JP7542068B2 - X線散乱装置 - Google Patents
X線散乱装置 Download PDFInfo
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- JP7542068B2 JP7542068B2 JP2022539650A JP2022539650A JP7542068B2 JP 7542068 B2 JP7542068 B2 JP 7542068B2 JP 2022539650 A JP2022539650 A JP 2022539650A JP 2022539650 A JP2022539650 A JP 2022539650A JP 7542068 B2 JP7542068 B2 JP 7542068B2
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
- G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
- G01N23/041—Phase-contrast imaging, e.g. using grating interferometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/20083—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials by using a combination of at least two measurements at least one being a transmission measurement and one a scatter measurement
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/201—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials by measuring small-angle scattering
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/05—Investigating materials by wave or particle radiation by diffraction, scatter or reflection
- G01N2223/054—Investigating materials by wave or particle radiation by diffraction, scatter or reflection small angle scatter
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/067—Construction details
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- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Pathology (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Immunology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Radiology & Medical Imaging (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP19290126.2 | 2019-12-30 | ||
| EP19290126.2A EP3845891B1 (en) | 2019-12-30 | 2019-12-30 | X-ray scattering apparatus |
| EP20197189.2 | 2020-09-21 | ||
| EP20197189.2A EP3845892B1 (en) | 2019-12-30 | 2020-09-21 | X-ray scattering apparatus |
| PCT/EP2020/087969 WO2021136774A1 (en) | 2019-12-30 | 2020-12-29 | X-ray scattering apparatus |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2023512899A JP2023512899A (ja) | 2023-03-30 |
| JP2023512899A5 JP2023512899A5 (https=) | 2023-12-20 |
| JP7542068B2 true JP7542068B2 (ja) | 2024-08-29 |
Family
ID=69467290
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022539650A Active JP7542068B2 (ja) | 2019-12-30 | 2020-12-29 | X線散乱装置 |
| JP2022539408A Active JP7635239B2 (ja) | 2019-12-30 | 2020-12-29 | X線散乱装置 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022539408A Active JP7635239B2 (ja) | 2019-12-30 | 2020-12-29 | X線散乱装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US11796485B2 (https=) |
| EP (2) | EP3845891B1 (https=) |
| JP (2) | JP7542068B2 (https=) |
| CN (2) | CN114222916B (https=) |
| WO (2) | WO2021136771A1 (https=) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP4095522B1 (en) * | 2021-05-25 | 2023-08-16 | Xenocs SAS | X-ray scattering apparatus and x-ray scattering method |
| US12436115B2 (en) * | 2022-02-25 | 2025-10-07 | Proto Patents Ltd. | Transmission X-ray diffraction apparatus and related method |
| CN116008322A (zh) * | 2022-12-27 | 2023-04-25 | 中国科学院高能物理研究所 | 一种广角/小角/超小角x射线散射无缝联用装置 |
| CN117054457A (zh) * | 2023-07-03 | 2023-11-14 | 深圳综合粒子设施研究院 | 相机系统及小角x射线散射仪 |
| US20250035691A1 (en) * | 2023-07-27 | 2025-01-30 | International Business Machines Corporation | Emc scattering apparatus |
| EP4589288A1 (en) | 2024-01-16 | 2025-07-23 | Chemovator GmbH | Sample holder, in particular for a sample analyzed by x-ray diffraction |
| FR3160771B1 (fr) * | 2024-03-26 | 2026-03-20 | Letsee Imaging | Système d’imagerie à rayons X de type Hartmann |
| CN119510465A (zh) * | 2024-09-25 | 2025-02-25 | 中国科学院高能物理研究所 | 一种x射线散射衍射实验入射光斑实时监测的方法和装置 |
| CN120948519B (zh) * | 2025-10-20 | 2026-01-27 | 中科先进技术温州研究院 | 一种多几何构型衍射引导装置及x射线衍射设备 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006091017A (ja) | 2004-09-21 | 2006-04-06 | Jordan Valley Applied Radiation Ltd | 組み合わされたx線反射率計及び回折計 |
