JP7494386B2 - 荷電粒子線装置 - Google Patents

荷電粒子線装置 Download PDF

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Publication number
JP7494386B2
JP7494386B2 JP2023514287A JP2023514287A JP7494386B2 JP 7494386 B2 JP7494386 B2 JP 7494386B2 JP 2023514287 A JP2023514287 A JP 2023514287A JP 2023514287 A JP2023514287 A JP 2023514287A JP 7494386 B2 JP7494386 B2 JP 7494386B2
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JP
Japan
Prior art keywords
charged particle
particle beam
shield
beam device
bushing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2023514287A
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English (en)
Japanese (ja)
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JPWO2022219790A1 (https=
Inventor
裕 森田
貴 久保
稔 酒巻
修平 石川
俊一 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi High Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Tech Corp filed Critical Hitachi High Tech Corp
Publication of JPWO2022219790A1 publication Critical patent/JPWO2022219790A1/ja
Application granted granted Critical
Publication of JP7494386B2 publication Critical patent/JP7494386B2/ja
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/07—Eliminating deleterious effects due to thermal effects or electric or magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/24—Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
    • H01J37/241—High voltage power supply or regulation circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/295—Electron or ion diffraction tubes
    • H01J37/2955—Electron or ion diffraction tubes using scanning ray
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/047—Changing particle velocity
    • H01J2237/0473—Changing particle velocity accelerating

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
JP2023514287A 2021-04-15 2021-04-15 荷電粒子線装置 Active JP7494386B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2021/015638 WO2022219790A1 (ja) 2021-04-15 2021-04-15 荷電粒子線装置

Publications (2)

Publication Number Publication Date
JPWO2022219790A1 JPWO2022219790A1 (https=) 2022-10-20
JP7494386B2 true JP7494386B2 (ja) 2024-06-03

Family

ID=83640272

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023514287A Active JP7494386B2 (ja) 2021-04-15 2021-04-15 荷電粒子線装置

Country Status (3)

Country Link
US (1) US12283452B2 (https=)
JP (1) JP7494386B2 (https=)
WO (1) WO2022219790A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024247022A1 (ja) * 2023-05-29 2024-12-05 株式会社日立ハイテク 荷電粒子線装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014127296A (ja) 2012-12-26 2014-07-07 Nissin Electric Co Ltd 電子線照射装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5279758A (en) 1975-12-26 1977-07-05 Hitachi Ltd Electronic gun
JPS5568096A (en) * 1978-11-16 1980-05-22 Nippon Electron Optics Lab Electron beam generator
JPS5948738U (ja) * 1982-09-18 1984-03-31 日本電子株式会社 イオン源
JPS6199958U (https=) * 1984-12-06 1986-06-26
JPS61153999A (ja) * 1984-12-26 1986-07-12 株式会社日立製作所 荷電粒子加速装置
US20240170248A1 (en) * 2022-11-22 2024-05-23 Kamil Podhola Particle beam system

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014127296A (ja) 2012-12-26 2014-07-07 Nissin Electric Co Ltd 電子線照射装置

Also Published As

Publication number Publication date
US12283452B2 (en) 2025-04-22
US20250079112A1 (en) 2025-03-06
JPWO2022219790A1 (https=) 2022-10-20
WO2022219790A1 (ja) 2022-10-20

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