JPWO2022219790A1 - - Google Patents
Info
- Publication number
- JPWO2022219790A1 JPWO2022219790A1 JP2023514287A JP2023514287A JPWO2022219790A1 JP WO2022219790 A1 JPWO2022219790 A1 JP WO2022219790A1 JP 2023514287 A JP2023514287 A JP 2023514287A JP 2023514287 A JP2023514287 A JP 2023514287A JP WO2022219790 A1 JPWO2022219790 A1 JP WO2022219790A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/16—Vessels; Containers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/07—Eliminating deleterious effects due to thermal effects or electric or magnetic fields
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/24—Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
- H01J37/241—High voltage power supply or regulation circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/295—Electron or ion diffraction tubes
- H01J37/2955—Electron or ion diffraction tubes using scanning ray
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/047—Changing particle velocity
- H01J2237/0473—Changing particle velocity accelerating
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2021/015638 WO2022219790A1 (ja) | 2021-04-15 | 2021-04-15 | 荷電粒子線装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2022219790A1 true JPWO2022219790A1 (https=) | 2022-10-20 |
| JP7494386B2 JP7494386B2 (ja) | 2024-06-03 |
Family
ID=83640272
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023514287A Active JP7494386B2 (ja) | 2021-04-15 | 2021-04-15 | 荷電粒子線装置 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US12283452B2 (https=) |
| JP (1) | JP7494386B2 (https=) |
| WO (1) | WO2022219790A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2024247022A1 (ja) * | 2023-05-29 | 2024-12-05 | 株式会社日立ハイテク | 荷電粒子線装置 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5568096A (en) * | 1978-11-16 | 1980-05-22 | Nippon Electron Optics Lab | Electron beam generator |
| JPS5948738U (ja) * | 1982-09-18 | 1984-03-31 | 日本電子株式会社 | イオン源 |
| JPS6199958U (https=) * | 1984-12-06 | 1986-06-26 | ||
| JPS61153999A (ja) * | 1984-12-26 | 1986-07-12 | 株式会社日立製作所 | 荷電粒子加速装置 |
| JP2014127296A (ja) * | 2012-12-26 | 2014-07-07 | Nissin Electric Co Ltd | 電子線照射装置 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5279758A (en) | 1975-12-26 | 1977-07-05 | Hitachi Ltd | Electronic gun |
| US20240170248A1 (en) * | 2022-11-22 | 2024-05-23 | Kamil Podhola | Particle beam system |
-
2021
- 2021-04-15 WO PCT/JP2021/015638 patent/WO2022219790A1/ja not_active Ceased
- 2021-04-15 US US18/285,457 patent/US12283452B2/en active Active
- 2021-04-15 JP JP2023514287A patent/JP7494386B2/ja active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5568096A (en) * | 1978-11-16 | 1980-05-22 | Nippon Electron Optics Lab | Electron beam generator |
| JPS5948738U (ja) * | 1982-09-18 | 1984-03-31 | 日本電子株式会社 | イオン源 |
| JPS6199958U (https=) * | 1984-12-06 | 1986-06-26 | ||
| JPS61153999A (ja) * | 1984-12-26 | 1986-07-12 | 株式会社日立製作所 | 荷電粒子加速装置 |
| JP2014127296A (ja) * | 2012-12-26 | 2014-07-07 | Nissin Electric Co Ltd | 電子線照射装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP7494386B2 (ja) | 2024-06-03 |
| US12283452B2 (en) | 2025-04-22 |
| US20250079112A1 (en) | 2025-03-06 |
| WO2022219790A1 (ja) | 2022-10-20 |
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