JP7346262B2 - 回折光学素子、回折光学素子の製造方法、光学機器および撮像装置 - Google Patents

回折光学素子、回折光学素子の製造方法、光学機器および撮像装置 Download PDF

Info

Publication number
JP7346262B2
JP7346262B2 JP2019213739A JP2019213739A JP7346262B2 JP 7346262 B2 JP7346262 B2 JP 7346262B2 JP 2019213739 A JP2019213739 A JP 2019213739A JP 2019213739 A JP2019213739 A JP 2019213739A JP 7346262 B2 JP7346262 B2 JP 7346262B2
Authority
JP
Japan
Prior art keywords
resin
diffractive optical
optical element
cured product
element according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2019213739A
Other languages
English (en)
Japanese (ja)
Other versions
JP2021085948A (ja
JP2021085948A5 (https=
Inventor
真持 松本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2019213739A priority Critical patent/JP7346262B2/ja
Priority to US17/095,533 priority patent/US11719866B2/en
Priority to CN202011349667.4A priority patent/CN112946801B/zh
Publication of JP2021085948A publication Critical patent/JP2021085948A/ja
Publication of JP2021085948A5 publication Critical patent/JP2021085948A5/ja
Application granted granted Critical
Publication of JP7346262B2 publication Critical patent/JP7346262B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1842—Gratings for image generation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F126/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
    • C08F126/06—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a heterocyclic ring containing nitrogen
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1876—Diffractive Fresnel lenses; Zone plates; Kinoforms
    • G02B5/189—Structurally combined with optical elements not having diffractive power
    • G02B5/1895—Structurally combined with optical elements not having diffractive power such optical elements having dioptric power
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C08F220/303—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one or more carboxylic moieties in the chain
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/106—Esters of polycondensation macromers
    • C08F222/1067—Esters of polycondensation macromers of alcohol terminated epoxy functional polymers, e.g. epoxy(meth)acrylates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C08G75/02—Polythioethers
    • C08G75/04—Polythioethers from mercapto compounds or metallic derivatives thereof
    • C08G75/045—Polythioethers from mercapto compounds or metallic derivatives thereof from mercapto compounds and unsaturated compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1852—Manufacturing methods using mechanical means, e.g. ruling with diamond tool, moulding
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
  • Optical Elements Other Than Lenses (AREA)
JP2019213739A 2019-11-26 2019-11-26 回折光学素子、回折光学素子の製造方法、光学機器および撮像装置 Active JP7346262B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2019213739A JP7346262B2 (ja) 2019-11-26 2019-11-26 回折光学素子、回折光学素子の製造方法、光学機器および撮像装置
US17/095,533 US11719866B2 (en) 2019-11-26 2020-11-11 Diffractive optical element, method for producing diffractive optical element, optical device, and image pickup apparatus
CN202011349667.4A CN112946801B (zh) 2019-11-26 2020-11-26 衍射光学元件及其生产方法、光学设备和图像拾取装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019213739A JP7346262B2 (ja) 2019-11-26 2019-11-26 回折光学素子、回折光学素子の製造方法、光学機器および撮像装置

Publications (3)

Publication Number Publication Date
JP2021085948A JP2021085948A (ja) 2021-06-03
JP2021085948A5 JP2021085948A5 (https=) 2022-11-28
JP7346262B2 true JP7346262B2 (ja) 2023-09-19

Family

ID=75975329

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019213739A Active JP7346262B2 (ja) 2019-11-26 2019-11-26 回折光学素子、回折光学素子の製造方法、光学機器および撮像装置

Country Status (3)

