JP7292799B2 - 修正方法 - Google Patents
修正方法 Download PDFInfo
- Publication number
- JP7292799B2 JP7292799B2 JP2019112540A JP2019112540A JP7292799B2 JP 7292799 B2 JP7292799 B2 JP 7292799B2 JP 2019112540 A JP2019112540 A JP 2019112540A JP 2019112540 A JP2019112540 A JP 2019112540A JP 7292799 B2 JP7292799 B2 JP 7292799B2
- Authority
- JP
- Japan
- Prior art keywords
- cutting
- holding surface
- chuck table
- cutting blade
- axis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
- B28D5/022—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
- B28D5/023—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels with a cutting blade mounted on a carriage
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0064—Devices for the automatic drive or the program control of the machines
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/007—Use, recovery or regeneration of abrasive mediums
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
- B28D5/0094—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work the supporting or holding device being of the vacuum type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68792—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the construction of the shaft
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Dicing (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Description
4 基台
6 X軸移動機構(加工送りユニット)
8 X軸ガイドレール
10 X軸移動テーブル
11 被加工物
12 X軸ボールねじ
14 X軸パルスモータ
16 θテーブル
18a テーブル基台
18b テーブルカバー
20 チャックテーブル
20a 枠体
20b 保持プレート
20c 保持面
20d 修正面
22 チャックテーブル
22a 円盤部
22b1 第1環状部
22b2 第2環状部
22c 保持面
22c1 内周領域
22c2 外周領域
22d 修正面
30 支持構造
32 切削ユニット移動機構(割り出し送りユニット、切り込み送りユニット)
34 Y軸ガイドレール
36 Y軸移動プレート
38 Y軸ボールねじ
40 Y軸パルスモータ
42 Z軸ガイドレール
44 Z軸移動プレート
46 Z軸ボールねじ
48 Z軸パルスモータ
50 切削ユニット
52 カメラ
54 スピンドル
56 切削ブレード
58 モータ
60 切削液供給ノズル
62 ブレード位置検出ユニット
A,B 回転軸
C 回転中心
D 半径
E1,E2,E3 経路
F1,F2 経路
Claims (3)
- 被加工物を保持面で吸引して保持可能であり且つ所定の回転軸の周りに回転可能なチャックテーブルと、切り刃を有する切削ブレードが装着され該切削ブレードの回転軸となるスピンドルを含む切削ユニットと、を備える切削装置の該保持面の高さを修正する修正方法であって、
該チャックテーブルを回転させる回転ステップと、
回転している該チャックテーブルの該保持面に、該スピンドルを回転軸として回転している該切削ブレードの下端を接触させることにより、該保持面を切削して、該保持面の高さを修正する切削ステップと、
を備え、該保持面は、円環状であることを特徴とする修正方法。 - 該切削ステップは、
該切削ブレードを該チャックテーブルの外周よりも外側に位置付けた状態で、該切削ブレードの厚さ未満の距離、該切削ユニットを該回転軸と平行な割り出し送り方向に移動させる割り出し送りステップと、
該切削ブレードの該割り出し送り方向の位置を所定時間固定する割り出し送り方向位置固定ステップと、を含み、
該切削ステップでは、該割り出し送りステップと該割り出し送り方向位置固定ステップとを繰り返すことで、該保持面の全体が切削されることを特徴とする請求項1記載の修正方法。 - 該切削ステップでは、回転している該保持面に該切削ブレードの下端を接触させた状態で、該切削ユニットを該回転軸と平行な割り出し送り方向に移動させることにより、該保持面を該チャックテーブルの該回転軸に沿う方向から見た場合に、該保持面の少なくとも一部を螺旋状に切削することを特徴とする請求項1記載の修正方法。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019112540A JP7292799B2 (ja) | 2019-06-18 | 2019-06-18 | 修正方法 |
KR1020200061413A KR20200144463A (ko) | 2019-06-18 | 2020-05-22 | 수정 방법 |
CN202010532996.6A CN112092224A (zh) | 2019-06-18 | 2020-06-12 | 修正方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019112540A JP7292799B2 (ja) | 2019-06-18 | 2019-06-18 | 修正方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2020203345A JP2020203345A (ja) | 2020-12-24 |
JP7292799B2 true JP7292799B2 (ja) | 2023-06-19 |
Family
ID=73749665
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019112540A Active JP7292799B2 (ja) | 2019-06-18 | 2019-06-18 | 修正方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP7292799B2 (ja) |
KR (1) | KR20200144463A (ja) |
CN (1) | CN112092224A (ja) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009202323A (ja) | 2008-02-29 | 2009-09-10 | Disco Abrasive Syst Ltd | 板状物の保持面の加工方法 |
WO2014098771A1 (en) | 2012-12-17 | 2014-06-26 | Agency For Science, Technology And Research | Wafer dicing apparatus and wafer dicing method |
JP2015050296A (ja) | 2013-08-30 | 2015-03-16 | 株式会社ディスコ | ウェーハの加工方法 |
JP2018062048A (ja) | 2016-10-14 | 2018-04-19 | 株式会社ディスコ | 保持テーブルの保持面形成方法、研削装置及び研削ホイール |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5321546B2 (ja) * | 1973-05-16 | 1978-07-03 | ||
JPH10217076A (ja) * | 1997-02-07 | 1998-08-18 | Ngk Insulators Ltd | ディスク基板の加工方法、加工装置および該加工方法に使用する外周刃砥石 |
JP3515917B2 (ja) | 1998-12-01 | 2004-04-05 | シャープ株式会社 | 半導体装置の製造方法 |
JP4153899B2 (ja) * | 2004-05-25 | 2008-09-24 | 株式会社ディスコ | 加工装置におけるチャックテーブルの加工方法 |
JP2008114336A (ja) * | 2006-11-06 | 2008-05-22 | Disco Abrasive Syst Ltd | チャックテーブルのセルフグラインディング方法 |
JP6637831B2 (ja) * | 2016-04-28 | 2020-01-29 | 株式会社ディスコ | デバイスの製造方法及び研削装置 |
-
2019
- 2019-06-18 JP JP2019112540A patent/JP7292799B2/ja active Active
-
2020
- 2020-05-22 KR KR1020200061413A patent/KR20200144463A/ko unknown
- 2020-06-12 CN CN202010532996.6A patent/CN112092224A/zh active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009202323A (ja) | 2008-02-29 | 2009-09-10 | Disco Abrasive Syst Ltd | 板状物の保持面の加工方法 |
WO2014098771A1 (en) | 2012-12-17 | 2014-06-26 | Agency For Science, Technology And Research | Wafer dicing apparatus and wafer dicing method |
JP2015050296A (ja) | 2013-08-30 | 2015-03-16 | 株式会社ディスコ | ウェーハの加工方法 |
JP2018062048A (ja) | 2016-10-14 | 2018-04-19 | 株式会社ディスコ | 保持テーブルの保持面形成方法、研削装置及び研削ホイール |
Also Published As
Publication number | Publication date |
---|---|
KR20200144463A (ko) | 2020-12-29 |
CN112092224A (zh) | 2020-12-18 |
JP2020203345A (ja) | 2020-12-24 |
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