JP7530291B2 - 接合構造、半導体装置および接合構造の形成方法 - Google Patents
接合構造、半導体装置および接合構造の形成方法 Download PDFInfo
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- JP7530291B2 JP7530291B2 JP2020541140A JP2020541140A JP7530291B2 JP 7530291 B2 JP7530291 B2 JP 7530291B2 JP 2020541140 A JP2020541140 A JP 2020541140A JP 2020541140 A JP2020541140 A JP 2020541140A JP 7530291 B2 JP7530291 B2 JP 7530291B2
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Description
Claims (28)
- 第1方向において互いに離間した素子主面および素子裏面を有し、前記素子主面に第1電極および第2電極が形成され且つ前記素子裏面に裏面電極が形成された半導体素子と、
前記素子主面と同じ方向を向く搭載面を有し、前記搭載面と前記素子裏面とが対向した姿勢で前記半導体素子を支持する第1導電体と、
前記第1電極に電気的に接続される第2導電体と、
前記搭載面に配置された絶縁層上に配置されつつ、前記第1電極と電気的に接続され、且つ前記第1導電体と電気的に絶縁されつつ、前記第2導電体と電気的に接続された第3導電体と、
前記絶縁層上に配置されつつ、前記第2電極と電気的に接続され、且つ前記第1導電体、前記第2導電体および前記第3導電体と電気的に絶縁された第4導電体と、
前記半導体素子を前記第1導電体に接合し、かつ、前記裏面電極と前記第1導電体とを導通させる焼結金属層と、
を備えており、
前記搭載面は、粗化処理された粗化領域を含んでおり、
前記焼結金属層は、前記粗化領域の上に形成されており、
前記半導体素子は、前記第1方向の一方の第1端縁が前記素子主面に繋がり、かつ、前記第1方向の他方の第2端縁が前記素子裏面に繋がる素子側面を、さらに有しており、
前記焼結金属層は、前記素子側面のうち前記素子裏面に繋がる側の一部を覆うフィレット部を含んでおり、
前記フィレット部は、前記第1方向に見て、前記第2端縁に沿って前記半導体素子を囲んでいる、
接合構造。 - 前記粗化領域は、前記第1方向に見て、前記搭載面のうち、前記絶縁層が配置される領域に重ならない、
請求項1に記載の接合構造。 - 前記粗化領域には、前記搭載面から前記第1方向に窪んだ窪みが形成されている、
請求項1または請求項2に記載の接合構造。 - 前記窪みは、前記第1方向に見て、各々が前記第1方向に直交する第2方向に延び、かつ、前記第1方向に直交しかつ前記第2方向に交差する第3方向に配列された複数の第1線状溝を含んでいる、
請求項3に記載の接合構造。 - 前記窪みは、前記第1方向に見て、各々が前記第3方向に延び、かつ、前記第2方向に配列された複数の第2線状溝をさらに含んでおり、
前記複数の第2線状溝は、前記第1方向に見て、前記複数の第1線状溝に交差する、
請求項4に記載の接合構造。 - 前記複数の第1線状溝の各々は、前記第1方向に見て、前記第2方向に沿う直線状であり、
前記複数の第2線状溝の各々は、前記第1方向に見て、前記第3方向に沿う直線状である、
請求項5に記載の接合構造。 - 前記複数の第1線状溝と前記複数の第2線状溝とは、前記第1方向に見て、略直交している、
請求項6に記載の接合構造。 - 前記粗化領域は、前記第1方向に見て、前記第1線状溝および前記第2線状溝の両方に重なる交差部と、前記第1方向に見て、前記第1線状溝あるいは前記第2線状溝のいずれか一方にのみ重なる非交差部とを含んでおり、
前記交差部の前記第1方向の寸法は、前記非交差部の前記第1方向の寸法よりも大きい、
請求項5ないし請求項7のいずれか一項に記載の接合構造。 - 前記窪みの表面には、前記粗化領域において前記窪みによって形成される凹凸よりも、微細な凹凸が形成されている、
請求項3ないし請求項8のいずれか一項に記載の接合構造。 - 前記粗化領域は、表面に銀めっきされている、
請求項1ないし請求項9のいずれか一項に記載の接合構造。 - 前記焼結金属層は、焼結銀から構成される、
請求項1ないし請求項10のいずれか一項に記載の接合構造。 - 前記焼結金属層は、複数の孔を有する多孔質である、
請求項1ないし請求項11のいずれか一項に記載の接合構造。 - 前記第1導電体は、銅を含む素材から構成される、
請求項1ないし請求項12のいずれか一項に記載の接合構造。 - 前記半導体素子は、炭化ケイ素を構成材料とするトランジスタまたはダイオードである、
請求項1ないし請求項13のいずれか一項に記載の接合構造。 - 請求項1ないし請求項14のいずれか一項に記載の接合構造を備える半導体装置であって、
前記半導体素子としての第1スイッチング素子と、
前記第1スイッチング素子を支持する、前記第1導電体としての第1導電部材と、
前記第1スイッチング素子と前記第1導電部材とを導通接合する、前記焼結金属層としての第1接合層と、