Country Link
US (1) US11719866B2 (https=)
JP (1) JP7346262B2 (https=)
CN (1) CN112946801B (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7685751B2 (ja) * 2021-06-29 2025-05-30 株式会社精工技研 ホルダー一体複合型回折光学素子の製造方法
JP2023058288A (ja) * 2021-10-13 2023-04-25 キヤノン株式会社 光学素子、光学機器、撮像装置
WO2024095101A1 (en) * 2022-11-04 2024-05-10 3M Innovative Properties Company Optical construction including at least two films
JP2024093434A (ja) * 2022-12-27 2024-07-09 キヤノン株式会社 光学系及び表示装置
JP2025110946A (ja) * 2024-01-17 2025-07-30 キヤノン株式会社 光学素子、光学機器、撮像装置、及び光学素子の製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017179476A1 (ja) 2016-04-11 2017-10-19 三菱瓦斯化学株式会社 複合回折光学素子用の高屈折率低分散樹脂用組成物、及び、それを用いた複合回折光学素子
WO2018134871A1 (ja) 2017-01-17 2018-07-26 株式会社ニコン （メタ）アクリレート化合物、光学用樹脂添加剤、光学素子、及び光学装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6579673B2 (en) * 1998-12-17 2003-06-17 Kimberly-Clark Worldwide, Inc. Patterned deposition of antibody binding protein for optical diffraction-based biosensors
JP2005107298A (ja) 2003-09-30 2005-04-21 Nikon Corp 回折光学素子及び回折光学素子の製造方法
JP4872671B2 (ja) * 2004-12-20 2012-02-08 株式会社ニコン 密着複層型回折光学素子
KR101243901B1 (ko) * 2012-03-21 2013-03-20 주식회사 태성포리테크 알루미늄-고분자 수지 접합체 및 이의 제조방법
JP6887761B2 (ja) * 2016-05-31 2021-06-16 キヤノン株式会社 積層型の回折光学素子の製造方法
EP3570076B1 (en) * 2018-05-14 2022-05-11 Canon Kabushiki Kaisha Cured product, and optical element, diffractive optical element, optical apparatus, and imaging device using the cured product

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017179476A1 (ja) 2016-04-11 2017-10-19 三菱瓦斯化学株式会社 複合回折光学素子用の高屈折率低分散樹脂用組成物、及び、それを用いた複合回折光学素子
WO2018134871A1 (ja) 2017-01-17 2018-07-26 株式会社ニコン （メタ）アクリレート化合物、光学用樹脂添加剤、光学素子、及び光学装置

Also Published As

Publication number Publication date
JP2021085948A (ja) 2021-06-03
CN112946801A (zh) 2021-06-11
US20210157040A1 (en) 2021-05-27
US11719866B2 (en) 2023-08-08
CN112946801B (zh) 2024-05-28

Similar Documents

Publication Publication Date Title
JP7346262B2 (ja) 回折光学素子、回折光学素子の製造方法、光学機器および撮像装置
JP2024161182A (ja) 光学素子の製造方法、光学素子、光学機器および撮像装置
JP2021085948A5 (https=)
JP7753035B2 (ja) 光学素子、光学素子の製造方法、樹脂組成物、光学機器及び撮像装置
JP7204363B2 (ja) 回折光学素子、その製造方法および光学機器
JP7346278B2 (ja) 回折光学素子、光学機器および撮像装置
JP2023014556A (ja) 回折光学素子、光学機器、撮像装置および回折光学素子の製造方法
JP7451299B2 (ja) 回折光学素子、光学機器および撮像装置
CN114806062A (zh) 可聚合组合物、光学元件及其制造方法、光学设备和摄像装置
EP3722841A1 (en) Diffractive optical element, optical device, and imaging apparatus
JP2021184048A (ja) 回折光学素子、光学機器および撮像装置
JP7418079B2 (ja) 回折光学素子、光学機器、撮像装置
US12601864B2 (en) Optical element, optical equipment, and imaging apparatus
JP2020173429A (ja) 回折光学素子、光学機器および撮像装置
JP2022170558A (ja) 光学素子、光学機器、撮像装置および光学素子の製造方法
US20240111077A1 (en) Optical element, optical apparatus, and image pickup apparatus
JP7414399B2 (ja) 回折光学素子、光学機器、撮像装置および回折光学素子の製造方法
JP2026067613A (ja) 光学素子、樹脂組成物、光学機器及び撮像装置
US20250224543A1 (en) Resin composition, optical element, optical apparatus, image pickup apparatus, and method for manufacturing optical element
JP7433765B2 (ja) 光学素子、光学機器および撮像装置
JP2024043481A (ja) 樹脂組成物、光学素子、光学機器、撮像装置及び光学素子の製造方法
JP2025110946A (ja) 光学素子、光学機器、撮像装置、及び光学素子の製造方法
JP2021085950A (ja) 回折光学素子、光学機器および撮像装置
JP2024113839A (ja) 光学素子及び光学素子の製造方法
JP2021009199A (ja) 回折光学素子、回折光学素子の製造方法および撮像装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20221117

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20221117

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20230519

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20230530

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20230720

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20230808

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20230906

R151 Written notification of patent or utility model registration

Ref document number: 7346262

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151