JP7443669B2 - 炭化珪素エピタキシャル基板、炭化珪素エピタキシャル基板の製造方法、炭化珪素半導体装置および炭化珪素半導体装置の製造方法 - Google Patents
炭化珪素エピタキシャル基板、炭化珪素エピタキシャル基板の製造方法、炭化珪素半導体装置および炭化珪素半導体装置の製造方法 Download PDFInfo
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- 229910010271 silicon carbide Inorganic materials 0.000 title claims description 254
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 title claims description 251
- 239000000758 substrate Substances 0.000 title claims description 153
- 239000004065 semiconductor Substances 0.000 title claims description 110
- 238000004519 manufacturing process Methods 0.000 title claims description 26
- 238000000034 method Methods 0.000 title claims description 13
- 239000010936 titanium Substances 0.000 claims description 14
- 239000012535 impurity Substances 0.000 claims description 13
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 12
- 239000011651 chromium Substances 0.000 claims description 12
- 229910052719 titanium Inorganic materials 0.000 claims description 12
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 11
- 229910052804 chromium Inorganic materials 0.000 claims description 11
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims description 11
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 10
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical group [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 10
- 229910052791 calcium Inorganic materials 0.000 claims description 10
- 239000011575 calcium Substances 0.000 claims description 10
- 229910052749 magnesium Inorganic materials 0.000 claims description 10
- 239000011777 magnesium Substances 0.000 claims description 10
- 229910052706 scandium Inorganic materials 0.000 claims description 10
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 claims description 10
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 239000010703 silicon Substances 0.000 claims description 10
- 229910052720 vanadium Inorganic materials 0.000 claims description 10
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims description 8
- 229910052748 manganese Inorganic materials 0.000 claims description 8
- 239000011572 manganese Substances 0.000 claims description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 5
- 239000010410 layer Substances 0.000 description 84
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 16
- 238000006243 chemical reaction Methods 0.000 description 15
- 238000000137 annealing Methods 0.000 description 14
- 230000008646 thermal stress Effects 0.000 description 14
- 208000030963 borderline personality disease Diseases 0.000 description 11
- 206010006475 bronchopulmonary dysplasia Diseases 0.000 description 11
- 230000033001 locomotion Effects 0.000 description 9
- 229910052757 nitrogen Inorganic materials 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 239000013078 crystal Substances 0.000 description 7
