JP7477966B2 - ガントリ型の位置決め装置 - Google Patents
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- F16M11/00—Stands or trestles as supports for apparatus or articles placed thereon ; Stands for scientific apparatus such as gravitational force meters
- F16M11/20—Undercarriages with or without wheels
- F16M11/2092—Undercarriages with or without wheels comprising means allowing depth adjustment, i.e. forward-backward translation of the head relatively to the undercarriage
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- F16M11/20—Undercarriages with or without wheels
- F16M11/22—Undercarriages with or without wheels with approximately constant height, e.g. with constant length of column or of legs
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- H01L21/67005—Apparatus not specifically provided for elsewhere
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- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
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- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
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- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/6773—Conveying cassettes, containers or carriers
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16M—FRAMES, CASINGS OR BEDS OF ENGINES, MACHINES OR APPARATUS, NOT SPECIFIC TO ENGINES, MACHINES OR APPARATUS PROVIDED FOR ELSEWHERE; STANDS; SUPPORTS
- F16M2200/00—Details of stands or supports
- F16M2200/08—Foot or support base
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- Computer Hardware Design (AREA)
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- Condensed Matter Physics & Semiconductors (AREA)
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Description
Ca、Cc 縦方向ビーム
Cb、Cd 横方向ビーム(Cd ガイドビーム)
EA エンドストップ
G1、G2、G2’、G3、G4 ジョイント
GS ガイド面
L1、L2 空気軸受
P1、P2 プレート
R フレーム
S 可動要素
V1,V2 結合ウェブ
VA 仮想回転軸線
VAG ジョイント
Y 第1の方向
Y1、Y2 リニア軸
X 第2の方向
Z 第3の方向
LMY1、LMY2 第1のリニアドライブ,第2のリニアドライブ
Claims (15)
- ガントリ型の位置決め装置であって、第1の方向(Y)および第2の方向(X)に平行な平坦なベース(B)と、第1の方向(Y)に配置された、それぞれ1つの第1のリニアドライブ(LMY1、LMY2)を有する2つの第1のリニア軸(Y1、Y2)を備え、該第1のリニア軸(Y1、Y2)がフレーム(R)を第1の方向(Y)に移動可能に保持し、フレーム(R)が、第2の方向(X)に延在する2つの横方向ビーム(Cb、Cd)を備え、該横方向ビーム(Cb、Cd)が、第1の方向(Y)に延在する2つの縦方向ビーム(Ca、Cc)に固定されており、縦方向ビーム(Ca、Cc)は横方向ビーム(Cb、Cd)と共にフレーム(R)を形成しており、それぞれ1つの縦方向ビーム(Ca、Cc)が、それぞれ1つの第1のリニアドライブ(LMY1、LMY2)に結合されており、横方向ビーム(Cb、Cd)が、第2の方向(X)に平行なそれぞれ1つの第2のリニアドライブ(LMX1、LMX2)を有する第2のリニア軸(X1、X2)を支持し、これにより横方向ビーム(Cb、Cd)の間に配置された可動要素(S)が、第2のリニアドライブ(LMX1、LMX2)によって第2の方向(X)に移動可能に保持されており、フレーム(R)は、可動要素(S)が第1および第2の方向(Y、X)への並進に加えて、第1および第2の方向(Y、X)に垂直な第3の方向(Z)を中心として回動することもできるように、柔軟に構成されており、可動要素(S)が、第3の方向(Z)と、平坦なベース(B)の第1および第2の方向(Y、X)を中心とした回転とに関して案内される位置決め装置において、
可動要素(S)が、第1の方向(Y)に関して、可動要素(S)のためのガイドビーム(Cd)としての役割を果たす横方向ビーム(Cb、Cd)のうちのちょうど1つのガイド面(GS)によって案内され、
前記ガイドビーム(Cd)が、ジョイント(G1、G2、G2’)を介して、それぞれ前記第3の方向(Z)を中心とした回転を可能にする前記縦方向ビーム(Ca、Cc)に結合されていることを特徴とする位置決め装置。 - 請求項1に記載の位置決め装置において、
前記ジョイントの1つ(G2’)が、前記ガイドビーム(Cd)に沿って、前記第1の方向(Y)への並進を付加的に可能にする位置決め装置。 - 請求項2に記載の位置決め装置において、
前記フレーム(R)のコーナーで、前記横方向ビームの1つ(Cb)と前記縦方向ビームの1つ(Cc)とが互いに堅固に結合されている位置決め装置。 - 請求項1から3までのいずれか1項に記載の位置決め装置において、
前記フレーム(R)の前記縦方向ビーム(Ca、CC)と前記横方向ビーム(Cb、Cd)との間のジョイント(G1、G2、G2’、G3、G4)が、横方向ビーム(Cb、Cd)と縦方向ビーム(Ca、Cc)とを相互に結合し、これにより、合計で4つの面内自由度がフレーム(R)に可撓性を与える位置決め装置。 - 請求項1から4までのいずれか1項に記載の位置決め装置において、
