1 (https=) | 2024-10-03 |
Family
ID=92905098
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025510785A Pending JPWO2024203960A1 (https=) | 2023-03-30 | 2024-03-22 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPWO2024203960A1 (https=) |
| KR (1) | KR20250166894A (https=) |
| TW (1) | TW202442715A (https=) |
| WO (1) | WO2024203960A1 (https=) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100203450A1 (en) * | 2009-02-11 | 2010-08-12 | International Business Machines Corporation | Photoresist compositions and methods of use |
| JP7172495B2 (ja) * | 2018-11-22 | 2022-11-16 | 日本ゼオン株式会社 | 重合体及びポジ型レジスト組成物 |
| TW202530276A (zh) * | 2019-08-09 | 2025-08-01 | 日商三菱瓦斯化學股份有限公司 | 化合物、聚合物、組成物、膜形成用組成物、圖型形成方法、絕緣膜之形成方法及化合物之製造方法，以及含有碘之乙烯基聚合物及其乙醯化衍生物之製造方法 |
| CN115023652A (zh) * | 2020-01-31 | 2022-09-06 | 富士胶片株式会社 | 正型抗蚀剂组合物、抗蚀剂膜、图案形成方法及电子器件的制造方法 |
-
2024
- 2024-03-22 JP JP2025510785A patent/JPWO2024203960A1/ja active Pending
- 2024-03-22 WO PCT/JP2024/011498 patent/WO2024203960A1/ja not_active Ceased
- 2024-03-22 KR KR1020257030260A patent/KR20250166894A/ko active Pending
- 2024-03-26 TW TW113111243A patent/TW202442715A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| KR20250166894A (ko) | 2025-11-28 |
| WO2024203960A1 (ja) | 2024-10-03 |
| TW202442715A (zh) | 2024-11-01 |