TW201042281A - Antireflection film and polarizing plate comprising the same - Google Patents

Antireflection film and polarizing plate comprising the same Download PDF

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TW201042281A
TW201042281A TW098133695A TW98133695A TW201042281A TW 201042281 A TW201042281 A TW 201042281A TW 098133695 A TW098133695 A TW 098133695A TW 98133695 A TW98133695 A TW 98133695A TW 201042281 A TW201042281 A TW 201042281A
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Taiwan
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refractive index
layer
film
group
coating
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TW098133695A
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Chinese (zh)
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Kyu-Ha Choi
Sang-Yeol Um
Moon-Bok Lee
Jeong-Tae Seo
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Toray Saehan Inc
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Publication of TW201042281A publication Critical patent/TW201042281A/en

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/16Optical coatings produced by application to, or surface treatment of, optical elements having an anti-static effect, e.g. electrically conducting coatings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528Polarisers
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/38Anti-reflection arrangements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Polarising Elements (AREA)
  • Laminated Bodies (AREA)
  • Liquid Crystal (AREA)

Abstract

The present invention generally relates to an antireflection film and a polarizing plate comprising the same, and more specifically, to an antireflection film which has excellent rainbow effect and a very low reflectance by reducing the amplitude of reflectance spectrum and a polarizing plate comprising the same. An antireflection film according to the present invention comprise: a transparent substrate of cellulose triacetate (TAC) for protecting a polyvinyl alcohol (PVA) polarizer; a high-hardness layer of high-refractive index for being coated on the transparent substrate, the high-hardness layer of high-refractive index having a refractive index of 1.50 to 1.60 and antistatic function; and a low-refractive layer for being coated on the high-hardness layer of high-refractive index, the low-refractive layer having a refractive index of 1.31 to 1.40 and being wet-coated, wherein the antireflection film has an average specular reflectance of 0.1 to 0.4% at an incidence angle of 5 DEG in a wavelength region of 480 to 680 nm.

Description

201042281 六、發明說明: 【發明所屬^_技術領域;3 發明領域 本發明總體上涉及抗反射膜和包括其的偏振板 (polarizing plate),並且更具體而言涉及通過使反射光譜波 長的振幅減小而具有優異的彩虹效應(rainb〇w effect)和非 常低的反射率的抗反射膜以及包括其的偏振板。 〇 發明背景 通常,抗反射膜用於各種圖像顯示裝置例如液晶顯示 器(LCD)、等離子體顯示面板(PDP)、電致發光顯示器(ELD) 和陰極射線管顯示器(C RT)中。抗反射膜還用於眼鏡片和照 - 相機。對於這樣的抗反射膜,通常使用具有透明金屬氧化 物薄層的疊層的多層抗反射膜。這種薄的透明多層用於防 止在可見光範圍的盡可能寬的波長範圍内的光反射。 Q 所述透明金屬氧化物薄膜通過化學氣相沉積(CVD)或 者物理氣相沉積(pVD),尤其是通過被歸類為pvD技術的真 空 >儿積或者濺射方法形成。雖然所述透明金屬氧化物薄膜 作為抗反射塗層呈現優異的光學性質,但是用於形成這些 膜的真空沉積和濺射方法造成低的生產率並且不適合於大 規模製造。 已提出將通過用無機顆粒進行濕法塗覆而形成抗反射 膜的方法作為氣相沉積技術的替代方案。例如, JP-B-60-59250公開了通過塗覆而獲得的含有顆粒狀無機物 3 201042281 貝並且具有微孔(microvoid)的抗反射層。具有這種微孔的 抗反射層是通過對塗覆組合物進行塗布並且用活性氣體 (activated gas)對塗覆層進行處理而獲得的。JP-A-2-245702 公開了含有兩種或更多種超細顆粒(例如,MgF:2和Si02)的 抗反射膜。使所述顆粒的混合比在膜厚度方向上變化以改 變折射率’從而實現與JP-A-59-50401中包括高折射率層/ 低折射率層組合的抗反射膜的光學性質類似的光學性質。 所述超細顆粒與由矽酸乙酯的熱分解得到的Si02結合。石夕 酸乙酯的熱分解伴有乙基部分的燃燒從而產生二氧化碳和 蒸汽,二氧化碳和蒸汽從所述塗覆層釋放而在所述超細顆 粒之間留下空隙。此外,JP-A-5-13021提出用黏合劑填充超 細顆粒之間的上述空隙。JP-A-7-48527公開了含有黏合劑和 顆粒無機物質的抗反射膜,所述顆粒無機物質包括多孔二 氧化矽。JP-A-11 -6902描述了用於以低成本製造具有高的膜 強度和低反射的抗反射膜的全濕法塗覆技術,其公開了具 有通過濕法塗覆形成的三層抗反射層的膜,其中在低折射 率層上堆疊至少兩種無機顆粒以形成含有微孔的層。此 外,如JP-A-2000-275401 和JP-A-2000-275404所述,用於騎 予通過濕法塗覆技術形成的抗反射膜以防眩光性質的已知 方法包括:用抗反射層覆蓋具有表面不均勻性的基底、將 用於造成表面不均勻性的消光(matting)顆粒引入到抗反射 層中、和對光滑的抗反射膜進行壓花(emboss)以形成表面不 均勻性。 然而,通過真空沉積或者濺射形成的在450〜650nm波 201042281 ' 長範圍内具有〇·4%或者更低的平均反射率的抗反射膜使得 ' 反射光強烈地變色為帶紅色到帶藍色的紫色,並且如果光 源在觀察者之後,則這種變色的反射光損害顯示品質。另 一方面,通過濕法塗覆形成的抗反射膜儘管具有幾乎中和 色(neutral color)的反射光,但其具有超過1%的平均反射 率’這在抗反射性能方面特別是在其中外部光直接入射在 顯示面上的應用方面是不夠的。 【發明内容】 ❹ 發明概要 因此’設計本發明以解決上述問題。本發明的目的是 提供通過使反射光譜波長的振幅減小而具有優異的反射外 觀和非常低的反射率的抗反射膜以及包括其的偏振板。 . 本發明的這些和其他目的和優點將從本發明的以下具 體描述而明晰。 以上目的通過抗反射膜而實現,該抗反射膜包括:用 ❹ 於保護聚乙烯醇(PVA)偏振片(polarizer)的三醋酸纖維素 (TAC)透明基底;塗覆在所述透明基底上的高折射率的高硬 度層,所述高折射率的高硬度層具有1.5〇〜1.60的折射率和 抗靜電功能;和塗覆在所述高折射率的高硬度層上的低折 射率層,所述低折射率層具有1.31〜mo的折射率並且是濕 法塗覆的’其中所述抗反射膜在480〜680nm波長範圍内在 5°的入射角下具有0.1〜0.4%的平均鏡面反射率。 此處,所述抗反射膜具有1〇4〜的抗靜電指數。 優選所述高折射率的高硬度層具有〇 1〜2〇μΓη的厚度 5 201042281 並且所述低折射率層具有的厚度。 優選地’所述抗反射膜進一步包括在所述低折射率層 和所述高折射率的高硬度層之間的黏合層,或者,所述高 折射率的高硬度層包含用於黏合層的組分,其中所述黏合 層的與所述低折射率層的下側接觸的表面具有〇 〇〇1〜 〇.〇30μηι的中心線平均粗糙度(Ra)。 所述1¾折射率的高硬度層優選由塗覆組合物塗覆而 成,所述塗覆組合物包括:至少一種選自鈦、鍅、銦、鋅、 錫、銘和銻的氧化物的金屬氧化物顆粒;陰離子型分散劑; 具有至少三官能的能聚合基團的固化樹脂;聚合引發劑; 和溶劑。 所述咼折射率的高硬度層優選通過如下方法形成:塗 布所述塗覆組合物;對塗覆膜進行乾燥以除去溶劑;和通 過施加熱和電離輻射中的至少一種使所述塗覆膜固化。 優地,所述低折射率層包括能夠通過施加熱或者電 離輻射中的至少一種而固化的含氟化合物,並且具有〇〇3 〜0.15的動摩擦係數和95。〜120。的與水的接觸角。 以上目的進一步通過包括抗反射膜的偏振板實現,所 述偏振板具有偏振片和黏附在所述偏振片的至少一側上的 表面保護膜’其中所述表面保護膜為抗反射膜,並且其中 所述抗反射膜通過如下方法製備:用鹼性溶液塗覆抗反射 膜的與其上待形成低折射率層的一側相反的透明基底側以 在形成所述低折射率層的同時或者之後皂化;加熱所述經 塗覆的基底,之後用水洗滌或者對其進行中和;和將所述 201042281 基底黏附於所述偏振片上。 以上目的通過包括所述机反射膜或者其中具有所述於 反射膜的偏振板的顯示裝置實現。 根據本發明’所述抗反射膜具有優異的彩虹效應和非 常低的反射率。 圖式簡單說明 參照以下描述、所附權利要求和附圖將有助於更好地 理解本發明的這些和其他特徵、方面和優點,其中相同的 部件始終由相同的附圖標記表示。在附圖中: 第1圖為根據本發明的抗反射膜的橫截面視圖;和 第2圖為將現有技術抗反射膜和本發明抗反射祺的 反射光譜的波長進行比較的圖。 【實施方式3 具體實施方式 下文中,將參照附圖具體 地描述本發明的優選實施方式。應理解,本發明優選 實施方式的具體描述僅為了說明而給出,並且因此根據該 具體描述,在本發明精神和範圍内的各種變化和改進對^ 本領域技術人員來說將變得明晰。 ' 第1圖為顯示本發明的抗反射膜的基本層結構的橫截 面視圖。從第i圖中可以看到,本發明的抗反射膜具有包括 依次堆疊在透明基底(10)上的高折射率的高硬度層(20)和 低折射率層(3〇)_層抗反㈣構。在這躺層抗反射結構 的情況下’可通過改變各層的光學厚度例如產品的折射率 7 201042281 和膜厚度來調節光譜波長。 由於具有上述兩層結構的本發明的抗反射膜可實現彩 虹效應的降低和低反射兩者,因此當本發明的抗反射膜作 為顯示裝置的最外層應用時,其為顯示裝置(例如LCD)提供 迄今未獲得的高的可視性(visibility)。此外,由於本發明的 抗反射膜在480nm〜680nm的波長範圍内在5。的入射角下 具有0.4%或者更低的平均鏡面反射率,因此所述抗反射膜 令人滿意地防止由於外部光在顯示面板上的反射引起的可 視性的降低。 本發明的抗反射膜具有極低的反射率並且不存在與常 規多層抗反射膜有關的問題,即反射光著色為帶紅色到帶 藍色的紫色的所謂彩虹效應。而且,當將本發明的抗反射 膜應用於LCD時,由具有高亮度的外部光例如來自室内榮 光管的光的反射造成的反射光的顏色是非彩色的(neutral) 並且可忽略不計。 根據本發明的抗反射膜的透明基底優選具有丨45〜 1.55的折射率’並且優選為三醋酸纖維素基底(TAc,折射 率:1.49)。在這種情況下,要求所述高折射率的高硬度層 的折射率(nl)應為1.50〜1.6〇 , |且所述低折射率層的折射 率(n2)應為1.40或者更低,優選為丨扣〜丨.^。在作為高折 射率樹脂層和低折射率樹脂層的具有所需折射率的材料難 以獲得或者不合適的情況下,包括折射率高於所需折射率 的層和折射率低於所需折射率的層的多個層的組合可用於 實現與所設計的高折射率樹脂層或者低折射率層的基本上 201042281 ' 的光學等效,這是本領域中已知的。用於本發明抗反射膜 ' 的術語“基本上兩層結構,,旨在包括含有這種光學等效層的 結構,並且因此可包括四層或者五層結構。 由於上述的反射光著色(coloring)的大大降低,本發明 的抗反射膜在反射光的色調(tint)方面具有大大降低的由於 抗反射層的厚度變化引起的不均勻性。換言之,容許的厚 度變化的範圍變寬,這導致產品收得率提高和生產成本進 ▲ 一步降低。 〇 可在本發明的抗反射膜中使用的透明基底優選包括塑 膠膜。製造所述塑膠膜的合適聚合物包括:纖維素酯(例 如,三醋酸纖維素、二乙酸纖維素、丙酸纖維素、丁酸纖 維素、醋酸丙酸纖維素和硝基纖維素)、聚醯胺、聚碳酸酯、 . 聚酯(例如,聚對苯二甲酸乙二醇酯、聚萘二甲酸乙二醇 酯、聚對苯二甲酸1,4-環己烷二曱醇酯、聚1,2-二苯氧基乙 烷-4,4’-二羧酸乙二醇酯和聚對苯二甲酸丁二醇酯)、聚苯乙 Q 烯(例如,間規立構聚苯乙烯)、聚烯烴(例如,聚丙烯、聚 乙稀和聚甲基戊烯)、聚颯、聚醚礙、聚丙烯酸g旨、聚醚_ 醯亞胺、聚甲基丙烯酸甲酯和聚醚酮。 當將本發明的抗反射膜用作在LCD、有機LED等中應 用的偏振片的保護膜之一時,最優選三醋酸纖維素。三醋 酸纖維素基底優選通過Technical Disclosure Bulletin 2001-1745中所公開的方法製備。在其中將所述抗反射膜黏 附於平面CRT、PDP等中由玻璃等製成的面板上的應用中, 優選使用聚對苯二曱酸乙二醇酯或者聚萘二甲酸乙二醇 9 201042281201042281 VI. Description of the Invention: [Technical Field] 3 FIELD OF THE INVENTION The present invention generally relates to an antireflective film and a polarizing plate including the same, and more particularly to reducing the amplitude of a wavelength of a reflection spectrum An antireflection film which is small and has an excellent rainbow effect and a very low reflectance, and a polarizing plate including the same. BACKGROUND OF THE INVENTION Generally, antireflection films are used in various image display devices such as liquid crystal displays (LCDs), plasma display panels (PDPs), electroluminescent displays (ELDs), and cathode ray tube displays (CRTs). Anti-reflective films are also used in ophthalmic lenses and photo-cameras. For such an antireflection film, a laminated multilayer antireflection film having a thin layer of a transparent metal oxide is usually used. This thin transparent multilayer is used to prevent light reflection in the widest possible wavelength range in the visible range. Q The transparent metal oxide film is formed by chemical vapor deposition (CVD) or physical vapor deposition (pVD), especially by a vacuum > cation or sputtering method classified as pvD technology. Although the transparent metal oxide film exhibits excellent optical properties as an anti-reflective coating, the vacuum deposition and sputtering methods for forming these films result in low productivity and are not suitable for large-scale manufacturing. A method of forming an antireflection film by wet coating with inorganic particles has been proposed as an alternative to the vapor deposition technique. For example, JP-B-60-59250 discloses an antireflection layer containing a particulate inorganic substance 3 201042281 and having a microvoid obtained by coating. The antireflection layer having such micropores is obtained by coating the coating composition and treating the coating layer with an activated gas. JP-A-2-245702 discloses an antireflection film containing two or more kinds of ultrafine particles (for example, MgF: 2 and SiO 2 ). The mixing ratio of the particles is changed in the film thickness direction to change the refractive index 'to achieve optical properties similar to those of the antireflection film including the high refractive index layer/low refractive index layer in JP-A-59-50401 nature. The ultrafine particles are combined with SiO 2 obtained by thermal decomposition of ethyl decanoate. The thermal decomposition of ethyl oleate is accompanied by combustion of the ethyl moiety to produce carbon dioxide and steam, and carbon dioxide and steam are released from the coating layer leaving a void between the ultrafine particles. Further, JP-A-5-13021 proposes to fill the above gap between the ultrafine particles with a binder. JP-A-7-48527 discloses an antireflection film comprising a binder and a particulate inorganic substance, the particulate inorganic substance comprising porous cerium oxide. JP-A-11-6902 describes a full wet coating technique for producing an antireflection film having high film strength and low reflection at low cost, which discloses having three layers of antireflection formed by wet coating. A film of a layer in which at least two inorganic particles are stacked on a low refractive index layer to form a layer containing micropores. Further, as described in JP-A-2000-275401 and JP-A-2000-275404, a known method for riding an anti-reflection film formed by a wet coating technique to prevent glare properties includes: using an anti-reflection layer A substrate having surface unevenness is covered, matting particles for causing surface unevenness are introduced into the anti-reflection layer, and embossing is performed on the smooth anti-reflection film to form surface unevenness. However, an anti-reflection film having an average reflectance of 〇·4% or less in a long range of 450 to 650 nm wave 201042281' formed by vacuum deposition or sputtering causes the reflected light to be strongly discolored to reddish to bluish The purple color, and if the light source is behind the viewer, the discolored reflected light impairs the display quality. On the other hand, the antireflection film formed by wet coating has an average reflectance of more than 1% although it has a reflected light of almost neutral color 'this is particularly in terms of antireflection performance. The application of light directly on the display surface is not sufficient. SUMMARY OF THE INVENTION The present invention has been devised to solve the above problems. SUMMARY OF THE INVENTION An object of the present invention is to provide an antireflection film having an excellent reflection appearance and a very low reflectance by reducing the amplitude of a wavelength of a reflection spectrum, and a polarizing plate including the same. These and other objects and advantages of the present invention will be apparent from the following description of the invention. The above object is achieved by an antireflection film comprising: a cellulose triacetate (TAC) transparent substrate for protecting a polyvinyl alcohol (PVA) polarizer; coated on the transparent substrate a high refractive index high hardness layer having a refractive index and an antistatic function of 1.5 〇 to 1.60; and a low refractive index layer coated on the high refractive index high hardness layer, The low refractive index layer has a refractive index of 1.31 to mo and is wet-coated, wherein the antireflection film has an average specular reflectance of 0.1 to 0.4% at an incident angle of 5° in a wavelength range of 480 to 680 nm. . Here, the antireflection film has an antistatic index of 1 〇 4 〜. Preferably, the high refractive index high hardness layer has a thickness of 〇 1 to 2 〇 μ Γ 5 201042281 and the low refractive index layer has a thickness. Preferably, the anti-reflection film further includes an adhesive layer between the low refractive index layer and the high refractive index high hardness layer, or the high refractive index high hardness layer includes an adhesive layer. a component, wherein a surface of the adhesive layer that is in contact with a lower side of the low refractive index layer has a center line average roughness (Ra) of 〇〇〇1 to 〇.〇30μη. The high hardness layer of the refractive index of 13⁄4 is preferably coated with a coating composition comprising: at least one metal selected from the group consisting of oxides of titanium, bismuth, indium, zinc, tin, lanthanum and cerium Oxide particles; anionic dispersant; a cured resin having at least trifunctional polymerizable groups; a polymerization initiator; and a solvent. The high hardness layer of the ruthenium refractive index is preferably formed by coating the coating composition; drying the coating film to remove the solvent; and applying the coating film by applying at least one of heat and ionizing radiation Cured. Preferably, the low refractive index layer comprises a fluorine-containing compound which is curable by application of at least one of heat or ionizing radiation, and has a dynamic friction coefficient of 〇〇3 to 0.15 and 95. ~120. Contact angle with water. The above object is further achieved by a polarizing plate comprising an antireflection film having a polarizing plate and a surface protective film adhered on at least one side of the polarizing plate, wherein the surface protective film is an antireflection film, and wherein The anti-reflection film is prepared by coating the transparent substrate side of the anti-reflection film opposite to the side on which the low refractive index layer is to be formed with an alkaline solution to saponify at the same time as or after the formation of the low refractive index layer Heating the coated substrate, followed by washing with water or neutralizing it; and adhering the 201042281 substrate to the polarizing plate. The above object is achieved by a display device including the machine reflection film or a polarizing plate having the same in the reflection film. The antireflection film according to the present invention has an excellent rainbow effect and a very low reflectance. BRIEF DESCRIPTION OF THE DRAWINGS These and other features, aspects and advantages of the present invention will become better understood from the following description, the appended claims and the appended claims. In the drawings: Fig. 1 is a cross-sectional view of an antireflection film according to the present invention; and Fig. 2 is a view for comparing wavelengths of reflection spectra of a prior art antireflection film and an antireflection crucible of the present invention. [Embodiment 3] Hereinafter, preferred embodiments of the present invention will be specifically described with reference to the accompanying drawings. It is understood that the detailed description of the preferred embodiments of the present invention is intended to Fig. 1 is a cross-sectional view showing the basic layer structure of the antireflection film of the present invention. As can be seen from the i-th figure, the anti-reflection film of the present invention has a high-refractive-index high-hardness layer (20) and a low-refractive-index layer (3〇)_layer anti-reverse which are sequentially stacked on the transparent substrate (10). (4) Structure. In the case of this lying layer anti-reflective structure, the spectral wavelength can be adjusted by changing the optical thickness of each layer such as the refractive index of the product 7 201042281 and the film thickness. Since the antireflection film of the present invention having the above two-layer structure can achieve both the reduction of the rainbow effect and the low reflection, when the antireflection film of the present invention is applied as the outermost layer of the display device, it is a display device (for example, an LCD). Provides high visibility that has not been obtained to date. Further, since the antireflection film of the present invention is at 5 in the wavelength range of 480 nm to 680 nm. The average specular reflectance of 0.4% or less at the incident angle is such that the antireflection film satisfactorily prevents the decrease in visibility due to reflection of external light on the display panel. The antireflection film of the present invention has extremely low reflectance and does not have a problem associated with a conventional multilayer antireflection film, i.e., the reflected light is colored as a so-called rainbow effect of reddish to bluish purple. Moreover, when the antireflection film of the present invention is applied to an LCD, the color of the reflected light caused by the reflection of external light having high luminance such as light from the indoor illuminator is neutral and negligible. The transparent substrate of the antireflection film according to the present invention preferably has a refractive index ' of 45 to 1.55 and is preferably a cellulose triacetate substrate (TAc, refractive index: 1.49). In this case, the high refractive index (nl) of the high refractive index layer is required to be 1.50 to 1.6 Å, and the refractive index (n2) of the low refractive index layer should be 1.40 or less. Preferably, it is a buckle-丨.^. In the case where a material having a desired refractive index as a high refractive index resin layer and a low refractive index resin layer is difficult to obtain or is not suitable, a layer having a refractive index higher than a desired refractive index and a refractive index lower than a desired refractive index are included. The combination of multiple layers of layers can be used to achieve optical equivalent to substantially 201042281' of the designed high refractive index resin layer or low refractive index layer, as is known in the art. The term "substantially two-layer structure" used in the antireflection film of the present invention is intended to include a structure containing such an optical equivalent layer, and thus may include a four-layer or five-layer structure. Due to the above-described reflected light coloring (coloring) The anti-reflection film of the present invention has a greatly reduced unevenness due to the thickness variation of the anti-reflection layer in terms of the tint of the reflected light. In other words, the range of the allowable thickness variation is widened, which results in The product yield increase and the production cost are further reduced. The transparent substrate which can be used in the antireflection film of the present invention preferably comprises a plastic film. Suitable polymers for manufacturing the plastic film include: cellulose ester (for example, three Cellulose acetate, cellulose diacetate, cellulose propionate, cellulose butyrate, cellulose acetate propionate and nitrocellulose), polyamide, polycarbonate, polyester (for example, polyterephthalic acid) Ethylene glycol ester, polyethylene naphthalate, 1,4-cyclohexanedonol polybutyl terephthalate, poly 1,2-diphenoxyethane-4,4'-dicarboxylate Acid glycol ester and polyparaphenylene Butylene glycolate), polystyrene (for example, syndiotactic polystyrene), polyolefin (for example, polypropylene, polyethylene, and polymethylpentene), polyfluorene, polyether, Polyacrylic acid, polyether amide, polymethyl methacrylate, and polyether ketone. When the antireflection film of the present invention is used as one of protective films for polarizing plates used in LCDs, organic LEDs, and the like, Most preferred is cellulose triacetate. The cellulose triacetate substrate is preferably prepared by the method disclosed in Technical Disclosure Bulletin 2001-1745, in which the antireflection film is adhered to a panel made of glass or the like in a flat CRT, PDP or the like. In the above application, it is preferred to use polyethylene terephthalate or polyethylene naphthalate 9 201042281

合意的是透明基底具有80%或者更高、尤其是86%或更 高的透光率,和不超過2.0%、尤其是為1.0%或者更低的霧 度,以及1.4〜1.7的折射率。所述透明基底的厚度優選為, 但不限於,30〜200μηι,更優選為75〜125μηι。 接下來,本發明抗反射膜的高折射率的高硬度層通過 如下方法形成:將包括具有高折射率的無機顆粒、熱或者 電離輕射固化單體、聚合引發劑、和溶劑的塗覆組合物塗 布到所述透明基底上;對塗覆膜進行乾燥以除去所述溶 劑;和通過施加熱和/或電離輻射使所述塗覆膜固化。由此 形成的高折射率的高硬度層在黏附性方面優於通過塗布具 有高折射率和抗刮傷性的聚合物溶液並對塗覆膜進行乾燥 而形成的那些。優選如和美國專刺 Νο·6,210,858中所述將多官能的(曱基)丙烯酸酯單體和含有 陰離子基團的(曱基)丙烯酸酯分散劑添加到塗覆組合物 中,以改善分散穩定性和固化膜的強度。 所述無機顆粒優選為選自鈦、錯、銦、鋅、錫和錄的 氧化物的至y種金屬氧化物的顆粒。所述無機顆粒優選 具有用C〇Ulter計數器測量的1〜励⑽的平均粒度。小於 hnn的顆粒具有太大的比表面積而不能確缺夠的分散靜 定性’大於職m的顆粒可由於與黏合劑在折射率上的差異 而造成可見㈣散射’從而造成較高的霧度水準和透射率 的惡化。 高折射率的高硬度層的霧度優選為3%或者更小、更優 10 201042281 選為1%或者更小。 ' 树明的抗反射顧㈣射率層優選包括在施加熱或 者電離輻射時能固化的含銳化合物,並且所述低折射率層 具有0.03〜(U5的動摩擦係數和95。〜12〇。的與水的接觸 角。動摩擦係數大於0_15時,當擦拭時所述層容易刮傷。 水接觸角小於9 5。時,所述層對指紋或者油質污垢的污染具 有差的耐受性。 0 所述熱固化型或者電離輻射固化型含氟化合物包括含 有全氟烷基的矽烷化合物(例如,(十七氟_U22四癸基) 二乙氧基矽烷)、和包括含氟單體和提供能交聯基團的單體 的含氟共聚物。提供所述含氟聚合物的含氟單體包括:氟 - 烯烴,例如氟乙烯、偏二氟乙烯、四氟乙烯、六氟丙烯和 ' 全氟_2,2—二甲基-Udioxonol ;部分或者完全氟化的(甲基) 丙烯酸烷基酯,例如,Viscote 6FM(可得自Osaka Organic Chemical Industry Ltd.)和M-2020(可得自 Daikin Industries, 〇 Ud.);和部分或者完全氟化的乙烯基醚。最優選六氟丙烯, 因為所得聚合物具有低折射率和由於其易於處理。 提供能交聯基團的單體包括:其分子中具有能交聯基 團的(曱基)丙烯酸酯單體,例如甲基丙烯酸縮水甘油酯;和 具有羧基、羥基、氨基、磺酸基團等的(甲基)丙烯酸酯單體, 例如(曱基)丙烯酸、羥甲基(甲基)丙烯酸酯、羥烷基(甲基) 丙烯酸酯和丙烯酸烯丙酯。特別優選的是已知能夠在共聚 之後引入交聯結構的後一組單體(參見JP A_ 10_25388和 JP-A-10-147739) 〇 11 201042281 不純的料《可與錢單體組合使用 聚單體包括,但不限於:狀(例如。這樣的共 烯、氣乙烯和偏二氯乙嬌)、而、& 丙烯、異戊二 乙奸丙稀酸2-乙基㈤、甲基:酸丙烯酸 ^、甲基丙稀酸乙醋、甲基丙缚酸〜甲Π 基丙稀酸醋)、苯乙晞衍生物(例如 —私一甲 ^一曱基苯乙稀)、乙稀基二:,= =、乙稀基,’乙酸乙稀^酸心和:= i小丙席醯胺(例如’ N_叔丁基丙烯 仏 JF-A-10-25388和 jp_A_1〇_147739 中。 摩物可進一步包括用於改進滑移和降低動 2 ^單元,料致改料抗顺性。例如, 優選採鈔^讓对所提出的㈣二^基 =到=中。優選將超細二氧化秒顆粒分散在含氟 漱合物中以改進抗刮傷性。 為了抗反射性能,最好是使本發明抗反射膜的低折射 率層具有較㈣折射率,但是抗·性隨折射率的降低而 降低。因此,對所述含氟聚合物的折射率和待添加的二氧 化矽顆粒的量進行優化以在抗刮傷性和低折射率之間達到 最佳平衡。可將可商購得到的在有機溶劑中的矽溶膠或者 由可商購得到的在有機溶劑中的二氧化矽粉末所製備的分 散液添加到用於所述低折射率層的塗覆組合物中。 所述超細氧化物顆粒優選具有0.001〜0·2μπι、尤其是 12 201042281 . 〇.〇01〜0·〇5μηι的平均粒度,和盡可能窄的尺寸分佈(單分 • 散)。所述超細氧化物顆粒以基於所述低折射率層總重量的 5〜90重量%、優選1〇〜70重量%、更優選1〇〜5〇重量%的 量適當地添加。 本發明的抗反射膜可進一步包括在所述低折射率層和 所述高折射率的高硬度層之間的黏合層,或者所述高折射 率的面硬度層包括用於黏合層的組分,並且所述黏合層與 所述低折射率層的下側接觸的表面具有〇 〇〇1〜〇㈨卟瓜的 ® 中心線平均粗糙度(Ra)。 所述黏合層為對於上層和下層兩者均呈現出優異黏附 性的層。在本發明中,所述上層(直接設置在所述黏合層上 - 的層)為通常對另一層具有差的黏附性的低折射材料。由於 . 所述黏合層的該黏附性改進效應,本發明的抗反射膜呈現 出非常高的抗刮傷性。本發明的黏合層的特徵在於其表面 上具有粗糙度。認為所述黏合層為所述低折射率層提供良 0 好的錨定(anchorage)從而提供改善的黏附力。所述黏合層 優選具有0.001〜〇.〇3〇μπι、特別是_i〜〇 〇2〇μιη、尤其是 0.001〜Ο.ΟΙΟμιη的厚度,以便不影響基於光干涉的抗反射 功能。如果所述黏合層的中心線平均粗糙度(Ra)太小,則 所述黏合層喪失錨定效果,並且如果所述黏合層的中心線 平均粗糙度(Ra)太大,則在介面上發生擾動,這又對基於 光干涉的抗反射性能有不利影響。 當所述黏合層的折射率與所述低折射率層(上層)的折 射率相同時,對所述黏合層的厚度進行選擇使得所述黏合 13 201042281 層和所述低折射率層的總厚度衧為低折射率層的最初設計 厚产。當所述黏合層的折射率與所述下層的折射率相同 時,叮想到對所述黏合層的厚度進行選擇使得所述黏合層 和所述下層的總厚度可為該下層的最初設計厚度。更合意 的是所述黏合層代替所述下層’即結合最初設計的下層的 功能。即,所述黏合層可作為黏合層加高折射率層、黏合 層加硬塗覆層、或者黏合層加防眩光層。在這樣的情況下, 所述黏合層的厚度應為已針對各功能層所設計的厚度。 所述黏合層的表面粗糙度由根據JIS B-0601確定的中 心線平均粗糙度(Ra)表示。Ra是通過對用原子力顯微鏡在 4μιη評估長度上測得的表面輪廓資料進行分析而確定的。 當表面具有由下文中所述的消光顆粒引起的防眩不均勻性 時’將這種不均勻性週期從所述資料中排除。 對可使黏合層具有上述Ra的材料沒有特別限制。用於 獲知所述表面粗縫度的優選結構是由有機黏合劑和細顆粒 組成的雙組分體系;提供所述有機黏合劑以保證與下層的 黏合和黏合膜強度,和提供所述顆粒以產生表面不均勻 性。所述顆粒的優選含量為2〇〜95重量%、特別是5〇〜95 重里% ’基於所述黏合層的總重量。就透明性而言,優選 所述顆粒盡可能細。優選的體均粒徑為0.001〜0.2μηι、特 別疋〇.0〇5〜〇 1 。所述體均粒徑*5]·通過動態光散射方法 利用可得自Beckman Coulter,Inc.的粒度分析儀N4確定。優 選無機顇粒以提供具有膜強度的黏合層。 對所述無機顆粒的形狀沒有特別限制並且其包括球 201042281 形片狀、纖維狀、棒狀、無定形或者中空形狀。就分散 優選球形顆粒。對所述無機顆粒的材料也沒有特 别限制、優選無定形材料。優選金屬的氧化物、氮化物、 ^化物或者_化物’特別優選金屬氧化物。可用的金屬物 括他 K、Mg、Ca、Ba、A1、Zn、Fe、Cu、Ti、Sn、Desirably, the transparent substrate has a light transmittance of 80% or more, especially 86% or more, and a haze of not more than 2.0%, particularly 1.0% or less, and a refractive index of 1.4 to 1.7. The thickness of the transparent substrate is preferably, but not limited to, 30 to 200 μm, and more preferably 75 to 125 μm. Next, the high refractive index high hardness layer of the antireflection film of the present invention is formed by coating a combination comprising inorganic particles having a high refractive index, thermal or ionizing light-curing monomers, a polymerization initiator, and a solvent. Coating onto the transparent substrate; drying the coating film to remove the solvent; and curing the coating film by applying heat and/or ionizing radiation. The high refractive index high hardness layer thus formed is superior in adhesion to those formed by coating a polymer solution having a high refractive index and scratch resistance and drying the coating film. Preferably, a polyfunctional (fluorenyl) acrylate monomer and an anionic group-containing (fluorenyl) acrylate dispersant are added to the coating composition as described in U.S. Patent No. 6,210,858 to improve dispersion stability. Sex and cured film strength. The inorganic particles are preferably particles of y metal oxide selected from the group consisting of titanium, erbium, indium, zinc, tin and recorded oxides. The inorganic particles preferably have an average particle size of 1 to 10 (10) as measured by a C〇Ulter counter. Particles smaller than hnn have too large specific surface area and cannot be deficient in dispersion static stability. Particles larger than m can cause visible (four) scattering due to differences in refractive index with binders, resulting in higher haze levels. And the deterioration of transmittance. The haze of the high refractive index high hardness layer is preferably 3% or less, more preferably 10 201042281 is selected to be 1% or less. The anti-reflective (four) luminosity layer of the tree preferably includes a sharp-containing compound which is curable upon application of heat or ionizing radiation, and the low-refractive-index layer has a dynamic friction coefficient of U3 and a frequency of 95 to 12 〇. Contact angle with water. When the dynamic friction coefficient is greater than 0_15, the layer is easily scratched when wiped. When the water contact angle is less than 95, the layer is poorly resistant to fingerprint or oily soil contamination. The heat curing type or ionizing radiation curing type fluorine-containing compound includes a perfluoroalkyl group-containing decane compound (for example, (heptadecafluoro-U22 tetradecyl) diethoxy decane), and includes a fluorine-containing monomer and provides a fluorine-containing copolymer of a monomer capable of crosslinking a group. The fluorine-containing monomer providing the fluorine-containing polymer includes: a fluorine-olefin such as vinyl fluoride, vinylidene fluoride, tetrafluoroethylene, hexafluoropropylene, and ' Perfluoro-2,2-dimethyl-Udioxonol; partially or fully fluorinated alkyl (meth)acrylate, for example, Viscote 6FM (available from Osaka Organic Chemical Industry Ltd.) and M-2020 (available From Daikin Industries, 〇Ud.); and partial or complete fluorine Vinyl ether. Most preferred is hexafluoropropylene because the resulting polymer has a low refractive index and is easy to handle. The monomer capable of providing a crosslinking group includes a (fluorenyl group) having a crosslinkable group in its molecule. An acrylate monomer such as glycidyl methacrylate; and a (meth) acrylate monomer having a carboxyl group, a hydroxyl group, an amino group, a sulfonic acid group or the like, such as (mercapto)acrylic acid, hydroxymethyl (methyl) Acrylates, hydroxyalkyl (meth) acrylates and allyl acrylates. Particularly preferred are the latter group of monomers which are known to be capable of introducing a crosslinked structure after copolymerization (see JP A_10_25388 and JP-A-10-). 147739) 〇11 201042281 Impure materials "Polymers that can be used in combination with money monomers include, but are not limited to: (for example, such co-olefins, ethylene and dichloroethylene), and & propylene, Isoprene, 2-ethyl (5), methyl: acid acrylate, methyl acetoacetate, methyl propyl methacrylate, acetophenone derivative ( For example - private one is a thiophene styrene), ethylene is two:, = =, ethylene , 'Ethyl acetate · acid core and: = i small acrylamide (such as 'N_tert-butyl propylene hydride JF-A-10-25388 and jp_A_1 〇 _ 147739. The motorcycle can further include for improving slippery Moving and lowering the moving unit 2^, the material is modified to resist the sufficiency. For example, it is preferred to collect the banknotes so that the proposed (four) bis group = to =. Preferably, the ultrafine oxidized second particles are dispersed in the fluorine-containing conjugate. In order to improve the anti-scratch property, it is preferable that the low refractive index layer of the antireflection film of the present invention has a (four) refractive index, but the resistance decreases as the refractive index decreases. Therefore, the refractive index of the fluoropolymer and the amount of ruthenium dioxide particles to be added are optimized to achieve an optimum balance between scratch resistance and low refractive index. A commercially available cerium sol in an organic solvent or a dispersion prepared from a commercially available cerium oxide powder in an organic solvent may be added to the coating composition for the low refractive index layer. in. The ultrafine oxide particles preferably have an average particle size of 0.001 to 0. 2 μm, especially 12 201042281. 〇.〇01~0·〇5μηι, and a narrowest size distribution (single-split). The ultrafine oxide particles are appropriately added in an amount of 5 to 90% by weight, preferably 1 to 70% by weight, more preferably 1 to 5 % by weight based on the total weight of the low refractive index layer. The antireflection film of the present invention may further comprise an adhesive layer between the low refractive index layer and the high refractive index high hardness layer, or the high refractive index face hardness layer includes a component for the adhesive layer And the surface of the adhesive layer in contact with the lower side of the low refractive index layer has a center line average roughness (Ra) of 〇〇〇1~〇(9). The adhesive layer is a layer which exhibits excellent adhesion to both the upper layer and the lower layer. In the present invention, the upper layer (the layer directly disposed on the adhesive layer) is a low refractive material which generally has poor adhesion to another layer. The antireflection film of the present invention exhibits a very high scratch resistance due to the adhesion improving effect of the adhesive layer. The adhesive layer of the present invention is characterized by having a roughness on its surface. The adhesion layer is believed to provide a good anchorage for the low refractive index layer to provide improved adhesion. The adhesive layer preferably has a thickness of 0.001 to 〇.3 〇μπι, particularly _i~〇 〇2〇μηη, especially 0.001 to Ο.ΟΙΟμηη, so as not to affect the anti-reflection function based on light interference. If the center line average roughness (Ra) of the adhesive layer is too small, the adhesive layer loses the anchoring effect, and if the center line average roughness (Ra) of the adhesive layer is too large, it occurs at the interface Disturbance, which in turn adversely affects the anti-reflective performance based on optical interference. When the refractive index of the adhesive layer is the same as the refractive index of the low refractive index layer (upper layer), the thickness of the adhesive layer is selected such that the total thickness of the adhesive layer 13 201042281 layer and the low refractive index layer衧 is the initial design of the low refractive index layer. When the refractive index of the adhesive layer is the same as the refractive index of the lower layer, it is conceivable to select the thickness of the adhesive layer such that the total thickness of the adhesive layer and the lower layer may be the initial designed thickness of the lower layer. It is more desirable that the adhesive layer replaces the lower layer', i.e., the function of the underlying layer originally designed. That is, the adhesive layer can be used as an adhesive layer with a high refractive index layer, an adhesive layer plus a hard coating layer, or an adhesive layer plus an anti-glare layer. In such a case, the thickness of the adhesive layer should be the thickness that has been designed for each functional layer. The surface roughness of the adhesive layer is represented by a center line average roughness (Ra) determined in accordance with JIS B-0601. Ra was determined by analyzing the surface profile data measured by an atomic force microscope at an estimated length of 4 μm. This unevenness period is excluded from the data when the surface has anti-glare unevenness caused by the matting particles described hereinafter. There is no particular limitation on the material which can make the adhesive layer have the above Ra. A preferred structure for knowing the roughness of the surface is a two-component system composed of an organic binder and fine particles; the organic binder is provided to ensure adhesion to the underlayer and the strength of the adhesive film, and the particles are provided Produces surface unevenness. The particles are preferably present in an amount of from 2 to 95% by weight, particularly from 5 to 95% by weight, based on the total weight of the adhesive layer. In terms of transparency, it is preferred that the particles be as fine as possible. Preferably, the volume average particle diameter is 0.001 to 0.2 μm, and particularly 疋〇.0〇5 to 〇1. The volume average particle diameter *5] was determined by a dynamic light scattering method using a particle size analyzer N4 available from Beckman Coulter, Inc. Inorganic niobium is preferred to provide an adhesive layer having film strength. The shape of the inorganic particles is not particularly limited and it includes a ball 201042281 in the form of a sheet, a fiber, a rod, an amorphous or a hollow shape. The spherical particles are preferably dispersed. There is also no particular limitation on the material of the inorganic particles, and preferably an amorphous material. Preferably, the oxide, nitride, compound or compound of the metal is particularly preferably a metal oxide. Available metals include K, Mg, Ca, Ba, A1, Zn, Fe, Cu, Ti, Sn,

In、w、γ、 、Mn、Ga、v、Nt)、Ta、Ag、Si、B、Bi、 M〇、Ce、ph t>In, w, γ, Mn, Ga, v, Nt), Ta, Ag, Si, B, Bi, M〇, Ce, ph t>

να、Be、Pb和Ni。對使用所述無機顆粒的方式沒 沒、限制。例如,所述顆粒可以乾燥狀態添加或者以分 政在水巾或有機溶射的狀態添加。 為了抑制所述無機顆粒的團聚或者沉降,優選組合使 。刀散%定劑。可用的分散穩定劑包括聚乙烯醇、聚乙烯 、、-綱纖維素讨生物、聚醢胺、磷酸s旨、聚謎、表面 、眭劑、矽烷偶聯劑和鈦偶聯劑。具體而言,優選使用矽 、元偶^劑’其將能與有機黏合劑共聚的官能團引入到所述 、機顇粒的表面’從而產生強的固化膜。例如,乙烯基三 氣基矽烷、γ-甲基丙烯醯氧丙基三甲氧基矽烷等對於能 句通過乙烯基的自由基聚合而固化的有機黏合劑是有效 ―,γ-縮水甘油氧基丙基·三甲氧基矽烷等對於能夠通過環 虱基團的陽離子聚合而固化的有機黏合劑是有效的。雖然 1限制,但是優選地以相對於100重量份的所述無機顆粒 為至少1重量份的量添加作為分散穩定劑的矽烷偶聯劑。可 在添加前使所述矽烷偶聯劑水解,或者可使所述矽烷偶聯 蜊與所述無機顆粒混合,之後進行水解和縮合。優選後一 添加方法。 15 201042281 要用在所述黏合層中的有機黏合劑應提供與所述下層 的優異黏附力並且具有形成堅固的膜的能力。為了滿足這 些要求,優選具有飽和烴或者聚醚作為主鏈的聚合物。更 優選具有飽和烴作為主鏈的聚合物。還優選所述黏合劑聚 合物具有交聯結構。 優選所述具有飽和烴作為主鏈的黏合劑聚合物包括烯 屬不飽和單體。具有飽和烴鏈作為主鏈且具有交聯結構的 黏合劑聚合物包括含有每個分子具有兩個或者更多個烯屬 不飽和基團的單體的均聚物或者共聚物。為了獲得高折射 率的黏合層,優選使用具有兩個或者更多個烯屬不飽和基 團和芳環或者至少一個選自除氟之外的鹵素、硫、磷和氮 的原子的單體。 具有兩個或者更多個烯屬不飽和基團的單體的實例包 括多元醇和(曱基)丙烯酸之間的酯,例如乙二醇二(甲基)丙 烯酸酯、1,4-環己二醇二丙烯酸酯、季戊四醇四(甲基)丙烯 酸酯、季戊四醇三(甲基)丙烯酸酯、三羥甲基丙烷三(曱基) 丙烯酸酯、三羥曱基乙烷三(甲基)丙烯酸酯、二季戊四醇四 (甲基)丙烯酸酯、二季戊四醇五(曱基)丙烯酸酯、二季戊四 醇六(甲基)丙烯酸酯、1,2,3-環己三醇三甲基丙烯酸酯、聚 氨醋聚丙稀酸S旨、和聚醋聚丙稀酸醋;乙稀基苯和其衍生 物,例如1,4-二乙烯基苯、4-乙烯基苯甲酸2-丙烯醯基乙 酯、和1,4-二乙烯基環己酮;乙烯基砜(例如,二乙烯基颯)、 丙烯醯胺(例如,亞曱基雙丙烯醯胺)、和甲基丙烯醯胺。 提供高折射率黏合劑的單體的實例有雙(4-曱基丙烯醯 16 201042281 基硫代苯基)硫醚、乙烯基萘、乙烯基笨基硫醚和4_曱基丙 烯醯氧基笨基-4’-甲氧基苯基硫醚。在光自由基引發劑或者 熱自由基引發劑的存在下、通過施加電離輻射或者熱使所 述具有烯屬不飽和基團的單體聚合。 具有聚醚作為主鏈的黏合劑聚合物優選地包括多官能 環氧化合物的開環聚合物。多官能環氧化合物的開環聚合 可在光致產酸劑或者熱致產酸劑的存在下、通過施加電離 0 輻射或者熱而進行。 具有能交聯官能團的單體可代替具有兩個或者更多個 烯屬不飽和基團的單體使用或者除了使用具有兩個或者更 多個烯屬不飽和基團的單體之外還可使用具有能交聯官能 ' 團的單體,以引入所述能交聯的官能團,所述能交聯的官 ^ 能團發生反應以將交聯結構引入到黏合劑聚合物中。能交 聯的官能團包括異氰酸酯基團、環氧基團、吖丙啶基團、 噁唑啉基團、醛基、羰基、肼基、羧基、羥甲基和活性亞 Q 甲基。乙烯基磺酸、酸酐、氰基丙烯酸酯衍生物、三聚氰 胺、醚化的羥甲基化合物、酯、氨基甲酸酯、和金屬烷氧 基化合物如四甲氧基矽烷也可用作用於引入交聯結構的單 體。也可使用分解後顯現交聯能力的官能團例如被封端的 異氰酸酯基團。即,所述能交聯的官能團可為隨時可以反 應的基團或者由於分解而顯示出反應性的基團。在將具有 上述能交聯的官能團的黏合劑聚合物塗布為膜之後對其進 行加熱以形成交聯結構。 所述黏合層中的空隙通過空隙體積(體積表示’其由 17 201042281 所述黏合層的折射率和基於所述黏合層的組成計算的折射 率=間的差值除以所述黏合層中包含的空氣的折射率(折 ^ )而獲知。空隙體積也可通過在透射電子顯微鏡 下觀察所述層的切片而獲得。本發明的黏合層優選具有0.5 〜3〇體積%、特別是1〜25體積%的空隙體積。所述空隙體 積的優選下_紐所述缺效果的錄,並且優選的上 :為保證黏合層強度的極值。對可使所述黏合層具有上述 空隙體積的材料沒有特別限制。用於獲得以上空隙體積的 優選結構是由有機黏合劑和細顆粒組成的雙组分體系;所 述有機黏合劑用於保證與下層的黏附力和黏合層強度,所 述顆粒用於在它們之間製造空隙。所述顆粒的優選含量為 60 95重量%、特別是8〇〜95重量%。就透明性而言,優選 所述顆粒盡可能地細。優選的體均粒徑為〇 〇〇1〜〇 2pm、 特別是0.005〜Ο.ΐμπι。該實施方式中所使用的有機黏合劑 和顆粒的種類與對其中所述黏合層具有特sRa的實施方式 所描述的那些相同。 如果需要,本發明的抗反射膜可具有硬塗覆層、向前 散射層(forward-scattering layer)、抗靜電層和/或保護層。 本發明的抗反射膜具有104〜1〇10的抗靜電指數。 提供所述硬塗覆層以使所述透明基底抗刮傷。其還起 到使所述透明基底和所述上層之間的黏附力增強的作用。 所述硬塗覆層優選通過如下方法形成:塗布包括多官能丙 稀酸類單體、氨基甲酸酯丙稀酸酯、環氧丙稀酸酯等的低 聚物、聚合引發劑和溶劑的塗覆組合物,所述塗覆組合物 18 201042281 可含有無機_(例如二氧切或者氧化妳乾燥 和通過施加鮮/或電離_而使所述塗覆 層口化。所柄塗„的厚錢選桃H帅 1〜,m、特別優選―。所述硬塗覆層的二:; 刚物椒高,=3 ^更:應綱_率峨u〜L6、特 厂Μ吨,又里復Να, Be, Pb and Ni. There is no limitation or limitation on the manner in which the inorganic particles are used. For example, the particles may be added in a dry state or added in a state of water towel or organic spray. In order to suppress agglomeration or sedimentation of the inorganic particles, it is preferred to combine them. Knife loose % fixative. Useful dispersion stabilizers include polyvinyl alcohol, polyethylene, - cellulose, polyamine, phosphoric acid, polymymy, surface, an anthraquinone, a decane coupling agent, and a titanium coupling agent. Specifically, it is preferred to use a ruthenium, a geminal agent which introduces a functional group copolymerizable with an organic binder to the surface of the granules of the granules to produce a strong cured film. For example, vinyl trioxodecane, γ-methacryloxypropyltrimethoxydecane, etc. are effective for organic binders which can be cured by radical polymerization of vinyl groups, γ-glycidoxypropyl c The base trimethoxy decane or the like is effective for an organic binder which can be cured by cationic polymerization of a cyclic sulfonium group. Although 1 is limited, it is preferable to add a decane coupling agent as a dispersion stabilizer in an amount of at least 1 part by weight with respect to 100 parts by weight of the inorganic particles. The decane coupling agent may be hydrolyzed prior to the addition, or the decane-coupled hydrazine may be mixed with the inorganic particles, followed by hydrolysis and condensation. The latter addition method is preferred. 15 201042281 The organic binder to be used in the adhesive layer should provide excellent adhesion to the underlayer and have the ability to form a strong film. In order to satisfy these requirements, a polymer having a saturated hydrocarbon or a polyether as a main chain is preferred. More preferred are polymers having a saturated hydrocarbon as a main chain. It is also preferred that the binder polymer has a crosslinked structure. Preferably, the binder polymer having a saturated hydrocarbon as a main chain includes an ethylenically unsaturated monomer. A binder polymer having a saturated hydrocarbon chain as a main chain and having a crosslinked structure includes a homopolymer or a copolymer containing a monomer having two or more ethylenically unsaturated groups per molecule. In order to obtain a high refractive index adhesive layer, it is preferred to use a monomer having two or more ethylenically unsaturated groups and an aromatic ring or at least one atom selected from halogen, sulfur, phosphorus and nitrogen other than fluorine. Examples of the monomer having two or more ethylenically unsaturated groups include an ester between a polyhydric alcohol and (mercapto)acrylic acid, such as ethylene glycol di(meth)acrylate, 1,4-cyclohexane Alcohol diacrylate, pentaerythritol tetra(meth)acrylate, pentaerythritol tri(meth)acrylate, trimethylolpropane tris(decyl) acrylate, trihydroxydecylethane tri(meth)acrylate, Dipentaerythritol tetra(meth)acrylate, dipentaerythritol penta(indenyl)acrylate, dipentaerythritol hexa(meth)acrylate, 1,2,3-cyclohexanetriol trimethacrylate, polyurethane polypropyl acetate Dilute acid S, and polyacetal polyacetic acid vinegar; ethylene benzene and its derivatives, such as 1,4-divinylbenzene, 2-propenylethyl 4-vinylbenzoate, and 1,4 - Divinylcyclohexanone; vinyl sulfone (for example, divinyl fluorene), acrylamide (for example, fluorenylene bis decyl amide), and methacrylamide. Examples of monomers providing a high refractive index binder are bis(4-mercaptopropene 16 201042281 thiophenyl) sulfide, vinyl naphthalene, vinyl strepazine sulfide, and 4-mercaptopropenyloxyl Stupid-4'-methoxyphenyl sulfide. The monomer having an ethylenically unsaturated group is polymerized by application of ionizing radiation or heat in the presence of a photoradical initiator or a thermal radical initiator. The binder polymer having a polyether as a main chain preferably comprises a ring-opening polymer of a polyfunctional epoxy compound. The ring-opening polymerization of the polyfunctional epoxy compound can be carried out by applying ionizing 0 radiation or heat in the presence of a photoacid generator or a thermal acid generator. A monomer having a crosslinkable functional group may be used in place of a monomer having two or more ethylenically unsaturated groups or in addition to a monomer having two or more ethylenically unsaturated groups. A monomer having a crosslinkable functional group is used to introduce the crosslinkable functional group, and the crosslinkable functional group reacts to introduce a crosslinked structure into the binder polymer. The functional group capable of crosslinking includes an isocyanate group, an epoxy group, an aziridine group, an oxazoline group, an aldehyde group, a carbonyl group, a thiol group, a carboxyl group, a hydroxymethyl group, and an active sub-Q methyl group. Vinylsulfonic acid, anhydride, cyanoacrylate derivative, melamine, etherified methylol compound, ester, carbamate, and metal alkoxide such as tetramethoxynonane can also be used for introducing crosslinks The monomer of the structure. A functional group which exhibits cross-linking ability after decomposition, for example, a blocked isocyanate group can also be used. Namely, the crosslinkable functional group may be a group which can be reacted at any time or a group which exhibits reactivity due to decomposition. After the binder polymer having the above-mentioned crosslinkable functional group is coated as a film, it is heated to form a crosslinked structure. The voids in the adhesive layer are divided by the void volume (volume representation 'the difference between the refractive index of the adhesive layer described by 17 201042281 and the refractive index calculated based on the composition of the adhesive layer= divided by the inclusion in the adhesive layer The refractive index of the air is obtained by folding the void volume. The void volume can also be obtained by observing the slice of the layer under a transmission electron microscope. The adhesive layer of the present invention preferably has 0.5 to 3 vol%, especially 1 to 25体积% void volume. The void volume is preferably described below, and preferably is: an extreme value for ensuring the strength of the adhesive layer. There is no material that can make the adhesive layer have the void volume described above. Particularly limited. A preferred structure for obtaining the above void volume is a two-component system composed of an organic binder and fine particles for ensuring adhesion to the underlayer and strength of the adhesive layer, the particles being used for A void is formed between them. The preferred content of the particles is 60 95% by weight, in particular 8 to 95% by weight. In terms of transparency, it is preferred that the particles are as fine as possible. The volume average particle diameter is 〇〇〇1 to 〇2 pm, particularly 0.005 Ο.ΐμπι. The types of organic binders and particles used in this embodiment are described in the embodiment in which the adhesive layer has a specific sRa. Those which are the same. If necessary, the antireflection film of the present invention may have a hard coat layer, a forward-scattering layer, an antistatic layer, and/or a protective layer. The antireflection film of the present invention has 104 to 1 Antistatic index of 〇 10. The hard coating layer is provided to make the transparent substrate scratch resistant. It also serves to enhance the adhesion between the transparent substrate and the upper layer. The coating layer is preferably formed by coating a coating composition comprising an oligomer of a polyfunctional acrylic monomer, a urethane acrylate, a propylene acrylate, a polymerization initiator, and a solvent, The coating composition 18 201042281 may contain inorganic _ (for example, dioxin or yttria dried and the coating layer is made by applying fresh/ion ionization _. 1~, m, particularly preferred ―. The second layer of the coating:; the material is high in pepper, = 3 ^ more: should be the _ rate 峨 u ~ L6, special plant Μ ton, and again

一 ν 又0仿一氧化矽的盔播爲 ,^ 具有飽和烴或者聚醚作為主鏈的聚合物的有機層或= 括無機化合物和有機化合物的私物的混雜層。特別優選 由具有飽和轉為主鏈的聚合物製成的層。所述聚人物優 選地具有詞結構。所述具有糾烴作為主鏈的以物優 選地通過使烯屬不齡單體聚合而製備。優選㈣^兩 個或者更多個關不飽和基團的單㈣提供转的黏合劑 聚合物。 具有兩個或者更多個晞屬不飽和基團的單體的實例包 括:多元醇和(甲基)丙烯酸之間的酯,例如乙二醇二(甲々 丙烯酸醋 ' 丨,4-環己二醇二丙烯_、季細軸(甲基)土丙 烯酸醋、季戊四醇三(甲基)丙埽_旨、三經甲基丙院三(甲 基)丙稀酸酷、三經甲基乙院三(甲基)丙稀酸醋、二季:四 醇四(甲基)丙烯酸醋、三季戊四醇五(甲基)丙稀酸醋、季戊 四醇六(曱基)丙烯_、u,3_環己三醇三甲基丙稀酸醋、 ?《氨醋聚丙稀_、和聚S旨聚⑽_ ;乙烯基笨和其衍 生物,例如1’4-二乙·笨、4义稀基笨甲酸2_丙烯醯基乙 19 201042281 醋、和1,4-二乙稀基環己酮;乙稀基礙(例如,二乙烤基礙)、 丙烯醯胺(例如,亞甲基雙丙烯醢胺)、和甲基丙烯醯胺。 具有烯屬不飽和基團的單體在濕法塗覆後通過電離輻 射誘導的或者熱誘導的聚合而固化。具有聚醚作為主鏈的 聚合物優選通過多官能環氧化合物的開環聚合而合成。可 使用具有能交聯的官能團的單體代替具有兩個或者更多個 烯屬不飽和基團的單體,或者除了使用具有兩個或者更多 個烯屬不飽和基團的單體之外還可使用具有能交聯的官能 團的單體’以將交聯結構引入到黏合劑聚合物中。能交聯 的官能團包括異氰酸酯基團、環氧基團、吖丙啶基團、噁 °坐琳基團、搭基、羰基、肼基、叛基、經甲基和活性亞甲 基。乙烯基續酸、酸gf、氰基丙稀酸g旨衍生物、三聚氰胺、 醚化的羥甲基化合物、酯、氨基甲酸酯和金屬烷氧基化合 物如四甲氧基矽烷也可用作用於引入交聯結構的單體。也 可使用具有由於分解而顯現出交聯能力的官能團的化合 物,例如具有被封端的異氰酸酯基團的化合物。在將具有 上述能父聯官能團的黏合劑聚合物濕法塗布為膜後通過施 加熱等使其交聯。4 所述硬塗覆層可含有無機顆粒以調整折射率或者提高 膜強度。優選使用具有0_001〜〇·5μιη、特別是〇 〇〇1〜〇 2叫 平均粒度的無機顆粒。合適的無機顆粒為二氧化矽、二氧 化鈦、氧化銘、氧化錫、碳酸約、硫酸鋇、滑石、高嶺土 和硫酸朗顆粒。特別優選二氧化碎、二氧化鈦和氧化銘 的顆粒。所述無機顆粒優選以基於所述硬塗覆層的⑴〜卯 20 201042281 重置%、特別是2〇〜看署%、士,廿θ 洲重直々尤其是3〇〜6〇重量%的量添 加。 在應用於LCD時設置向前散射層以使垂直*水準兩個 方向上的視角變寬。含有具有不同折射率的細顆粒的上述 硬塗覆層可起到向前散射層的作用。 當通過濕法塗覆形成的本發明的多層抗反射膜具有表 面不均勻性以呈現防眩光性質(使觀察者背景(W,s 〇 baekg_d)狀射_)時,料_成在基底上的抗反射 I進行㈣比在具有表面糾㈣的層上形成含有消光顆 粒等的抗反射層來製造表面不均勻性更為合意。前-方法 實現了膜厚度的更好均勻性,導致改善的抗反射性能。 - 構成杬反射層的各層可通過各種濕法塗覆技術例如浸 • 潰塗覆、氣刀塗覆、幕塗、輥塗、繞線棒控塗覆(wire bar coating)、凹版塗布、微凹版塗覆和擠塗(參見美國專利 No.2,681,294)形成。優選微凹版塗覆和凹版塗覆以使鋪展 Q 最小化從而降低乾燥不均勻性。優選凹版塗覆以保證橫向 上的厚度均勻性。可同時形成兩個或更多個層。對於同時 塗覆’可參見美國專利2,761,791、2 941 898、3,508,947和 3,526,528和 Yuji Harasaki, Coating Kogaku, ρ.253,Asakura Shoten (1973)。 使用本發明抗反射膜的偏振板包括至少一層本發明的 抗反射膜。當使用根據本發明的抗反射膜作為偏振片的表 面保護層(保護層)之一以製造偏振板時,所述透明基底與所 述抗反射層(所述低折射率層)側相反的一側應使用域進行 21 201042281 息化。用域進行皂化可根據以下過程(1)和(2)中的任一個進 行: (1) 將其上形成有低折射率層的透明基底浸潰在鹼性溶 液中至少一次以使所述基底的背面皂化。 (2) 用鹼性溶液塗覆所述透明基底的與其上要形成低折 射率層的一側相反的一側,所述塗覆在形成所述低折射率 層的同時或者之後進行;並且對經塗覆的基底進行加熱, 然後用水洗滌和/或對其進行中和以僅使所述抗反射膜的 背面皂化。 過程(1)的優越之處在於其在與通用的三醋酸纖維素膜 相同的處理步驟中進行。然而,過程(1)涉及這樣的缺點: 不僅基底的背面而且所述抗反射層側均被水解,這可導致 抗反射層的劣化;和鹼性處理溶液殘留在所述抗反射層上 造成汙跡。在這樣的缺點成為問題的情況下,合意的是按 照包括特定步驟的過程(2)來進行。 所述偏振片包括基於破的偏振片、二色性染料偏振片 和多烯型偏振片。通常通過在拉伸之前或者之後對聚乙稀 醇(PVA)膜進行染色而製備所述基於碘的偏振片和所述— 色性染料偏振片。通常使用通過使聚乙酸乙歸酿息化而製 備的PVA。也可使用改性的PVA。PVA膜的染色可通、㈠立 方式進行,所述方式例如浸潰在蛾-蛾化鉀水溶液中。 刮塗(spread coating)、或者用峨溶液或染料溶液進嗔 在拉伸P VA膜時’優選使用用於使P VA交聯的添加劑例如 酸化合物。優選所述偏振板在550nm波長下斗有% 22 201042281 特別是35〜50%的透光率,並且在550nm波長下具有90〜 100%、特別是95〜1〇〇%、尤其是99〜100%的偏振度。 其一側上具有本發明的抗反射膜作為保護膜的偏振板 適合應用於TN模式、STN模式、VA模式、IPS模式或者OCB 模式的透射、反射或者半透射型LCD。在應用於透射或半 透射型LCD時,當與可商購得到的增亮膜組合時,所述偏 振板保證較高的可視性,所述增亮膜即具有偏振光選擇層 的偏振光束分離膜,例如可得自Sumitomo 3M Ltd的 DBEF(雙重增亮膜)。所述偏振板可與1/4波長片組合以提供 用於有機ELD的起到使來自表面和内部的反射光減少的作 用的表面保護板。具有聚對苯二甲酸乙二醇酯(pET)膜或聚 萘二甲酸乙二醇酯(PEN)膜作為透明基底的本發明的抗反 射膜適用於諸如PDP和CRT這樣的圖像顯示裝置。 本領域技術人員明晰,本發明可適用於包括以上抗反 射膜的顯示裝置和包括上述偏振板的顯示裝置。 下文中,將具體描述本發明的優選實施方式。 1 .高折射率的高硬度層的製備 1.1高折射率的高硬度層 如上所述’作為本發明抗反射膜的必要薄層的高折射 率的高硬度層具有1.50〜1.60、更優選1.52〜1.56的折射 率。為了製造高折射率的高硬度層,雖然可使用通過化學 氣相沉積(CVD)或者物理氣相沉積(pVD)特別是歸類為 PVD技術的真空沉積或者濺射所形成的無機氧化物的透明 薄層,但是優選通過全濕法塗覆所形成的薄層。 23 201042281 所述高折射率的高硬度層優選通過如下方法形成:對 塗覆組合物進行塗布,所述塗覆組合物包括:具有選自鈦 (Ti)、鍅(Zr)、銦(In)、鋅(Zn)、錫(Sn)、鋁(A1)和銻(Sb)的氧 化物中的至少一種金屬氧化物的無機細顆粒,陰離子分散 劑,具有至少三官能的能聚合基團的固化樹脂(在下文中也 稱為“黏合劑”),聚合引發劑,以及溶劑;對塗覆膜進行乾 燥以除去所述溶劑;和通過施加熱和電離輻射中的至少一 種而使所述塗覆膜固化。當使用所述固化樹脂或者引發劑 時,由於使所述固化樹脂在塗覆之後通過熱的施加或者電 離輻射的作用進行聚合反應而固化,因此形成了具有優異 的抗刮傷性和黏附性的高折射率的高硬度層。 1.2無機細顆粒 對於無機細顆粒,優選金屬(例如Ti、Zr、In、Zn、Sn、 Sb、Al)氧化物,尤其是就較好的折射率而言最優選氧化 錯。然而,就電導率而言,優選使用具有Sb、In和Sn中的 至少一種金屬的氧化物作為主要組分的無機細顆粒。可通 過改變所述無機細顆粒的量而將折射率調節至一定範圍。 當使用氧化锆作為主要組分時,所述層内的無機細顆粒的 平均粒徑優選為1〜120nm、更優選為1〜60nm、最優選為2 〜40nm。優選該直徑範圍,因為其使霧度降低並且改善了 分散穩定性以及與表面具有適當不均勻性的上層的黏附 力。用於本發明的包括氧化鍅作為組分的無機細顆粒具有 優選1.90〜2.80、更優選2.10〜2.80、且最優選2.20〜2.80 的折射率。待添加的無機細顆粒的量取決於待加入所述無 24 201042281 機顆粒的層,並且待加入所述高折射率層中的量為基於整 個高折射率層的粉末固體的40〜85重量%、優選50〜75重 量%、且更優選60〜70重量%。所述無機細顆粒的粒徑可通 過光散射方法或者由透射電子顯微鏡(TEM)得到的照片進 行確定。所述無機細顆粒的比表面積優選為10〜400m2/g、 更優選為20〜200m2/g、最優選為30〜150m2/g。 為了使在塗覆溶液或者分散劑溶液中的分散穩定或者 為了改善對黏合劑組分的親和性或者與黏合劑組分的結合 〇 性能,可對所述無機細顆粒進行物理表面處理例如等離子 體放電處理或者電暈放電處理,或者使用表面活性劑、偶 聯劑等進行化學表面處理。優選使用偶聯劑。烧氧基金屬 - 化合物(例如矽烷偶聯劑和鈦偶聯劑)作為所述偶聯劑。具體 而言,使用具有丙烯醯基或者甲基丙烯醯基的矽烷偶聯劑 進行的處理是有效的。在專利檔JP-A-2006-17870的第[0058] 〜[008 3 ]段中描述了所述無機細顆粒的化學表面處理劑、溶 0 劑、催化劑和分散穩定劑。 1.3固化樹脂 優選使用能聚合的化合物作為固化樹脂,並且優選使 用電離輻射固化型多官能單體或者多官能低聚物作為所述 能聚合的化合物。作為這樣的化合物的官能團的實例,優 選能光聚合、能電子束聚合或者能輻射聚合的官能團,並 且進一步優選能光聚合的基團。 能光聚合的官能團的實例包括不飽和的能聚合的官能 團,例如(甲基)丙烯酸類基團、乙烯基、苯乙烯基團和烯丙 25 201042281 基。在這樣的基團中,優選(甲基)丙烯酸類基團。 具有能光聚合官能團的能光聚合的多官能單體的具體 J匕括亞燒基一醇的二(甲基)丙稀酸醋,例如新戍二醇 丙烯酸酯' 1,6-己二醇(甲基)丙烯酸酯和丙二醇二(甲基)丙 烯酸S曰,聚氧化亞烧基二醇的二(甲基)丙烯酸酯,例如三甘 醇二(甲基)丙烯酸酯、一縮二丙二醇二(甲基)丙烯酸酯、聚 乙一醇二(甲基)丙烯酸酯和聚丙二醇二(曱基)丙烯酸酯;多 兀醇的二(甲基)丙烯酸酯,例如季戊四醇二(甲基)丙烯酸 S曰,和%氧乙烷或者環氧丙烷加合物的二(甲基)丙烯酸酯, 例如2,2-雙{4-丙烯醯氧基·二乙氧基)苯基}丙烷和2,2_雙 {4-(丙烯醯氧基.多丙氧基)苯基}丙烷。 另外,優選使用環氧(甲基)丙烯酸酯、氨基甲酸酯(甲 基)丙烯酸酯和聚酯(曱基)丙烯酸酯作為能光聚合的多官能 單體。 其中,優選多元醇和(曱基;)丙烯酸酯,並且更優選每個 为子具有二個或更多個(曱基)丙烯酸類基團的多官能單 體。這樣的多官能單體的具體實例包括:三㈣基丙烧三 (甲基)丙稀酸醋、2經曱基乙烧三(甲基)丙稀酸醋、124_ %己二醇二(甲基)丙烯酸酯、五甘油三丙烯酸酯 (PentaglyCer〇l triacrylate)、季戊四醇四(曱基)丙烯酸酯季 戊四醇三(甲基)丙稀_、二季戊四醇三丙烯㈣、二季戊 四醇五丙烯酸醋、二季戊四醇四(甲基)丙稀酸醋、二季戍四 醇六(曱基)丙稀酸I三φ細醇三丙_自旨和三季戊四醇 六丙烯酸酯。也可組合使用兩種或者更多種的多官能單 26 201042281 體。可在一定範圍内調節待使用的固化樹脂的量以滿足上 述各層的折射率。 1.4聚合引發劑 作為聚合引發劑’優選使用光聚合引發劑。對於光聚 合引發劑’優選光自由基聚合引發劑或者光陽離子聚合引 發劑,並且更優選光自由基聚合引發劑。 光自由基聚合引發劑的實例包括苯乙酮、二苯甲酮、 苯甲酿基本甲酸酉旨(benzoyl benzoate)Michler<207>、α-戊基 肟酯、一硫化四曱基秋蘭姆和嘆》頓酮。市場上可得到的光 自由基聚合引發劑的實例包括:由Nippon Kayaku Co.,Ltd. 製造的KAYACURE(例如DETX-S、BP-100、BDMK ' CTX、 BMS、2-EAQ、ABQ、CPTX、EPD、ITX、QTX、BTC、 MCA);由Ciba Specialty Chemicals Corp.製造的Irgacure(例 如 651、184、127、500、907、369、1173、2959、4265 ' 4263);和由 Sartomer Company Inc.製造的 Esacure(KIP100F、KB1、EB3、BP、X33、KT046、KT37、 KIP150、TZT)。尤其優選光致斷裂型光自由基聚合引發劑。 在 Technical Information Institute Co.,Ltd 的 ‘Recent UV Curing Techniques’(Kazuhiro Takausu發行)(1991)的第 159頁 描述了光致斷裂型光自由基聚合引發劑。市場上可得到的 光致斷裂型光自由基聚合引發劑的實例包括Ciba sPecialty Chemicals Corp.製造的 Irgacure(例如651、184、127、907)。 相對於100重量份的所述固化樹脂’要使用的光聚合引發劑 的量優選為0.1〜15重量份、更優選為1〜10重量份。 27 201042281 除了所述光聚合引發劑之外’可使用光促進劑 (photo-accelerator)。所述光促進劑的具體實例包括正丁基 胺、三乙胺、三正丁基膦、噻噸酮和米蚩酿1。市場上可得 到的光促進劑的實例包括Nippon Kayaku Co.,Ltd製造的 KAYACURE(例如DMBI和EPA)。 所述光聚合反應優選通過在塗覆和乾燥所述高折射率 的高硬度層之後照射紫外線而進行。除了上述組分(例如, 無機細顆粒、固化樹脂、聚合引發劑、光促進劑)之外,也 可向所述高折射率的高硬度層中添加表面活性劑、抗氧化 劑、偶聯劑、增黏劑、抗著色劑(antic〇l〇ring agent)、著色 劑(例如染料)、消泡劑、流平劑、耐熱試劑(heat resistam agent)、紫外線吸收劑、紅外線吸收劑、賦予黏附力的試劑、 阻聚劑、抗氧化劑、表面改性劑、導電金屬細顆粒等。 1.5溶劑 作為溶劑,優選使用具有6〇〜17〇t彿點的液體。所述 溶劑的具體實例包括水、醇(例如曱醇、乙醇、異丙醇、丁 醇、苄醇)、酮(例如丙酮、帘 甲基.乙基酮、甲基·異丁基酮、 環己酮)、酯(例如乙酸甲黯、 9 乙酸乙酯、乙酸丙酯、乙酸丁 酯、甲酸甲酯、甲酸乙酯、田 甲酸丙酯、甲酸丁酯)、脂族烴 (例如,己烷、環己烷)、鹵枠 Q代烴(例如,二氯甲烷、氯仿、 四氯化碳)、芳族烴(例如,笼 m _ 未甲本、一甲本)、酿胺(例如, 二甲基甲醯胺、二曱基乙醯脸l &胺、N-甲基吡咯烷酮)、醚(例如, 二乙鍵、二氧六環、四氫七南)和醚醇(例如,1-甲氧基-2-丙醇)。其中,優選甲苯、二甲苯、甲基.乙基酮、甲基.異 28 201042281 丁基酮、環己酮和丁醇。具體而言,更優選曱基.乙基_、 曱基.異丁基酮和環己_。 使用上述溶劑使得用於所述高折射率層的塗覆組合物 的固體含量的量優選為2〜3〇品質%、更優選為3〜2〇品 %。 ' 1.6兩折射率的南硬度層的製備 用於高折射率的高硬度層的包括氧化錯作為主要組分 0 的無機細顆粒優選以分散狀態使用以製備所述高折射率的 高硬度層。通過使用分散器使所述無機細顆粒分散。分散 器的實例包括砂磨機(例如,具有銷棒(pin)的珠磨機)、高速 葉輪式研磨機、礫磨機、輥磨機、超微磨碎機和膠體磨。 * 其中’優選砂磨機和高速葉輪式研磨機。而且,可進行預 ' 先分散處理。用於預先分散處理的分散器的實例包括球磨 機、三輥磨、捏合機和擠出機。 無機細顆粒優選地分散在分散介質中以具有儘量小的 Ο 粒度。質均粒度為10〜12〇nm、優選為20〜l00nm、更優選 為30〜90nm、還更優選為3〇〜8〇nm。通過將無機細顆粒分 散至20〇nm或者更小的小粒度,可形成高折射率的高硬度層 而不損害透明性。 本發明中使用的高折射率的高硬度層優選通過如下方 法形成。優選將形成基體所必需的作為黏合劑前體的固化 樹脂(例如上述的能電離輻射固化的多官能單體或者多官 能低聚物)、光聚合引發劑等添加到以上通過將所述無機二 顆粒分散在分散介質中而獲得的分散溶液中,以製備用於 29 201042281 形成高折射率層或者中間折射率層的塗覆組合物,並且將 所獲得的用於形成高折射率層或者中間折射率層的塗覆組 合物塗覆在透明載體上並且使其通過交聯反應或者聚合反 應固化。在塗覆所述高折射率的高硬度層的同時或者之 後,優選使該層的黏合劑與所述分散劑交聯或者聚合。由 此產生的用於高折射率層或者中間折射率層的黏合劑採取 如下形式:由於上述優選分散劑和能電離輻射固化的多官 能單體或者低聚物之間的交聯或者聚合反應,所述分散劑 的陰離子基團結合到所述黏合劑中。此外,結合到所述高 折射率層或者中間折射率層的黏合劑中的陰離子基團具有 維持無機細顆粒分散狀態的功能,並且交聯或者聚合結構 賦予所述黏合劑以成膜能力,結果,改善了含有所述無機 細顆粒的高折射率的高硬度層的物理強度和對化學品和氣 候的对受性。 在所述高折射率的高硬度層的形成中,固化樹脂的交 聯或者聚合反應優選地在ίο體積%或者更少氧氣濃度的氣 氛中進行。通過在10體積%或者更少氧氣濃度的氣氛中形 成高折射率的高硬度層,可改善所述高折射率的高硬度層 的物理強度和對化學品和氣候的耐受性,此外還改善所述 高折射率的高硬度層和與所述高硬度層相鄰的層之間的黏 附力。 優選通過在6體積%或者更低、更優選4體積%或者更 低、還更優選2體積%或者更低、且最優選1體積%或者更低 氧氣濃度的氣氛中進行所述固化樹脂的交聯或者聚合反應 30 201042281 而形成所述馬折射率的高硬度層。 所述间折射率的高硬度層的厚度優選為0.1〜2〇 優選為2〜8,。更具體而言,為了滿足所述高折射:的f 硬度層的料和折㈣,對所述細娜和樹㈣種類進= 選擇並立確定其混合比以製備主體組合物。 仃 2.低折射率層的製備 2.1低折射率層 根據本發明的抗反射膜的低折射率層具有優選為131 〜1.40、更優選為1.38或者更低的折射率。優選該數值範 圍,因為可降低折射率並且同時保持膜強度。在低折射率 層的形成中’雖然通過化學氣相沉積(CVD)或者物理氣相沉 積(PVD)、特別是歸類為PVD技術的真空沉積或者濺射形成 的無機氧化物的透明薄膜可類似地用於以上描述,但是優 選使用全濕法塗覆方法,所述全濕法塗覆方法利用用於形 成下文中所述的低折射率層的塗覆組合物。優選所述低折 射率層含有無機細顆粒’並且優選在這樣的無機細顆粒中 至少一種無機細顆粒為中空顆粒,並且更優選含有二氧化 矽作為主要組分的中空顆粒(下文中也稱為“中空二氧化矽 顆粒° 這種低折射率層的厚度優選為90〜130nm、且更優選 為 1〇〇 〜120nm。 所述低折射率層的霧度優選為3%或者更低、更優選為 2%或更低、最優選為或更低。 形成有最高至所述低折射率層的層的抗反射膜的強度 31 201042281 優選為Η或者更高、更優選為2H或者更高、且最優選為3h 或者更高,所述強度通過鉛筆硬度測試在500g載荷下測定。 為了改善所述抗反射膜對指紋污染的耐受性,所述表 面與水的接觸角優選為95〜120。。 2.2無機細顆粒 優選中空顆粒作為要用在所述低折射率層中的無機細 顆粒。所述中空顆粒的折射率優選為1·4〇或者更低、更優 選為1.28〜1.38、和最優選為1.32〜1.36。作為中空顆粒, 優選中空二氧化矽顆粒,並且下文中將參照中空二氧化矽 顆粒對所述無機細顆粒進行描述。此處所用的折射率指顆 粒總體上的折射率,而不是僅表示作為形成中空二氧化石夕 顆粒外忒的一氧化矽的折射率。此處,如果我們假設顆粒 内空穴的半徑為a並且顆粒外殼半徑為b,則由以下方程Q) 表示的孔隙率X優選為10〜60%、更優選為2〇〜6〇%、最優 選為30〜60%。 ⑴.X = [(4Ka3/3)/(47tb3/3)]xl〇〇% 如果使所述中空二氧化石夕顆粒具有減小得更多的折射 率和增加得更多的孔隙率,則外殼的厚度變小並且顆粒的 強度降低。S此’考慮到抗刮傷性,優選顆粒具有上述範 圍的折射率。 此處,通過阿貝折射儀(由ATAG〇 κ κ.製造)測量中空 二氧切顆粒的折射率。在日本專利槽JP -A-2001-233611 寿JP A-2002-79616中描述了中空二氧㈣的製備方法。也 可使用可在市場上得到的中空二氧化㈣粒。 32 201042281 塗覆的中空二氧化石夕顆粒的量優選為1〜1 〇〇mg/m2、更 優選為5〜80mg/m2、還更優選為10〜60mg/m2。在該範圍 内,可獲得合意的改進抗刮傷性或者降低折射率的效果、 防止在所述低折射率層的表面上形成細小的粗糙不平、和 保持優異的外觀(例如為黑色的、非鬆散的外觀)和低的總反 射率。 所述中空—氧化石夕顆粒的平均粒徑優選為所述低折射 0 率層厚度的30〜150%、更優選為35〜80%、還更優選為40 〜60%。換言之,如果所述低折射率層的厚度為1〇〇nm,則 所述中空二氧化矽顆粒的粒徑優選為3〇〜15〇11111、更優選為 35〜80nm、還更優選為4〇〜60nm。如果所述粒徑在該範圍 - 内,則可令人滿意地保持空穴比率,以便使折射率充分降 - 低、防止在所述低折射率層的表面上形成細小的粗縫不 平、和保持優異的外觀(例如為黑色的、非鬆散的外觀)或者 低的總反射率。所述二氧化矽細顆粒可為結晶或者無定形 Q 的,並且優選單分散顆粒。形狀最優選為球形但是即使為 無疋形的,也沒有問題。所述中空二氧化矽顆粒的平均粒 徑可通過由透射電子顯微鏡(TEM)獲得的照片確定。 在本發明中,不具有空穴的二氧化矽顆粒可與所述中 空二氧化石夕顆粒組合使用。所述不具有空穴的二氧化石夕顆 粒的粒度優選為5〜150nm、更優選為1〇〜8〇nm、且最優選 為15〜60nm。而且,至少一種具有小於所述低折射率層厚 度的25%的平均粒度的二氧化石夕細顆粒(該細顆粒稱為“小 粒度二氧化石夕細顆粒”)優選地與具有上述粒度的氧化石夕細 33 201042281 顆粒(該細顆粒稱為“大粒度二氧化矽細顆粒”)組合使用。 所述小粒度二氧化矽細顆粒可存在於大粒度二氧化石夕 細顆粒之間的空間中,並且因此可有助於作為大粒度二氧 化石夕、.’田顆粒的保持劑(hGiding agent)。所述小粒度二氧化石夕 細顆粒的平均粒徑優選為1〜20nm、更優選為5〜15nm、更 進^優1為10〜15nm。考慮到原材料成本和保持劑效 果’優選使用這樣的二氧化#細顆粒。可對所述中空顆粒 進行物理表面處理如等離子體放該理和電較電處理或 者用表面活性劑、偶聯劑等進行化學表面處理以使在分散 溶液或者塗覆溶液中的分散穩定或者使對黏合劑組分的親 和性或者與黏合劑組分的黏合性能增強。特別優選使用偶 聯劑。 作為所述偶聯劑,優選使職氧基金屬化合物(例如, 鈦偶聯劑、魏偶聯劑)。具體而言,使用具有丙稀酿基或 者曱基糾雜的喊偶聯劑進行處理是有效的。在專利 檔JP-A-2006-17870的第[0058]_[〇〇83]段中描述了中空顆粒 的化學表面處_、溶劑、催化劑和分散穩定劑。 所述低折射率層優選通過如下方法形成:塗布包括成 膜溶質和至4 -種溶劑的塗覆組合物、使所述塗覆膜乾燥 以除去所述溶劑'和通過施加熱和電離輻射的至少一種而 使所述塗覆膜固化。 作為所述溶質,優選包括能熱固化或者電離輕射固化 型含氟E1化龍、有機魏化合物的水解產物或者部分縮 合物的組合物。 34 201042281 另外’在所述低折射率層中優選使用所述包括含氟固 化樹脂的組合物,並且優選輔助使用有機矽烷化合物的水 解產物或者部分縮合物。基於所述含氟的能固化樹脂,要 添加的輔助性的有機矽烷化合物的水解產物或者部分縮合 物的量為10〜40重量%。 2.3含氟固化樹脂 所述含氟固化樹脂包括作為組分的如下物質:含有全 說烧基的石夕烧化合物(例如(十七氣-1,1,2,2-四癸基)三乙氧 基石夕炫))的水解產物以及其脫水縮合物;以及包含含氣單體 單元和提供交聯反應的構成單元的含氟共聚物。用於本發 明中的低折射率層優選由如下共聚物的固化膜形成,所述 共聚物包括付自含氟的乙浠基單體的重複單元和在側鏈上 具有(甲基)丙烯醯基的重複單元作為必要的構成單元。考慮 到折射率的降低和膜強度的改善,優選組合使用固化劑例 如多官能(曱基)丙烯酸醋。所述含氟聚合物和所述多官能 (甲基)丙烯酸酯的混合比率不限於特定的值,並且優選確定 所述比率使得在所述膜乾燥之後在所述含氟聚合物和所述 多官能(甲基)丙稀酸醋之間不發生相分離。事實上,也可僅 使用它們中之一。所述多官能(甲基)丙烯酸酯的實例包括以 上對於所述高折射率層所描述的能光聚合的多官能單體。 下文中’將具體描述用於本發明低折射率層的優選的 含氟固化樹脂。 所述含氟的乙烯基單體的實例包括:氟烯烴(例如,氟 乙稀、偏一氟乙稀、四氟乙稀、六氟丙稀);部分或者完全 35 201042281 氟化的烷基醋衍生物(例如,可得自Osaka 0rganic Chemical Ind論y Ltd.的 Viscote 6FM和可得自 Daikin Ind敵ies,Ud 的M 2〇2G) ’和部分或者完全氟化的乙烯細。其中優選氣 嫦烴’並且考慮到折射率 '轉性、透雜和可獲得性, 更優選六氟丙稀。在本發明中,添加所述含氣的乙稀基單 體使得所述共聚物的氟含量優選為20〜6〇品質%、更優選 為25〜55品質%'還更優選為扣〜如品質%。當所述含氣的 乙稀基單體的組成比率在城_時,不僅可使折射率令 人滿意地降低,而且可保持膜強度。 用於所述低折射率層中的含氟固化樹脂優選包括能交 聯的基團。賦+交聯反應性的構成單元(咖仙咖㈣⑽ 實例包括:通過先前在分子内具有能自交聯的官能團的單 體(例如(甲基)丙烯酸縮水甘油酯和縮水甘油基乙烯基醚) 的聚合而獲得的構成單元;通過具有羧基、羥基、氨基或 者磺基的單體(例如(甲基)丙烯酸、羥曱基(甲基)丙烯酸酯、 羥烷基(甲基)丙烯酸酯、丙烯酸烯丙酯、羥乙基.乙烯基醚、 羥丁基.乙烯基醚、馬來酸和巴豆酸)的聚合而獲得的構成單 元;和在通過聚合物反應將交聯用反應性基團例如(甲基) 丙烯醯基引入到上述構成單元中之後的構成單元(所述交 聯用反應性基團可例如通過讓丙烯醯氣與羥基反應而引 入)。作為用於所述低折射率層中的含氟聚合物的共聚物優 選含有在側鍵上具有(曱基)丙稀酿基的重複單元。通常,優 選所述具有(甲基)丙烯醯基的重複單元占5〜9〇品質%、更 優選30〜70品質%、甚至更優選40〜60品質%,儘管所述比 36 201042281 率根據由所述含氟的乙烯基單體得到的重複單元的種類而 變化。如果具有(甲基)丙烯醯基的重複單元的組成比率提 高,則是合意的,因為膜強度和折射率提高。 對於可用在本發明中的共聚物,考慮到各種觀點例如 與透明支撐體的黏附力、聚合物的Tg(其對膜硬度有貢 獻)、在溶劑中的溶解性、透明性、光滑性(slipperiness)、 和防灰塵/防土性質,除了由含氟的乙烯基單體得到的重複 單元和側鏈上具有(甲基)丙烯醯基的重複單元之外,還可適 當地共聚其他乙烯基單體。可根據用途將多種乙烯基單體 組合,並且在共聚物中,這樣的單體的添加量優選為總共0 〜65摩爾%、更優選為總共0〜40摩爾%、甚至更優選為總 共0〜30摩爾%。 對可組合使用的乙烯基單體沒有特別限制,並且其實 例包括烯烴(例如,乙烯、丙烯、異戊二烯、氯乙烯、偏二 氯乙浠)、丙烯酸i旨(例如,丙烯酸曱醋、丙烯酸乙酷、丙浠 酸2-乙基己酯、丙烯酸2-羥基乙酯)、甲基丙烯酸酯(例如, 曱基丙烯酸甲酯、曱基丙稀酸乙酯、甲基丙烯酸丁酯、甲 基丙烯酸2-羥基乙酯)、苯乙烯衍生物(例如,苯乙烯、對羥 甲基苯乙烯、對曱氧基苯乙烯)、乙烯基醚(例如,曱基·乙 烯基醚、乙基·乙烯基醚、環己基·乙烯基醚、羥乙基·乙浠 基醚、羥丁基·乙烯基醚)、乙烯基酯(例如,乙酸乙浠酯、 丙酸乙烯酯、肉桂酸乙烯酯)、不飽和羧酸(例如,丙烯酸、 曱基丙稀酸、巴豆酸、馬來酸、衣康酸)、丙稀醯胺(例如, Ν,Ν-二甲基丙烯醯胺、N-叔丁基丙烯醯胺、N-環己基丙烯 37 201042281 醯胺)、甲基丙烯醯胺(例如,n,n-二甲基甲基丙烯醯胺)和 丙嫦腈。 如JP-A-10-25388和JP-A-10-147739中所述,可將固化 劑與該聚合物適當地組合使用。 用於本發明中的含氟固化樹脂的優選實施方式為由式 1表示的樹脂。 [式1]A ν and 0 oxime-like helmet is used as an organic layer of a polymer having a saturated hydrocarbon or a polyether as a main chain or a mixed layer of a private substance including an inorganic compound and an organic compound. A layer made of a polymer having a saturated to main chain is particularly preferred. The poly character preferably has a word structure. The substance having a hydrocarbon rectification as a main chain is preferably produced by polymerizing an ethylenic monomer. Preferably, (four) ^ two or more unsaturation groups of the single (d) provide a rotating binder polymer. Examples of the monomer having two or more thorium unsaturated groups include an ester between a polyhydric alcohol and (meth)acrylic acid, such as ethylene glycol di(methacrylate vinegar ' 丨, 4-cyclohexane Alcoholic propylene _, quaternary fine (methyl) acryl vinegar, pentaerythritol tris(methyl) propyl hydrazine _, trimethomethyl propyl tris(methyl) acrylate acid, three jing jing (Methyl)acrylic acid vinegar, two seasons: tetraol tetra(meth)acrylic acid vinegar, tripentaerythritol penta(methyl) acrylate vinegar, pentaerythritol hexa(indenyl) propylene _, u, 3_cyclohexanetriol Trimethyl acrylate vinegar, ? "Ammonia acrylate propylene _, and poly S condensed poly (10) _; vinyl stupid and its derivatives, such as 1 '4-diethyl stupid, 4 sense dilute benzoic acid 2 propylene醯基乙19 201042281 vinegar, and 1,4-diethylcyclohexanone; ethylene barrier (eg, diethyl bromide), acrylamide (eg, methylenebis acrylamide), and Methacrylamide The monomer having an ethylenically unsaturated group is cured by ionizing radiation-induced or thermally induced polymerization after wet coating. Polymerization with a polyether as a main chain The material is preferably synthesized by ring-opening polymerization of a polyfunctional epoxy compound. A monomer having a functional group capable of crosslinking can be used instead of a monomer having two or more ethylenically unsaturated groups, or two Alternatively, a monomer having a crosslinkable functional group may be used in addition to a monomer having more ethylenically unsaturated groups to introduce a crosslinked structure into the binder polymer. The crosslinkable functional group includes an isocyanate group. , epoxy group, aziridine group, oxalate group, cyclization, carbonyl, thiol, thiol, methyl and active methylene. vinyl acid, acid gf, cyanopropyl A dilute acid derivative, a melamine, an etherified methylol compound, an ester, a urethane, and a metal alkoxide such as tetramethoxynonane may also be used as a monomer for introducing a crosslinked structure. A compound having a functional group which exhibits cross-linking ability due to decomposition, for example, a compound having a blocked isocyanate group. After the wet coating of the binder polymer having the above-mentioned parent-functional group is applied as a film, heat or the like is applied thereto. The hard coating layer may contain inorganic particles to adjust the refractive index or increase the film strength. It is preferred to use inorganic particles having an average particle size of 0_001 to 〇5 μm, especially 〇〇〇1 to 〇2. The particles are cerium oxide, titanium dioxide, oxidized iron, tin oxide, carbonic acid, barium sulfate, talc, kaolin and sulphate granules. Particularly preferred are granules of cerium oxide, titanium dioxide and oxidized. The inorganic particles are preferably based on the Hard coating layer (1) ~ 卯 20 201042281 Reset %, especially 2 〇 ~ see the department %, 士, 廿 θ zhou 重 straight 々 especially the amount of 3 〇 ~ 6 〇 wt% added. The front scattering layer broadens the viewing angle in both directions of the vertical* level. The above hard coating layer containing fine particles having different refractive indices can function as a forward scattering layer. When the multilayer anti-reflection film of the present invention formed by wet coating has surface unevenness to exhibit an anti-glare property (a viewer's background (W, s 〇baekg_d) is formed), the material is formed on the substrate. It is more desirable to perform anti-reflection I (4) than to form an anti-reflection layer containing matting particles or the like on a layer having surface correction (4) to produce surface unevenness. The pre-method achieves better uniformity of film thickness, resulting in improved anti-reflective properties. - The layers constituting the ruthenium reflective layer can be applied by various wet coating techniques such as dip coating, air knife coating, curtain coating, roll coating, wire bar coating, gravure coating, micro gravure It is formed by coating and extrusion coating (see U.S. Patent No. 2,681,294). Microgravure coating and gravure coating are preferred to minimize spreading Q to reduce drying unevenness. Gravure coating is preferred to ensure thickness uniformity in the cross direction. Two or more layers can be formed simultaneously. For simultaneous coating, see U.S. Patents 2,761,791, 2,941,898, 3,508,947 and 3,526,528 and Yuji Harasaki, Coating Kogaku, ρ.253, Asakura Shoten (1973). The polarizing plate using the antireflection film of the present invention comprises at least one layer of the antireflection film of the present invention. When the antireflection film according to the present invention is used as one of a surface protective layer (protective layer) of a polarizing plate to manufacture a polarizing plate, the transparent substrate is opposite to the side of the antireflection layer (the low refractive index layer) The side should use the domain for 21 201042281. Saponification by a domain can be carried out according to any one of the following processes (1) and (2): (1) immersing a transparent substrate on which a low refractive index layer is formed in an alkaline solution at least once to make the substrate The back is saponified. (2) coating the side of the transparent substrate opposite to the side on which the low refractive index layer is to be formed with an alkaline solution, the coating being performed simultaneously or after forming the low refractive index layer; The coated substrate is heated, then washed with water and/or neutralized to saponify only the back side of the antireflective film. Process (1) is advantageous in that it is carried out in the same processing steps as the general cellulose triacetate membrane. However, the process (1) involves such a disadvantage that not only the back surface of the substrate but also the side of the anti-reflection layer is hydrolyzed, which may cause deterioration of the anti-reflection layer; and the alkaline treatment solution remains on the anti-reflection layer to cause contamination. trace. In the case where such a disadvantage becomes a problem, it is desirable to carry out the process (2) including a specific step. The polarizing plate includes a broken polarizing plate, a dichroic dye polarizing plate, and a polyene type polarizing plate. The iodine-based polarizing plate and the color-developing dye polarizing plate are usually prepared by dyeing a polyethylene glycol (PVA) film before or after stretching. PVA prepared by brewing polyacetate is usually used. Modified PVA can also be used. The dyeing of the PVA film can be carried out in a (1) vertical manner, for example, by dipping in an aqueous solution of moth-moth molybdate. Spread coating, or hydrazine solution or dye solution 嗔 When stretching a P VA film, an additive such as an acid compound for crosslinking P VA is preferably used. Preferably, the polarizing plate has a transmittance of % 22 201042281, particularly 35 to 50%, at a wavelength of 550 nm, and has 90 to 100%, particularly 95 to 1%, especially 99 to 100, at a wavelength of 550 nm. % degree of polarization. A polarizing plate having the antireflection film of the present invention as a protective film on one side thereof is suitable for a transmissive, reflective or semi-transmissive LCD of TN mode, STN mode, VA mode, IPS mode or OCB mode. When applied to a transmissive or semi-transmissive LCD, the polarizing plate ensures high visibility when combined with a commercially available brightness enhancing film, ie, polarized beam splitting with a polarized light selective layer The membrane is, for example, DBEF (Double Brightness Enhancement Film) available from Sumitomo 3M Ltd. The polarizing plate can be combined with a quarter-wave plate to provide a surface protective sheet for the organic ELD that functions to reduce reflected light from the surface and the inside. The antireflection film of the present invention having a polyethylene terephthalate (pET) film or a polyethylene naphthalate (PEN) film as a transparent substrate is suitable for an image display device such as a PDP and a CRT. It will be apparent to those skilled in the art that the present invention is applicable to a display device including the above anti-reflection film and a display device including the above polarizing plate. Hereinafter, preferred embodiments of the present invention will be specifically described. 1. Preparation of high-refractive-index high-hardness layer 1.1 High-refractive-index high-hardness layer As described above, the high refractive index high hardness layer which is an essential thin layer of the antireflection film of the present invention has 1.50 to 1.60, more preferably 1.52 Refractive index of 1.56. In order to produce a high refractive index high hardness layer, the transparency of the inorganic oxide formed by chemical vapor deposition (CVD) or physical vapor deposition (pVD), particularly vacuum deposition or sputtering classified as PVD technology, may be used. A thin layer, but preferably a thin layer formed by a full wet process. 23 201042281 The high refractive index high hardness layer is preferably formed by coating a coating composition comprising: having a selected from the group consisting of titanium (Ti), bismuth (Zr), and indium (In) , inorganic fine particles of at least one metal oxide of oxides of zinc (Zn), tin (Sn), aluminum (A1) and antimony (Sb), an anionic dispersant, curing with at least trifunctional polymerizable groups a resin (hereinafter also referred to as "binder"), a polymerization initiator, and a solvent; drying the coating film to remove the solvent; and applying the coating film by applying at least one of heat and ionizing radiation Cured. When the cured resin or initiator is used, since the cured resin is cured by polymerization by heat application or ionizing radiation after coating, excellent scratch resistance and adhesion are formed. High hardness layer with high refractive index. 1.2 Inorganic Fine Particles For the inorganic fine particles, a metal (e.g., Ti, Zr, In, Zn, Sn, Sb, Al) oxide is preferable, and especially in terms of a preferable refractive index, oxidization is most preferable. However, as the conductivity, inorganic fine particles having an oxide of at least one of Sb, In and Sn as a main component are preferably used. The refractive index can be adjusted to a certain range by changing the amount of the inorganic fine particles. When zirconium oxide is used as a main component, the average particle diameter of the inorganic fine particles in the layer is preferably from 1 to 120 nm, more preferably from 1 to 60 nm, and most preferably from 2 to 40 nm. This diameter range is preferred because it lowers the haze and improves the dispersion stability and the adhesion of the upper layer with appropriate unevenness to the surface. The inorganic fine particles comprising cerium oxide as a component for use in the present invention have a refractive index of preferably 1.90 to 2.80, more preferably 2.10 to 2.80, and most preferably 2.20 to 2.80. The amount of the inorganic fine particles to be added depends on the layer to be added to the machine-free particles, and the amount to be added to the high refractive index layer is 40 to 85% by weight based on the powder solids of the entire high refractive index layer. It is preferably 50 to 75% by weight, and more preferably 60 to 70% by weight. The particle diameter of the inorganic fine particles can be determined by a light scattering method or a photograph obtained by a transmission electron microscope (TEM). The specific surface area of the inorganic fine particles is preferably from 10 to 400 m 2 /g, more preferably from 20 to 200 m 2 /g, and most preferably from 30 to 150 m 2 /g. The inorganic fine particles may be subjected to physical surface treatment such as plasma in order to stabilize the dispersion in the coating solution or the dispersant solution or to improve the affinity for the binder component or the binding property to the binder component. Discharge treatment or corona discharge treatment, or chemical surface treatment using a surfactant, a coupling agent, or the like. It is preferred to use a coupling agent. An alkoxy metal-compound (such as a decane coupling agent and a titanium coupling agent) is used as the coupling agent. Specifically, treatment with a decane coupling agent having an acrylonitrile group or a methacryl group is effective. The chemical fine surface treatment agent, the solvent, the catalyst, and the dispersion stabilizer of the inorganic fine particles are described in paragraphs [0058] to [008 3] of the patent document JP-A-2006-17870. 1.3 Curing Resin It is preferred to use a polymerizable compound as a curing resin, and it is preferred to use an ionizing radiation curable polyfunctional monomer or a polyfunctional oligomer as the polymerizable compound. As an example of the functional group of such a compound, a functional group capable of photopolymerization, electron beam polymerization or radiation polymerization can be preferably used, and a photopolymerizable group is further preferable. Examples of the photopolymerizable functional group include unsaturated polymerizable functional groups such as a (meth)acrylic group, a vinyl group, a styrene group, and an allyl group 25 201042281. Among such groups, a (meth)acrylic group is preferred. A specific (meth)acrylic acid-containing di(meth)acrylic acid vinegar having a photopolymerizable functional group capable of photopolymerizable functional group, such as neodecyl acrylate '1,6-hexanediol (Meth) acrylate and propylene glycol di(meth)acrylic acid S 曰, polyoxyalkylene diol di(meth) acrylate, such as triethylene glycol di (meth) acrylate, dipropylene glycol di (Meth) acrylate, polyethylene glycol di(meth) acrylate and polypropylene glycol bis(indenyl) acrylate; di(meth) acrylate of polyterpene alcohol, such as pentaerythritol di(meth)acrylic acid S 曰, a di(meth) acrylate with a % oxyethane or propylene oxide adduct, such as 2,2-bis{4-acryloxyl-diethoxy)phenyl}propane and 2,2_ Double {4-(acryloxy.polypropoxy)phenyl}propane. Further, epoxy (meth) acrylate, urethane (meth) acrylate, and polyester (mercapto) acrylate are preferably used as the photopolymerizable polyfunctional monomer. Among them, a polyhydric alcohol and a (fluorenyl) acrylate are preferable, and a polyfunctional monomer each having two or more (fluorenyl) acrylic groups is more preferable. Specific examples of such a polyfunctional monomer include: tris(tetra)propenyl tris(meth)acrylic acid vinegar, 2 mercaptoacetone tris(meth)acrylic acid vinegar, 124% hexanediol di(a) Acrylate, pentaglyceryl triacrylate, pentaerythritol tetrakis(meth) acrylate pentaerythritol tris(methyl) propylene _, dipentaerythritol tripropylene (tetra), dipentaerythritol vinegar vinegar, dipentaerythritol (Methyl)acrylic acid vinegar, diquaternary decyl alcohol hexa(indenyl) acrylic acid I tri 1,3- fine alcohol tripropyl _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ It is also possible to use two or more kinds of multifunctional single 26 201042281 bodies in combination. The amount of the cured resin to be used can be adjusted within a certain range to satisfy the refractive indices of the above layers. 1.4. Polymerization initiator As the polymerization initiator, a photopolymerization initiator is preferably used. The photopolymerization initiator is preferably a photoradical polymerization initiator or a photocationic polymerization initiator, and more preferably a photoradical polymerization initiator. Examples of the photoradical polymerization initiator include acetophenone, benzophenone, and benzoyl benzoate Michler. <207>, α-amyl decyl ester, tetradecyl thiuram monosulfide, and succinolone. Examples of commercially available photoradical polymerization initiators include: KAYACURE manufactured by Nippon Kayaku Co., Ltd. (e.g., DETX-S, BP-100, BDMK 'CTX, BMS, 2-EAQ, ABQ, CPTX, EPD, ITX, QTX, BTC, MCA); Irgacure (for example, 651, 184, 127, 500, 907, 369, 1173, 2959, 4265 ' 4263) manufactured by Ciba Specialty Chemicals Corp.; and manufactured by Sartomer Company Inc. Esacure (KIP100F, KB1, EB3, BP, X33, KT046, KT37, KIP150, TZT). A photo-cleavable photoradical polymerization initiator is particularly preferred. Photo-cleavable photoradical polymerization initiators are described on page 159 of 'Recent UV Curing Techniques' (published by Kazuhiro Takausu) (1991) of Technical Information Institute Co., Ltd. Examples of photo-cleavable photoradical polymerization initiators which are commercially available include Irgacure (e.g., 651, 184, 127, 907) manufactured by Cibas Pecialty Chemicals Corp. The amount of the photopolymerization initiator to be used with respect to 100 parts by weight of the cured resin' is preferably 0.1 to 15 parts by weight, more preferably 1 to 10 parts by weight. 27 201042281 In addition to the photopolymerization initiator, a photo-accelerator can be used. Specific examples of the photo-promoter include n-butylamine, triethylamine, tri-n-butylphosphine, thioxanthone, and rice bran 1. Examples of commercially available light promoters include KAYACURE (e.g., DMBI and EPA) manufactured by Nippon Kayaku Co., Ltd. The photopolymerization reaction is preferably carried out by irradiating ultraviolet rays after coating and drying the high-refractive-index high-hardness layer. In addition to the above components (for example, inorganic fine particles, a curing resin, a polymerization initiator, a photo-promoter), a surfactant, an antioxidant, a coupling agent, or a surfactant may be added to the high-refractive-index high-hardness layer. Adhesive, anti-coloring agent, coloring agent (such as dye), antifoaming agent, leveling agent, heat resistam agent, ultraviolet absorber, infrared absorber, adhesion Reagents, polymerization inhibitors, antioxidants, surface modifiers, fine particles of conductive metals, and the like. 1.5 Solvent As the solvent, it is preferred to use a liquid having a particle size of 6 〇 to 17 〇. Specific examples of the solvent include water, alcohol (e.g., decyl alcohol, ethanol, isopropanol, butanol, benzyl alcohol), ketone (e.g., acetone, curtain methyl ethyl ketone, methyl isobutyl ketone, ring) Hexanone), esters (eg, formazan acetate, 9 ethyl acetate, propyl acetate, butyl acetate, methyl formate, ethyl formate, propyl formate, butyl formate), aliphatic hydrocarbons (eg, hexane) , cyclohexane), halogenated Q-generation hydrocarbons (eg, dichloromethane, chloroform, carbon tetrachloride), aromatic hydrocarbons (eg, cage m _ un-bens, one-method), saponin (eg, two Methylformamide, dimercaptoacetone face & amine, N-methylpyrrolidone), ether (for example, diethyl bond, dioxane, tetrahydroseven) and ether alcohol (for example, 1- Methoxy-2-propanol). Among them, toluene, xylene, methyl ethyl ketone, methyl. iso 28 201042281 butyl ketone, cyclohexanone and butanol are preferred. Specifically, mercapto.ethyl_, mercapto.isobutyl ketone and cyclohexyl are more preferred. The amount of the solid content of the coating composition for the high refractive index layer is preferably from 2 to 3 % by mass, more preferably from 3 to 2 % by weight, using the above solvent. '1.6 Preparation of the two-refractive-index south hardness layer The inorganic fine particles including the oxidation-defect as the main component 0 for the high-refractive-index high-hardness layer are preferably used in a dispersed state to prepare the high-refractive-index high-hardness layer. The inorganic fine particles are dispersed by using a disperser. Examples of the disperser include a sand mill (e.g., a bead mill having a pin), a high speed impeller mill, a gravel mill, a roll mill, an attritor, and a colloid mill. * Where 'the preferred sander and high speed impeller mill. Moreover, pre-dispersion processing can be performed. Examples of the disperser used for the pre-dispersion treatment include a ball mill, a three-roll mill, a kneader, and an extruder. The inorganic fine particles are preferably dispersed in a dispersion medium to have a particle size as small as possible. The mass average particle size is 10 to 12 nm, preferably 20 to 100 nm, more preferably 30 to 90 nm, still more preferably 3 to 8 nm. By dispersing the inorganic fine particles to a small particle size of 20 Å or less, a high hardness layer of high refractive index can be formed without impairing transparency. The high refractive index high hardness layer used in the present invention is preferably formed by the following method. It is preferable to add a curing resin (for example, the above-mentioned ionizable radiation-curable polyfunctional monomer or polyfunctional oligomer) necessary for forming a matrix to a binder, a photopolymerization initiator, or the like, by adding the inorganic The dispersion solution obtained by dispersing the particles in a dispersion medium to prepare a coating composition for forming a high refractive index layer or an intermediate refractive index layer for 29 201042281, and the obtained obtained for forming a high refractive index layer or intermediate refraction The coating composition of the rate layer is coated on a transparent support and allowed to cure by a crosslinking reaction or a polymerization reaction. The binder of the layer is preferably crosslinked or polymerized with the dispersant at the same time as or after the application of the high refractive index high hardness layer. The resulting adhesive for the high refractive index layer or the intermediate refractive index layer takes the form of crosslinking or polymerization between the above preferred dispersant and the ionizable radiation-curable polyfunctional monomer or oligomer, The anionic group of the dispersant is incorporated into the binder. Further, the anionic group incorporated in the binder of the high refractive index layer or the intermediate refractive index layer has a function of maintaining the dispersed state of the inorganic fine particles, and the crosslinking or polymerization structure imparts a film forming ability to the binder, resulting in The physical strength and the resistance to chemicals and the weather of the high refractive index layer containing the inorganic fine particles are improved. In the formation of the high refractive index high hardness layer, the crosslinking or polymerization reaction of the cured resin is preferably carried out in an atmosphere of 5% by volume or less. The physical strength and resistance to chemicals and weather of the high refractive index high hardness layer can be improved by forming a high refractive index high hardness layer in an atmosphere of 10% by volume or less of oxygen concentration, and further improved Adhesion between the high refractive index high hardness layer and the layer adjacent to the high hardness layer. Preferably, the crosslinking of the cured resin is carried out in an atmosphere of 6 vol% or less, more preferably 4 vol% or less, still more preferably 2 vol% or less, and most preferably 1 vol% or less of oxygen concentration. The high hardness layer of the horse refractive index is formed by a polymerization reaction 30 201042281. The thickness of the high hardness layer of the intermediate refractive index is preferably 0.1 to 2 Å, preferably 2 to 8. More specifically, in order to satisfy the material and the fold (four) of the high-refraction: f hardness layer, the fineness and the tree (four) species are selected to determine the mixing ratio in parallel to prepare a host composition.仃 2. Preparation of Low Refractive Index Layer 2.1 Low Refractive Index Layer The low refractive index layer of the antireflection film according to the present invention has a refractive index of preferably 131 to 1.40, more preferably 1.38 or less. This range of values is preferred because the refractive index can be lowered while maintaining the film strength. In the formation of a low refractive index layer, a transparent film of an inorganic oxide formed by chemical vapor deposition (CVD) or physical vapor deposition (PVD), particularly vacuum deposition or sputtering classified as PVD technology, may be similar. It is used for the above description, but it is preferred to use a full wet coating method using a coating composition for forming a low refractive index layer described hereinafter. It is preferable that the low refractive index layer contains inorganic fine particles 'and preferably at least one of the inorganic fine particles is hollow particles, and more preferably hollow particles containing ceria as a main component (hereinafter also referred to as "Hollow yttria particles" The thickness of the low refractive index layer is preferably from 90 to 130 nm, and more preferably from 1 to 120 nm. The haze of the low refractive index layer is preferably 3% or less, more preferably 2% or less, most preferably or lower. The strength 31 201042281 of the antireflection film formed with the layer up to the low refractive index layer is preferably Η or higher, more preferably 2H or higher, and Most preferably, it is 3 h or higher, and the strength is measured by a pencil hardness test under a load of 500 g. In order to improve the resistance of the antireflection film to fingerprint contamination, the contact angle of the surface with water is preferably 95 to 120. 2.2 Inorganic Fine Particles Preferably, hollow particles are used as the inorganic fine particles to be used in the low refractive index layer. The refractive index of the hollow particles is preferably 1.4 Å or lower, more preferably 1.28 to 1.38, and most excellent It is 1.32 to 1.36. As the hollow particles, hollow cerium oxide particles are preferable, and the inorganic fine particles will be described hereinafter with reference to hollow cerium oxide particles. The refractive index used herein refers to the refractive index of the particles as a whole, and It is not only the refractive index of ruthenium oxide which is the outer ruthenium of the hollow silica dioxide. Here, if we assume that the radius of the cavity in the particle is a and the radius of the particle shell is b, it is represented by the following equation Q) The porosity X is preferably from 10 to 60%, more preferably from 2 to 6 %, most preferably from 30 to 60%. (1). X = [(4Ka3/3) / (47tb3/3)] xl〇〇% When the hollow silica dioxide particles are reduced in refractive index and increased in porosity, the thickness of the outer shell becomes small and the strength of the particles is lowered. Thus, in view of scratch resistance, it is preferred. The particles have a refractive index in the above range. Here, the refractive index of the hollow dioxy-cut particles is measured by an Abbe refractometer (manufactured by ATAG 〇 κ.). Japanese Patent Slot JP-A-2001-233611 Shou JP A- The preparation of hollow dioxins (tetra) is described in 2002-79616. The hollow dihydrate (tetra) particles which are commercially available are used. The amount of the coated hollow silica dioxide particles is preferably from 1 to 1 〇〇mg/m2, more preferably from 5 to 80 mg/m2, still more preferably 10 to 60 mg/m 2 . Within this range, a desirable effect of improving scratch resistance or lowering the refractive index, preventing formation of fine roughness on the surface of the low refractive index layer, and maintaining an excellent appearance are obtained ( For example, a black, non-loose appearance) and a low total reflectance. The average particle diameter of the hollow-oxide oxide particles is preferably 30 to 150%, more preferably 35 to the thickness of the low refractive index layer. 80%, still more preferably 40 to 60%. In other words, if the thickness of the low refractive index layer is 1 〇〇 nm, the particle diameter of the hollow cerium oxide particles is preferably from 3 〇 to 15 〇 11111, more preferably from 35 to 80 nm, still more preferably 4 Å. ~60nm. If the particle diameter is within the range - the hole ratio can be satisfactorily maintained so that the refractive index is sufficiently lowered - low to prevent formation of fine unevenness on the surface of the low refractive index layer, and Maintain an excellent appearance (for example, a black, non-loose appearance) or a low total reflectance. The cerium oxide fine particles may be crystalline or amorphous Q, and are preferably monodisperse particles. The shape is most preferably spherical but there is no problem even if it is invisible. The average particle diameter of the hollow ceria particles can be determined by photographs obtained by a transmission electron microscope (TEM). In the present invention, cerium oxide particles having no voids may be used in combination with the hollow cerium oxide particles. The particle size of the cerium dioxide particles having no voids is preferably 5 to 150 nm, more preferably 1 Torr to 8 Å, and most preferably 15 to 60 nm. Moreover, at least one of the fine silica fine particles having an average particle size smaller than 25% of the thickness of the low refractive index layer (the fine particles are referred to as "small particle size fine silica dioxide fine particles") preferably has the above particle size Oxide oxide fine 33 201042281 Particles (this fine particle is called "large particle size ceria fine particles") are used in combination. The small particle size ceria fine particles may be present in the space between the large particle size dioxide fine particles, and thus may serve as a retaining agent for the large particle size dioxide dioxide, the 'field agent' (hGiding agent) ). The average particle diameter of the fine particle size fine silica fine particles is preferably from 1 to 20 nm, more preferably from 5 to 15 nm, and further preferably from 10 to 15 nm. It is preferable to use such a dioxide #fine particle in consideration of the raw material cost and the retaining agent effect. The hollow particles may be subjected to physical surface treatment such as plasma discharge and electro-electric treatment or chemical surface treatment with a surfactant, a coupling agent or the like to stabilize the dispersion in the dispersion solution or the coating solution or to The affinity for the binder component or the adhesion to the binder component is enhanced. It is particularly preferable to use a coupling agent. As the coupling agent, an organochemical compound (for example, a titanium coupling agent or a Wei coupling agent) is preferred. Specifically, it is effective to carry out treatment using a squeezing coupling agent having an acrylonitrile group or a thiol group. The chemical surface of the hollow particles, solvent, catalyst and dispersion stabilizer are described in paragraph [0058]_[〇〇83] of the patent document JP-A-2006-17870. The low refractive index layer is preferably formed by coating a coating composition comprising a film forming solute and to a solvent, drying the coating film to remove the solvent, and applying heat and ionizing radiation. The coating film is cured by at least one. As the solute, a composition comprising a heat-curable or ionizing light-curing type fluorine-containing E1 hydrazine, a hydrolyzate or a partial condensate of an organic Wei compound is preferable. 34 201042281 Further, the composition including the fluorine-containing curable resin is preferably used in the low refractive index layer, and preferably a hydrolyzed product or a partial condensate of the organodecane compound is used. The amount of the hydrolyzate or partial condensate of the auxiliary organodecane compound to be added is from 10 to 40% by weight based on the fluorine-containing curable resin. 2.3 Fluorinated Curing Resin The fluorine-containing curing resin includes, as a component, a compound containing a fully-burning group (for example, (seventeen gas-1,1,2,2-tetradecyl)triethyl) a hydrolyzate of the oxetium) and a dehydrated condensate thereof; and a fluorinated copolymer comprising a gas-containing monomer unit and a constituent unit providing a crosslinking reaction. The low refractive index layer used in the present invention is preferably formed of a cured film of a copolymer comprising a repeating unit derived from a fluorine-containing ethyl fluorene monomer and having (meth) acrylonitrile on the side chain. The repeating unit of the base serves as a necessary constituent unit. In view of the decrease in refractive index and the improvement in film strength, it is preferred to use a curing agent such as a polyfunctional (fluorenyl) acrylate. The mixing ratio of the fluoropolymer and the polyfunctional (meth) acrylate is not limited to a specific value, and it is preferred to determine the ratio such that the fluoropolymer and the plurality after the film is dried No phase separation occurs between the functional (meth) acrylate vinegar. In fact, you can also use only one of them. Examples of the polyfunctional (meth) acrylate include the photopolymerizable polyfunctional monomer described above for the high refractive index layer. Hereinafter, a preferred fluorine-containing curing resin used in the low refractive index layer of the present invention will be specifically described. Examples of the fluorine-containing vinyl monomer include: a fluoroolefin (for example, fluoroethylene, vinylidene fluoride, tetrafluoroethylene, hexafluoropropylene); partially or completely 35 201042281 fluorinated alkyl vinegar Derivatives (e.g., Viscote 6FM available from Osaka 0rganic Chemical Ind y Ltd. and M 2 〇 2G) available from Daikin Ind Enes, Ud, and partially or fully fluorinated vinyl fine. Among them, gaseous hydrocarbons are preferred and hexafluoropropylene is more preferred in view of refractive index 'transferability, permeability and availability. In the present invention, the gas-containing ethylene-based monomer is added so that the fluorine content of the copolymer is preferably 20 to 6% by mass, more preferably 25 to 55 % by mass, and still more preferably as a deduction - such as quality. %. When the composition ratio of the gas-containing ethylene-based monomer is in the city, not only the refractive index can be satisfactorily lowered, but also the film strength can be maintained. The fluorine-containing curing resin used in the low refractive index layer preferably includes a group capable of crosslinking. The constituent unit of the +crosslinking reactivity (Cai Xian Coffee (4) (10) Examples include: a monomer having a functional group capable of self-crosslinking in the molecule (for example, glycidyl (meth)acrylate and glycidyl vinyl ether) a constituent unit obtained by polymerization; a monomer having a carboxyl group, a hydroxyl group, an amino group or a sulfo group (for example, (meth)acrylic acid, hydroxydecyl (meth) acrylate, hydroxyalkyl (meth) acrylate, acrylic acid a constituent unit obtained by polymerization of allyl ester, hydroxyethyl.vinyl ether, hydroxybutyl.vinyl ether, maleic acid, and crotonic acid; and a reactive group for crosslinking by reaction with a polymer, for example a constituent unit after the (meth)acryloyl group is introduced into the above constituent unit (the reactive group for crosslinking can be introduced, for example, by reacting propylene helium with a hydroxyl group) as the low refractive index layer. The fluoropolymer copolymer preferably contains a repeating unit having a (fluorenyl) propylene group on a side bond. Usually, it is preferred that the repeating unit having a (meth) acryl fluorenyl group is 5 to 9 Å in quality. %, More preferably, it is 30 to 70% by mass, and even more preferably 40 to 60% by mass, although the ratio of 36 201042281 varies depending on the kind of the repeating unit obtained from the fluorine-containing vinyl monomer. If it has (meth) It is desirable that the composition ratio of the repeating unit of the acrylonitrile group is increased because the film strength and the refractive index are improved. For the copolymer usable in the present invention, various viewpoints such as adhesion to a transparent support, polymer, and the like are considered. Tg (which contributes to film hardness), solubility in solvents, transparency, slipperiness, and dust/anti-soil properties, in addition to repeating units and side chains derived from fluorine-containing vinyl monomers In addition to the repeating unit having a (meth)acryl fluorenyl group, other vinyl monomers may be appropriately copolymerized. A plurality of vinyl monomers may be combined according to the use, and in the copolymer, such a monomer may be added. It is preferably 0 to 65 mol% in total, more preferably 0 to 40 mol%, even more preferably 0 to 30 mol% in total. There is no particular limitation on the vinyl monomer which can be used in combination, and Examples include olefins (e.g., ethylene, propylene, isoprene, vinyl chloride, vinylidene chloride), acrylic acid (e.g., acrylic acid vinegar, acrylic acid, 2-ethylhexyl propionate, acrylic acid). 2-hydroxyethyl ester), methacrylate (for example, methyl methacrylate, ethyl decyl acrylate, butyl methacrylate, 2-hydroxyethyl methacrylate), styrene derivatives (eg , styrene, p-hydroxymethylstyrene, p-nonyloxystyrene), vinyl ether (eg, mercapto vinyl ether, ethyl vinyl ether, cyclohexyl vinyl ether, hydroxyethyl) Ethyl ether, hydroxybutyl vinyl ether), vinyl ester (eg, ethyl acetate, vinyl propionate, vinyl cinnamate), unsaturated carboxylic acid (eg, acrylic acid, mercapto acrylic acid) , crotonic acid, maleic acid, itaconic acid), acrylamide (for example, hydrazine, hydrazine-dimethyl methacrylate, N-tert-butyl acrylamide, N-cyclohexyl propylene 37 201042281 decylamine) , methacrylamide (for example, n, n-dimethyl methacrylamide) and acrylonitrile. A curing agent can be suitably used in combination with the polymer as described in JP-A-10-25388 and JP-A-10-147739. A preferred embodiment of the fluorine-containing curing resin used in the present invention is a resin represented by Formula 1. [Formula 1]

在式1中,L表示碳數為1〜10、優選為卜6、更優選為 2〜4的連接基團,其可具有線型、支化或者環狀結構並且 可具有選自〇、N和S的雜原子。 其優選實例包括 、 *-(CH2)4-〇-** ' *-(CH2)6-〇-** , *-(CH2)2-〇-(CH2)2-〇-** ' *-C0NH-(CH2)3-0-** ' (CH2CH(0H)CH2-0-** 和 *-CH2CH2QCQNH(CH2)r〇·**(其巾*表示聚合物线側的連接 位置’ **表示(甲基)丙稀酿基側的連接位置)。m表示〇或卜 在式1中,X表不氫原子或者甲基,考慮到固化反應性, 優選為氫原子。 在式1中’ A表由任選的乙縣單體得到的重複單 兀對》亥重複早凡沒有特別限制,只要其為能夠與六氣丙 烯’、聚的單體構絲分。考相各種觀關如與透明支撐 體的黏附力、聚合物的Tg(這_硬度有貢獻)'在溶劑中 38 201042281In Formula 1, L represents a linking group having a carbon number of 1 to 10, preferably 2, more preferably 2 to 4, which may have a linear, branched or cyclic structure and may have an anthracene selected from 〇, N and The hetero atom of S. Preferred examples thereof include, *-(CH2)4-〇-** '*-(CH2)6-〇-**, *-(CH2)2-〇-(CH2)2-〇-** '*- C0NH-(CH2)3-0-** ' (CH2CH(0H)CH2-0-** and *-CH2CH2QCQNH(CH2)r〇·** (the towel* indicates the connection position on the polymer line side ** The position of the (meth) propylene-based side is shown. m represents 〇 or 卜. In the formula 1, X represents no hydrogen atom or methyl group, and in view of curing reactivity, a hydrogen atom is preferred. Table A is a repeating single enthalpy obtained by the optional Unit B monomer. There is no particular limitation on the repetition of the hai, as long as it is capable of being separated from the hexa-propylene propylene and the poly-monomer. The adhesion of the transparent support, the Tg of the polymer (which contributes to the hardness)' in the solvent 38 201042281

的冷解性、透明性、光滑性、和防灰塵/防土性質,可對重 複單元進行適當選擇。根據用途,所述重複單元可由單一 的乙烯基料或者多種乙縣單體構成。 這樣的乙烯基單體的優選實例包括 •乙稀基8^1 ’例如 甲基.乙烯基§€、乙基·乙烯基鍵、叔丁基乙烯基驗、環己 基·乙稀基键、異丙基·乙烯基醚' 羥乙基·乙烯基醚、羥丁 基·乙烯基醚、縮水甘油基·乙烯基醚和烯丙基·乙烯基醚; 乙稀基醋’例如乙酸乙烯酯、丙酸乙烯酯和丁酸乙烯酯;(甲 基)丙稀酸醋’例如(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、 (曱基)丙烯_乙酿、(甲基)丙稀酸縮水甘油醋、(曱基)丙 烯&C烯丙S曰和(曱基)丙烯醯氧丙基三甲氧基矽烷;苯乙烯衍 生物,例如笨乙烯和對羥甲基苯乙烯;不飽和羧酸,例如 巴丑酸、馬來酸和衣康酸;以及其衍生物。其中,更優選 乙烯基醚衍生物和乙烯基酯衍生物,更進一步優選乙烯基 醚衍生物。 在式1中,X、y和z表示各自構成組分的摩爾百分比並 且表不在條件x+y+z=1〇〇下滿足3〇$χ$6〇、5$^^7〇和〇 ’ 優選35。$55、3〇Sy$6〇和〇szs20,且更優 選4〇^X^55、4OS055和的值。 用於本發明中的共聚物的更優選實施方式為由式2表 示的共聚物: [式2] 七 -B- 0The resolving, transparency, smoothness, and anti-dust/anti-soil properties allow for proper selection of repeating units. The repeating unit may be composed of a single vinyl material or a plurality of ethylenic monomers depending on the use. Preferable examples of such a vinyl monomer include • ethylene group 8^1 'e., for example, methyl group, vinyl group, ethyl group, vinyl group, t-butyl group, cyclohexyl group, and the like. Propyl vinyl ether 'hydroxyethyl vinyl ether, hydroxybutyl vinyl ether, glycidyl vinyl ether and allyl vinyl ether; ethylene vinegar' such as vinyl acetate, C Vinyl acetate and vinyl butyrate; (meth)acrylic acid vinery such as methyl (meth) acrylate, ethyl (meth) acrylate, (mercapto) propylene, ethyl, (meth) propylene Acid glycidol vinegar, (mercapto) propylene & C allyl S and (fluorenyl) propylene oxypropyl trimethoxy decane; styrene derivatives, such as stupid ethylene and p-hydroxymethyl styrene; unsaturated Carboxylic acids such as baric acid, maleic acid and itaconic acid; and derivatives thereof. Among them, a vinyl ether derivative and a vinyl ester derivative are more preferable, and a vinyl ether derivative is still more preferable. In Formula 1, X, y and z represent the molar percentage of the respective constituent components and are not in the condition x+y+z=1〇〇 satisfying 3〇$χ$6〇, 5$^^7〇 and 〇'. 35. $55, 3〇Sy$6〇 and 〇szs20, and more preferably 4〇^X^55, 4OS055 and the values. A more preferred embodiment of the copolymer used in the present invention is a copolymer represented by Formula 2: [Formula 2] Seven-B- 0

0-(CH2)ij-〇{!c=cH2 O-f-CH^OH 390-(CH2)ij-〇{!c=cH2 O-f-CH^OH 39

X 22 201042281 在式2中,x和y具有與式1中相同的含義並且它們的優 選範圍也與式1中的相同。 η表示2Sn$10、優選2SnS6、更優選2$η$4的整數。 B表示由任選的乙烯基單體得到的重複單元並且可由 單一組成或者多種組成構成。其實例包括以上作為式1中A 的實例所描述的那些。 zl和z2表示各重複單元的摩爾百分比並且表示在條件 x+y+zl+z2=100下滿足0SzlS65和0Sz2$65,優選OSzl $30和0Sz2S 10,更優選OSzlS 10和0Sz2S5的值。 由式1或2表示的共聚物可例如通過根據任一種上述方 法將(曱基)丙烯醯基引入到包括六氟丙烯組分和羥烷基·乙 烯基醚組分的共聚物中而合成。 以下描述了可用在本發明中的共聚物的優選實例;然 而,本發明不限於此。 40 201042281X 22 201042281 In Formula 2, x and y have the same meanings as in Formula 1 and their preferred ranges are also the same as in Formula 1. η represents an integer of 2Sn$10, preferably 2SnS6, more preferably 2$η$4. B represents a repeating unit derived from an optional vinyl monomer and may be composed of a single composition or a plurality of compositions. Examples thereof include those described above as examples of A in Formula 1. Zl and z2 represent the molar percentage of each repeating unit and represent values satisfying 0SzlS65 and 0Sz2$65, preferably OSzl$30 and 0Sz2S10, more preferably OSzlS10 and 0Sz2S5, under the condition x+y+zl+z2=100. The copolymer represented by Formula 1 or 2 can be synthesized, for example, by introducing a (fluorenyl)propenyl group into a copolymer comprising a hexafluoropropylene component and a hydroxyalkyl vinylidene component according to any of the above methods. Preferred examples of the copolymer which can be used in the present invention are described below; however, the invention is not limited thereto. 40 201042281

X y m X LI X 數均分子量 Mn(xl04) P-1 so 0 1 t-CHiCHjO- H 3! Μ ια 0 1 卜 CHaCHiO- CHa 4.0 Ρ-3 45 5 1 *-CHaCH2〇- H 2.8 Μ 40 to 1 *-CHjCHi〇- H 3.8 P-5 30 20 1 卜 C^CHaO- H 5.0 Μ 2β 30 Ϊ «-CHaCHgO- H 4.0 Μ SO 0 0 — H Ρ-β 5& D 1 »-〇4Ηβ〇~ H 0.8 ρ-ι SO 0 1 ifc^ofCHa^O- H 1.0 ΜΟ SO 0 l H 7.0 *表示聚合物主鏈側 41 201042281 -fcf2-CF^ -fCHa-CH^ ^ I」J HubX ym X LI X number average molecular weight Mn(xl04) P-1 so 0 1 t-CHiCHjO- H 3! Μ ια 0 1 卜CHaCHiO-CHa 4.0 Ρ-3 45 5 1 *-CHaCH2〇- H 2.8 Μ 40 to 1 *-CHjCHi〇- H 3.8 P-5 30 20 1 Bu C^CHaO- H 5.0 Μ 2β 30 Ϊ «-CHaCHgO- H 4.0 Μ SO 0 0 — H Ρ-β 5& D 1 »-〇4Ηβ〇~ H 0.8 ρ-ι SO 0 1 ifc^ofCHa^O- H 1.0 ΜΟ SO 0 l H 7.0 * indicates the polymer main chain side 41 201042281 -fcf2-CF^ -fCHa-CH^ ^ I"J Hub

Huhr〒CHa 數均分子量 Mn(xl04)Huhr〒CHa number average molecular weight Mn(xl04)

LILI

Ml 50 0 MZ 50 0 P-13 50 0 f-H 50 e P-15 50 0 P-16 50 0 M7 50 0 Ρ,1β 50 0Ml 50 0 MZ 50 0 P-13 50 0 f-H 50 e P-15 50 0 P-16 50 0 M7 50 0 Ρ,1β 50 0

CH3 4.0 4.5 45 5.0 3.5 3.0 3,0 3.0CH3 4.0 4.5 45 5.0 3.5 3.0 3,0 3.0

P-1S 50 0 JP-1S 50 0 J

3*0 P-tO 40 103*0 P-tO 40 10

CH, 0·6 *表示聚合物主鏈侧β 42 201042281 +cf 广 7七+CH2"T+b +A 七 CF3 I 〇 CKU1—cch=ch2 數均分子量CH, 0·6 * indicates the polymer main chain side β 42 201042281 +cf broad 7 7 +CH 2 "T+b +A 7 CF3 I 〇 CKU1—cch=ch2 number average molecular weight

a b c LI A Mn(xl04) Ρ-21 55 45 0 •-ch2ch2o—♦傘 i_ 1·8 Ρ-22 45 55 0 拿-ch2ch2o_« ο 一 0.8 Ρ-23 50 45 5拳- -ch2ch2ocnhch2ch2o - -ch2-ch- och2ch2oh 0.7 Ρ-24 50 45 5 卜 CH2CIi-CH2〇— OH -ch2-ch- 〇' ch2 \ / 4.0 Ρ-25 50 45 5 幸着 CH2CHO一·· I ch2oh -ch2-ch- 〇> CH2,g?r 4*0 Ρ-26 50 40 10 *-ch2ch2o— -ch2-ch- 1 OCH2CH3 4.0 Ρ-27 50 40 10 ♦»ch2ch2o—♦♦ -ch2-ch- ch3 4.0 Ρ-28 50 40 10 ♦-ch2ch2o—幸韋 -CH-CH- 1 COOH 5.0Abc LI A Mn(xl04) Ρ-21 55 45 0 •-ch2ch2o—♦ Umbrella i_ 1·8 Ρ-22 45 55 0 Take-ch2ch2o_« ο a 0.8 Ρ-23 50 45 5 punches - -ch2ch2ocnhch2ch2o - -ch2- Ch- och2ch2oh 0.7 Ρ-24 50 45 5 卜CH2CIi-CH2〇— OH -ch2-ch- 〇' ch2 \ / 4.0 Ρ-25 50 45 5 Fortunately CH2CHO I·I ch2oh -ch2-ch- 〇> CH2,g?r 4*0 Ρ-26 50 40 10 *-ch2ch2o— -ch2-ch- 1 OCH2CH3 4.0 Ρ-27 50 40 10 ♦»ch2ch2o—♦♦ -ch2-ch- ch3 4.0 Ρ-28 50 40 10 ♦-ch2ch2o—幸韦-CH-CH- 1 COOH 5.0

*表示聚合物主鏈側β **表示丙烯醯氧基側β 43 201042281* indicates that the polymer main chain side β ** indicates the propylene oxime side β 43 201042281

xx

-f CHa-^ -f CHa-CH^· 4e-fe =CH^ X y Zl Z2 n X_ B-f CHa-^ -f CHa-CH^· 4e-fe =CH^ X y Zl Z2 n X_ B

數均分子量 Mn(xl04) P-29 50 40 5 5 2 H -©<*-<»1- 5.0 o-a^CH3 P-30 50 35 5 10 2 H '•CHe-CH- 5.0 〇-C(CH3>3 P-31 40 40 10 10 4 CH3 4.0 +CFa-(fPfe +Y七 + Z七 數均分子量 Z Mn(xl04)Number average molecular weight Mn(xl04) P-29 50 40 5 5 2 H -© <*-<»1- 5.0 oa^CH3 P-30 50 35 5 10 2 H '•CHe-CH- 5.0 〇-C (CH3>3 P-31 40 40 10 10 4 CH3 4.0 +CFa-(fPfe +Y7+Z seven-number average molecular weight Z Mn(xl04)

CP3CP3

a b Y 作為用於本發明中的含氟固化樹脂的共聚物可如下獲 得:根據各種類型的聚合方法例如溶液聚合、沉澱聚合、 懸浮聚合、本體聚合和乳液聚合合成前體例如含有羥基的 聚合物,然後通過上述聚合物反應引入(甲基)丙烯醯基。所 述聚合可通過已知操作例如間歇系統、半連續系統和連續 系統進行。 44 201042281 對於聚合反應的引發,例如可使用利用自由基引發劑 的方法和照射光或者輕射線的方法。在例如TeijiAb Y as a copolymer of the fluorine-containing curing resin used in the present invention can be obtained by synthesizing a precursor such as a polymer having a hydroxyl group according to various types of polymerization methods such as solution polymerization, precipitation polymerization, suspension polymerization, bulk polymerization, and emulsion polymerization. Then, a (meth) acrylonitrile group is introduced by the above polymer reaction. The polymerization can be carried out by known operations such as a batch system, a semi-continuous system, and a continuous system. 44 201042281 For the initiation of the polymerization reaction, for example, a method using a radical initiator and a method of irradiating light or light rays can be used. In eg Teiji

Tsuruta的“Polymer Synthesis Method” 以及由 Nikkan Kogyo Newspaper Office (1971)出版的由 Takayuki Ohtsu和 Masayoshi Kinoshita编著的 “Polymer SynthesisTsuruta's "Polymer Synthesis Method" and "Polymer Synthesis" by Takayuki Ohtsu and Masayoshi Kinoshita, published by Nikkan Kogyo Newspaper Office (1971)

Method”(修订版),pp 124-154, Kagaku Dojin (1972) 中描述了這些聚合方法和聚合引發方法。 0 在這些聚合方法中,優選使用自由基引發劑的溶液聚 合。用於溶液聚合的溶劑的實例包括各種有機溶劑,例如 乙酸乙酯、乙酸丁酯、丙酮、甲基.乙基酮、甲基.異丁基酮、 環己酮、四氫呋喃、二氧六環、Ν,Ν-二曱基曱醯胺、n,N-二甲基乙醯胺、苯、曱苯、乙腈、二氯甲烷、氯仿、二氯 - 乙烷、曱醇、乙醇、1_丙醇、2-丙醇和1_丁醇。這些溶劑可 單獨使用或者作為其兩種或更多種的混合物使用或者可作 為與水的混合物使用。 Q 聚合溫度需要根據所產生的聚合物的分子量、引發劑 種類等設定,並且可選自0°C或者更低至10(rc或者更高, 但是優選在50〜100°C的溫度下進行聚合。 可適當選擇反應壓力,但是其通常為〇〇98〜98MPa(1 〜100kg/cm2),優選約為0.098〜2.94MPa(l〜30kg/cm2)。反 應時間約為5〜30㈣。祕所獲得聚合㈣再沉贿劑優 選為異丙醇、己院、甲醇等。對於含IL固化樹脂,也可使 可在市場上得到的那些產品。如此獲得的含氟固化樹脂 的使用量優選為1〇〜98品質%、且更優選為3〇〜95品質%, 45 201042281 基於用於所述低折射率層的塗覆組合物的總固體含量。尤 其是當組合使用所述無機細顆粒時,所述使用量優選為3〇 〜80品質%、且更優選為40〜75品質%。 2.4用於形成低折射率層的塗覆組合物 通常,用於形成用在本發明中的低折射率層的塗覆組 合物為液體形式,並且通過將所述含氟固化樹脂、合意地 含有的無機細顆粒、各種添加劑(如果需要的話)、以及自由 基聚合引發劑溶解在合適的溶劑中而製備。此時,根據效 用(use)對固體内容物的濃度進行適當選擇,但是其通常約 為0.01〜60品質%、優選〇5〜5〇品質%、更優選為卜加品 質 %。 口口 所述自由基聚合引發劑可為在施加熱時產生自由基的 引發劑類型或者在施加光時產生自由基的引發劑類型。對 於在施加熱時引發自由基聚合的化合物,可使用有機或者 無機過氧化物和有機偶氮或者重氮化合物。 更具體而言’所述有機過氧化物的實例包括過氧 Z、域過氧化笨甲醢、過氧化月桂酿、過氧化乙酿、 氧化物、氫過氧化枯烯和氫過氧化叔丁基;所 #過氧化物的實例包括過氧化氫、過硫酸銨和過硫酸 ^所述偶氮化合物的實例包括2,2、偶氮二異丁腈、2,2,_ 實例勺Γ腈和^,2 ·偶氣二環己燒二腈;所述重氮化合物的 1 =重氮氨絲和剩絲重氮化物。 當使用在施加光時自由基聚合的化合物時 ,通過 1輕射而使_化。所述光自由基聚合引發劑的實 46 201042281 例包括苯乙酮類、安息香類、二苯甲酮類、氫 + 麟類、输 酮類、葱醌類、噻噸酮類、偶氮化合物、過条 匕化物、2 3- 二烷基二酮化合物、二硫化合物、氟胺化合物和芳枚,~ 苯乙酮類的實例包括2,2-二乙氧基苯乙酮、對一夫錄。 甲基笨乙 酮、1-羥基二甲基苯基酮、1-羥基環己基笨基 -Ί、2-甲基 -1-(4-甲硫基本基)-2-嗎嘛基-1-丙嗣和2_节其^ 丞二甲氨基These polymerization methods and polymerization initiation methods are described in Method (pp. 124-154, Kagaku Dojin (1972). 0 Among these polymerization methods, solution polymerization using a radical initiator is preferred. Examples of the solvent include various organic solvents such as ethyl acetate, butyl acetate, acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, tetrahydrofuran, dioxane, hydrazine, hydrazine-di Mercaptoamine, n,N-dimethylacetamide, benzene, toluene, acetonitrile, dichloromethane, chloroform, dichloro-ethane, decyl alcohol, ethanol, 1-propanol, 2-propanol and 1-butanol. These solvents may be used singly or as a mixture of two or more thereof or as a mixture with water. Q The polymerization temperature needs to be set according to the molecular weight of the polymer produced, the type of the initiator, and the like. And may be selected from 0 ° C or lower to 10 (rc or higher, but preferably at a temperature of 50 to 100 ° C. The reaction pressure may be appropriately selected, but it is usually 〇〇98 to 98 MPa (1 〜 100kg/cm2), preferably about 0.098~2.94MPa (l~30kg/cm2) The reaction time is about 5 to 30 (4). The secret obtained by the secret (4) re-brittle agent is preferably isopropanol, hexanyl, methanol, etc. For the IL-containing resin, those products which are also available on the market can be obtained. The amount of the fluorine-containing curing resin to be used is preferably from 1 to 98% by mass, and more preferably from 3 to 95% by mass, and 45 201042281 is based on the total solid content of the coating composition for the low refractive index layer. When the inorganic fine particles are used in combination, the amount used is preferably from 3 to 80% by mass, and more preferably from 40 to 75% by mass. 2.4 A coating composition for forming a low refractive index layer is usually used. The coating composition for forming the low refractive index layer used in the present invention is in a liquid form, and by the fluorine-containing curing resin, the inorganic fine particles desirably contained, various additives (if necessary), and free radicals The polymerization initiator is prepared by dissolving in a suitable solvent. At this time, the concentration of the solid content is appropriately selected depending on the use, but it is usually about 0.01 to 60% by mass, preferably 〇5 to 55% by mass, Preferably, the amount of the radical polymerization initiator is the type of the initiator which generates a radical upon application of heat or the type of the initiator which generates a radical upon application of light. As the polymerized compound, an organic or inorganic peroxide and an organic azo or a diazo compound can be used. More specifically, examples of the organic peroxide include peroxy Z, domain peroxidation, and peroxidized laurel , oxidized ethylene, oxide, cumene hydroperoxide and t-butyl hydroperoxide; examples of the #peroxide include hydrogen peroxide, ammonium persulfate and persulfate. Examples of the azo compound include 2 , 2, azobisisobutyronitrile, 2, 2, _ example scoop nitrile and ^, 2 · dioxane dicyclohexanal dinitrile; 1 of the diazo compound = diazane and residual diazonium Compound. When a compound which radically polymerizes upon application of light is used, it is _ by a light shot. The photo-free radical polymerization initiator of the real 46 201042281 examples include acetophenones, benzoin, benzophenones, hydrogen + lin, ketones, onion, thioxanthone, azo compounds, Examples of the ruthenium halide, the 2 3-dialkyldione compound, the disulfide compound, the fluoroamine compound, and the aryl group, and the acetophenones include 2,2-diethoxyacetophenone, and the pair. Methyl acetophenone, 1-hydroxydimethyl ketone, 1-hydroxycyclohexyl styryl-indole, 2-methyl-1-(4-methylthio basic)-2-yl-yl-1- Propionin and 2_节^^丞dimethylamino

-1-(4-嗎啉基苯基)-丁酮。安息香類的實例包括安_香“ ^ 酸酯、安息香甲苯磺酸酯、安息香甲醚、安泉番 、 ’心'甘乙喊和安 息香異丙醚。二苯甲酮類的實例包括二苯甲顯|、& 厶,4*~二氣二 苯甲酮、4,4’-二氣二笨甲酮和對氣二苯曱酮。氣 乳化膦類的 實例包括2,4,6-三曱基笨甲醯基二苯基氧化膦。另 β 广,可優 選將增感染料與所述光自由基聚合引發劑組合使用。 對在施加熱或者光時引發自由基聚合的化合物的添加 量沒有限制,只要其可引發C-C雙鍵的聚合,並且添加^優 選為0.1〜15品質%、更優選為0.5〜10品質%、且甚至更優 選為2〜5品質%,基於用於形成所述低折射率層的組合物 的總固體含量。 2.5溶劑 對用於所述低折射率層的塗覆組合物中所含的溶劑沒 有具體限制,只要可使所述含氟固化樹脂溶解或者均勻分 散而不導致任何沉澱,並且可將兩種或者更多種溶劑組合 使用。其實例包括酮(例如,丙鲷、曱基.乙基酮和甲基異 丁基酮)、酯(例如,乙酸乙酯和乙酸丁酯)、醚(例如,四氫 咬喃和1,4-二氧六環)、醇(例如’甲醇、乙醇、異丙醇、丁 47 20104228 醇、己-▲ 26 〜醇)、芳烴(例如,曱苯和二甲苯)和水。 適且地包含在用於形成低折射率層的塗覆組合物中的 其他化合物 了啤予諸如光滑性和财指紋性的性質,可適當地添 加水和化興 ^ 等。 予叩,即已知的矽基或者氟基防指紋劑、潤滑劑 〜 *、、加這樣的添加劑的情況下,所述添加劑優選地以〇 %的Γ、%、更優選0〜10品質%、更進一步優選0〜5品質 圍添加,基於低折射率層的總固體含量。 劑、^迷低折射率層可含有無機填料、石夕烧偶聯劑、潤滑 偶聯劍Γ雜解。制是韻含有錢填料難、魏 °潤滑劑。魏偶聯劑的實例包括包含織 氣j的,基團、一基甲魏基、酿氧基或者酿 酿氣基 聯劑’並且更優選包含環氧基團、能聚合的 如 例如’(曱基)丙稀醯氧基)、或者能聚合的醯氨基(例 埽酿氨基、或者甲基丙烯醯氨基)的錢偶聯劑。 合物例Γ潤滑劑優選為引人了聚錢燒部分或者有機石夕化 〜甲基石夕氧炫的含氟化合物。 •7有機甲矽烷基化合物 =有㈣魏基化合物通過知㈣彡祕折射率居 =覆〜物巾的水解和/或縮合反心變成水解產物和曰/ 或^縮合物’料僅充當所述組合物中的黏合劑還改 善了耐驗性且使所述膜塗層軟化。 用在用於形成本發明低折射率層的塗覆組合物中 選有機甲魏基化合物包括由下式3表示的化合物。優 48 201042281 [式3] ν /η1-(4-morpholinylphenyl)-butanone. Examples of benzoin include benzoic acid esters, benzoin tosylate, benzoin methyl ether, Anquanfan, 'heart', and benzoin isopropyl ether. Examples of benzophenones include diphenyl显|, & 厶, 4*~ dibenzophenone, 4,4'-dioxadibenzophenone and p-benzophenone. Examples of gas-emulsified phosphines include 2,4,6-three Further, it is preferable to use a sensitizing dye in combination with the photoradical polymerization initiator. The amount of the compound which initiates radical polymerization upon application of heat or light is preferably used. There is no limitation as long as it can initiate polymerization of a CC double bond, and the addition is preferably 0.1 to 15% by mass, more preferably 0.5 to 10% by mass, and even more preferably 2 to 5 % by mass, based on the formation of the The total solid content of the composition of the low refractive index layer. 2.5 Solvent The solvent contained in the coating composition for the low refractive index layer is not particularly limited as long as the fluorine-containing cured resin can be dissolved or uniformly dispersed. Without causing any precipitation, and combining two or more solvents Examples thereof include ketones (for example, propionyl, decyl.ethyl ketone and methyl isobutyl ketone), esters (for example, ethyl acetate and butyl acetate), ethers (for example, tetrahydroanthracene and 1). , 4-dioxane), alcohol (eg 'methanol, ethanol, isopropanol, butyl 47 20104228 alcohol, hex- ▲ 26 ~ alcohol), aromatic hydrocarbons (eg, toluene and xylene) and water. Other compounds contained in the coating composition for forming the low refractive index layer have properties such as smoothness and fingerprinting, and water and chemical additives can be appropriately added. In the case of adding such an additive, the additive is preferably Γ% Γ, %, more preferably 0 to 10% by mass, still more preferably 0 to 5 by weight. Adding, based on the total solid content of the low refractive index layer. The agent, the low refractive index layer may contain an inorganic filler, a stone smelting coupling agent, and a lubricating coupled sword scorpion miscellaneous solution. °Lubricant. Examples of the coupling agent include a group containing a weaving gas, a group, a mesyl group, and a methoxy group. Brewing a gas-linking agent' and more preferably comprising an epoxy group, a polymerizable such as, for example, '(fluorenyl) acryloxy), or a polymerizable amide (for example, an amino group or a methacryl) The hydrazine coupling agent is preferably a fluorine-containing compound which is introduced into a polyanthracene portion or an organic sulfonate-methyl oxalate. (4) The Wei-based compound is improved by knowing (4) the refractive index of the coating = the hydrolysis and/or condensation of the towel, and the anti-heart becomes the hydrolyzate and the hydrazine/or condensate material only serves as a binder in the composition. The film coating is cured and the film coating is softened. The organic methylate compound used in the coating composition for forming the low refractive index layer of the present invention includes the compound represented by the following formula 3. Excellent 48 201042281 [Formula 3] ν /η

此處’ Χ,*·〇Η、鹵素原子、铺12基團或者,。C〇Ri2 土團’亚且R表示絲、烯基或者芳基。rI2表示狀 中_等於4,並且分別表示正整數。更具體而言土,r: 表不具有卜_碳數的取代或者未取代攸基(例如,甲 基、乙基、丙基、異丙基、丁基、己基和辛旬、具有2〜 1〇的碳數的取代或者未取代的稀基(例如,乙稀基、稀丙基 或者2-丁烯·ι_基)、或者具有6〜_碳數的取代或者未取 代的芳基齡祕或者細n與由Rll表示的院基 具有相同含義的基mRn或者Rl2絲的基團具有取二 基時,優選的取代基的實例包㈣素(例如,a、氯、漠)、 輕基、疏基、幾基、環氧基、烧基(例如,f基、乙基、異 =基、丙基、叔丁基)、芳基(例如,苯基、萘基)、芳族雜 %基團(例如”夫喃基、π比唾基、。比咬基)、烧氧基(例如, 甲乳基、乙氧基、異兩氧基、己氧基)、芳氧基(例如,笨氧 基)烧硫基(例如’甲硫基、乙硫基)、芳硫基(例如,苯硫 基)、婦基(例如’乙稀基、稀丙基)、醯氧基(例如,乙酸氧 基丙烯醯氧基、甲基内稀醯氧基)、炫氧It基(例如,甲氣 氣基、乙氧幾基)、芳氧幾基(例如苯氧幾基)、氨基甲酿基 類(例如’氨基曱醯基、N•甲餘基甲醯基、N,N_二甲基氨 基甲酿基、Ν'甲基辛基氨基甲酿基)和酿氨基(例如,乙 酿氨基、苯甲醯氨基、丙祕氨基、甲基丙烯酿氨基)。 式3的化合物通過包括水解和相互 縮合的所謂溶膠_;疑 49 201042281 膠法形成基體。式3的化合物由以下四個分子式表示。 [式 3a] Si(Xn)4 [式 3b] R"Si(Xn)3 [式 3c] Rn2Si(Xn)2 [式 3d] R113SiX11 下面詳細描述式3a組分。由式3a表示的化合物的具體 實例包括四甲氧基矽烷、四乙氧基矽烷、四異丙氧基矽烷、 四正丙氧基矽烷、四正丁氧基矽烷、四仲丁氧基矽烷和四 叔丁氧基矽烷。尤其優選四甲氧基矽烷和四乙氧基矽烷。 下面描述式3b組分。 在式3b組分中,R11表示與式3的R11具有相同含義的基 團,並且其實例包括烷基,例如曱基、乙基、正丙基和異 丙基、T -氣丙基、乙烯基、CF3CH2CH2CH2-、 c2f5ch2ch2ch2-、c3f7ch2ch2ch2-、c2f5ch2ch2-、 CF3OCH2CH2CH2-、C2F5OCH2CH2CHr、C3F7OCH2CH2CHr、 (CF3)2CHOCH2CH2CH2-、C4F9CH2OCH2CH2CH2-、3-(全氟環 己基氧基)丙基、h(cf2)4ch2och2ch2ch2-、 H(CF2)4CH2CH2CH2-、3-縮水甘油氧基丙基、3_丙烯醯氧丙 基、3-曱基丙烯醯氧丙基、3_魏丙基、笨基和3,4_環氧環己 基乙基。 X表示-OH、鹵素原子、_〇Ri2基團或者_〇c〇Ri2基團。 R12表示與式2的R"具有相同含義的基目,以及具有卜5的 石反數的烷氧基或者具有丨〜4的碳數的醯氧基。其實例包括 氣原子、甲氧基、乙氧基、正丙氧基、異丙氧基、正丁氧 50 201042281 基、仲丁氧基、叔丁氧基和乙醯氧基。 式3b組分的具體實例包括甲基三甲氧基矽烷、曱基三 乙氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、正 丙基三曱氧基矽烷、正丙基三乙氧基矽烷、異丙基三曱氧 基矽烷、異丙基三乙氧基矽烷、氯丙基三甲氧基矽烷、3-氯丙基三乙氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙 氧基矽烷、3-縮水甘油氧基丙基三曱氧基矽烷、3-縮水甘油 氧基丙基三乙氧基矽烷、3-丙烯醯氧丙基三甲氧基矽烷、 3-丙烯醯氧丙基三乙氧基矽烷、3-甲基丙烯醯氧丙基三曱氧 基矽烷、3-曱基丙烯醯氧丙基三乙氧基矽烷、3-毓丙基三甲 氧基矽烷、3-巯丙基三乙氧基矽烷、苯基三甲氧基矽烷、 苯基三乙氧基矽烷、3,4-環氧環己基乙基.三甲氧基矽烷、 3,4-環氧環己基乙基.三乙氧基矽烷、 CF3CH2CH2CH2Si(OCH3)3、C2H5CH2CH2CH2Si(OCH3)3、 C2F5CH2CH2Si(OCH3)3 、 C3F7CH2CH2CH2Si(OCH3)3 、 C2F5OCH2CH2CH2Si(OCH3)3、C3F7OCH2CH2CH2Si(OC2H5)3、 (CF3)2CHOCH2CH2CH2Si(OCH3)3、C4F9CH2OCH2CH2CH2Si(OCH3)3、 H(CF2)4CH2〇CH2CH2CH2Si(OCH3)3 和 3-(全氟環己基氧基)丙基 矽烷。 其中’優選具有氟原子的有機曱矽烷基化合物。如果 使用不具有氟原子的有機甲矽烷基化合物作為R,則優選使 用曱基三甲氧基石夕烧或者甲基三乙氧基矽燒。在這些有機 甲魏基化合物中’可使用其中的〜種或者組合使用 其中的兩種或者更多種。 51 201042281 下面描述式3c組分。 式3c組分為由下式表示的有機甲矽烷基化合物: R^SKXlHR11和X11與對於用作式3b組分的有機曱矽烷基 化合物所定義的R11和X11具有相同含義}。 此處,多個R11可不為相同的基團。所述有機甲矽烷基 化合物的具體實例包括二甲基二甲氧基矽烷、二甲基二乙 氧基矽烷、二乙基二甲氧基矽烷、二乙基二乙氧基矽烷、 二正丙基二甲氧基矽烷、二正丙基二乙氧基矽烷、二異丙 基二曱氧基矽烷、二異丙基二乙氧基矽烷、二苯基二甲氧 基矽烷、二苯基二乙氧基矽烷、(CF3CH2CH2)2Si(OCH3)2、 (CF3CH2CH2CH2)2Si(OCH3)2 、(C3F7OCH2CH2CH2)2Si(OCH3)2 、 [H(CF2)6CH2OCH2CH2CH2]2Si(OCH3)2 和(C2F5OCH2CH2)2Si(OCH3)2 〇 優選具有氟原子的有機甲矽烷基化合物。如果使用不具有 氟原子的有機甲矽烷基化合物作為R11,則優選二甲基二曱 氧基矽烷或者二甲基二乙氧基矽烷。在由式3c組分所表示 的有機甲矽烷基化合物中,可單獨使用其中的一種,或者 可組合使用其中的兩種或更多種。 下面描述式3d組分。 式3d組分為由下式表示的有機甲矽烷基化合物: Ru3SiXu{此處,R11和X11與對於用作式3b組分的有機甲矽 烷基化合物所定義的R11和X11具有相同的含義}。此處,多 個R11可不為相同的基團。所述有機甲矽烷基化合物的具體 實例包括三甲基曱氧基矽烷、三甲基乙氧基矽烷、三乙基 甲氧基石夕烧、三乙基乙氧基碎烧、三正丙基甲氧基石夕烧、 52 201042281 三正丙基乙氧基矽烧、三異丙基甲氧基矽炫、三異丙基乙 氧基矽烷、三苯基甲氧基矽烷和三苯基乙氧基矽烷。 在本發明中,式1〜式3d的各組分可單獨使用或者作為 其中的兩種或者更多種的混合物使用。當作為混合物使用 時,混合比為:式3b組分為〇〜1〇〇重量份、優選1〜60重量 份、且更優選1〜40重量份,基於1〇〇重量份的式3a組分; 式3c組分為〇〜1〇重量份、優選〇1〜5重量份、且更優選〇.5 0 〜3重量份,基於1〇〇重量份的式3a組分;式3d組分為〇〜10 : 重量份、優選0.1〜5重量份、且更優選0.5〜3重量份,基於 100重量份的式3a組分。在式3a〜式3d組分中’式3a組分的 比率優選為30品質%或更高,基於1〇〇品質%的總的有機甲 矽烷基化合物。當式允組分的比率為30品質%或者更高時, ‘ 其為合意的’因為不存在例如得到的膜塗層的可固化性 (curability)或者黏附力下降的問題。除了式如〜式%組分之 外’也可優選添加日本專利檔Jp A 2〇〇6_3〇74〇的第[〇〇39] Ο 段和第[0052]〜’7]段中所公開的那些化合物,或者可適 當地製備此處所描述的用於形成低折射率層的塗覆組合 物。 2.8低折射率層的製備 所述低折射率層魏通過如下紐形成:塗布含有中 空顆粒、含氟固化樹脂、有機甲矽烷基化合物、以及溶解 或者分散於其中的其他任選組分(如果有必要含有這些任 選組分的話)的塗覆組合物;和在塗覆的同時或者在塗覆和 乾燥之後通過施加熱或者電離輕射進行交聯或者聚合反應 53 201042281 向便塗層固化 y是當通過能電_射固化的化合物的交聯或者聚 成⑽科層時,所敍聯以聚合反應優選在 =料或者更低減敍的氣氛巾料。通過在1〇體積% 或者更低魏濃度的歧切祕折料層,可獲得具有 優異的物理強度和化學品耐受性的最外層。 氧氣滚度優選為6體積%或者更低、更優選為4體積%或 者更低t進-步優選為2體積%或者更低、最優選為^體 積%或者更低。 /憂選通的氣體、更優選用氮氣(氮氣吹掃)置換 空氣(氮氣濃度:約79體積%,氧氣濃度:_體積%)而將 氧氣濃度調節至10體積%或者更低。 實施例1 使用110目的凹版塗布機(gravure c〇ater)將用於高折射 率的高硬度層的塗覆組合物塗布在厚纟為8()_的三醋酸 纖維素基底(TAC-TD80U,折射率:丨49,由Fuji ph〇t〇 Film Co.,Ltd·製造)上’在l〇(TC下乾燥2分鐘 ,並且通過用紫外 線照射而固化以形成具有4·2μιη的厚度和151的折射率的 南折射率的高硬度層。 接著’使用180目的凹版塗布機將用於低折射率層的塗 覆組合物塗布在所述高折射率的高硬度層 上,在100°C下乾 燥2分鐘’並且通過UV照射而固化以形成具有11〇細的厚度 和1.36的折射率的低折射率層。由此獲得本發明的抗反射 膜。 54 201042281 實施例2 使用110目的凹版塗布機將用於高折射率的高硬度層 的塗覆組合物塗布在厚度為⑽阿的三醋酸纖維素基底 (TAC-TD80U ’ 折射率:i 49,由邮 ph〇t〇 Film c〇 Ud 製造)上’在100 c下乾燥2分鐘,並且通過用紫外線照射而 固化以形成具有4.5μπι的厚度和154的折射率的高折射率 的高硬度層。 0 接著’使用180目的凹版塗布機將用於低折射率層的塗 覆組合物塗布在所述高折射率的高硬度層上,在1〇〇<3(:下乾 燥2分鐘’並且通過UV照射而固化以形成具有11〇nm的厚度 和1.36的折射率的低折射率層。由此獲得本發明的抗反射 膜。根據下面的方法評價所得抗反射膜。 λ . 實施例3 使用110目的凹版塗布機將用於高折射率的高硬度層 的塗覆組合物塗布在厚度為8〇μΓη的三醋酸纖維素基底 Q (TAC-TD80U,折射率:1.49,由Fuji Photo Film Co.,Ltd. 製造)上,在100°c下乾燥2分鐘,並且通過用紫外線照射而 固化以形成具有4·6μπι的厚度和1.57的折射率的高折射率 的高硬度層。 接著’使用180目的凹版塗布機將用於低折射率層的盡 覆組合物塗布在所述高折射率的高硬度層上,在l〇〇°c下乾 燥2分鐘,並且通過UV照射而固化以形成具有li〇nin的厚度 和1.36的折射率的低折射率層。由此獲得本發明的抗反射 膜0 55 201042281 實施例4 使用110目的凹版塗覆機將用於高折射率的高硬度層 的塗覆組合物塗布在厚度為的三醋酸纖維素基底 (TAC-TD80U,折射率:ι·49,由Fuji Photo Film Co.,Ltd. 製造)上,在100°c下乾燥2分鐘,並且通過用紫外線照射而 固化以形成具有4.3μιη的厚度和1 _54的折射率的高折射率 的高硬度層。 接著,使用180目的凹版塗布機將用於低折射率層的塗 覆組合物塗布在所述高折射率的高硬度層上,在 燥2分鐘,並且通過UV照射而固化以形成具有丨15nm的厚度 和1.33的折射率的低折射率層。由此獲得本發明的抗反射 膜。 實施例5 使用110目的凹版塗布機將用於高折射率的高硬度層 的塗覆組合物塗布在厚度為80μηι的三醋酸纖維素基底 (TAC-TD80U,折射率:1.49,由 Fuji Photo Film Co.,Ltd. 製造)上’在100°c下乾燥2分鐘,並且通過用紫外線照射而 固化以形成具有4.2μιη的厚度和1.54的折射率的高折射率 的高硬度層。 接著’使用180目的凹版塗布機將用於低折射率層的塗 覆組合物塗布在所述高折射率的高硬度層上’在10〇°C下乾 燥2分鐘,並且通過UV照射而固化以形成具有110nm的厚度 和1.36的折射率的低折射率層。由此獲得本發明的抗反射 膜0 56 201042281 實施例6 使用110目的凹版塗布機將用於高折射率的高硬度層 的塗覆組合物塗布在厚度為8〇μηι的三醋酸纖維素基底 (TAC-TD80U ’ 折射率:! 49,由Fuji Photo Film Co.,Ltd. 製造)上,在100°C下乾燥2分鐘,並且通過用紫外線照射而 固化以形成具有4·2μιη的厚度和1.54的折射率的高折射率 的高硬度層。 0 接著’使用180目的凹版塗布機將用於低折射率層的塗 , 覆組合物塗布在所述高折射率的高硬度層上,在l〇(TC下乾 燥2分鐘’並且通過uv照射而固化以形成具有丨10nm的厚度 和1.38的折射率的低折射率層。由此獲得本發明的抗反射 膜。 . 對比例1 使用110目的凹版塗布機將用於高折射率的高硬度層 的塗覆組合物塗布在厚度為8〇μηι的三醋酸纖維素基底 〇 (TAC_TD80U,折射率:1.49,由Fuji Photo Film Co” Ltd. 製造)上,在loot下乾燥2分鐘,並且通過用紫外線照射而 固化以形成具有4·3μιη的厚度和[45的折射率❺高折射率 的高硬度層。 接著’使用180目的凹版塗布機將用於低折射率層的塗 覆組合物塗布在所述高折射率的高硬度層上,在则。c下乾 紐2分鐘,並且通過Uv照射而固化以形成具有i 1〇咖的厚度 和1.36的折射率的低折射率層。由此獲得根據對比例的抗 反射膜。 57 201042281 對比例2 使用110目的凹版塗布機將用於高折射率的高硬度層 的塗覆組合物塗布在厚度為80μΓη的三醋酸纖維素基底 (TAC_TD80U,折射率:1.49,由Fuji Photo Film Co.,Ltd. 製造)上’在loot下乾燥2分鐘,並且通過用紫外線照射而 固化以形成具有3·9μηι的厚度和1.48的折射率的高折射率 的高硬度層。 接著’使用180目的凹版塗布機將用於低折射率層的塗 覆組合物塗布在所述高折射率的高硬度層上,在10(TC下乾 燥2分鐘’並且通過^^照射而固化以形成具有11〇mn的厚度 和1.36的折射率的低折射率層。由此獲得根據對比例的抗 反射膜。 對比例3 使用110目的凹版塗布機將用於高折射率的高硬度層 的塗覆組合物塗布在厚度為8〇μιη的三醋酸纖維素基底 (TAC-TD80U ’ 折射率:149,由 Fuji Photo Film Co.,Ltd. 製造)上’在10(TC下乾燥2分鐘’並且通過用紫外線照射而 固化以形成具有4.5μηι的厚度和丨·63的折射率的高折射率 的尚硬度層。 接著’使用180目的凹版塗布機將用於低折射率層的塗 覆组合物塗布在所述高折射率的高硬度層上,在1〇〇〇c下乾 燥2分鐘,並且通過UV照射而固化以形成具有11〇nm的厚度 和1.36的折射率的低折射率層。由此獲得根據對比例的抗 反射膜。 58 201042281 對比例4 使用110目的凹版塗布機將用於高折射率的高硬度層 的塗覆組合物塗布在厚度為8〇μπ1的三醋酸纖維素基底 (TAC-TD80U ’ 折射率:! 49,由ph〇t〇 Hlm c〇·, Ltd. 製造)上’在100°c下乾燥2分鐘,並且通過用紫外線照射而 固化以形成具有4.2μιη的厚度和1.68的折射率的高折射率 的高硬度層。 0 接著’使用180目的凹版塗布機將用於低折射率層的塗 , 覆組合物塗布在所述高折射率的高硬度層上,在loot:下乾 燥2分鐘’並且通過UV照射而固化以形成具有i 10nm的厚度 和1.36的折射率的低折射率層。由此獲得根據對比例的抗 ' 反射膜。 . 對比例5 使用110目的凹版塗布機將用於高折射率的高硬度層 的塗覆組合物塗布在厚度為8〇μπ1的三醋酸纖維素基底 Q (TAC_TD80U ’ 折射率:1.49,由 Fuji Photo Film Co.,Ltd· 製造)上’在100°c下乾燥2分鐘,並且通過用紫外線照射而 固化以形成具有4·2μιη的厚度和丨.54的折射率的高折射率 的南硬度層。 接著’使用180目的凹版塗布機將用於低折射率層的塗 覆組合物塗布在所述高折射率的高硬度層上,在1〇〇〇c下乾 燥2分鐘’並且通過UV照射而固化以形成具有110nm的厚度 和1_43的折射率的低折射率層。由此獲得根據對比例的抗 反射膜。 59 201042281 對比例6 使用110目的凹版塗布機將用於高折射率的高硬度層 的塗覆組合物塗布在厚度為80μπι的三醋酸纖維素基底 (TAC-TD80U > : 1.49 ' *Fuji Photo Film Co., Ltd. 製造)上,在100 C下乾燥2分鐘,並且通過用紫外線照射而 固化以形成具有4·2μηι的厚度和1.54的折射率的高折射率 的高硬度層。 接著’使用180目的凹版塗布機將用於低折射率層的塗 覆組合物塗布在所述高折射率的高硬度層上,在1〇(rc下乾 燥2分鐘’並且通過UV照射而固化以形成具有1 ι〇ηΐΏ的厚度 和1.48的折射率的低折射率層。由此獲得根據對比例的抗 反射膜。 根據下面的測試實施例評價由上述實施例和對比例製 造的抗反射膜,結果示於表1中。 [測試實施例1 :表面反射率的評價] 在將黑色防眩光帶(antiglare tape)或者防眩光塗料用 於所述抗反射膜的相反側上而將所述膜的背面處理為黑色 之後,使用UV分光光度計(ShimazuUV-PC3600)測量在380 〜780nm波長範圍内在5°C入射角(=反射角)下的表面反射 率。所獲得的反射光譜示於第2圖中。計算480〜680nm範圍 内的平均鏡面反射率以評價抗反射性能。 [測試實施例2 ··彩虹效應的評價] 在將黑色防眩光帶或者防眩光塗料用於A4尺寸抗反射 膜的相反側上而將所述膜的背面處理為黑色之後,在白熾 60 201042281 燈下用肉眼檢測彩虹效應。彩虹效應的評價結果表示為: ◎(優異),〇(良好),△(正常)和x(差)。 [表1]Here, 'Χ, *·〇Η, a halogen atom, a 12 group or a. C〇Ri2 earth group 'sub and R represents a silk, alkenyl or aryl group. rI2 indicates that _ is equal to 4 and represents a positive integer, respectively. More specifically, soil: r: a substituted or unsubstituted fluorenyl group having no carbon number (for example, methyl, ethyl, propyl, isopropyl, butyl, hexyl and octyl, having 2 to 1) a substituted or unsubstituted dilute group of a carbon number of hydrazine (for example, an ethylene group, a propyl group or a 2-butene group), or a substituted or unsubstituted aryl group having a carbon number of 6 to _ Or a group in which n is the same as the group of the mRn or Rl2 filament having the same meaning as the nominee represented by R11, and an example of a preferred substituent is a tetracycline (for example, a, chlorine, desert), light base, Sulfhydryl, alkyl, epoxy, alkyl (eg, f, ethyl, iso-, propyl, t-butyl), aryl (eg, phenyl, naphthyl), aromatic heteropoly a group (for example, "fumanyl, π-saltyl, butyl", alkoxy (for example, methyl lactyl, ethoxy, isoxyloxy, hexyloxy), aryloxy (for example, stupid) Oxygen) sulfur-based (eg, 'methylthio, ethylthio), arylthio (eg, phenylthio), phenyl (eg, 'ethenyl, propyl), decyloxy (eg, acetic acid) Oxypropenyloxy, Methyl endo-oxyalkyl), oxy-oxyl-based (for example, a gas-methyl group, ethoxy group), an aryloxy group (such as a phenoxy group), a mercapto group (for example, 'amino oxime) Base, N. methyl carbyl decyl, N, N dimethyl carbyl, Ν 'methyl octyl amide, and aryl amino (eg, amino, benzylamino, propyl The amino group, the methacrylic acid and the amino group. The compound of the formula 3 is formed into a matrix by a so-called sol _; suspect 49 201042281 gel method. The compound of the formula 3 is represented by the following four molecular formulas. [Formula 3a] Si ( Xn)4 [Formula 3b] R"Si(Xn)3 [Formula 3c] Rn2Si(Xn)2 [Formula 3d] R113SiX11 The composition of the formula 3a is described in detail below. Specific examples of the compound represented by the formula 3a include tetramethoxy Decane, tetraethoxy decane, tetraisopropoxy decane, tetra-n-propoxy decane, tetra-n-butoxy decane, tetra-sec-butoxy decane and tetra-tert-butoxy decane. Particularly preferred is tetramethoxy decane. And tetraethoxy decane. The component of formula 3b is described below. In the component of formula 3b, R11 represents a group having the same meaning as R11 of formula 3, and Examples include alkyl groups such as decyl, ethyl, n-propyl and isopropyl, T-methylpropyl, vinyl, CF3CH2CH2CH2-, c2f5ch2ch2ch2-, c3f7ch2ch2ch2-, c2f5ch2ch2-, CF3OCH2CH2CH2-, C2F5OCH2CH2CHr, C3F7OCH2CH2CHr, (CF3 2CHOCH2CH2CH2-, C4F9CH2OCH2CH2CH2-, 3-(perfluorocyclohexyloxy)propyl, h(cf2)4ch2och2ch2ch2-, H(CF2)4CH2CH2CH2-, 3-glycidoxypropyl, 3-propyleneoxypropyl 3-mercaptopropenyloxypropyl, 3-propionyl, stupyl and 3,4-epoxycyclohexylethyl. X represents -OH, a halogen atom, a _R2 group or a _〇c〇Ri2 group. R12 represents a group having the same meaning as R" of the formula 2, and an alkoxy group having the inverse of the stone of the formula 5 or a decyloxy group having a carbon number of 丨4. Examples thereof include a gas atom, a methoxy group, an ethoxy group, a n-propoxy group, an isopropoxy group, a n-butoxy group 50 201042281 group, a sec-butoxy group, a t-butoxy group and an ethoxy group. Specific examples of the component of the formula 3b include methyltrimethoxydecane, decyltriethoxydecane, ethyltrimethoxydecane, ethyltriethoxydecane, n-propyltrimethoxydecane, n-propyl Triethoxy decane, isopropyl trimethoxy decane, isopropyl triethoxy decane, chloropropyl trimethoxy decane, 3-chloropropyl triethoxy decane, vinyl trimethoxy decane, Vinyl triethoxy decane, 3-glycidoxypropyl trimethoxy decane, 3-glycidoxypropyl triethoxy decane, 3-propenyl methoxypropyl trimethoxy decane, 3- Propylene oxiranyl triethoxy decane, 3-methyl propylene oxypropyl tridecyl decane, 3-mercapto propylene oxypropyl triethoxy decane, 3-mercaptopropyl trimethoxy decane , 3-mercaptopropyltriethoxydecane, phenyltrimethoxydecane, phenyltriethoxydecane, 3,4-epoxycyclohexylethyl.trimethoxydecane, 3,4-epoxy ring Hexylethyl.triethoxydecane, CF3CH2CH2CH2Si(OCH3)3, C2H5CH2CH2CH2Si(OCH3)3, C2F5CH2CH2Si(OCH3)3, C3F7CH2CH2CH2Si(OCH3)3, C2F5OCH2CH2CH2Si(OCH3)3 C3F7OCH2CH2CH2Si (OC2H5) 3, (CF3) 2CHOCH2CH2CH2Si (OCH3) 3, C4F9CH2OCH2CH2CH2Si (OCH3) 3, H (CF2) 4CH2〇CH2CH2CH2Si (OCH3) 3 and 3- (perfluoro cyclohexyl) propyl Silane. Among them, an organic decyl group compound having a fluorine atom is preferred. If an organomethylalkylene compound having no fluorine atom is used as R, it is preferred to use mercaptotrimethoxysulfate or methyltriethoxysulfonate. Among these organic methylation compounds, one of them or a combination of two or more of them may be used. 51 201042281 The composition of formula 3c is described below. The component of the formula 3c is an organocarboalkyl compound represented by the formula: R^SKXlHR11 and X11 have the same meanings as R11 and X11 defined for the organodecyl group compound used as the component of the formula 3b}. Here, a plurality of R11 may not be the same group. Specific examples of the organocarboalkylene compound include dimethyldimethoxydecane, dimethyldiethoxydecane, diethyldimethoxydecane, diethyldiethoxydecane, and di-n-propyl Dimethoxy decane, di-n-propyldiethoxy decane, diisopropyl decyloxydecane, diisopropyldiethoxy decane, diphenyldimethoxydecane, diphenyl Ethoxy decane, (CF3CH2CH2)2Si(OCH3)2, (CF3CH2CH2CH2)2Si(OCH3)2, (C3F7OCH2CH2CH2)2Si(OCH3)2, [H(CF2)6CH2OCH2CH2CH2]2Si(OCH3)2 and (C2F5OCH2CH2)2Si ( OCH3)2 〇 is preferably an organocarboalkyl compound having a fluorine atom. If an organic formamidine compound having no fluorine atom is used as R11, dimethyldimethoxy decane or dimethyldiethoxy decane is preferred. In the organocarboalkylene compound represented by the component of the formula 3c, one of them may be used singly or two or more of them may be used in combination. The composition of formula 3d is described below. The component of the formula 3d is an organocarboalkyl compound represented by the following formula: Ru3SiXu{here, R11 and X11 have the same meanings as R11 and X11 defined for the organocarboalkyl compound used as the component of the formula 3b}. Here, a plurality of R11 may not be the same group. Specific examples of the organocarboalkylene compound include trimethyl decyl decane, trimethyl ethoxy decane, triethyl methoxy sulphur, triethyl ethoxy calcination, and tri-n-propyl Oxylate, 52 201042281 Tri-n-propyl ethoxy oxime, triisopropyl methoxy oxime, triisopropyl ethoxy decane, triphenyl methoxy decane and triphenyl ethoxy Decane. In the present invention, the components of the formulae 1 to 3d may be used singly or as a mixture of two or more of them. When used as a mixture, the mixing ratio is: the composition of the formula 3b is 〇~1 〇〇 by weight, preferably 1 to 60 parts by weight, and more preferably 1 to 40 parts by weight, based on 1 part by weight of the component of the formula 3a The composition of the formula 3c is 〇1 to 1 part by weight, preferably 〇1 to 5 parts by weight, and more preferably 〇0.50 to 3 parts by weight, based on 1 part by weight of the component of the formula 3a; the component of the formula 3d is 〇 10 : 10 parts by weight, preferably 0.1 to 5 parts by weight, and more preferably 0.5 to 3 parts by weight based on 100 parts by weight of the component of the formula 3a. The ratio of the component of the formula 3a in the components of the formula 3a to the formula 3d is preferably 30% by mass or more based on 1% by mass of the total of the organomethylalkylene compound. When the ratio of the component to the component is 30% by mass or more, it is 'desirable' because there is no problem such as curability of the obtained film coating or a decrease in adhesion. In addition to the formula such as the ~% component, it is also preferable to add the Japanese Patent Document Jp A 2〇〇6_3〇74〇, [〇〇39] 和 and [0052] to '7]. Those compounds, or a coating composition for forming a low refractive index layer described herein, may be suitably prepared. 2.8 Preparation of Low Refractive Index Layer The low refractive index layer is formed by coating a hollow particle, a fluorine-containing cured resin, an organic formamidine compound, and other optional components dissolved or dispersed therein (if any) a coating composition necessary to contain these optional components; and crosslinking or polymerization by applying heat or ionizing light at the same time as coating or after coating and drying 53 201042281 The curing of the coating is y When cross-linking or agglomerating into a (10) family layer by an electro-curable compound, the polymerization is preferably carried out in an atmosphere which is preferably a material or a lower reductive. The outermost layer having excellent physical strength and chemical resistance can be obtained by the cleavage layer at a concentration of 1% by volume or less. The oxygen rolling degree is preferably 6% by volume or less, more preferably 4% by volume or less, and further preferably 2% by volume or less, most preferably 2% by volume or less. The gas of the singularity is more preferably replaced with nitrogen (nitrogen purge: nitrogen gas concentration: about 79% by volume, oxygen concentration: _vol%) to adjust the oxygen concentration to 10% by volume or less. Example 1 A coating composition for a high-refractive-index high-hardness layer was coated on a triacetate cellulose substrate (TAC-TD80U, having a thickness of 8 ()_ using a 110-gauge gravure coater (gravure c〇ater). Refractive index: 丨49, manufactured by Fuji ph〇t〇 Film Co., Ltd.) was dried at 1 Torr (TC for 2 minutes, and cured by irradiation with ultraviolet rays to form a thickness of 4.2 μm and 151). a high hardness layer of the south refractive index of the refractive index. Next, a coating composition for the low refractive index layer is coated on the high refractive index high hardness layer using a 180-mesh gravure coater, and dried at 100 ° C 2 minutes' and cured by UV irradiation to form a low refractive index layer having a thickness of 11 Å and a refractive index of 1.36. Thus, the antireflection film of the present invention was obtained. 54 201042281 Example 2 Using a 110 gravure coater A coating composition for a high refractive index high hardness layer is coated on a cellulose triacetate substrate having a thickness of (10) (TAC-TD80U 'refractive index: i 49, manufactured by ph〇t〇Film c〇Ud) 'Dry at 100 c for 2 minutes and by UV irradiation And cured to form a high refractive index high refractive layer having a thickness of 4.5 μm and a refractive index of 154. 0 Next, a coating composition for a low refractive index layer was coated on the high refractive index using a 180-mesh gravure coater. On the high hardness layer of the rate, it was cured at 1 〇〇 <3 (: 2 min after drying) and cured by UV irradiation to form a low refractive index layer having a thickness of 11 〇 nm and a refractive index of 1.36. Inventive antireflection film. The obtained antireflection film was evaluated according to the following method. λ. Example 3 A coating composition for a high refractive index high hardness layer was coated with a thickness of 8 〇μΓ using a 110-mesh gravure coater. A cellulose triacetate substrate Q (TAC-TD80U, refractive index: 1.49, manufactured by Fuji Photo Film Co., Ltd.), dried at 100 ° C for 2 minutes, and cured by irradiation with ultraviolet rays to form having 4· a high-hardness layer having a thickness of 6 μm and a refractive index of 1.57. Next, a coating composition for a low refractive index layer is coated on the high-refractive-index high-hardness layer using a 180-gauge gravure coater, Dry at l〇〇°c 2 minutes, and cured by UV irradiation to form a low refractive index layer having a thickness of li〇nin and a refractive index of 1.36. Thus, an antireflection film of the present invention was obtained. 0 55 201042281 Example 4 Gravure coating machine using 110 mesh A coating composition for a high-refractive-index high-hardness layer was coated on a triacetate substrate (TAC-TD80U, refractive index: i. 49, manufactured by Fuji Photo Film Co., Ltd.) having a thickness of It was dried at 100 ° C for 2 minutes, and cured by irradiation with ultraviolet rays to form a high refractive index high hardness layer having a thickness of 4.3 μm and a refractive index of 1 to 54. Next, a coating composition for a low refractive index layer was coated on the high refractive index high hardness layer using a 180-mesh gravure coater, dried for 2 minutes, and cured by UV irradiation to form a film having 丨15 nm. A low refractive index layer having a thickness and a refractive index of 1.33. Thus, the antireflection film of the present invention was obtained. Example 5 A coating composition for a high refractive index high hardness layer was coated on a triacetate cellulose substrate (TAC-TD80U, refractive index: 1.49, by Fuji Photo Film Co, having a thickness of 80 μm using a 110-gauge gravure coater. .. manufactured.) was dried at 100 ° C for 2 minutes and cured by irradiation with ultraviolet rays to form a high refractive index high hardness layer having a thickness of 4.2 μηη and a refractive index of 1.54. Then, the coating composition for the low refractive index layer was coated on the high refractive index high hardness layer using a 180-mesh gravure coater to dry at 10 ° C for 2 minutes, and cured by UV irradiation. A low refractive index layer having a thickness of 110 nm and a refractive index of 1.36 was formed. Thus, the antireflection film of the present invention was obtained. 0 56 201042281 Example 6 A coating composition for a high refractive index high hardness layer was coated on a triacetate cellulose substrate having a thickness of 8 μm using a 110 gravure coater ( TAC-TD80U 'refractive index: ! 49, manufactured by Fuji Photo Film Co., Ltd.), dried at 100 ° C for 2 minutes, and cured by irradiation with ultraviolet rays to form a thickness of 4. 2 μm and 1.54. A high-refractive layer of high refractive index of refractive index. 0 Next, the coating composition for the low refractive index layer was coated on the high refractive index high hardness layer using a 180-gauge gravure coater, dried at 1 Torr (2 minutes under TC) and irradiated by uv. It was cured to form a low refractive index layer having a thickness of 丨10 nm and a refractive index of 1.38. Thus, the antireflection film of the present invention was obtained. Comparative Example 1 A high-hardness layer for high refractive index was used using a 110-mesh gravure coater. The coating composition was coated on a cellulose triacetate substrate (TAC_TD80U, refractive index: 1.49, manufactured by Fuji Photo Film Co., Ltd.) having a thickness of 8 μm, dried under a loot for 2 minutes, and irradiated with ultraviolet rays. And curing to form a high hardness layer having a thickness of 4·3 μηη and a refractive index 45 high refractive index of 45. Next, a coating composition for a low refractive index layer is coated at the height using a 180-mesh gravure coater. On the high hardness layer of the refractive index, the bond was dried for 2 minutes, and cured by Uv irradiation to form a low refractive index layer having a thickness of i 1 〇 和 and a refractive index of 1.36. Anti-reflective film 57 201042281 Comparative Example 2 A coating composition for a high-refractive-index high-hardness layer was coated on a triacetate cellulose substrate (TAC_TD80U, refractive index: 1.49, by Fuji Photo Film) having a thickness of 80 μΓ using a 110-gauge gravure coater. Co., Ltd. manufactured) was dried under a loot for 2 minutes, and cured by irradiation with ultraviolet rays to form a high-refractive-index high-hardness layer having a thickness of 3·9 μηι and a refractive index of 1.48. A gravure coater coats a coating composition for a low refractive index layer on the high refractive index high hardness layer, dried at 10 (TC for 2 minutes ' and cured by irradiation to form 11 〇 mn A low refractive index layer having a thickness and a refractive index of 1.36. Thus, an antireflection film according to a comparative example was obtained. Comparative Example 3 A coating composition for a high refractive index high hardness layer was coated with a 110-mesh gravure coater. A cellulose triacetate substrate (TAC-TD80U 'refractive index: 149, manufactured by Fuji Photo Film Co., Ltd.) having a thickness of 8 μm was dried at 10 (dry for 2 minutes at TC) and cured by irradiation with ultraviolet rays. A high refractive index hardness layer having a thickness of 4.5 μm and a refractive index of 丨·63 is formed. Next, a coating composition for a low refractive index layer is coated on the high refractive index using a 180-mesh gravure coater. On the high hardness layer, it was dried at 1 ° C for 2 minutes, and cured by UV irradiation to form a low refractive index layer having a thickness of 11 〇 nm and a refractive index of 1.36. Thus, antireflection according to the comparative example was obtained. membrane. 58 201042281 Comparative Example 4 A coating composition for a high-refractive-index high-hardness layer was coated on a triacetate cellulose substrate (TAC-TD80U 'refractive index: ! 49, having a thickness of 8 μ μπ 1 using a 110-gauge gravure coater. It was dried by ph〇t〇Hlm c〇·, Ltd.) at '100 ° C for 2 minutes, and cured by irradiation with ultraviolet rays to form a high refractive index having a thickness of 4.2 μm and a refractive index of 1.68. Hardness layer. 0 Next, the coating composition for the low refractive index layer was coated on the high refractive index high hardness layer using a 180-mesh gravure coater, dried under a loot: 2 minutes' and cured by UV irradiation. A low refractive index layer having a thickness of i 10 nm and a refractive index of 1.36 was formed. Thus, an anti-reflection film according to the comparative example was obtained. Comparative Example 5 A coating composition for a high refractive index high hardness layer was coated on a triacetate substrate Q having a thickness of 8 〇μπ1 using a 110-mesh gravure coater (TAC_TD80U' refractive index: 1.49, by Fuji Photo Film Co., Ltd. manufactured) was dried at 100 ° C for 2 minutes, and cured by irradiation with ultraviolet rays to form a high refractive index south hardness layer having a thickness of 4·2 μηη and a refractive index of 丨.54. Then, a coating composition for a low refractive index layer was coated on the high refractive index high hardness layer using a 180-mesh gravure coater, dried at 1 °c for 2 minutes' and cured by UV irradiation. To form a low refractive index layer having a thickness of 110 nm and a refractive index of 1 to 43. Thus, an antireflection film according to the comparative example was obtained. 59 201042281 Comparative Example 6 A coating composition for a high-refractive-index high-hardness layer was coated on a triacetate substrate having a thickness of 80 μm using a 110-gauge gravure coater (TAC-TD80U >: 1.49 ' *Fuji Photo Film Co., Ltd., manufactured by Co., Ltd., was dried at 100 C for 2 minutes, and cured by irradiation with ultraviolet rays to form a high refractive index high hardness layer having a thickness of 4·2 μm and a refractive index of 1.54. Next, a coating composition for a low refractive index layer was coated on the high refractive index high hardness layer using a 180-mesh gravure coater, dried at 1 Torr (2 minutes under rc' and cured by UV irradiation. A low refractive index layer having a thickness of 1 〇 〇 ΐΏ and a refractive index of 1.48 was formed. Thus, an antireflection film according to the comparative example was obtained. The antireflection film produced by the above examples and comparative examples was evaluated according to the following test examples, The results are shown in Table 1. [Test Example 1: Evaluation of surface reflectance] A black anti-glare tape or an anti-glare paint was applied to the opposite side of the anti-reflection film while the film was After the backside treatment was black, the surface reflectance at an incident angle (=reflection angle) of 5 ° C in the wavelength range of 380 to 780 nm was measured using a UV spectrophotometer (Shimazu UV-PC3600). The obtained reflection spectrum is shown in Fig. 2 The average specular reflectance in the range of 480 to 680 nm was calculated to evaluate the antireflection performance. [Test Example 2 · Evaluation of rainbow effect] A black antiglare tape or antiglare coating was used for the A4 size antireflection film. On the opposite side, after treating the back side of the film as black, the rainbow effect was visually detected under the lamp of Incand 60 201042281. The evaluation results of the rainbow effect are expressed as: ◎ (excellent), 〇 (good), △ (normal) and x (poor). [Table 1]

高折射率的 高硬度層的 折射率(nl) 低折射率 層的折射 率(n2) 在 480-680nm 範 圍内的平均表 面反射率(%) 彩虹 效應 實施例1 1.51 1.36 0.32 〇 實施例2 1.54 1.36 0.25 ◎ 實施例3 1.57 1.36 0.35 〇 實施例4 1.54 1.33 0.15 ◎ 實施例5 1.54 1.36 0.25 ◎ 實施例6 1.54 1.38 0.40 〇 對比例1 1.45 1.36 0.92 Δ 對比例2 1.48 1.36 1.12 Δ 對比例3 1.63 1.36 1.16 Δ 對比例4 1.68 1.36 1.25 X 對比例5 1.54 1.43 1.23 X 對比例6 1.54 1.48 1.34 X 雖然具有1 %或者更高的表面反射率的現有技術抗反 射膜由於可從第2圖看出的反射光譜的大的振幅而顯示出 差的彩虹效應,但是根據本發明的抗反射膜具有〇·4%或者 更低的平均表面反射率,並且由於反射光譜振幅的大大降 低而具有優異的彩虹效應。此外,可從表1中看出,在480 〜680nm波長範圍内在5°C的入射角下,本發明的實施例具 有0.4%或者更低的非常低的平均表面反射率,由此實現了 降低的彩虹效應。因此,本發明的抗反射膜具有非常低的 反射率、優異的彩虹效應等效果。 【圖式簡單說明】Refractive index of high refractive index high hardness layer (nl) Refractive index of low refractive index layer (n2) Average surface reflectance (%) in the range of 480-680 nm Rainbow effect Example 1 1.51 1.36 0.32 〇 Example 2 1.54 1.36 0.25 ◎ Example 3 1.57 1.36 0.35 〇 Example 4 1.54 1.33 0.15 ◎ Example 5 1.54 1.36 0.25 ◎ Example 6 1.54 1.38 0.40 〇 Comparative Example 1. 1.45 1.36 0.92 Δ Comparative Example 2 1.48 1.36 1.12 Δ Comparative Example 3 1.63 1.36 1.16 Δ Comparative Example 4 1.68 1.36 1.25 X Comparative Example 5 1.54 1.43 1.23 X Comparative Example 6 1.54 1.48 1.34 X Although the prior art antireflection film having a surface reflectance of 1% or higher is reflected by Fig. 2 The large amplitude of the spectrum shows a poor rainbow effect, but the antireflection film according to the present invention has an average surface reflectance of 〇·4% or less, and has an excellent rainbow effect due to a large decrease in the amplitude of the reflection spectrum. Further, it can be seen from Table 1 that the embodiment of the present invention has a very low average surface reflectance of 0.4% or less at an incident angle of 5 ° C in the wavelength range of 480 to 680 nm, thereby achieving a reduction Rainbow effect. Therefore, the antireflection film of the present invention has an effect of very low reflectance, excellent rainbow effect and the like. [Simple description of the map]

第1圖為根據本發明的抗反射膜的橫截面視圖;和 第2圖為將現有技術抗反㈣和本發明抗反射膜的UV 61 201042281 反射光譜的波長進行比較的圖。 【主要元件符號說明】 1···本發明抗反射膜的uv反 ιο· 射光譜的波長 20· 2·"現有技術抗反射膜的UV 30· 反射光譜的波長 •透明基底 •高折射率的高硬度層 *低折射率層1 is a cross-sectional view of an antireflection film according to the present invention; and FIG. 2 is a view comparing wavelengths of a reflection spectrum of UV 61 201042281 of the prior art anti-reflection film (4) and the antireflection film of the present invention. [Description of main component symbols] 1··· The wavelength of the UV-reflective spectrum of the antireflection film of the present invention is 20·2·"The wavelength of the UV 30·reflectance spectrum of the prior art antireflection film•Transparent substrate•High refractive index High hardness layer* low refractive index layer

6262

Claims (1)

201042281 七、申請專利範圍: 1. 一種抗反射膜,包括: 用於保護聚乙烯醇(PVA)偏振片的三醋酸纖維素 (TAC)透明基底; 塗覆在所述透明基底上的高折射率的高硬度層,所 述高折射率的高硬度層具有1_50〜1.60的折射率和抗靜 電功能;和 0 塗覆在所述高折射率的高硬度層上的低折射率 ; 層,所述低折射率層具有1 ·31〜1.40的折射率並且是濕 , ”、、 法塗覆的’ 其中所述抗反射膜在480〜680nm波長範圍内在5。 ^ 入射角下具有0.1〜0.4%的平均鏡面反射率。 1 _ 2.如申請專利範圍第1項的抗反射膜,其中所述抗反射膜 具有104〜101G的抗靜電指數。 3·如申§青專利範圍第1項的抗反射膜,其中所述高折射率 的咼硬度層具有ο.1〜的厚度並且所述低折射率層 具有90〜130nm的厚度。 4.如申請專利範圍第!項的抗反射膜,其進_步包括在所 述低折射率層和所述高折射率的高硬度層之間的黏合 層’或者所述高折射率的高硬度層包括用於黏合層的組 刀八中所述黏s層的與所述低折射率層的下側接觸的 表面具有0.001〜〇.〇3〇μιη的中心線平均粗棱度_。 5•如申請專利範圍第!的抗反_,其中所述高折射率的 高硬度層是通過包括如下物質的塗覆組合物塗覆而成 63 201042281 的.選自鈦、锆、銦、鋅、錫、鋁和銻的氧化物的至少 一種金屬氧化物顆粒;陰離子型分散劑;具有至少三官 能的能聚合基團的固化樹脂;聚合引發劑;和溶劑。 6. 如申請專利範圍第5項的抗反㈣,其中所述高拆射率 的间硬度層通過如下方法形成:塗布所述塗覆組合物; 對塗覆膜進行乾燥以除去所述溶劑;和通過施加熱和電 離輻射中的至少一種使所述塗覆膜固化。 7. 如申請專利範圍第1項的抗反射膜,其中所述低折射率 層包括能夠通過施加熱或者電離輻射中的至少—種而 固化的含氟化合物,並且具有〇〇3〜〇15的動摩擦係數 和95°〜120。的與水的接觸角。 8· —種包括抗反射膜的偏振板,所述偏振板具有偏振片和 黏附於所述偏振片的至少一側上的表面保護膜, 其中所述表面保護膜為如申請專利範圍第1〜7項 中任一項所述的抗反射膜,和 其中所述抗反射膜通過如下方法製備:用驗性溶液 塗覆所述抗反射膜的與其上要形成低折射率層的一側 相反的透明基底側以在形成所述低折射率層的同時或 者之後皂化;加熱所述經塗覆的基底,之後用水洗滌或 者進行中和;和將所述基底黏附於所述偏振片上。 9.如申請專利範圍第1〜7項中任一項所述的抗反射膜的 顯示裝置。 1 〇. —種包括如申請專利範圍第8項中所述偏振板的顯示裝 置。 64201042281 VII. Patent application scope: 1. An anti-reflection film comprising: a cellulose triacetate (TAC) transparent substrate for protecting a polyvinyl alcohol (PVA) polarizing plate; a high refractive index coated on the transparent substrate a high hardness layer having a refractive index and an antistatic function of from 1 to 50 to 1.60; and a low refractive index coated on the high hardness layer of the high refractive index; The low refractive index layer has a refractive index of 1.31 to 1.40 and is wet, ", and coated" wherein the antireflection film has a wavelength range of 480 to 680 nm at 5. ^ at an incident angle of 0.1 to 0.4%. The average anti-reflection film of the anti-reflection film of claim 1, wherein the anti-reflection film has an antistatic index of 104 to 101 G. 3 · Anti-reflection of claim 1 of the patent scope a film, wherein the high refractive index tantalum hardness layer has a thickness of ο. 1 〜 and the low refractive index layer has a thickness of 90 〜130 nm. 4. The antireflection film of the scope of the application of the patent item a step comprising the low refractive index layer and the high fold The adhesive layer between the high hardness layers or the high refractive index high hardness layer includes a surface of the adhesive layer of the adhesive layer that is in contact with the lower side of the low refractive index layer The centerline average coarseness of 0.001 to 〇.〇3〇μιη _. 5• The anti-reverse _, as described in the patent application scope, wherein the high-refractive-index high-hardness layer is coated by a coating comprising the following substances Coating of 63 201042281. at least one metal oxide particle selected from the group consisting of oxides of titanium, zirconium, indium, zinc, tin, aluminum, and antimony; anionic dispersant; having at least trifunctional polymerizable groups a curing resin; a polymerization initiator; and a solvent. 6. The anti-reverse (IV) of claim 5, wherein the high-removability inter-hardness layer is formed by coating the coating composition; The film is dried to remove the solvent; and the coating film is cured by applying at least one of heat and ionizing radiation. 7. The antireflection film of claim 1, wherein the low refractive index layer Including the ability to apply heat a fluorine-containing compound which is cured by at least one of ionizing radiation, and has a dynamic friction coefficient of 〇〇3 to 〇15 and a contact angle with water of 95° to 120°. 8· a polarizing plate including an antireflection film The polarizing plate has a polarizing plate and a surface protective film adhered to at least one side of the polarizing plate, wherein the surface protective film is anti-reflection according to any one of claims 1 to 7. a film, and wherein the anti-reflection film is prepared by coating an anti-reflective film with a test solution on a transparent substrate side opposite to a side on which a low-refractive-index layer is to be formed to form the low refractive index The layer is simultaneously or subsequently saponified; the coated substrate is heated, followed by washing with water or neutralized; and the substrate is adhered to the polarizing plate. The display device for an antireflection film according to any one of claims 1 to 7. A display device comprising a polarizing plate as described in claim 8 of the patent application. 64
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US11604308B2 (en) 2017-06-01 2023-03-14 Samsung Sdi Co., Ltd. Polarizing plate and liquid crystal display device including same
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CN112797666B (en) * 2021-02-04 2022-03-01 宁波瑞凌新能源科技有限公司 Radiation refrigeration film and product thereof

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001100006A (en) * 1999-09-29 2001-04-13 Fuji Photo Film Co Ltd Antidazzle antireflection film and image display device
JP4899263B2 (en) * 2001-01-15 2012-03-21 大日本印刷株式会社 Coating composition and coating film thereof
JP2002328206A (en) * 2001-05-07 2002-11-15 Kureha Elastomer Co Ltd Optical filter for display screen
JP4878796B2 (en) * 2004-09-06 2012-02-15 富士フイルム株式会社 Manufacturing method of optical film
JP2007316213A (en) * 2006-05-24 2007-12-06 Asahi Kasei Corp Antireflection film and optical component using the same

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