ジョイント(G1、G2、G2’、G3、G4)が中実ジョイントである位置決め装置。 - 請求項1から5までのいずれか1項に記載の位置決め装置において、
前記ガイドビーム(Cd)が、前記縦方向ビーム(Ca、Cc)および前記横方向ビームの1つ(Cb)の材料とは異なる材料により作製されている位置決め装置。 - 請求項6に記載の位置決め装置において、
前記ガイドビーム(Cd)が、炭化ケイ素または酸化アルミニウムから作製されている位置決め装置。 - 請求項6または7に記載の位置決め装置において、
前記縦方向ビーム(Ca、Cc)および前記横方向ビームの1つ(Cb)がアルミニウムから作製されている位置決め装置。 - 請求項6から8までのいずれか1項に記載の位置決め装置において、
前記ガイドビーム(Cd)が中空断面を有する位置決め装置。 - 請求項6から9までのいずれか1項に記載の位置決め装置において、
前記フレーム(R)が、4つの水平方向の空気軸受(L2)によって前記平坦なベース(B)上を案内されており、2つの水平方向の空気軸受(L2)が前記縦方向ビーム(Ca、Cc)の下方に位置し、しかもガイドビーム(Cd)に近接する前記縦方向ビーム(Ca、Cc)の端部に位置し、他の2つの水平方向の空気軸受(L2)が、ガイドビーム(Cd)に平行な前記横方向ビームの1つ(Cb)の下方に位置し、しかもそれぞれ該横方向ビームの1つ(Cb)の両端に位置している位置決め装置。 - 請求項6から9までのいずれか1項に記載の位置決め装置において、
前記フレーム(R)が、5つの水平方向の空気軸受(L2)によって前記平坦なベース(B)上を案内されており、それぞれ2つの水平方向の空気軸受(L2)が前記縦方向ビーム(Ca、Cc)の下方に位置し、しかも横方向ビーム(Cb、Cd)に近接する縦方向ビーム(Ca、Cc)端部に位置し、別の水平方向の空気軸受(L2)が、前記ガイドビーム(Cd)に平行な前記横方向ビームの1つ(Cb)の下方に位置し、しかもこのガイドビーム(Cd)の中央に位置する位置決め装置。 - 請求項1から11までのいずれか1項に記載の位置決め装置において、
前記可動要素(S)が、予荷重をかけられた側方の空気軸受(L1)によって前記ガイドビーム(Cd)のガイド面(GS)に沿って案内される位置決め装置。 - 請求項1から12までのいずれか1項に記載の位置決め装置において、
前記ガイドビーム(Cd)のガイド面(GS)と前記可動要素(S)との間に、前記第3の方向(Z)を中心として前記可動要素(S)を回転させるための仮想回転軸線(VA)を有するジョイント(VAG)が配置されている位置決め装置。 - 請求項13に記載の位置決め装置において、
前記仮想回転軸線(VA)が、前記可動要素(S)の質量中心を通過する位置決め装置。 - 請求項13または14に記載の位置決め装置において、
前記第1および第2の方向(Y、X)に垂直な第3の方向(Z)を中心とした前記可動要素(S)の回転が、前記第2のリニアドライブ(LMX1、LMX2)によって調節可能である位置決め装置。
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Application Number | Priority Date | Filing Date | Title |
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EP18214545.8A EP3670067B1 (de) | 2018-12-20 | 2018-12-20 | Positioniereinrichtung in portalbauweise |
EP18214545.8 | 2018-12-20 |
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JP2020102621A JP2020102621A (ja) | 2020-07-02 |
JP7477966B2 true JP7477966B2 (ja) | 2024-05-02 |
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US (1) | US11466809B2 (ja) |
EP (1) | EP3670067B1 (ja) |
JP (1) | JP7477966B2 (ja) |
KR (1) | KR20200078315A (ja) |
CN (1) | CN111354674B (ja) |
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EP3954497A1 (en) * | 2020-08-11 | 2022-02-16 | Patrick Meunier | High accuracy sliding assembly for a manufacturing machine, and manufacturing machine comprising at least one such assembly |
EP4376060A1 (de) * | 2022-11-22 | 2024-05-29 | Schneeberger Holding AG | Positioniervorrichtung zum positionieren eines beweglichen elements |
US20240191831A1 (en) * | 2022-12-13 | 2024-06-13 | Ningbo Shangjin Automation Technology Co., Ltd. | Gantry motion platform |
CN116748860B (zh) * | 2023-08-16 | 2023-11-21 | 湖南路桥建设集团有限责任公司 | 一种贝雷架快速搭接用校正机构及贝雷架快速搭接方法 |
Citations (3)
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JP2001238485A (ja) | 2000-02-21 | 2001-08-31 | Sharp Corp | ステージ装置 |
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JP2001238485A (ja) | 2000-02-21 | 2001-08-31 | Sharp Corp | ステージ装置 |
US20080229860A1 (en) | 2005-11-17 | 2008-09-25 | Ilian Bonev | Planar Parallel Mechanism and Method |
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EP3670067A1 (de) | 2020-06-24 |
EP3670067B1 (de) | 2022-07-27 |
US11466809B2 (en) | 2022-10-11 |
CN111354674B (zh) | 2022-10-18 |
KR20200078315A (ko) | 2020-07-01 |
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JP2020102621A (ja) | 2020-07-02 |
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