JP7394045B2 - 多孔質ガラス母材の製造装置、および製造方法 - Google Patents
多孔質ガラス母材の製造装置、および製造方法 Download PDFInfo
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- 238000004519 manufacturing process Methods 0.000 title claims description 36
- 239000000463 material Substances 0.000 title claims description 25
- 239000005373 porous glass Substances 0.000 title claims description 25
- 150000001875 compounds Chemical class 0.000 claims description 40
- 239000002994 raw material Substances 0.000 claims description 39
- 238000009423 ventilation Methods 0.000 claims description 38
- 230000007246 mechanism Effects 0.000 claims description 25
- 238000003860 storage Methods 0.000 claims description 14
- 238000000151 deposition Methods 0.000 claims description 13
- 230000008021 deposition Effects 0.000 claims description 11
- 238000011144 upstream manufacturing Methods 0.000 claims description 8
- 150000003377 silicon compounds Chemical class 0.000 claims description 7
- 239000010419 fine particle Substances 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 5
- 150000002291 germanium compounds Chemical class 0.000 claims description 3
- 239000011521 glass Substances 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims 1
- 239000007789 gas Substances 0.000 description 35
- 229910003902 SiCl 4 Inorganic materials 0.000 description 16
- 206010040925 Skin striae Diseases 0.000 description 12
- 239000011261 inert gas Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 4
- 238000005253 cladding Methods 0.000 description 3
- 230000018044 dehydration Effects 0.000 description 3
- 238000006297 dehydration reaction Methods 0.000 description 3
- 239000002019 doping agent Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000004017 vitrification Methods 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229910006113 GeCl4 Inorganic materials 0.000 description 1
- 229910005793 GeO 2 Inorganic materials 0.000 description 1
- 208000036758 Postinfectious cerebellitis Diseases 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000012792 core layer Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- IEXRMSFAVATTJX-UHFFFAOYSA-N tetrachlorogermane Chemical compound Cl[Ge](Cl)(Cl)Cl IEXRMSFAVATTJX-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
- C03B19/1423—Reactant deposition burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C11/00—Multi-cellular glass ; Porous or hollow glass or glass particles
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1484—Means for supporting, rotating or translating the article being formed
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
- C03B37/01433—Reactant delivery systems for delivering and depositing additional reactants as liquids or solutions, e.g. for solution doping of the porous glass preform
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/31—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with germanium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/50—Multiple burner arrangements
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/70—Control measures
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/80—Feeding the burner or the burner-heated deposition site
- C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
- C03B2207/88—Controlling the pressure
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Glass Melting And Manufacturing (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
Description
PIC5での圧力を0.06MPaとし、個別通気路のPIC(105A、105B)での圧力がPIC5での圧力の50、70、80、または98%となるようにバルブ(101A、101B)7の開度を調整しSiCl4を流した。流量制御器(103A、103B)はレンジ0~1200cc/minでSiCl4用に調整した。その他条件は同一とし、多孔質ガラス母材を製造し、圧力変動が起きたときの流量制御器での流量変動および多孔質母材への脈理有無を確認した。その結果を表1に示す。
