JP7495436B2 - プラズマ処理を統合したビームラインアーキテクチャ - Google Patents
プラズマ処理を統合したビームラインアーキテクチャ Download PDFInfo
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- JP7495436B2 JP7495436B2 JP2021576470A JP2021576470A JP7495436B2 JP 7495436 B2 JP7495436 B2 JP 7495436B2 JP 2021576470 A JP2021576470 A JP 2021576470A JP 2021576470 A JP2021576470 A JP 2021576470A JP 7495436 B2 JP7495436 B2 JP 7495436B2
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- 238000012545 processing Methods 0.000 title description 10
- 238000000034 method Methods 0.000 claims description 124
- 230000008569 process Effects 0.000 claims description 104
- 238000005468 ion implantation Methods 0.000 claims description 30
- 238000012546 transfer Methods 0.000 claims description 30
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims description 12
- 238000004140 cleaning Methods 0.000 claims description 10
- 239000000356 contaminant Substances 0.000 claims description 10
- 238000000137 annealing Methods 0.000 claims description 9
- 238000005530 etching Methods 0.000 claims description 7
- 238000002513 implantation Methods 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 3
- 238000007789 sealing Methods 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 37
- 150000002500 ions Chemical class 0.000 description 12
- 239000000872 buffer Substances 0.000 description 6
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- 238000010884 ion-beam technique Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
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- 239000007789 gas Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
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- 230000007547 defect Effects 0.000 description 2
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- BSYNRYMUTXBXSQ-UHFFFAOYSA-N Aspirin Chemical compound CC(=O)OC1=CC=CC=C1C(O)=O BSYNRYMUTXBXSQ-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
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Description
Claims (16)
- ビームラインアーキテクチャであって、
ウエハハンドリングチャンバと、
前記ウエハハンドリングチャンバに結合され、イオン注入前プロセス及びイオン注入後プロセスのうちの少なくとも1つをワークピースに実行するためのプラズマ源を含むプラズマチャンバと、
前記ウエハハンドリングチャンバに結合され、イオン注入プロセスをワークピースに実行するように適合されたプロセスチャンバと、
前記ウエハハンドリングチャンバと前記プラズマチャンバとの間に配置された移送チャンバであって、前記ウエハハンドリングチャンバ及び前記プラズマチャンバに対して密閉可能である、移送チャンバと、
前記移送チャンバ内に配置された計測構成要素であって、前記プラズマチャンバ内のワークピースにどのプロセスを実行するかを決定するために、前記ワークピースの表面の自然酸化物の検出及び測定、並びに前記ワークピースの表面に堆積された膜の厚さ及び組成の測定、のうちの1又は複数を容易にする、計測構成要素と
を備える、ビームラインアーキテクチャ。 - 前記プラズマチャンバを前記ウエハハンドリングチャンバ及び前記プロセスチャンバから密閉するために、前記ウエハハンドリングチャンバと前記プラズマチャンバとの間に配置されたバルブを更に備える、請求項1に記載のビームラインアーキテクチャ。
