JP7450119B2 - 真空処理装置 - Google Patents

真空処理装置 Download PDF

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Publication number
JP7450119B2
JP7450119B2 JP2023519145A JP2023519145A JP7450119B2 JP 7450119 B2 JP7450119 B2 JP 7450119B2 JP 2023519145 A JP2023519145 A JP 2023519145A JP 2023519145 A JP2023519145 A JP 2023519145A JP 7450119 B2 JP7450119 B2 JP 7450119B2
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JP
Japan
Prior art keywords
sealing member
processing apparatus
vacuum processing
crushing
opening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2023519145A
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English (en)
Japanese (ja)
Other versions
JPWO2023166653A1 (https=
Inventor
周一 横山
輝茂 竹山
伊織 岸
寿光 河野
知博 吉川
秀隆 生長
典史 塚本
哲也 大石
尚己 田村
保志 安松
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Canon Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Anelva Corp filed Critical Canon Anelva Corp
Publication of JPWO2023166653A1 publication Critical patent/JPWO2023166653A1/ja
Application granted granted Critical
Publication of JP7450119B2 publication Critical patent/JP7450119B2/ja
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/03—Pressure vessels, or vacuum vessels, having closure members or seals specially adapted therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16J—PISTONS; CYLINDERS; SEALINGS
    • F16J13/00—Covers or similar closure members for pressure vessels in general
    • F16J13/02—Detachable closure members; Means for tightening closures
    • F16J13/04—Detachable closure members; Means for tightening closures attached with a bridge member

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Gasket Seals (AREA)
  • Pivots And Pivotal Connections (AREA)
  • Pressure Vessels And Lids Thereof (AREA)
JP2023519145A 2022-03-03 2022-03-03 真空処理装置 Active JP7450119B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2022/009105 WO2023166653A1 (ja) 2022-03-03 2022-03-03 真空処理装置

Publications (2)

Publication Number Publication Date
JPWO2023166653A1 JPWO2023166653A1 (https=) 2023-09-07
JP7450119B2 true JP7450119B2 (ja) 2024-03-14

Family

ID=87883269

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023519145A Active JP7450119B2 (ja) 2022-03-03 2022-03-03 真空処理装置

Country Status (2)

Country Link
JP (1) JP7450119B2 (https=)
WO (1) WO2023166653A1 (https=)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005012174A (ja) 2003-06-19 2005-01-13 Samsung Electronics Co Ltd 反応装置
JP2011179531A (ja) 2010-02-26 2011-09-15 Canon Anelva Corp 蓋開閉装置及び真空装置
JP2012087923A (ja) 2010-10-15 2012-05-10 Fukuhara Co Ltd 真空チャンバーおよび真空保持方法
JP2021077815A (ja) 2019-11-13 2021-05-20 株式会社日立ハイテク 真空処理装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6224131Y2 (https=) * 1981-06-10 1987-06-19

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005012174A (ja) 2003-06-19 2005-01-13 Samsung Electronics Co Ltd 反応装置
JP2011179531A (ja) 2010-02-26 2011-09-15 Canon Anelva Corp 蓋開閉装置及び真空装置
JP2012087923A (ja) 2010-10-15 2012-05-10 Fukuhara Co Ltd 真空チャンバーおよび真空保持方法
JP2021077815A (ja) 2019-11-13 2021-05-20 株式会社日立ハイテク 真空処理装置

Also Published As

Publication number Publication date
WO2023166653A1 (ja) 2023-09-07
JPWO2023166653A1 (https=) 2023-09-07

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