JP7302897B2 - モジュールの製造方法 - Google Patents
モジュールの製造方法 Download PDFInfo
- Publication number
- JP7302897B2 JP7302897B2 JP2021134452A JP2021134452A JP7302897B2 JP 7302897 B2 JP7302897 B2 JP 7302897B2 JP 2021134452 A JP2021134452 A JP 2021134452A JP 2021134452 A JP2021134452 A JP 2021134452A JP 7302897 B2 JP7302897 B2 JP 7302897B2
- Authority
- JP
- Japan
- Prior art keywords
- resin
- package substrate
- semiconductor device
- acoustic wave
- wave device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 23
- 239000011347 resin Substances 0.000 claims description 213
- 229920005989 resin Polymers 0.000 claims description 213
- 239000000758 substrate Substances 0.000 claims description 104
- 239000004065 semiconductor Substances 0.000 claims description 62
- 229910052751 metal Inorganic materials 0.000 claims description 50
- 239000002184 metal Substances 0.000 claims description 50
- 238000000034 method Methods 0.000 claims description 26
- 239000000463 material Substances 0.000 claims description 15
- 238000010894 electron beam technology Methods 0.000 claims description 10
- 238000007747 plating Methods 0.000 claims description 10
- 229920001187 thermosetting polymer Polymers 0.000 claims description 10
- 239000004020 conductor Substances 0.000 claims description 5
- 238000001723 curing Methods 0.000 description 13
- 230000008569 process Effects 0.000 description 10
- 238000010586 diagram Methods 0.000 description 6
- 238000003475 lamination Methods 0.000 description 6
- 238000010897 surface acoustic wave method Methods 0.000 description 6
- 239000006059 cover glass Substances 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 229910000679 solder Inorganic materials 0.000 description 5
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 5
- 239000010408 film Substances 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000004075 alteration Effects 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000006071 cream Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000013007 heat curing Methods 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- WSMQKESQZFQMFW-UHFFFAOYSA-N 5-methyl-pyrazole-3-carboxylic acid Chemical compound CC1=CC(C(O)=O)=NN1 WSMQKESQZFQMFW-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000005243 fluidization Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 description 1
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- -1 polyethylene terephthalate Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders; Supports
- H03H9/10—Mounting in enclosures
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders; Supports
- H03H9/10—Mounting in enclosures
- H03H9/1007—Mounting in enclosures for bulk acoustic wave [BAW] devices
- H03H9/1042—Mounting in enclosures for bulk acoustic wave [BAW] devices the enclosure being defined by a housing formed by a cavity in a resin
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders; Supports
- H03H9/10—Mounting in enclosures
- H03H9/1064—Mounting in enclosures for surface acoustic wave [SAW] devices
- H03H9/1078—Mounting in enclosures for surface acoustic wave [SAW] devices the enclosure being defined by a foil covering the non-active sides of the SAW device
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/64—Filters using surface acoustic waves
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021134452A JP7302897B2 (ja) | 2021-08-19 | 2021-08-19 | モジュールの製造方法 |
CN202210464058.6A CN114785305A (zh) | 2021-08-19 | 2022-04-29 | 包含弹性波装置的模块的制造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021134452A JP7302897B2 (ja) | 2021-08-19 | 2021-08-19 | モジュールの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2023028625A JP2023028625A (ja) | 2023-03-03 |
JP7302897B2 true JP7302897B2 (ja) | 2023-07-04 |
Family
ID=82434081
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021134452A Active JP7302897B2 (ja) | 2021-08-19 | 2021-08-19 | モジュールの製造方法 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP7302897B2 (zh) |
CN (1) | CN114785305A (zh) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014155132A (ja) | 2013-02-13 | 2014-08-25 | Murata Mfg Co Ltd | 回路基板およびその製造方法 |
WO2016158050A1 (ja) | 2015-03-27 | 2016-10-06 | 株式会社村田製作所 | 弾性波装置、通信モジュール機器及び弾性波装置の製造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012009580A (ja) * | 2010-06-24 | 2012-01-12 | Panasonic Corp | 実装構造体の製造方法 |
-
2021
- 2021-08-19 JP JP2021134452A patent/JP7302897B2/ja active Active
-
2022
- 2022-04-29 CN CN202210464058.6A patent/CN114785305A/zh active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014155132A (ja) | 2013-02-13 | 2014-08-25 | Murata Mfg Co Ltd | 回路基板およびその製造方法 |
WO2016158050A1 (ja) | 2015-03-27 | 2016-10-06 | 株式会社村田製作所 | 弾性波装置、通信モジュール機器及び弾性波装置の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JP2023028625A (ja) | 2023-03-03 |
CN114785305A (zh) | 2022-07-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6154940A (en) | Electronic part and a method of production thereof | |
US7486160B2 (en) | Electronic component and manufacturing method thereof | |
JP2008182292A (ja) | 弾性波デバイス | |
JP2002184796A (ja) | 半導体装置及びその製造方法 | |
JP2007123506A (ja) | 回路モジュールの製造方法 | |
WO2017179300A1 (ja) | 弾性波装置及びその製造方法 | |
JP2023168426A (ja) | モジュールの製造方法 | |
JP7302897B2 (ja) | モジュールの製造方法 | |
JP7333965B2 (ja) | モジュール | |
CN117936530A (zh) | 一种射频模组制备方法及射频模组 | |
JP2004335496A (ja) | 電子デバイスのパッケージ、ベース基板、電子部品及びそれの製造方法 | |
JP2018201248A (ja) | 無線モジュール | |
JP4631912B2 (ja) | 弾性境界波装置の製造方法及び弾性境界波装置 | |
JP2013115664A (ja) | 弾性波デバイス及び多層基板 | |
JP2004147220A (ja) | Sawチップの構造、その製造方法、表面実装型sawデバイス、及びその製造方法 | |
JP2004153412A (ja) | 弾性表面波装置及びその製造方法 | |
JP2007027211A (ja) | 電子部品及びその製造方法 | |
JP7541324B2 (ja) | 弾性波デバイスパッケージ | |
JP2023102573A (ja) | 弾性波デバイスおよび弾性波デバイスの製造方法 | |
JPS62281360A (ja) | 半導体装置の製造方法 | |
JP7008377B1 (ja) | 弾性波デバイスおよびその弾性波デバイスを備えるモジュール | |
JPH07212013A (ja) | ボール・グリッド・アレイ及びボール・グリッド・アレイ用のプリント回路基板の製造方法 | |
JP5521016B2 (ja) | 弾性波デバイス | |
JP2004253529A (ja) | 半導体装置及びその製造方法 | |
JP7170845B2 (ja) | 電子部品及びその製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20230515 |
|
A871 | Explanation of circumstances concerning accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A871 Effective date: 20230515 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20230606 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20230615 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7302897 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |