JP7498630B2 - ダイボンディング装置および半導体装置の製造方法 - Google Patents

ダイボンディング装置および半導体装置の製造方法 Download PDF

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Publication number
JP7498630B2
JP7498630B2 JP2020152653A JP2020152653A JP7498630B2 JP 7498630 B2 JP7498630 B2 JP 7498630B2 JP 2020152653 A JP2020152653 A JP 2020152653A JP 2020152653 A JP2020152653 A JP 2020152653A JP 7498630 B2 JP7498630 B2 JP 7498630B2
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die
intermediate stage
head
flux
bonding apparatus
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Japanese (ja)
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JP2022046979A (ja
Inventor
一信 酒井
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Fasford Technology Co Ltd
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Fasford Technology Co Ltd
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Priority to JP2020152653A priority Critical patent/JP7498630B2/ja
Priority to TW110126828A priority patent/TWI818290B/zh
Priority to CN202110969703.5A priority patent/CN114171445A/zh
Priority to KR1020210120797A priority patent/KR102632912B1/ko
Publication of JP2022046979A publication Critical patent/JP2022046979A/ja
Application granted granted Critical
Publication of JP7498630B2 publication Critical patent/JP7498630B2/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67144—Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/52—Mounting semiconductor bodies in containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67706—Mechanical details, e.g. roller, belt
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67718—Changing orientation of the substrate, e.g. from a horizontal position to a vertical position
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K13/00—Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
    • H05K13/04—Mounting of components, e.g. of leadless components
    • H05K13/0404—Pick-and-place heads or apparatus, e.g. with jaws
    • H05K13/0406—Drive mechanisms for pick-and-place heads, e.g. details relating to power transmission, motors or vibration damping

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Wire Bonding (AREA)
  • Die Bonding (AREA)
JP2020152653A 2020-09-11 2020-09-11 ダイボンディング装置および半導体装置の製造方法 Active JP7498630B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2020152653A JP7498630B2 (ja) 2020-09-11 2020-09-11 ダイボンディング装置および半導体装置の製造方法
TW110126828A TWI818290B (zh) 2020-09-11 2021-07-21 晶粒接合裝置及半導體裝置的製造方法
CN202110969703.5A CN114171445A (zh) 2020-09-11 2021-08-23 芯片贴装装置及半导体器件的制造方法
KR1020210120797A KR102632912B1 (ko) 2020-09-11 2021-09-10 다이 본딩 장치 및 반도체 장치의 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020152653A JP7498630B2 (ja) 2020-09-11 2020-09-11 ダイボンディング装置および半導体装置の製造方法

Publications (2)

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JP2022046979A JP2022046979A (ja) 2022-03-24
JP7498630B2 true JP7498630B2 (ja) 2024-06-12

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Country Link
JP (1) JP7498630B2 (zh)
KR (1) KR102632912B1 (zh)
CN (1) CN114171445A (zh)
TW (1) TWI818290B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115863234B (zh) * 2023-03-03 2023-05-26 西北电子装备技术研究所(中国电子科技集团公司第二研究所) 一种全自动共晶贴片设备及其工作流程
CN117253832B (zh) * 2023-10-20 2024-05-28 江苏卓胜微电子股份有限公司 芯片传输装置、芯片贴装设备及芯片贴装方法

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001358179A (ja) 2000-06-15 2001-12-26 Matsushita Electric Ind Co Ltd 電子部品の実装装置および実装方法
US20030177633A1 (en) 2002-03-25 2003-09-25 Matsushita Electric Industrial Co., Ltd Electronic component mounting apparatus and electronic component mounting method
JP2003282640A (ja) 2002-03-27 2003-10-03 Matsushita Electric Ind Co Ltd 電子部品搭載装置および電子部品搭載方法
JP2004288796A (ja) 2003-03-20 2004-10-14 Matsushita Electric Ind Co Ltd 部品実装装置及び部品実装方法
JP2015142006A (ja) 2014-01-29 2015-08-03 パナソニックＩｐマネジメント株式会社 部品実装装置及び部品実装方法
JP2015177038A (ja) 2014-03-14 2015-10-05 ファスフォードテクノロジ株式会社 ダイボンダ用ディッピング機構及びフリップチップボンダ
JP2017050565A (ja) 2012-05-23 2017-03-09 パナソニックＩｐマネジメント株式会社 半導体素子の実装方法
JP2017183378A (ja) 2016-03-29 2017-10-05 芝浦メカトロニクス株式会社 電子部品の実装装置
JP2020136361A (ja) 2019-02-14 2020-08-31 ファスフォードテクノロジ株式会社 実装装置および半導体装置の製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001320196A (ja) 2000-05-09 2001-11-16 Toray Eng Co Ltd 電子部品実装装置
KR20130128919A (ko) * 2012-05-18 2013-11-27 삼성테크윈 주식회사 반도체 칩 이송 장치
KR101425613B1 (ko) 2013-03-28 2014-08-01 한미반도체 주식회사 플립칩 본딩장치 및 플립칩 본딩방법
JP6584234B2 (ja) * 2015-08-31 2019-10-02 ファスフォードテクノロジ株式会社 ダイボンダ、ボンディング方法および半導体装置の製造方法
KR20170042957A (ko) * 2015-10-12 2017-04-20 세메스 주식회사 반도체 다이들을 이송하기 위한 다이 셔틀 및 이를 포함하는 다이 본딩 장치
JP6705727B2 (ja) * 2016-09-26 2020-06-03 ファスフォードテクノロジ株式会社 フリップチップボンダおよび半導体装置の製造方法
JP7018338B2 (ja) * 2018-03-19 2022-02-10 ファスフォードテクノロジ株式会社 ダイボンディング装置および半導体装置の製造方法

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001358179A (ja) 2000-06-15 2001-12-26 Matsushita Electric Ind Co Ltd 電子部品の実装装置および実装方法
US20030177633A1 (en) 2002-03-25 2003-09-25 Matsushita Electric Industrial Co., Ltd Electronic component mounting apparatus and electronic component mounting method
JP2003282640A (ja) 2002-03-27 2003-10-03 Matsushita Electric Ind Co Ltd 電子部品搭載装置および電子部品搭載方法
JP2004288796A (ja) 2003-03-20 2004-10-14 Matsushita Electric Ind Co Ltd 部品実装装置及び部品実装方法
US20060185157A1 (en) 2003-03-20 2006-08-24 Satoshi Shida Parts packaging device and parts packaging method
JP2017050565A (ja) 2012-05-23 2017-03-09 パナソニックＩｐマネジメント株式会社 半導体素子の実装方法
JP2015142006A (ja) 2014-01-29 2015-08-03 パナソニックＩｐマネジメント株式会社 部品実装装置及び部品実装方法
JP2015177038A (ja) 2014-03-14 2015-10-05 ファスフォードテクノロジ株式会社 ダイボンダ用ディッピング機構及びフリップチップボンダ
JP2017183378A (ja) 2016-03-29 2017-10-05 芝浦メカトロニクス株式会社 電子部品の実装装置
JP2020136361A (ja) 2019-02-14 2020-08-31 ファスフォードテクノロジ株式会社 実装装置および半導体装置の製造方法

Also Published As

Publication number Publication date
CN114171445A (zh) 2022-03-11
TW202215571A (zh) 2022-04-16
KR20220034694A (ko) 2022-03-18
JP2022046979A (ja) 2022-03-24
KR102632912B1 (ko) 2024-02-05
TWI818290B (zh) 2023-10-11

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