前記第1スイッチング素子、前記第1導電部材の少なくとも一部、および、前記第1接合層を覆う封止樹脂と、
を備えており、
前記第1導電部材には、前記粗化領域としての第1領域を含んでおり、
前記第1領域は、前記第1方向に見て、前記第1接合層に重なる、
半導体装置。 - 前記第1スイッチング素子に導通する第1端子と、
前記第1スイッチング素子に導通し、前記第2導電体としての第2端子と、を備えており、
前記第1端子は、前記第1導電部材に接合されており、前記第1導電部材を介して前記第1スイッチング素子に導通する、
請求項15に記載の半導体装置。 - 前記第1端子と前記第1導電部材とには、レーザ溶接による溶接痕が形成されている、請求項16に記載の半導体装置。
- 前記溶接痕は、前記第1端子から前記第1導電部材に跨っており、
前記溶接痕の前記第1方向の前記他方の端部は、前記第1導電部材の前記第1方向の途中に位置する、
請求項17に記載の半導体装置。 - 前記第1端子は、前記封止樹脂から露出した第1端子部を含んでおり、
前記第2端子は、前記封止樹脂から露出した第2端子部を含んでいる、
請求項16ないし請求項18のいずれか一項に記載の半導体装置。 - 前記第1端子は、前記第1端子部に繋がり且つ前記封止樹脂に覆われた第1パッド部を含み、
前記第2端子は、前記第2端子部に繋がり且つ前記封止樹脂に覆われた第2パッド部を含み、
前記第1パッド部および前記第2パッド部の少なくとも一方には、前記粗化領域と異なる端子粗化領域が形成されており、
前記端子粗化領域は、前記封止樹脂に接する、
請求項19に記載の半導体装置。 - 前記第1スイッチング素子と異なる、前記半導体素子としての第2スイッチング素子と、
前記第2スイッチング素子を支持する第2導電部材と、
前記第2スイッチング素子と前記第2導電部材とを導通接合する、前記焼結金属層としての第2接合層と、をさらに備えており、
前記封止樹脂は、前記第2スイッチング素子、前記第2導電部材の少なくとも一部、および、前記第2接合層を、さらに覆っており、
前記第2導電部材には、前記粗化領域としての第2領域を含んでおり、
前記第2領域は、前記第1方向に見て、前記第2接合層に重なる、
請求項20に記載の半導体装置。 - 前記第2スイッチング素子に導通する第3端子をさらに備えており、
前記第3端子は、前記第2導電部材に接合されており、前記第2導電部材を介して前記第2スイッチング素子に導通し、
前記第2スイッチング素子は、前記第1導電部材に導通している、
請求項21に記載の半導体装置。 - 前記第3端子は、前記封止樹脂から露出した第3端子部を含んでいる、
請求項22に記載の半導体装置。 - 前記第1方向において、前記第2端子部と前記第3端子部との間に挟まれた絶縁部材をさらに備えており、
前記絶縁部材の一部は、前記第1方向に見て、前記第2端子部および前記第3端子部に重なる、
請求項23に記載の半導体装置。 - 前記第1方向に見て、前記第2端子部の周縁および前記第3端子部の周縁は、前記絶縁部材の周縁よりも内方に配置されている、
請求項24に記載の半導体装置。 - 前記第1スイッチング素子と前記第2導電部材とを電気的に接続する板状接続部材をさらに備える、
請求項21ないし請求項25のいずれか一項に記載の半導体装置。 - 第1方向において互いに離間した素子主面および素子裏面を有し、前記素子主面に第1電極および第2電極が形成され且つ前記素子裏面に裏面電極が形成された半導体素子と、
前記素子主面と同じ方向を向く搭載面を有し、前記搭載面と前記素子裏面とが対向した姿勢で前記半導体素子を支持する第1導電体と、
前記第1電極に電気的に接続される第2導電体と、
前記搭載面に配置された絶縁層上に配置されつつ、前記第1電極と電気的に接続され、且つ前記第1導電体と電気的に絶縁されつつ、前記第2導電体と電気的に接続された第3導電体と、
前記絶縁層上に配置されつつ、前記第2電極と電気的に接続され、且つ前記第1導電体、前記第2導電体および前記第3導電体と電気的に絶縁された第4導電体と、
前記半導体素子を前記第1導電体に接合し、かつ、前記裏面電極と前記第1導電体とを導通させる焼結金属層と、
を備え、
前記半導体素子は、前記第1方向の一方の第1端縁が前記素子主面に繋がり、かつ、前記第1方向の他方の第2端縁が前記素子裏面に繋がる素子側面を、さらに有しており、
前記焼結金属層は、前記素子側面のうち前記素子裏面に繋がる側の一部を覆うフィレット部を含んでおり、
前記フィレット部は、前記第1方向に見て、前記第2端縁に沿って前記半導体素子を囲んでいる、接合構造の形成方法であって、
前記第1導電体を準備する工程と、
前記搭載面の少なくとも一部に、粗化領域を形成する粗化処理工程と、
前記粗化領域の少なくとも一部に焼結用金属ペースト材を塗布するペースト塗布工程と、
前記素子裏面を前記搭載面に向かい合わせて、前記焼結用金属ペースト材の上に前記半導体素子を載置するマウント工程と、
熱処理によって、前記焼結用金属ペースト材を前記焼結金属層にする焼結処理工程と、を有する接合構造の形成方法。 - 前記粗化処理工程では、前記搭載面にレーザ光を照射することにより、前記粗化領域を形成する、
請求項27に記載の接合構造の形成方法。
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