| JP2017524926A (ja) | 2014-06-30 | 2017-08-31 | コミサリヤ・ア・レネルジ・アトミク・エ・オ・エネルジ・アルテルナテイブ | 透過スペクトル次いで散乱スペクトルを使用して2つのステージで物体を解析する方法 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5245648A (en) * | 1991-04-05 | 1993-09-14 | The United States Of America As Represented By The United States Department Of Energy | X-ray tomographic image magnification process, system and apparatus therefor |
| JP3271426B2 (ja) * | 1994-05-09 | 2002-04-02 | 石川島播磨重工業株式会社 | 放射光ビームライン装置 |
| JPH08145916A (ja) * | 1994-11-18 | 1996-06-07 | Hitachi Ltd | 小角散乱x線装置 |
| JP3697246B2 (ja) * | 2003-03-26 | 2005-09-21 | 株式会社リガク | X線回折装置 |
| JP5031215B2 (ja) * | 2004-09-21 | 2012-09-19 | ジョルダン バレー アプライド ラディエイション リミテッド | 多機能x線分析システム |
| US7076024B2 (en) * | 2004-12-01 | 2006-07-11 | Jordan Valley Applied Radiation, Ltd. | X-ray apparatus with dual monochromators |
| GB0500536D0 (en) * | 2005-01-12 | 2005-02-16 | Koninkl Philips Electronics Nv | Coherent scatter computer tomography material identification |
| JP4860418B2 (ja) * | 2006-10-10 | 2012-01-25 | 株式会社リガク | X線光学系 |
| EP1947448B1 (en) * | 2007-01-19 | 2013-07-03 | Panalytical B.V. | X-ray diffraction equipment for X-ray scattering |
| JP5116014B2 (ja) * | 2007-06-21 | 2013-01-09 | 株式会社リガク | 小角広角x線測定装置 |
| US20110064197A1 (en) * | 2009-09-16 | 2011-03-17 | Geoffrey Harding | X-ray diffraction devices and method for assembling an object imaging system |
| FR2955391B1 (fr) * | 2010-01-18 | 2012-03-16 | Xenocs | Systeme compact d'analyse par rayons-x |
| JP6322627B2 (ja) * | 2012-06-08 | 2018-05-09 | リガク イノベイティブ テクノロジーズ インコーポレイテッド | デュアルモード小角散乱カメラ |
| WO2013185000A1 (en) * | 2012-06-08 | 2013-12-12 | Rigaku Innovative Technologies, Inc. | X-ray beam system offering 1d and 2d beams |
| US9778213B2 (en) * | 2013-08-19 | 2017-10-03 | Kla-Tencor Corporation | Metrology tool with combined XRF and SAXS capabilities |
| GB201421837D0 (en) * | 2014-12-09 | 2015-01-21 | Reishig Peter | A method of generating a fingerprint for a gemstone using X-ray imaging |
| DE102015226101A1 (de) * | 2015-12-18 | 2017-06-22 | Bruker Axs Gmbh | Röntgenoptik-Baugruppe mit Umschaltsystem für drei Strahlpfade und zugehöriges Röntgendiffraktometer |
| EP3246695B1 (en) | 2016-05-20 | 2020-12-16 | Xenocs SAS | X-ray scattering apparatus |
| CN109982640A (zh) * | 2016-11-16 | 2019-07-05 | 皇家飞利浦有限公司 | 用于根据相衬成像数据生成多能量数据的装置 |
| US10707051B2 (en) | 2018-05-14 | 2020-07-07 | Gatan, Inc. | Cathodoluminescence optical hub |
-
2019
- 2019-12-30 EP EP19290126.2A patent/EP3845891B1/en active Active
-
2020
- 2020-09-21 EP EP20197189.2A patent/EP3845892B1/en active Active
- 2020-12-29 WO PCT/EP2020/087964 patent/WO2021136771A1/en not_active Ceased
- 2020-12-29 US US17/621,005 patent/US11796485B2/en active Active
- 2020-12-29 US US17/783,183 patent/US11835474B2/en active Active
- 2020-12-29 WO PCT/EP2020/087969 patent/WO2021136774A1/en not_active Ceased
- 2020-12-29 CN CN202080057746.XA patent/CN114222916B/zh active Active
- 2020-12-29 CN CN202080094499.0A patent/CN115053125B/zh active Active
- 2020-12-29 JP JP2022539650A patent/JP7542068B2/ja active Active
- 2020-12-29 JP JP2022539408A patent/JP7635239B2/ja active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006091017A (ja) | 2004-09-21 | 2006-04-06 | Jordan Valley Applied Radiation Ltd | 組み合わされたx線反射率計及び回折計 |
| JP2017524926A (ja) | 2014-06-30 | 2017-08-31 | コミサリヤ・ア・レネルジ・アトミク・エ・オ・エネルジ・アルテルナテイブ | 透過スペクトル次いで散乱スペクトルを使用して2つのステージで物体を解析する方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN114222916A (zh) | 2022-03-22 |
| CN115053125B (zh) | 2026-03-17 |
| EP3845891B1 (en) | 2022-02-09 |
| US20230012833A1 (en) | 2023-01-19 |
| EP3845891A1 (en) | 2021-07-07 |
| WO2021136774A1 (en) | 2021-07-08 |
| CN114222916B (zh) | 2025-07-18 |
| JP2023512424A (ja) | 2023-03-27 |
| JP7635239B2 (ja) | 2025-02-25 |
| EP3845892B1 (en) | 2022-01-05 |
| WO2021136771A1 (en) | 2021-07-08 |
| JP2023512899A (ja) | 2023-03-30 |
| US11796485B2 (en) | 2023-10-24 |
| US11835474B2 (en) | 2023-12-05 |
| US20220326166A1 (en) | 2022-10-13 |
| CN115053125A (zh) | 2022-09-13 |
| EP3845892A1 (en) | 2021-07-07 |
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