- 前記プラズマチャンバと前記プロセスチャンバとの間でワークピースを移動させるために、前記ウエハハンドリングチャンバ内に配置された真空ロボットを更に備える、請求項1に記載のビームラインアーキテクチャ。
- 前記プラズマチャンバは、プラズマ前洗浄プロセス、プラズマ化学気相堆積プロセス、プラズマアニーリングプロセス、予熱プロセス、及びエッチングプロセスのうちの少なくとも1つを実行するように適合される、請求項1に記載のビームラインアーキテクチャ。
- 前記プラズマチャンバ内の圧力と前記プロセスチャンバ内の圧力は互いに独立して変化させることができる、請求項1に記載のビームラインアーキテクチャ。
- 前記ウエハハンドリングチャンバ内に配置された計測構成要素を更に備える、請求項1に記載のビームラインアーキテクチャ。
- 前記ウエハハンドリングチャンバと前記プラズマチャンバとの間でワークピースを移動させるために、前記移送チャンバ内に配置された移送ロボットを更に備える、請求項1に記載のビームラインアーキテクチャ。
- 大気環境と前記ウエハハンドリングチャンバとの間のワークピースの移送を容易にするために、前記ウエハハンドリングチャンバに結合されたロードロックを更に備える、請求項1に記載のビームラインアーキテクチャ。
- 前記ウエハハンドリングチャンバ内に配置されたアライメントステーションを更に備える、請求項1に記載のビームラインアーキテクチャ。
- ビームラインアーキテクチャであって、
ウエハハンドリングチャンバと、
大気環境と前記ウエハハンドリングチャンバとの間のワークピースの移送を容易にするために、前記ウエハハンドリングチャンバに結合されたロードロックと、
前記ウエハハンドリングチャンバに結合され、プラズマ前洗浄プロセス、プラズマ化学気相堆積プロセス、プラズマアニーリングプロセス、予熱プロセス、及びエッチングプロセスのうちの少なくとも1つをワークピースに実行するためのプラズマ源を含むプラズマチャンバと、
前記ウエハハンドリングチャンバに結合され、イオン注入プロセスをワークピースに実行するように適合されたプロセスチャンバと、
前記ウエハハンドリングチャンバと前記プラズマチャンバとの間に配置された移送チャンバであって、前記ウエハハンドリングチャンバ及び前記プラズマチャンバに対して密閉可能である、移送チャンバと、
前記移送チャンバ内に配置された計測構成要素であって、前記プラズマチャンバ内のワークピースにどのプロセスを実行するかを決定するために、前記ワークピースの表面の自然酸化物の検出及び測定、並びに前記ワークピースの表面に堆積された膜の厚さ及び組成の測定、のうちの1又は複数を容易にする、計測構成要素と、
前記プラズマチャンバを前記ウエハハンドリングチャンバ及び前記プロセスチャンバから密閉するために、前記ウエハハンドリングチャンバと前記移送チャンバとの間に配置されたバルブ、及び前記移送チャンバと前記プラズマチャンバとの間に配置されたバルブと
を備え、前記プラズマチャンバ内の圧力及び前記プロセスチャンバ内の圧力は互いに独立して変化させることができる、ビームラインアーキテクチャ。 - ウエハハンドリングチャンバと、前記ウエハハンドリングチャンバに結合されたプラズマチャンバと、前記ウエハハンドリングチャンバに結合されたプロセスチャンバとを含むビームラインアーキテクチャを操作する方法であって、
前記ウエハハンドリングチャンバから前記プラズマチャンバにワークピースを移動させることであって、前記ウエハハンドリングチャンバと前記プラズマチャンバとの間に配置された移送チャンバに前記ワークピースを移動させることを含み、前記移送チャンバは前記ウエハハンドリングチャンバ及び前記プラズマチャンバに対して密閉可能である、前記ウエハハンドリングチャンバから前記プラズマチャンバにワークピースを移動させることと、
前記プラズマチャンバ内の前記ワークピースにどのプロセスを実行するかを決定するために、前記移送チャンバ内に配置された計測構成要素へと前記ワークピースを移動させて、前記ワークピースの表面の汚染物質と表面の特徴のうちの少なくとも1つを測定することと、
イオン注入前プロセス及びイオン注入後プロセスのうちの少なくとも1つを前記ワークピースに実行することと、
前記ウエハハンドリングチャンバから前記プロセスチャンバに前記ワークピースを移動させて、イオン注入プロセスを前記ワークピースに実行することと
を含む、方法。 - イオン注入前プロセス及びイオン注入後プロセスのうちの少なくとも1つを前記ワークピースに実行することは、イオン注入プロセスを前記ワークピースに実行する前に、プラズマ前洗浄プロセス、プラズマ化学気相堆積プロセス、及び予熱プロセスのうちの少なくとも1つを前記ワークピースに実行することを含む、請求項11に記載の方法。
- イオン注入前プロセス及びイオン注入後プロセスのうちの少なくとも1つを前記ワークピースに実行することは、イオン注入プロセスを前記ワークピースに実行した後に、プラズマ化学気相堆積プロセス、プラズマアニーリングプロセス、及びエッチングプロセスのうちの少なくとも1つを前記ワークピースに実行することを含む、請求項11に記載の方法。
- 前記プラズマチャンバを前記ウエハハンドリングチャンバ及び前記プロセスチャンバに対して密閉することを更に含む、請求項11に記載の方法。
- 前記プラズマチャンバ内の圧力を前記ウエハハンドリングチャンバ及び前記プロセスチャンバ内の圧力に対して変化させることを更に含む、請求項14に記載の方法。
- 前記ウエハハンドリングチャンバに結合されたロードロックに前記ワークピースを移動させて、大気環境と前記ウエハハンドリングチャンバとの間で前記ワークピースを移送することを更に含む、請求項11に記載の方法。
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