JP7280359B2 - サンプルとアパーチャとの間の距離制御のための方法および装置 - Google Patents

サンプルとアパーチャとの間の距離制御のための方法および装置 Download PDF

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JP7280359B2
JP7280359B2 JP2021531777A JP2021531777A JP7280359B2 JP 7280359 B2 JP7280359 B2 JP 7280359B2 JP 2021531777 A JP2021531777 A JP 2021531777A JP 2021531777 A JP2021531777 A JP 2021531777A JP 7280359 B2 JP7280359 B2 JP 7280359B2
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Prior art keywords
sample
aperture
sample surface
pressure
electrostatic lens
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Japanese (ja)
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JP2022512113A (ja
Inventor
ペータル・アマン
アンデシュ・ニルソン
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シエンタ・オミクロン・アーベー
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/227—Measuring photoelectric effect, e.g. photoelectron emission microscopy [PEEM]
    • G01N23/2273—Measuring photoelectron spectrum, e.g. electron spectroscopy for chemical analysis [ESCA] or X-ray photoelectron spectroscopy [XPS]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/227—Measuring photoelectric effect, e.g. photoelectron emission microscopy [PEEM]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/285—Emission microscopes, e.g. field-emission microscopes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/085—Investigating materials by wave or particle radiation secondary emission photo-electron spectrum [ESCA, XPS]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/30—Accessories, mechanical or electrical features
    • G01N2223/34—Accessories, mechanical or electrical features sensing means for gap between source and detector
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/182—Obtaining or maintaining desired pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/188—Differential pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20221—Translation
    • H01J2237/20235—Z movement or adjustment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/285—Emission microscopes
    • H01J2237/2855—Photo-emission

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2021531777A 2018-12-07 2019-12-06 サンプルとアパーチャとの間の距離制御のための方法および装置 Active JP7280359B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
SE1851528-8 2018-12-07
SE1851528A SE542904C2 (sv) 2018-12-07 2018-12-07 Method and arrangement for distance control between a sample and an aperture
PCT/SE2019/051242 WO2020117124A1 (en) 2018-12-07 2019-12-06 Method and arrangement for distance control between a sample and an aperture

Publications (2)

Publication Number Publication Date
JP2022512113A JP2022512113A (ja) 2022-02-02
JP7280359B2 true JP7280359B2 (ja) 2023-05-23

Family

ID=68916519

Family Applications (1)

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JP2021531777A Active JP7280359B2 (ja) 2018-12-07 2019-12-06 サンプルとアパーチャとの間の距離制御のための方法および装置

Country Status (4)

Country Link
EP (1) EP3891774A1 (sv)
JP (1) JP7280359B2 (sv)
SE (1) SE542904C2 (sv)
WO (1) WO2020117124A1 (sv)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001266788A (ja) 2000-03-17 2001-09-28 Univ Tokyo 回折面アパチャー透過エネルギー制御方式の角度分解型電子分光器及びこの分光器を用いた分析方法
JP2004087483A (ja) 1991-05-30 2004-03-18 Kla Instr Corp 基板の自動検査システムと方法
JP2016146362A (ja) 2016-05-16 2016-08-12 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料画像取得方法、およびプログラム記録媒体
JP2016533612A (ja) 2013-09-25 2016-10-27 オックスフォード インストルメンツ ナノテクノロジー ツールス リミテッド 空気中でのｘ線分析

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4528451A (en) * 1982-10-19 1985-07-09 Varian Associates, Inc. Gap control system for localized vacuum processing
US4560880A (en) * 1983-09-19 1985-12-24 Varian Associates, Inc. Apparatus for positioning a workpiece in a localized vacuum processing system
US5103102A (en) * 1989-02-24 1992-04-07 Micrion Corporation Localized vacuum apparatus and method
US6300630B1 (en) * 1999-12-09 2001-10-09 Etec Systems, Inc. Annular differential seal for electron beam apparatus using isolation valve and additional differential pumping

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004087483A (ja) 1991-05-30 2004-03-18 Kla Instr Corp 基板の自動検査システムと方法
JP2001266788A (ja) 2000-03-17 2001-09-28 Univ Tokyo 回折面アパチャー透過エネルギー制御方式の角度分解型電子分光器及びこの分光器を用いた分析方法
JP2016533612A (ja) 2013-09-25 2016-10-27 オックスフォード インストルメンツ ナノテクノロジー ツールス リミテッド 空気中でのｘ線分析
JP2016146362A (ja) 2016-05-16 2016-08-12 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料画像取得方法、およびプログラム記録媒体

Also Published As

Publication number Publication date
SE542904C2 (sv) 2020-09-15
SE1851528A1 (sv) 2020-06-08
WO2020117124A1 (en) 2020-06-11
EP3891774A1 (en) 2021-10-13
JP2022512113A (ja) 2022-02-02

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