JP7526428B2 - 中空微粒子の製造方法及び中空微粒子 - Google Patents

中空微粒子の製造方法及び中空微粒子 Download PDF

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JP7526428B2
JP7526428B2 JP2022535366A JP2022535366A JP7526428B2 JP 7526428 B2 JP7526428 B2 JP 7526428B2 JP 2022535366 A JP2022535366 A JP 2022535366A JP 2022535366 A JP2022535366 A JP 2022535366A JP 7526428 B2 JP7526428 B2 JP 7526428B2
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fluorine
monomer
hollow
phase separation
mass
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JPWO2022009917A1 (https=
JPWO2022009917A5 (https=
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義人 田中
真由美 飯田
秀人 南
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Daikin Industries Ltd
Kobe University NUC
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Daikin Industries Ltd
Kobe University NUC
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/22—Esters containing halogen
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
    • B01J13/02—Making microcapsules or microballoons
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
    • B01J13/02—Making microcapsules or microballoons
    • B01J13/06—Making microcapsules or microballoons by phase separation
    • B01J13/14—Polymerisation; cross-linking
    • B01J13/18—In situ polymerisation with all reactants being present in the same phase
    • B01J13/185—In situ polymerisation with all reactants being present in the same phase in an organic phase
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/12—Polymerisation in non-solvents
    • C08F2/16—Aqueous medium
    • C08F2/18—Suspension polymerisation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F257/00—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00
    • C08F257/02—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00 on to polymers of styrene or alkyl-substituted styrenes
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    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D151/00—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • C09D151/003—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers grafted on to macromolecular compounds obtained by reactions only involving unsaturated carbon-to-carbon bonds
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    • C09D201/00—Coating compositions based on unspecified macromolecular compounds
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    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
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    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/65—Additives macromolecular
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/66—Additives characterised by particle size
    • C09D7/69—Particle size larger than 1000 nm
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/70—Additives characterised by shape, e.g. fibres, flakes or microspheres
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00—Polymer mixtures characterised by other features
    • C08L2205/14—Polymer mixtures characterised by other features containing polymeric additives characterised by shape
    • C08L2205/18—Spheres
    • C08L2205/20—Hollow spheres

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Dispersion Chemistry (AREA)
  • Nanotechnology (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Manufacturing Of Micro-Capsules (AREA)
  • Polymerisation Methods In General (AREA)
JP2022535366A 2020-07-09 2021-07-07 中空微粒子の製造方法及び中空微粒子 Active JP7526428B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020118644 2020-07-09
JP2020118644 2020-07-09
PCT/JP2021/025578 WO2022009917A1 (ja) 2020-07-09 2021-07-07 中空微粒子の製造方法及び中空微粒子

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JPWO2022009917A1 JPWO2022009917A1 (https=) 2022-01-13
JPWO2022009917A5 JPWO2022009917A5 (https=) 2023-03-20
JP7526428B2 true JP7526428B2 (ja) 2024-08-01

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US (1) US20230144395A1 (https=)
EP (1) EP4166579A4 (https=)
JP (1) JP7526428B2 (https=)
KR (1) KR20230022436A (https=)
CN (1) CN115803350B (https=)
TW (1) TW202211980A (https=)
WO (1) WO2022009917A1 (https=)

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Publication number Priority date Publication date Assignee Title
CN118043130A (zh) * 2021-10-08 2024-05-14 大金工业株式会社 中空微粒的制造方法、中空微粒、相分离微粒、水分散体和组合物
WO2024214700A1 (ja) * 2023-04-12 2024-10-17 ダイキン工業株式会社 中空微粒子の製造方法、中空微粒子、相分離微粒子、水分散体及び組成物

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006126737A (ja) 2004-11-01 2006-05-18 Sekisui Chem Co Ltd 拡散反射板用コーティング剤及び拡散反射板

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JPS4840414B1 (https=) 1969-07-11 1973-11-30
JPS5895753A (ja) * 1981-12-02 1983-06-07 Daikin Ind Ltd 加圧定着用カプセル化トナ−
JPS6187734A (ja) * 1984-10-03 1986-05-06 Japan Synthetic Rubber Co Ltd 中空ポリマ−粒子の製造方法
US4954412A (en) * 1988-10-31 1990-09-04 Xerox Corporation Processes for the preparation of encapsulated toner compositions
JPH05142847A (ja) * 1991-11-15 1993-06-11 Fuji Xerox Co Ltd マイクロカプセルおよびマイクロカプセルトナー並びにそ の製造法
JPH07163864A (ja) * 1993-12-14 1995-06-27 Fuji Xerox Co Ltd 機能性マイクロカプセルおよびその製造方法
JP3785440B2 (ja) 2001-07-19 2006-06-14 財団法人新産業創造研究機構 目的成分内包微粒子の製造方法並びに中空高分子微粒子及びその製造方法
JP4238147B2 (ja) 2004-01-29 2009-03-11 積水化学工業株式会社 中空樹脂微粒子及び反射防止フィルム
KR101238514B1 (ko) * 2004-04-05 2013-02-28 세키스이가가쿠 고교가부시키가이샤 중공 수지 미립자, 유기·무기 하이브리드 미립자 및 중공수지 미립자의 제조 방법
JP2008231241A (ja) * 2007-03-20 2008-10-02 Sanyo Chem Ind Ltd 中空樹脂粒子
JP2010167410A (ja) * 2008-12-26 2010-08-05 Fujifilm Corp 中空微粒子の製造方法、それにより得られる中空微粒子及びその分散液、並びにこの中空微粒子を用いた反射防止フィルム
KR101797722B1 (ko) * 2014-09-30 2017-11-15 셍기 테크놀로지 코. 엘티디. 연성 금속 적층체 및 이의 제조 방법
JP7352804B2 (ja) * 2019-05-09 2023-09-29 ダイキン工業株式会社 中空微粒子の製造方法及び中空微粒子

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006126737A (ja) 2004-11-01 2006-05-18 Sekisui Chem Co Ltd 拡散反射板用コーティング剤及び拡散反射板

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JPWO2022009917A1 (https=) 2022-01-13
KR20230022436A (ko) 2023-02-15
EP4166579A1 (en) 2023-04-19
CN115803350B (zh) 2025-02-25
EP4166579A4 (en) 2024-07-10
WO2022009917A1 (ja) 2022-01-13
CN115803350A (zh) 2023-03-14
US20230144395A1 (en) 2023-05-11
TW202211980A (zh) 2022-04-01

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