PIC15での圧力を0.06MPaとし、個別通気路のPIC(115A、115B)での圧力がPIC15での圧力の50、70、80、または98%となるようにバルブ(111A、111B)の開度を調整しGeCl4を流した。流量制御器(113A、113B)はレンジ0~50cc/minでGeCl4用に調整した。その他条件は同一とし、多孔質ガラス母材を製造し、圧力変動が起きたときの流量制御器での流量変動および多孔質母材への脈理有無を確認した。その結果を表2に示す。
2、12 貯留容器
3、13 蒸気発生機構
4、14 共通通気路
101A、101B、111A、111B、20A、20B バルブ
102A、102B、106A、106B、112A、112B、116A、116B 蒸気弁
103A、103B、113A、113B、21A、21B 流量制御器
5、15、105A、105B、115A、115B PIC
31A、31B VAD装置
32A、32B コア形成用バーナ
33A、33B、34A、34B クラッド形成用バーナ
40 制御部
Claims (4)
- 気化された原料化合物を、酸水素火炎中で原料微粒子を発生させ、発生させた前記原料微粒子を回転している出発部材上に付着させて多孔質ガラス母材を製造する堆積装置を複数備える多孔質ガラス母材の製造装置であって、
液体状の前記原料化合物を種類別に貯留する少なくとも1基の貯留容器と、
前記貯留容器内の前記原料化合物を気化させる少なくとも1基の蒸気発生機構と、
前記蒸気発生機構で気化された前記原料化合物を複数の前記堆積装置に供給する少なくとも1本の通気路とを備え、
前記通気路は、
複数の前記堆積装置に気化された前記原料化合物を供給するべく共用される共通通気路と、
気化された前記原料化合物を個々の前記堆積装置に向けて供給すべく前記共通通気路から分岐された複数の個別通気路とを備え、
複数の前記個別通気路は、
それぞれ、気化された前記原料化合物の流量を制御する流量制御器と、
気化された前記原料化合物の流通をオン/オフ制御する蒸気弁と、
前記流量制御器よりも上流に配置され、流路面積を調整することができるバルブと、を備え、
前記蒸気発生機構での気化した前記原料化合物の圧力に対して前記個別通気路における前記バルブの下流の圧力が60~95%となるように前記個別通気路が備える前記バルブの開度を調整する制御部をさらに備えることを特徴とする製造装置。 - 前記原料化合物は、シリコン化合物および/またはドープ用化合物であることを特徴とする請求項1に記載の製造装置。
- 前記ドープ用化合物は、ゲルマニウム化合物であることを特徴とする請求項2に記載の製造装置。
- 請求項1から3の何れか1項に記載の製造装置において、前記蒸気発生機構での気化した前記原料化合物の圧力に対して前記バルブの下流の圧力が60~95%となるように前記バルブの開度を調整することを特徴とする多孔質ガラス母材の製造方法。
Priority Applications (5)
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JP2020179250A JP7394045B2 (ja) | 2020-10-26 | 2020-10-26 | 多孔質ガラス母材の製造装置、および製造方法 |
US17/501,512 US11878929B2 (en) | 2020-10-26 | 2021-10-14 | Manufacturing apparatus and manufacturing method of porous glass base material |
CN202111226057.XA CN114477777A (zh) | 2020-10-26 | 2021-10-21 | 多孔玻璃基材的制造设备和制造方法 |
EP21204287.3A EP3988508A1 (en) | 2020-10-26 | 2021-10-22 | Manufacturing apparatus and manufacturing method of porous glass base material |
KR1020210141798A KR20220055427A (ko) | 2020-10-26 | 2021-10-22 | 다공질 유리 모재의 제조 장치, 및 제조 방법 |
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JP2020179250A JP7394045B2 (ja) | 2020-10-26 | 2020-10-26 | 多孔質ガラス母材の製造装置、および製造方法 |
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JP7394045B2 true JP7394045B2 (ja) | 2023-12-07 |
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US (1) | US11878929B2 (ja) |
EP (1) | EP3988508A1 (ja) |
JP (1) | JP7394045B2 (ja) |
KR (1) | KR20220055427A (ja) |
CN (1) | CN114477777A (ja) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000211929A (ja) | 1999-01-26 | 2000-08-02 | Shin Etsu Chem Co Ltd | シリカガラスの製造装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61254242A (ja) * | 1985-05-01 | 1986-11-12 | Sumitomo Electric Ind Ltd | 原料供給装置 |
JP3186446B2 (ja) * | 1994-07-27 | 2001-07-11 | 信越化学工業株式会社 | シリカガラスの製造方法 |
JP3707104B2 (ja) * | 1995-08-28 | 2005-10-19 | 住友電気工業株式会社 | 原料供給装置及び原料供給方法 |
JP5959792B1 (ja) * | 2015-01-08 | 2016-08-02 | 古河電気工業株式会社 | 気体分岐装置及びそれを用いたガラス微粒子堆積体の製造方法 |
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- 2020-10-26 JP JP2020179250A patent/JP7394045B2/ja active Active
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2021
- 2021-10-14 US US17/501,512 patent/US11878929B2/en active Active
- 2021-10-21 CN CN202111226057.XA patent/CN114477777A/zh active Pending
- 2021-10-22 EP EP21204287.3A patent/EP3988508A1/en active Pending
- 2021-10-22 KR KR1020210141798A patent/KR20220055427A/ko unknown
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2000211929A (ja) | 1999-01-26 | 2000-08-02 | Shin Etsu Chem Co Ltd | シリカガラスの製造装置 |
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US20220127181A1 (en) | 2022-04-28 |
KR20220055427A (ko) | 2022-05-03 |
US11878929B2 (en) | 2024-01-23 |
EP3988508A1 (en) | 2022-04-27 |
CN114477777A (zh) | 2022-05-13 |
JP2022070166A (ja) | 2022-05-12 |
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