- 230000007547 defect Effects 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- 239000001257 hydrogen Substances 0.000 description 6
- 230000035515 penetration Effects 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- 238000005530 etching Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 150000002431 hydrogen Chemical class 0.000 description 4
- 238000005468 ion implantation Methods 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 239000000969 carrier Substances 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 230000005669 field effect Effects 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 2
- 239000006104 solid solution Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000006355 external stress Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
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Description
本発明にかかる炭化珪素エピタキシャル基板、炭化珪素エピタキシャル基板の製造方法、炭化珪素半導体装置および炭化珪素半導体装置の製造方法の内、最初に炭化珪素エピタキシャル基板を説明する。図1は、実施の形態にかかる炭化珪素エピタキシャル基板の構造を示す断面図である。
実施の形態にかかる炭化珪素半導体装置の製造方法について、半導体材料として炭化珪素を用い、PiNダイオードを作製(製造)する場合を例に説明する。図11および図12は、実施の形態にかかる炭化珪素半導体装置の製造途中の状態を示す断面図である。
2、102 n型炭化珪素エピタキシャル層
3 p型炭化珪素層
5 アノード電極
6 カソード電極
20、120 基底面転位(BPD)
21、121 貫通刃状転位(TED)
22、122 貫通基底面転位(貫通BPD)
23 SiC中の異種元素
24 異種元素高密度領域
25 異種元素
31 n+型炭化珪素基板
32 n-型ドリフト層
33 第1p+型領域
34 第2p+型領域
35 n型領域
36 p型ベース層
37 n+型ソース領域
38 p+型コンタクト領域
39 ゲート絶縁膜
40 ゲート電極
41 層間絶縁膜
42 ソース電極
48 トレンチ
100、200 炭化珪素エピタキシャル基板
Claims (6)
- 第1導電型の炭化珪素半導体基板と、
前記炭化珪素半導体基板のおもて面に接して設けられた、前記炭化珪素半導体基板より低不純物濃度の第1導電型の炭化珪素エピタキシャル層と、
前記炭化珪素半導体基板内に、前記炭化珪素半導体基板のおもて面から離して所定の深さに設けられた、前記炭化珪素半導体基板より炭素、珪素以外の異種元素の密度が高い異種元素高密度領域と、
を備え、
前記異種元素は、マグネシウム、カルシウム、スカンジウム、チタン、バナジウム、クロム、またはマンガンであることを特徴とする炭化珪素エピタキシャル基板。 - 前記異種元素高密度領域の厚さは、0.1μm以上、1.0μm以下であることを特徴とする請求項1に記載の炭化珪素エピタキシャル基板。
- 前記異種元素高密度領域内の異種元素密度は、1×1014/cm3以上、1×1018/cm3以下であることを特徴とする請求項1または2に記載の炭化珪素エピタキシャル基板。
- 第1導電型の炭化珪素半導体基板と、
前記炭化珪素半導体基板内に、前記炭化珪素半導体基板のおもて面から離して所定の深さに設けられた、前記炭化珪素半導体基板より炭素、珪素以外の異種元素の密度が高い異種元素高密度領域と、
前記炭化珪素半導体基板のおもて面に接して設けられた、前記炭化珪素半導体基板より低不純物濃度の第1導電型の炭化珪素エピタキシャル層と、
前記炭化珪素エピタキシャル層の、前記炭化珪素半導体基板側に対して反対側の表面に設けられた第2導電型の第2半導体層と、
前記第2半導体層の表面に設けられた第1電極と、
前記炭化珪素半導体基板の裏面に設けられた第2電極と、
を備え、
前記異種元素は、マグネシウム、カルシウム、スカンジウム、チタン、バナジウム、クロム、またはマンガンであることを特徴とする炭化珪素半導体装置。 - 第1導電型の炭化珪素半導体基板のおもて面に、炭素、珪素以外の異種元素を0.1μm以上の深さでイオン注入し、前記炭化珪素半導体基板の内部に前記おもて面から離して異種元素高密度領域を設ける第1工程と、
前記異種元素高密度領域を設けた前記炭化珪素半導体基板のおもて面に、前記炭化珪素半導体基板より低不純物濃度の第1導電型の炭化珪素エピタキシャル層をエピタキシャル成長により形成する第2工程と、
を含み、
前記異種元素は、マグネシウム、カルシウム、スカンジウム、チタン、バナジウム、クロム、またはマンガンであることを特徴とする炭化珪素エピタキシャル基板の製造方法。 - 第1導電型の炭化珪素半導体基板のおもて面に、炭素、珪素以外の異種元素を0.1μm以上の深さで照射し、前記炭化珪素半導体基板の内部に前記おもて面から離して異種元素高密度領域を設ける第1工程と、
前記異種元素高密度領域を設けた前記炭化珪素半導体基板のおもて面に、前記炭化珪素半導体基板より低不純物濃度の第1導電型の炭化珪素エピタキシャル層をエピタキシャル成長により形成する第2工程と、
前記炭化珪素エピタキシャル層の、前記炭化珪素半導体基板側に対して反対側の表面に第1導電型の第2半導体層を形成する第3工程と、
前記第2半導体層の、前記炭化珪素半導体基板側に対して反対側の表面に第2導電型の第3半導体層を形成する第4工程と、
前記第3半導体層の表面に第1電極を形成する第5工程と、
前記炭化珪素半導体基板の裏面に第2電極を形成する第6工程と、
を含み、
前記異種元素は、マグネシウム、カルシウム、スカンジウム、チタン、バナジウム、クロム、またはマンガンであることを特徴とする炭化珪素半導体装置の製造方法。
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